• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.215.1-215.1
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• 2015

본 연구에서는 용액 공정 기반 ZrO2 절연막의 우수한 특성을 확인하기 위해 SiO2 절연막을 가지는 IGZO (Indium-Gallium-Zinc Oxide) 박막 트랜지스터와 비교했다. In:Ga:Zn=1:1:1의 비율의 0.3 M IGZO 용액과 0.2 M ZrO2용액을 사용하였다. ZrO2 박막 트랜지스터는 0.2M ZrO2 용액을 5번 반복 증착하며 140nm 두께의 ZrO2 절연막을 가지는 IGZO 박막 트랜지스터와 비교대상으로 동일한 두께의 SiO2의 절연막을 가지는 IGZO 박막 트랜지스터를 제작하였다. ZrO2 박막 트랜지스터의 문턱전압은 4.3V로 SiO2 박막 트랜지스터의 -6.1V보다 낮았고, 이동도는 $1.2356cm^2/V{\cdot}s$로 $0.0554cm^2/V{\cdot}s$ 보다 약 20배 높았다. 실험 결과를 통해 ZrO2를 절연막으로 사용한 박막 트랜지스터의 특성이 더 향상되었음을 확인하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.217.1-217.1
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• 2015

본 연구에서는 차세대 투명소자의 기본 요구사항인 투명 산화물 TFT를 제조하는데 가장 유망한 재료인 IGZO (Indium-Gallium-Zinc oxide) 박막의 구동 안정성과 신뢰성을 높이기 위한 후처리 기술을 제시하고자 한다. 이는 기존의 400도 이상의 고온 후열처리 공정을 대체할 수 있는 기술로써, IGZO 박막의 스퍼터링 공정 후에 동일 챔버에서 전자빔 조사를 통해 수분 이하의 고속 후처리를 진행함으로써 가능하다. 본 발표에서는 전자빔 후처리 공정을 통해 얻어지는 IGZO 기반의 TFT 소자 물성에 대해서 소개가 이루어질 것이다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.185.2-185.2
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• 2015

Tin Oxide (SnO2) has been widely investigated as a transparent conducting oxide (TCO) and can be used in optoelectronic devices such as solar cell and flat-panel displays. In addition, it would be applicable to fabricating the wide bandgap semiconductor because of its bandgap of 3.6 eV. There have been concentrated on the improvement of optical properties, such as conductivity and transparency, by doping Indium Oxide and Gallium Oxide. Recently, with development of fabrication techniques, high-qulaity SnO2 epitaxial thin films have been studied and received much attention to produce the electronic devices such as sensor and light-emitting diode. In this study, powder sputtering method was employed to deposit epitaxial thin films on sapphire (0001) substrates. A commercial SnO2 powder was sputtered. The samples were prepared with varying the growth parameters such as gas environment and film thickness. Then, the samples were characterized by using XRD, SEM, AFM, and Raman spectroscopy measurements. The details of physical properties of epitaxial SnO2 thin films will be presented.

• Ceramist
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• v.10 no.3
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• pp.48-54
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• 2007

Glass-ceramics transparent above $10\;{\mu}m$ in the infrared, have been synthesized. They are based on germanium and antimony sulphides or selenides associated to alkali halides. They are prepared by heating glass samples at temperatures above the glass transition, as a function of time. Ceramisation can be controlled, so that sub-100 nm crystals are generated in the glass matrix. Then, low light scattering is achieved and the transparency window of the original glass is maintained. When gallium sulphide is added, glass ceramics can be doped with rare-earth ions. Emissions from the $^4F_{3/2}$ and $^4I_{13/2}$ of $Nd^{3+}$ and $Er^{3+}$ ions, respectively, are more intense in glass-ceramics, as compared to their vitreous counterpart. Examination of band profiles and decaytimes show that rare-earth ions are embedded in both crystalline and glassy environments.

• The Korean Journal of Ceramics
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• v.3 no.2
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• pp.134-138
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• 1997

$Dy^{3+}-(or Tm^{3+}-)$ doped $Ga_2O_3 \;and\; ZnGa_2O_4$ phosphors were prepared using the solid state reaction method to investigate their photoluminescent characteristics. Under 254 nm excitation, $Dy^{3+}-doped Ga2_O_3$ exhibited two emission bands of 460~505nm and 570~600nm. On the other hand, $Dy^{3+}-(or Tm^{3+}-)$ doped $ZnGa_2O_4 $phosphors exhibited a broad-band emission extending from 330 nm to 610 nm, peaking at about 430 nm(or 370 nm). In this study, an emission peak shift of nealy 50 nm towards longer wavelength region was observed with $Dy^{3+}$ doping in the $ZnGa_2O_4 $.

