• 제목/요약/키워드: Glass dielectric layer

검색결과 101건 처리시간 0.038초

Thermal Property of Phosphate Glasses for Low Firing Temperature in PDP

  • Park, Jun-Hyun;Jung, Byung-Hae;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.795-798
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    • 2002
  • Replacing Pb-free glass composition for the dielectric materials is expected in PDP industry. In this study, phosphate glasses, $P_2O_5$- ZnO- SnO (PZS), $P_2O_5$-ZnO-BaO (PZB) were selected for a new transparent dielectric. Thermal properties (Tg, CTE) were measured with differential thermal analyzer and thermal mechanical analyzer. The glass transition of the glasses was ranged at $365{\sim}405^{\circ}C$ for the PZS system and $5.9{\sim}9.5{\times}\;10^{-6}$ of thermal expansion were found. The PZB system showed $445{\sim}470^{\circ}C$ of glass transition. Thus, the glass compositions would be a potential candidate for a transparent dielectric layer in plasma display panel.

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초고집적소자의 층간절연막용 polysilazane계 spin on glass (SOG)에 관한 연구 (A study on the spin on glass (SOG) from polysilazane resin for the premetal dielectric (PMD) layer of sub-quarter micron devices)

  • 나사균;정석철;이재관;김진우;홍정의;이원준
    • 한국진공학회지
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    • 제9권1호
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    • pp.69-75
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    • 2000
  • We have investigated the feasibility of spin on glass (SOG) film from polysilazane-type resin as a premetal dielectric (PMD) layer of the next-generation ultra-large scale integrated (ULSI) devices. A commercial polysilazane resin and a polysilazane-type resin with oxidizing agent were spin-coated and cured to form SOG films. In order to study the effect of oxidizing agent and annealing, the SOG films were characterized as cured and after annealing at $400^{\circ}C$ to $900^{\circ}C$. the density and the resistance against wet chemical of the SOG films were improved by the addition of oxidizing agent, because oxidizing agent enhanced the conversion from polysilazane polymer to $SiO_2$. The hole profile issue associated with insufficient curing of polysilazane in narrow gaps was also resolved by oxidizing agent, while the gapfill capability of SOG was not deteriorated by oxidizing agent.

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Pb-Free 백색유전체에서 필러함량과 소성온도에 따른 유전체 특성 (Dielectric Characteristics on Filler Content and Sintering Temperature in Pb-Free White Dielectric Layer)

  • 안용태;최병현;지미정;이정민;김형순;정경원
    • 한국전기전자재료학회논문지
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    • 제21권8호
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    • pp.755-759
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    • 2008
  • For the development of a new white dielectric layer in plasma display panel, different $TiO_2$ types as a filler was add to the $Bi_2O_3$-BaO-ZnO glass matrix. The reflectance and dielectric constant of dielectric have been investigated as a function of the mixing content (rutile and anatase), and sintering temperature. The reflectance of dielectric sintered at the 520$^{\circ}C$ appeared most highly and suitable in terms of the adhesion and reflectance of the soda-lime glasses. Also, the thermal expansion coefficient of dielectric was found to be $85.6\times10^{-7}/K$, which was similar to that of the soda-lime glasses. Especially, the dielectric constants were not increased with increasing of $TiO_2$ filler contents.

후열처리 및 seeding 층이 초음파분무 MOCVD법에 의한 PLT 박막 제조 시 전기적 특성에 미치는 영향 (Effects of post-annealing and seeding layers on electrical properties of PLT thin films by MOCVD using ultrasonic spraying)

  • 이진홍;김기현;박병옥
    • 한국결정성장학회지
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    • 제12권5호
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    • pp.247-252
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    • 2002
  • $(Pb_{1-x}La_x)TiO_3$ (x = 0.1) 박막을 초음파분무 MOCVD법으로 ITO-coated glass 기판 위에 제조하였다. PLT 박막 제조 시 후열처리 및 seeding layer가 결정화 및 미세구조, 전기적 특성에 대한 영향을 알아보았다. 후열처리에 의하여 박막의 결정성은 향상되었고 미세구조에도 영향을 주었으며, 전기적 특성은 이들 특성의 변화에 의해서 향상되었다. 그리고 seeding layer에 의한 핵 생성자리 제공에 의하여 결정성의 향상과 grain 크기의 증가에 의하여 박막의 전기적 특성 또한 향상되었다. Seeding layer를 가지고 60분 동안 후열처리를 한 박막이 가장 우수한 전기적 특성을 나타내었으며 이 박막의 1 kHz에서 유전 상수는 213을 나타내었다.

Characteristics of Inorganic Silica-Neodymia Alloy Films as a Dielectric Layer of the Plasma Display Panel

  • Lee, Do-Kyung;Lee, Gi-Sung;Lee, Sang-Geul;Cho, Yong;Sohn, Sang-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.810-813
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    • 2003
  • Application of inorganic silica-neodymia alloy films grown by sputtering technology to the dielectric layer of plasma display panel (PDP) is presented. The experimental results reveal that dielectric constant of the alloy films increases with neodymia concentration. Also, the alloy films act as band rejection color filter owing to sharp absorptions originating in the intratransition within the 4f shell of the $Nd^{3+}$ ion. In the optical band pass region, the transmittances of the alloy films show higher than those of commercial glass-like dielectrics. As a result, the luminance of PDP device with the alloy dielectric layer is higher than that of device with conventional dielectrics, indicating wider color gamut and higher color purity.

