• Journal of the Semiconductor & Display Technology
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• v.10 no.2
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• pp.13-17
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• 2011

We have developed a new energy-consuming monitoring system that has made it possible to measure the energy consumption of a gas scrubber, one of semiconductor processing equipments, and installed this system to the gas scrubber under operating at a manufacture site. Using this system, we have measured consumptions of electric power and processing gas consumed at standby to operating mode. In case of the gas scrubber, processing gas flows continuously into it at standby and operating mode. Therefore, if the electric power has been supplied, the processing gas can flows into the device for 24 hours. Moreover, at operating of gas scrubber, the amount of electricity consumption is 5 kWh. At Standby of gas scrubber, it spends 3kwh. It is certain that the energy consumption is greater at operating mode than at standby mode. The carbon emission rates from 24 hour gas scrubber operation are 236 $kgCO_2$/day of $N_2$, 57 $kgCO_2$/day of electric power and 0.001 $kgCO_2$/day of cooling water. Most of carbon is emitted from $N_2$ gas and electric power consumption.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.1046-1050
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• 2003

In this paper, we describe study on the development or multi-path ultrasonic gas flowmeter using a transit time method. This system includes 5 pairs of ultrasonic transducers. ultrasonic signal processing unit using switch matrix method, computation algorithm of gas flow rate, spool piece type multi-path pipe unit. We have developed enhanced type of main ultrasonic signal processing unit using switch matrix method fer multi-path ultrasonic gas flowmeter. Also, we have developed the new transmitting ＆ receiving method of ultrasonic waves and the new signal processing algorithm for the computation of ultrasonic transit time from received ultrasonic waves. In this study, we have designed more compact signal processing unit compared with the conventional hardware system of multi-path ultrasonic gas flowmeter. We have confirmed its reliability for multi-path ultrasonic gas flowmeter through the laboratory test using calibration system. In the future. we will perform the field test for the developed system in the POSCO gas line.

• Journal of Information Processing Systems
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• v.16 no.5
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• pp.1095-1104
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• 2020

This paper introduces a design scheme of intelligent gas valve management and service system based on Internet. This scheme adds sensor and general packet radio service (GPRS) modules to the traditional gas valve and establishes communication connection between gas valve and the server through wireless packet communication technology, which makes the traditional gas valve have the networking ability. Compared with the traditional gas valve management and service business, the method proposed in this paper is more convenient and efficient.

• Journal of Sensor Science and Technology
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• v.17 no.6
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• pp.406-413
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• 2008

We have been implemented simple statistical pattern recognition methods for harmful gases classification using gas sensors array fabricated by MEMS (Micro Electro Mechanical System) technology. The performance of pattern recognition method as a gas classifier is highly dependent on the choice of pre-processing techniques for sensor and sensors array signals and optimal classification algorithms among the various classification techniques. We carried out pre-processing for each sensor's signal as well as sensors array signals to extract features for each gas. We adapted simple statistical pattern recognition algorithms, which were PCA (Principal Component Analysis) for visualization of patterns clustering and MLR (Multi-Linear Regression) for real-time system implementation, to classify harmful gases. Experimental results of adapted pattern recognition methods with pre-processing techniques have been shown good clustering performance and expected easy implementation for real-time sensing system.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.09a
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• pp.91-95
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• 1998

Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/H2 gas system during the deposition. the schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

• Journal of Multimedia Information System
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• v.2 no.3
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• pp.249-254
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• 2015

This article considers the development of an integrated control and safety management system (ICSS) and its interfaces with an automated enterprise management system (AEMS) in light of the establishment of industrial enterprises with intelligent model of centralized management on the example of Kandym GPP.