• Journal of Electrochemical Science and Technology
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• v.3 no.3
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• pp.95-115
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• 2012

Although indium (In) is not an abundant element, the use of indium is expected to grow, especially as applied to copper-indium-(gallium)-selenide (CI(G)S) solar cells. In future when CIGS solar cells will be used extensively, the available amount of indium could be a limiting factor, unless a synthetic technique of efficiently utilizing the element is developed. Current vacuum techniques inherently produce a significant loss of In during the synthetic process, while electrodeposition exploits nearly 100% of the In, with little loss of the material. Thus, an electrochemical process will be the method of choice to produce alloys of In once the proper conditions are designed. In this review, we examine the electrochemical processes of electrodeposition in the synthesis of indium alloys. We focus on the conditions under which alloys are electrodeposited and on the factors that can affect the composition or properties of alloys. The knowledge is to facilitate the development of electrochemical means of efficiently using this relatively rare element to synthesize valuable materials, for applications such as solar cells and light-emitting devices.

• Journal of Sensor Science and Technology
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• v.26 no.2
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• pp.79-84
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• 2017

The drain current of the SB MOSFET was analytically modeled by an equation composed of thermionic emission and tunneling with consideration of the image force lowering. The depletion region electron concentration was used to model the channel electron concentration for the tunneling current. The Schottky barrier width is dependent on the channel electron concentration. The drain current is changed by the gate oxide thickness and Schottky barrier height, but it is hardly changed by the doping concentration. For a GaN SB MOSFET with ITO source and drain electrodes, the calculated threshold voltage was 3.5 V which was similar to the measured value of 3.75 V and the calculated drain current was 1.2 times higher than the measured.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.231-231
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• 2003

I-III-Ⅵ족 CuInGaSe$_2$(CIGS)계 화합물 태양전지는 1 eV 이상의 직접 천이형 에너지 밴드갭을 가지며, 전기 광학적으로 매우 안정하여 태양전지의 광흡수층으로 매우 이상적이다. CIGS 광흡수층제조를 위하여 용매열법 (solvothermal method)으로 CIGS나노입자를 합성하였다. 용매열법은 진공장비를 사용하던 기존의 방법에 비해 저온, 저압에서 저가로 합성할 수 있다는 장점을 가지고 있다. Copper, indium selenium 및 gallium 분말과 유기용매 ethylenediarnine을 autoclave안에서 반응시켜 CIGS 나노입자를 제조하였다. 280 에서 14시간동안 반응시켜 직경이 30-80 nm인 구형에 가까운 CIGS 나노입자를 얻었다. 이것은 용매열법에 의한 4성분계의 CIGS 나노입자의 최초 합성이다. diehyleneamine을 용매로 사용한 경우에 한하여 구형의 CIS 입자를 합성할 수 있다고 보고되었으나, Cu와 이중 N-chelation이 형성되는 ethylenediamine 용매임에도 불구하고 구형의 CIGS 나노분말이 형성된 것은 solution-liquid-solid (SLS) 기구로 설명할 수 있었다. HRSEM, TEM, XRD. EDS으로 나노분말의 형상 크기 및 조성을 조사하여 chalcopyrite 구조의 CuInGaSe$_2$ 임을 확인하였다.

• Journal of Electrical Engineering and Technology
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• v.6 no.4
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• pp.539-542
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• 2011

Thin-film transistors (TFTs) are fabricated using an amorphous indium gallium zinc oxide (a-IGZO) channel layer by rf-magnetron sputtering. Oxygen partial pressure significantly changed the transfer characteristics of a-IGZO TFTs. Measurements performed on a-IGZO TFT show the change of threshold voltage in the transistor channel layer and electrical properties with varying $O_2$ ratios. The device performance is significantly affected by adjusting the $O_2$ ratio. This ratio is closely related with the modulation generation by reducing the localized trapping carriers and defect centers at the interface or in the channel layer.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.66 no.9
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• pp.1351-1358
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• 2017

In this work, we investigated radiation hardness of GaN-based transistors which are strong candidates for next-generation power electronics. Field effect transistors with three types of gate structures including metal Schottky gate, recessed gate, and p-AlGaN layer gate were fabricated on AlGaN/GaN heterostructure on Si substrate. The devices were irradiated with energetic protons and alpha-particles. The irradiated transistors exhibited the reduction of on-current and the shift of threshold voltage which were attributed to displacement damage by incident energetic particles at high fluence. However, FET operation was still maintained and leakage characteristics were not degraded, suggesting that GaN-based FETs possess high potential for radiation-hardened electronics.