• Title/Summary/Keyword: Glass etching

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Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma

  • Kim, Hwa-Min;Seo, Sung Bo;Kim, Dong Young;Bae, Kang;Sohn, Sun Young
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.3
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    • pp.152-155
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    • 2013
  • $TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

Change in shear bond strength of orthodontic brackets using self-etching primer according to adhesive types and saliva contamination (Self-etching primer를 사용하여 교정용 브라켓 접착 시 접착제와 타액오염에 따른 전단결합강도 변화)

  • Nam, Eun-Hye;Yoon, Young-Ah;Kim, Il-Kyu
    • The korean journal of orthodontics
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    • v.35 no.6 s.113
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    • pp.433-442
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    • 2005
  • The purpose of this study was to evaluate and compare the shear bond strength of orthodontic brackets depending on the variety of adhesives and whether saliva exists, by using self-etching primer (SEP). Groups were divided according to the type of adhesive into resin adhesive (Trans bond XT) and resin-modified glass ionomer cement (Fuji Ortho LC). One group of resin adhesive used XT primer after etching with 37% phosphoric acid, and the other group used self-etching primer. One group of resin-modified glass ionomer cement only used etching for bonding, and the other group used SEP. Each of the groups were also classified by whether saliva was contaminated or not. and then the shear bond strength was measured. The results showed that when using resin adhesive, the shear bond strength of SEP was lower than the XT primer. In the resin-modified glass ionomer cement groups, the shear bond strength which depends on the priming method, did not have a meaningful difference statistically When saliva was contaminated, the group which used SEP, regardless of the adhesive variety, had a greater shear bond strength than the normal priming group. From these results, SEP showed a shear bond strength that is possible to be used clinically, regardless of the adhesive variety. It can especially be clinically useful to use SEP to bond brackets even on tooth surfaces contaminated with saliva, because it offers the appropriate bonding strength as well as shorter treatment time and easy application.

The Fabrication of Megasonic Agitated Module(MAM) for the Improved Characteristics of Wet Etching

  • Park, Tae-Gyu;Yang, Sang-Sik;Han, Dong-Chul
    • Journal of Electrical Engineering and Technology
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    • v.3 no.2
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    • pp.271-275
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    • 2008
  • The MAM(Megasonic Agitated Module) has been fabricated for improving the characteristics of wet etching. The characteristics of the MAM are investigated during the wet etching with and without megasonic agitation in this paper. The adoption of the MAM has improved the characteristics of wet etching, such as the etch rate, etch uniformity, and surface roughness. Especially, the etching uniformity on the entire wafer was less than ${\pm}1%$ in both cases of Si and glass. Generally, the initial root-mean-square roughness($R_{rms}$) of the single crystal silicon was 0.23nm. Roughnesses of 566nm and 66nm have been achieved with magnetic stirring and ultrasonic agitation, respectively, by some researchers. In this paper, the roughness of the etched Si surface is less than 60 nm. Wet etching of silicon with megasonic agitation can maintain nearly the original surface roughness during etching. The results verified that megasonic agitation is an effective way to improve etching characteristics of the etch rate, etch uniformity, and surface roughness and that the developed micromachining system is suitable for the fabrication of devices with complex structures.

Sem Study of the Adhesion of New Glass Ionomer Cements to Dentin (글라스 아이오노모 시멘트의 상아질 접착에 관한 주사전자현미경적 연구)

  • Pak, Jay
    • Journal of the Korean Academy of Esthetic Dentistry
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    • v.7 no.1
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    • pp.42-47
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    • 1998
  • This study was performed to compare the bonding mechanism of glass ionomers. In this study, hybrid glass ionomers were used for restoration(Fuji II LC, GC, Japan) as the material of choice. Two different etching solutions were used in this study, 35% phosphoric acid and 10% polyacrylic acid. The effect of two different conditioners to dentin surface of a primary molar was studied and compared by using scanning electron microscope. Further, the interface of the dentin surface and the hybrid glass ionomers were examined.