• Journal of Ceramic Processing Research
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• v.13 no.spc2
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• pp.407-410
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• 2012

The properties of Al-doped ZnO (AZO) films were investigated as a function of H2/(Ar + H2) gas ratio using an AZO (2 wt% Al2O3) ceramic target in a radio frequency (RF) magnetron sputtering system. The deposition process was done at 200 ℃ and in 2 × 10-2Torr working pressure and with various ratios of H2/(Ar + H2) gas. During the AZO film deposition process, partial H2 gas affected the AZO film characteristics. The electron resistivity (~ 9.21 × 10-4 Ωcm) was lowest and mobility (~17.8 ㎠/Vs) was highest in AZO films when the H2/(Ar + H2) gas ratio was 2.5%. When the H2/(Ar + H2) gas ratio was increased above 2.5%, the electron resistivity increased and mobility decreased with increasing H2/(Ar + H2) gas ratio in AZO films. The carrier concentration increased with increasing H2/(Ar + H2) gas ratio from 0% to 7.5%. This phenomenon was explained by reaction of hydrogen and oxygen and additional formation of oxygen vacancy. The average optical transmission in the visible light wavelength region over 90% and an orientation of the deposition was [002] orientation for AZO films grown with all H2/(Ar + H2) gas ratios.

• Journal of the Korean Society of Combustion
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• v.15 no.3
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• pp.8-14
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• 2010

Fuel processing systems which convert fuel into rich gas (such as stream reforming, partial oxidation, autothermal reforming) need high temperature environment ($600{\sim}1,000^{\circ}$). Generally, anode-off gas or mixture of anode-off gas and LNG is used as input gas of fuel reformer. In order to make efficient and low emission burner system for fuel reformer, it is necessary to elucidate the combustion and emission characteristic of fuel reformer burner. The purpose of this study is to develop a porous premixed flat ceramic burner that can be used for 1~5 kW fuel cell reformer. Ceramic burner experiments using natural gas, hydrogen gas, anode off gas, mixture of natural gas & anode off gas were carried out respectively to investigate the flame characteristics by heating capacity and equivalence ratio. Results show that the stable flat flames can be established for natural gas, hydrogen gas, anode off gas and mixture of natural gas & anode off gas as reformer fuel in the porous ceramic burner. For all of fuels, their burning velocities become smaller as the equivalence ratio goes to the lean mixture ratio, and a lift-off occurs at lean limit. Flame length in hydrogen and anode off gas became longer with increasing the heat capacity. In particular, the blue surface flame is found to be very stable at a very lean equivalence ratio at heat capacity and different fuels. The exhausted NOx and CO measurement shows that the blue surface flame represents the lowest NOx and CO emissions since it remains very stable at a lean equivalence ratio.

• KSTLE International Journal
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• v.4 no.2
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• pp.56-59
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• 2003

Boron carbide thin coatings were deposited on silicon wafers by DC magnetron sputtering using a ${B}_4$C target with Ar as processing gas. Various amounts of methane gas (${CH}_4$) were added in the deposition process to better understand their influence on tribological properties of the coatings. Reciprocating wear tests employing an oscillating friction wear tester were performed to investigate the tribological behaviors of the coatings in ambient environment. The chemical characteristics of the coatings and worn surfaces were studied using X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). It revealed that ${CH}_4$addition to Ar processing gas strongly affected the tribologcal properties of sputtered boron carbide coating. The coefficient of friction was reduced approximately from 0.4 to 0.1, and wear resistance was improved considerably by increasing the ratio of ${CH}_4$gas component from 0 to 1.2 vol %. By adding a sufficient amount of ${CH}_4$(1.2 %) in the deposition process, the boron carbide coating exhibited lowest friction and highest wear resistance.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2003.11a
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• pp.78-84
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• 2003

Boron carbide thin coatings were deposited on silicon wafers by DC magnetron sputtering using a $B_4C$ target with As as processing gas. Various amounts of methane gas $(CH_4)$ were added in the deposition process to better understand their influence on tribological properties of the coatings. Reciprocating wear tests employing an oscillating friction wear tester were performed to investigate the tribological behaviors of the coatings in ambient environment. The chemical characteristics of the coatings and worn surfaces were studied using X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). It revealed that $CH_4$ addition to As processing gas strongly affected the tribologcal properties of sputtered boron carbide coating. The coefficient of friction was reduced approximately from 0.4 to 0.1, and wear resistance was improved considerably by increasing the ratio of $CH_4$, gas component from 0 to $1.2\;vol\;\%$. By adding a sufficient amount of $CH_4\;(1.2\%)$ in the deposition process, the boron carbide coating exhibited lowest friction and highest wear resistance.