• 제목/요약/키워드: Gate charge

검색결과 341건 처리시간 0.031초

Active RFID를 이용한 실내 무선 위치 인식 기반 스마트 센서 빌딩 구현에 관한 연구 (A Study on Realization of System in Wireless Location Awareness Technology Using Ubiquitous Active RFID)

  • 정창덕
    • 지능정보연구
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    • 제12권3호
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    • pp.83-93
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    • 2006
  • 이 논문은 RFID를 이용한 무선 위치 인식 기술에 대한 것이다. 데이터의 RF 분석에 의한 수신된 신호의 강도로써 위치를 파악하고 위치 특성을 이해하는 실험을 하였다. 이 실험 시스템은 외부 환경 요인을 고려한 상태에서 5000대의 단말기를 이용하여 연구하였다. 이 위치 서비스는 특히 구매, 물류, 제조와 같은 일반산업, 자동조명/공조연동, 주차장 GATE 연동 서비스 등과 같은 많은 산업에서 이용될 것이다. 이 기술의 최적 솔루션은 일상생활의 지능형 정보가 필요하는 데이터의 저장과 접촉 비접촉에 토대를 둔 스마트 카드(전화카드, 은행카드..)등에도 이용될 것이다. 실내 위치 실험 방법은 서비스 및 추정된 위치 데이터를 이용한다. 이 연구의 결과는 아래와 같다. 첫째, Active RFID의 위치인식 시스템 설치 운영의 효율성과 둘째, 실내 무선위치 시스템의 추후 지능형 정보가 필요하는 여러 분야에서의 적용 가능성실험에 있다.

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Scaled SONOSFET를 이용한 NAND형 Flash EEPROM (The NAND Type Flash EEPROM using the Scaled SCNOSFET)

  • 김주연;김병철;김선주;서광열
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권1호
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    • pp.1-7
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    • 2000
  • The SNOSFET memory devices with ultrathin ONO(tunnel oxide-nitride-blocking oxide) gate dielectric were fabricated using n-well CMOS process and investigated its characteristics. The thicknesses of tunnel oxide, nitride and blocking oxide were $23{\AA},\; 53{\AA}\; and\; 33{\AA}$, respectively. Auger analysis shows that the ONO layer is made up of $SiO_2(upper layer of blocking oxide)/O-rich\; SiO_x\N\_y$. It clearly shows that the converting layer with $SiO_x\N\_y(lower layer of blocking oxide)/N-rich SiO_x\N\_y(nitride)/O-rich SiO_x\N\_y(tunnel oxide)$. It clearly shows that the converting layer with $SiO_x\N\_y$ phase exists near the interface between the blocking oxide and nitride. The programming condition of +8 V, 20 ms, -8 V, 50 ms is determined and data retention over 10 years is obtained. Under the condition of 8 V programming, it was confirmed that the modified Fowler-Nordheim tunneling id dominant charge transport mechanism. The programmed threshold voltage is distributed less than 0.1 V so that the reading error of memory stated can be minimized. An $8\times8$ NAND type flash EEPROM with SONOSFET memory cell was designed and simulated with the extracted SPICE parameters. The sufficient read cell current was obtained and the upper limit of $V_{TH}$ for write state was over 2V.

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The Performance Improvement of a Linear CCD Sensor Using an Automatic Threshold Control Algorithm for Displacement Measurement

  • Shin, Myung-Kwan;Choi, Kyo-Soon;Park, Kyi-Hwan
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2005년도 ICCAS
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    • pp.1417-1422
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    • 2005
  • Among the sensors mainly used for displacement measurement, there are a linear CCD(Charge Coupled Device) and a PSD(Position Sensitive Detector) as a non-contact type. Their structures are different very much, which means that the signal processing of both sensors should be applied in the different ways. Most of the displacement measurement systems to get the 3-D shape profile of an object using a linear CCD are a computer-based system. It means that all of algorithms and mathematical operations are performed through a computer program to measure the displacement. However, in this paper, the developed system has microprocessor and other digital components that make the system measure the displacement of an object without a computer. The thing different from the previous system is that AVR microprocessor and FPGA(Field Programmable Gate Array) technology, and a comparator is used to play the role of an A/D(Analog to Digital) converter. Furthermore, an ATC(Automatic Threshold Control) algorithm is applied to find the highest pixel data that has the real displacement information. According to the size of the light circle incident on the surface of the CCD, the threshold value to remove the noise and useless data is changed by the operation of AVR microprocessor. The total system consists of FPGA, AVR microprocessor, and the comparator. The developed system has the improvement and shows the better performance than the system not using the ATC algorithm for displacement measurement.