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A STUDY OF THE SHEAR BOND STRENGTH OF COMPOSITE RESIN TO LIGHT-CURING GLASS IONOMER CEMENTS (광중합형 글라스아이오노머 시멘트와 복합레진과의 전단결합강도에 관한 연구)

  • Kim, Deok;Min, Byung-Soon
    • Restorative Dentistry and Endodontics
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    • v.19 no.2
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    • pp.447-459
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    • 1994
  • The purpose of this study is to evaluate of shear bond strength of light-curing composite resin to light-curing glass ionomer cement. Composite resin and glass ionomer cement have been widely used as an esthetic filling materials in dental clinics. To achieve better clinical results, sandwich technic was developed with conpensating for disadvantages of these two materials. Especially, light-curing glass ionomer cement provided greately improved bonding strength of teeth or composite resin, and then excellent clinical results can be acquired. In this study, 6 commercial light-curing glass ionomer cements(3 commercial restorative materials : Fuji II LC, Variglass VLC, Vitremer, and 3 commercial lining materials : Fuji Lining LC, Baseline VLC, Vitrebond) were devided two groups. According to manufacturer's appointment, no surface treatment was referred to N groups. Supposing. of clinical practice, surface grinding with water spray at 320 grit sand paper, 40 seconds etching with 37% phosphoric acid, 20 seconds washing, 20 seconds air drying was referred to N groups. Totally 12 experimental groups were devided, and all 120 specimens from 10 specimens of each groups were made. After light-curing composite resin was bonded to light-curing glass ionomer cement, shear bond strength was tested by Instron universal testing machine between glass ionomer cement and composit resin. The data were analyzed statistically by Student's t-test and ANOVA. The obtained results were as follows; 1. In light-curing glass ionomer cement, restorative materials showed higher shear bond strength to composite resin than lining materials(p<0.05). 2. Variglass VLC of restorative material group and Baseline VLC of lining material group have highest shear bond strength to composite resin(p<0.001). 3. In light-curing glass ionomer cement, surface grinding and acid etching reduced shear bond strength to composite resin(p<0.001)}. 4. VGN group 1s highest shear bond strength to composite resin, VBE group is lowest shear bond strength to composite resin(p<0.001).

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Comparison of Properties of Polymer Based Glass Lenses by Chemical Etching Reaction (고분자 안경 렌즈의 재질별 화학적 식각 반응성 비교)

  • Lee, Junghwa;Noh, Hyeran
    • Journal of Korean Ophthalmic Optics Society
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    • v.17 no.2
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    • pp.119-126
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    • 2012
  • Purpose: To study changes in coating and lens materials after chemically etched different polymer based glass lenses in short-term and ambient condition using hydrofluoric acid. Methods: Vinyl ester polymer (Lens A) and thiourethane polymer (Lens B), both dyed in gray 70%, were etched in hydrofluoric acid solution for 5, 10, or 15 min. The mechanical properties, degrees of damages in hard coating, anti-reflection coating, and other coatings, rates of refractive index and light transmission of both polymer types were evaluated. Results: Rates of refractive index of both lens types were not changed significantly after chemical etching. However, anti-reflection coatings and hard coatings were removed and lens surfaces were damaged. As a results, UV light transmission of lenses increased and mechanical properties decreased. Chemical etching notably changed various properties of thiourethane polymer materials. Conclusions: Depending on types of polymer materials, chemical reactions by hydrofluoric acid were dissimilar. Thus, various properties of les materials were altered differently.

Etching of the PDP barrier rib material using laser beam (레이저빔에 의한 PDP 격벽 재료의 식각)