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PMN 계 유전체 적용 EL 소자의 광전특성 연구 (The Study of Opto-electric Properties in EL Device with PMN Dielectric Layer)

  • 금정훈;한다솔;안성일;이성의
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.776-780
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    • 2009
  • In this study, the opto-electric properties of EL devices with PMN dielectric layer with variation of firing tempereature were investigated. For the PMN dielectric layer process, the paste was prepared by optimization of quantitative mixing of PMN powder, $BaTiO_3$, Glass Frit, $\alpha$-Terpineol and ethyl cellulose. The EL device stack consists of Alumina substrate ($Al_2O_3$), metallic electrode (Au), insulating layer (manufactured PMN paste), phosphor layer (ELPP- 030, ELK) and transparent electrode (ITO), which is well structure as a thick film EL device. The phase transformation properties of PMN dielectric with various firing temperatures of $150^{\circ}C$ to $850^{\circ}C$ was characterized by XRD. Also the opto-electric properties of EL devices with different firing temperature were investigated by LCR meter and spectrometer. We found the best opto-electric property was obtained at the condition of $550^{\circ}C$ firing which is 3432.96 $cd/m^2$ at 1948.3 pF Capacitance, 40 kHz Frequency, 40% Duty, Vth+330 V voltage.

The Effect of Dielectric Thickness and Barrier Rib Height on Addressing Time of Coplanar ac PDP

  • Lee, Sung-Hyun;Kim, Young-Dae;Shin, Joong-Hong;Cho, Jung-Soo;Park, Chung-Hoo
    • Journal of KIEE
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    • 제11권1호
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    • pp.41-45
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    • 2001
  • The addressing time should be reduced by modifying cell structure and/or driving method in order to replace the dual scan system by single scan and increase the luminance in large ac plasma display panel(PDP). In this paper, the effects of the dielectric layer thickness and the barrier rib height on the addressing time of ac PDP are investigated. It is found out that the addressing time was decreased with decreasing thickness of dielectric layer on the front glass and thickness of white dielectric layer on the rear glass. The decreasing rate were 160ns/10${\mu}{\textrm}{m}$ and 270nsd/10${\mu}{\textrm}{m}$, respectively. Also in case of decreasing the height of barrier rib, addressing time was decreased at the rate of 550ns/10${\mu}m$.

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투명 유전체 (PbO-B2O3-SiO2-Al2O3 계)와 Ag 전극과의 반응에 의한 Ag+과 Sn2+의 거동 (Behavior of Ag+ and Sn2+ After Reaction Between the Transparent Dielectric PbO-B2O3-SiO2-Al2O3 and Ag Electrodes)

  • 홍경준;박준현;허증수;김형준
    • 한국재료학회지
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    • 제12권5호
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    • pp.347-352
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    • 2002
  • A transparent dielectric of the $PbO-B_2O_3-SiO_2-A1_2O_3$ system which was a low melting glass has been used for PDP (Plasma Display Panel), but it has a problem which is a reaction to be occurred between a transparent dielectric layer and electrodes (Ag, ITO) after firing. This research was conducted for ion migration of $Ag^+\$ and $Sn^ {2+}$ during firing three different frits of low melting glass. The result showed that yellowing phenomena occurred through a chemical reaction between $Ag^+\$and $Sn^ {2+}$ at 550~58$0^{\circ}C$ for 20~60 min. In addition, it was confirmed that the migration of $Sn^{2+}$ from ITO electrode made a strong effect on the yellowing phenomena.

Glass Frit의 첨가에 따른 BaTiO3 소결체의 유전 특성 및 미세구조 변화 (Effects of Glass Frit Addition on Microstructures and Dielectric Properties of Sintered BaTiO3 Ceramics)

  • 우덕현;윤만순;손용호;류성림;어순철;권순용
    • 한국전기전자재료학회논문지
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    • 제23권3호
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    • pp.206-210
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    • 2010
  • $BaTiO_3$ dielectric ceramics are widely used to multi-layer ceramic capacitor. The $BaTiO_3$ powder was synthesized at $950^{\circ}C$ by using a solid state reaction and grinded by using a high-energy mill. And then, 2.53 wt% glass frit was added to the synthesized $BaTiO_3$ powders for lowering the sintering temperature. The mixed powders were sintered at various temperatures of $1170^{\circ}C$, $1200^{\circ}C$, $1230^{\circ}C$. Microstructures of the sintered $BaTiO_3$ ceramics were inspected by SEM and crystal structures were analyzed by XRD method. The relative dielectric constant was measured by using a impedance/gain phase analyzer. The synthesized $BaTiO_3$ powder had the tetragonal perovskite structure without secondary phase and the particle size was below 200 nm. The relative densities measured at the samples sintered at the temperature above $1200^{\circ}C$ were about 95%. The relative dielectric constant showed maximum value of 2310, which was measured in the specimen sintered at $1200^{\circ}C$. From these results, we could know that the added glass frit had effects on both lowering the sintering temperature and improving the dielectric property.

Glass-Al2O3 복합소재를 원료로 한 LTCC 다층회로 기판의 제조 (Fabrication of LTCC Multi-layer Circuit Board made of Glass-Al2O3 Composites)

  • 곽훈;전형도;김환;이원재;신병철;김일수
    • 한국전기전자재료학회논문지
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    • 제21권6호
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    • pp.509-516
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    • 2008
  • Multi-layer circuit card for semiconductor inspection was fabricated by LTCC technology. After a proper impedance design without electrical interference, ceramic tapes with the composition of $CaO-Al_2O_3-SiO_2-B_2O_3$ glass and $Al_2O_3$ were prepared. The electrode with silver paste printed on the tape. Printed ceramic sheets were then laminated and sintered. Densities and dielectric properties were measured. The microstructure, fracture surface of the region of via and matching state of substrate-electrode were observed. The durability of plated outside electrode were examined by hardness and scratch test.