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GaN FET을 이용한 토템폴 구조의 브리지리스 부스트 PFC 컨버터 (Totem-pole Bridgeless Boost PFC Converter Based on GaN FETs)

  • 장바울;강상우;조보형;김진한;서한솔;박현수
    • 전력전자학회논문지
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    • 제20권3호
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    • pp.214-222
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    • 2015
  • The superiority of gallium nitride FET (GaN FET) over silicon MOSFET is examined in this paper. One of the outstanding features of GaN FET is low reverse-recovery charge, which enables continuous conduction mode operation of totem-pole bridgeless boost power factor correction (PFC) circuit. Among many bridgeless topologies, totem-pole bridgeless shows high efficiency and low conducted electromagnetic interference performance, with low cost and simple control scheme. The operation principle, control scheme, and circuit implementation of the proposed topology are provided. The converter is driven in two-module interleaved topology to operate at a power level of 5.5 kW, whereas phase-shedding control is adopted for light load efficiency improvement. Negative bias circuit is used in gate drivers to avoid the shoot-through induced by high speed switching. The superiority of GaN FET is verified by constructing a 5.5 kW prototype of two-module interleaved totem-pole bridgeless boost PFC converter. The experiment results show the highest efficiency of 98.7% at 1.6 kW load and an efficiency of 97.7% at the rated load.

Application of Graphene in Photonic Integrated Circuits

  • 김진태;최성율;최춘기
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.196-196
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    • 2012
  • Graphene, two-dimensional one-atom-thick planar sheet of carbon atoms densely packed in a honeycomb crystal lattice, has grabbled appreciable attention due to its extraordinary mechanical, thermal, electrical, and optical properties. Based on the graphene's high carrier mobility, high frequency graphene field effect transistors have been developed. Graphene is useful for photonic components as well as for the applications in electronic devices. Graphene's unique optical properties allowed us to develop ultra wide-bandwidth optical modulator, photo-detector, and broadband polarizer. Graphene can support SPP-like surface wave because it is considered as a two-dimensional metal-like systems. The SPPs are associated with the coupling between collective oscillation of free electrons in the metal and electromagnetic waves. The charged free carriers in the graphene contribute to support the surface waves at the graphene-dielectric interface by coupling to the electromagnetic wave. In addition, graphene can control the surface waves because its charge carrier density is tunable by means of a chemical doping method, varying the Fermi level by applying gate bias voltage, and/or applying magnetic field. As an extended application of graphene in photonics, we investigated the characteristics of the graphene-based plasmonic waveguide for optical signal transmission. The graphene strips embedded in a dielectric are served as a high-frequency optical signal guiding medium. The TM polarization wave is transmitted 6 mm-long graphene waveguide with the averaged extinction ratio of 19 dB at the telecom wavelength of $1.31{\mu}m$. 2.5 Gbps data transmission was successfully accomplished with the graphene waveguide. Based on these experimental results, we concluded that the graphene-based plasmonic waveguide can be exploited further for development of next-generation integrated photonic circuits on a chip.

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홀로그래픽 WORM의 하드웨어 채널 디코더 (Hardware Channel Decoder for Holographic WORM Storage)

  • 황의석;윤필상;김학선;박주연
    • 정보저장시스템학회논문집
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    • 제1권2호
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    • pp.155-160
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    • 2005
  • In this paper, the channel decoder promising reliable data retrieving in noisy holographic channel has been developed for holographic WORM(write once read many) system. It covers various DSP(digital signal processing) blocks, such as align mark detector, adaptive channel equalizer, modulation decoder and ECC(error correction code) decoder. The specific schemes of DSP are designed to reduce the effect of noises in holographic WORM(H-WORM) system, particularly in prototype of DAEWOO electronics(DEPROTO). For real time data retrieving, the channel decoder is redesigned for FPGA(field programmable gate array) based hardware, where DSP blocks calculate in parallel sense with memory buffers between blocks and controllers for driving peripherals of FPGA. As an input source of the experiments, MPEG2 TS(transport stream) data was used and recorded to DEPROTO system. During retrieving, the CCD(charge coupled device), capturing device of DEPROTO, detects retrieved images and transmits signals of them to the FPGA of hardware channel decoder. Finally, the output data stream of the channel decoder was transferred to the MPEG decoding board for monitoring video signals. The experimental results showed the error corrected BER(bit error rate) of less than $10^{-9}$, from the raw BER of DEPROTO, about $10^{-3}$. With the developed hardware channel decoder, the real-time video demonstration was possible during the experiments. The operating clock of the FPGA was 60 MHz, of which speed was capable of decoding up to 120 mega channel bits per sec.

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A Unified Analytical One-Dimensional Surface Potential Model for Partially Depleted (PD) and Fully Depleted (FD) SOI MOSFETs

  • Pandey, Rahul;Dutta, Aloke K.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제11권4호
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    • pp.262-271
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    • 2011
  • In this work, we present a unified analytical surface potential model, valid for both PD and FD SOI MOSFETs. Our model is based on a simplified one dimensional and purely analytical approach, and builds upon an existing model, proposed by Yu et al. [4], which is one of the most recent compact analytical surface potential models for SOI MOSFETs available in the literature, to improve its accuracy and remove its inconsistencies, thereby adding to its robustness. The model given by Yu et al. [4] fails entirely in modeling the variation of the front surface potential with respect to the changes in the substrate voltage, which has been corrected in our modified model. Also, [4] produces self-inconsistent results due to misinterpretation of the operating mode of an SOI device. The source of this error has been traced in our work and a criterion has been postulated so as to avoid any such error in future. Additionally, a completely new expression relating the front and back surface potentials of an FD SOI film has been proposed in our model, which unlike other models in the literature, takes into account for the first time in analytical one dimensional modeling of SOI MOSFETs, the contribution of the increasing inversion charge concentration in the silicon film, with increasing gate voltage, in the strong inversion region. With this refinement, the maximum percent error of our model in the prediction of the back surface potential of the SOI film amounts to only 3.8% as compared to an error of about 10% produced by the model of Yu et al. [4], both with respect to MEDICI simulation results.