  • Ahn, Min-Young;Lee, Kyoung-Cheol;Lee, Hong-Kyu;Lee, Sang-Don;Lee, Cheon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.6
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    • pp.526-532
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    • 2000
  • The paste on the glass or fabrication of the PDP(Plasma Display Panel) barrier rib was selectively etched using focused A $r_{+}$ laser(λ=514 nm) and Nd:YAG(λ=532, 266 nm) laser irradiation. The depth of the etched grooves increase with increasing a laser fluence and decreasing a laser beam scan speed. Using second harmonic of Nd:YAG laser(532 nm) the etching threshold laser fluence was 6.5 mJ/c $m^2$ for the sample of PDP barrier rib. The thickness of 180 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5J/c $m^2$beam scan speed of 20${\mu}{\textrm}{m}$ /s. In order to increase the etch rate of the barrier rib material barrier rib samples heated by a resistive heater during laser irradiation. The heated sample has many defects and becomes to be fragile. This imperfection of the structure compared to the sample without heat treatment allows the effective etching by the focused laser beam. The etch rates were 65${\mu}{\textrm}{m}$/s and 270 ${\mu}{\textrm}{m}$/s at room temperature and 20$0^{\circ}C$, respectively.y.

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A Study of Mechanochemical Hyperfine-Writing Technique Using Deformation Induced Etch Hillock Phenomena (변형유기 식각 힐록 현상을 이용한 기계화학적 극미세 Writing 기법에 대한 연구)

  • Kang Chung Gil;Youn Sung Won
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.7 s.172
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    • pp.71-78
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    • 2005
  • The purpose of this study is to suggest a hyperfine maskless writing technique by using the nanoindentation and HF wet etching technique. Indents were made on the surface of Pyrex7740 glass by the hyperfine indentation process with a Berkovich diamond indenter, and they were etched in $50\;wr\%$ HF solution. After etching process, convex structure was obtained due to the deformation-induced hillock phenomena. In this study, effects of indentation process parameters (etching time, normal load, loading .ate, hold-time at the maximum load) on the morphologies of the indented surfaces after isotopic etching were investigated from an angle of deformation energies. Finally, sample characters were written to show the possibility of the application.

Effect of Deformation Energy on the Indentation Induced Etch Hillock (변형 에너지가 나노압입 유기 Hillock 현상에 미치는 영향)

  • Kim H. I.;Youn S. W.;Kang C. G.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.225-228
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    • 2005
  • The purpose of this study is to investigate effects of the plastic/elastic deformation energy on wet etching characterization on the surface of material by using the nanoindentation and HF wet etching technique. Indents were made on the surface of Pyrex 7740 glass by the hyperfine indentation process with a Berkovich diamond indenter, and they were etched in $50\;wt\%$ HF solution. After etching process, convex structure was obtained due to the deformation-induced hillock phenomena. In this study, effects of indentation process parameters (normal load, loading rate) on the morphologies of the indented surfaces after isotopic etching were investigated from an angle of deformation energies.

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Vertically Standing Graphene on Glass Substrate by PECVD

  • Ma, Yifei;Hwang, Wontae;Jang, Haegyu;Chae, Heeyeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.232.2-232.2
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    • 2014
  • Since its discovery in 2004, graphene, a sp2-hybridized 2-Dimension carbon material, has drawn enormous attention. A variety of approaches have been attempted, such as epitaxial growth from silicon carbide, chemical reduction of graphene oxide and CVD. Among these approaches, the CVD process takes great attention due to its guarantee of high quality and large scale with high yield on various transition metals. After synthesis of graphene on metal substrate, the subsequent transfer process is needed to transfer graphene onto various target substrates, such as bubbling transfer, renewable epoxy transfer and wet etching transfer. However, those transfer processes are hard to control and inevitably induce defects to graphene film. Especially for wet etching transfer, the metal substrate is totally etched away, which is horrendous resources wasting, time consuming, and unsuitable for industry production. Thus, our group develops one-step process to directly grow graphene on glass substrate in plasma enhanced chemical vapor deposition (PECVD). Copper foil is used as catalyst to enhance the growth of graphene, as well as a temperature shield to provide relatively low temperature to glass substrate. The effect of growth time is reported that longer growth time will provide lower sheet resistance and higher VSG flakes. The VSG with conductivity of $800{\Omega}/sq$ and thickness of 270 nm grown on glass substrate can be obtained under 12 min growing time. The morphology is clearly showed by SEM image and Raman spectra that VSG film is composed of base layer of amorphous carbon and vertically arranged graphene flakes.

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