응답 시간을 향상 시킨 외부 커패시터가 없는 Low-Dropout 레귤레이터 회로 (A Capacitorless Low-Dropout Regulator With Enhanced Response Time)

  • 여재진;노정진
    • 전기전자학회논문지
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    • 제19권4호
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    • pp.506-513
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    • 2015
  • 본 논문에서는 외부 커패시터가 없는 low-dropout (LDO) 레귤레이터를 설계하였으며, 대기 전류는 $4.5{\mu}A$ 이다. 제안하는 LDO 레귤레이터는 정밀한 로드 레귤레이션과 빠른 응답 속도를 만족하기 위해 두 개의 증폭기를 사용 하였고, 높은 이득을 갖는 증폭기와 빠른 속도 및 높은 슬루율을 가지는 증폭기로 구성 되어 있다. 이와 함께 패스 트랜지스터의 게이트에 존재하는 큰 기생 커패시터에 전류를 빠르게 충 방전시키기 위해, 전류 부스팅 회로를 추가하였다. 이를 통해 부하 전류 변화 시 응답 시간을 향상 시키게 된다. 설계된 회로는 $0.11-{\mu}m$ CMOS 공정으로 제작되었다. 최대 200mA 의 부하 전류를 구동할 수 있으며, 출력 전압 변동은 260mV, 회복 시간은 $0.8{\mu}s$ 을 측정하였다.

플래시메모리를 위한 Scaled SONOSFET NVSM의 프로그래밍 조건과 특성에 관한 연구 (A Study on the Characteristics and Programming Conditions of the Scaled SONOSFET NVSM for Flash Memory)

  • 박희정;박승진;남동우;김병철;서광열
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.914-920
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    • 2000
  • When the charge-trap type SONOS(polysilicon-oxide-nitride-oxide-semiconductor) cells are used to flash memory, the tunneling program/erase condition to minimize the generation of interface traps was investigated. SONOSFET NVSM(Nonvolatile Semiconductor Memory) cells were fabricated using 0.35 ㎛ standard memory cell embedded logic process including the ONO cell process, based on retrograde twin-well, single-poly, single metal CMOS(Complementary Metal Oxide Semiconductor) process. The thickness of ONO triple-dielectric for the memory cell is tunnel oxide of 24 $\AA$, nitride of 74 $\AA$, blocking oxide of 25 $\AA$, respectively. The program mode(V$\_$g/=7, 8, 9 V, V$\_$s/=V$\_$d/=-3 V, V$\_$b/=floating) and the erase mode(V$\_$g/=-4, -5, -6 V, V$\_$s/=V$\_$d/=floating, V$\_$b/=3 V) by MFN(Modified Fowler-Nordheim) tunneling were used. The proposed programming condition for the flash memory of SONOSFET NVSM cells showed less degradation(ΔV$\_$th/, S, G$\_$m/) characteristics than channel MFN tunneling operation. Also, the program inhibit conditins of unselected cell for separated source lines NOR-type flash memory application were investigated. we demonstrated that the phenomenon of the program disturb did not occur at source/drain voltage of 1 V∼12 V and gate voltage of -8 V∼4 V.

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펄스 레이저 증착법으로 증착된 $MgTiO_3$박막의 전기적 특성 분석 (Electrical Properties Of MgTiO$_3$ thin films grown by pulsedd laser deposition method)

  • 안순홍;노용한;이영훈;강신충;이재찬
    • 한국진공학회지
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    • 제9권3호
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    • pp.249-253
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    • 2000
  • 차세대 마이크로파 유전체 소자에 응용하기 위한 $MgTiO_3$ 박막을 펄스 레이저 증착법(PLD, pulsed laser deposition)을 이용하여 400-$500^{\circ}C$에서 비정질 상태로 실리콘 기판 위에 성장시킨 후 전기적 특성을 분석하였다. PLD로 증착된 $MgTiO_3$ 박막의 전기적 특성은 성장시 온도에 의존하였다. 즉, 증착 온도가 낮아짐에 따라 $MgTiO_3$ 박막 내부에 존재하는 이상정전하 결함 밀도가 증가하였으며, 이들 결함과 실리콘 기판과의 전하교환에 의하여 High Frequency(HF) C-V 곡선이 음의 방향으로 이동하는 현상이 관측된 것으로 사료된다. 또한, 증착 온도간 HF C-V 곡선 이동 폭 및 이상정전하 밀도는 ~l00$\AA$ 두께의 $SiO_2$ 중간층을 사용할 경우에 현저히 감소함을 확인하였다.

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