• Title/Summary/Keyword: Gallium

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Physical and Electrochemical Properties of Gallium Oxide (β-Ga2O3) Nanorods as an Anode Active Material for Lithium Ion Batteries (리튬이온전지용 산화갈륨 (β-Ga2O3) 나노로드 (Nanorods) 음극 활물질의 물리적.전기화학적 특성)

  • Choi, Young-Jin;Ryu, Ho-Suk; Cho, Gyu-Bon;Cho, Kwon-Koo;Ryu, Kwang-Sun;Kim, Ki-Won
    • Journal of the Korean Electrochemical Society
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    • v.12 no.2
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    • pp.189-195
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    • 2009
  • $\beta-Ga_{2}O_{3}$ nanorods were synthesized by chemical vapor deposition method using nickel-oxide nanoparticle as a catalyst and gallium metal powder as a source material. The average diameter of nanorods was around 160 nm and the average length was $4{\mu}m$. Also, we confirmed that the synthesis of nanorods follows the vapor-solid growth mechanism. From the results of X-ray diffraction and HR-TEM observation, it can be found that the synthesized nanorods consisted of a typical core-shell structure with single-crystalline $\beta-Ga_{2}O_{3}$ core with a monoclinic crystal structure and an outer amorphous gallium oxide layer. Li/$\beta-Ga_{2}O_{3}$ nanorods cell delivered capacity of 867 mAh/g-$\beta-Ga_{2}O_{3}$ at first discharge. Although the Li/$\beta-Ga_{2}O_{3}$ nanorods cell showed low coulombic efficiency at first cycle, the cell exhibited stable cycle life property after fifth cycle.

Photoelectrochemical Properties of Gallium Nitride (GaN) Photoelectrode Using Cobalt-phosphate (Co-pi) as Oxygen Evolution Catalyst (산소발생용 Cobalt-phosphate (Co-pi) 촉매를 이용한 Gallium Nitride (GaN) 광전극의 광전기화학적 특성)

  • Seong, Chaewon;Bae, Hyojung;Burungale, Vishal Vilas;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.2
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    • pp.33-38
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    • 2020
  • In the photoelectrochemical (PEC) water splitting, GaN is one of the most promising photoanode materials due to high stability in electrolytes and adjustable energy band position. However, the application of GaN is limited because of low efficiency. To improve solar to hydrogen conversion efficiency, we introduce a Cobalt Phosphate (Co-pi) catalyst by photo-electrodeposition. The Co-pi deposition GaN were characterized by SEM, EDS, and XPS, respectively, which illustrated that Co-pi was successfully decorated on the surface of GaN. PEC measurement showed that photocurrent density of GaN was 0.5 mA/㎠ and that of Co-pi deposited GaN was 0.75 mA/㎠. Impedance and Mott-Schottky measurements were performed, and as a result of the measurement, polarization resistance (Rp) and increased donor concentration (ND) values decreased from 50.35 Ω to 34.16 Ω were confirmed. As a result of analyzing the surface components before and after the water decomposition, it was confirmed that the Co-pi catalyst is stable because Co-pi remains even after the water decomposition. Through this, it was confirmed that Co-pi is effective as a catalyst for improving GaN efficiency, and when applied as a catalyst to other photoelectrodes, it is considered that the efficiency of the PEC system can be improved.

Spatial variation in quality of Ga2O3 single crystal grown by edge-defined film-fed growth method (EFG 방법으로 성장한 β-Ga2O3 단결정의 영역별 품질 분석)

  • Park, Su-Bin;Je, Tae-Wan;Jang, Hui-Yeon;Choi, Su-Min;Park, Mi-Seon;Jang, Yeon-Suk;Moon, Yoon-Gon;Kang, Jin-Ki;Lee, Won-Jae
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.32 no.4
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    • pp.121-127
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    • 2022
  • β-Gallium oxide (Ga2O3), an ultra-wide bandgap semiconductor, has attracted great attention due to its promising applications for high voltage power devices. The most stable phase among five different polytypes, β-Ga2O3 has the wider bandgap of 4.9 eV and higher breakdown electric field of 8 MV/cm. Furthermore, it can be grown from melt source, implying higher growth rate and lower fabrication cost than other wide bandgap semiconductors such as SiC, GaN and diamond for the power device applications. In this study, β-Ga2O3 bulk crystals were grown by the edge-defined film-fed growth (EFG) process. The growth direction and the principal surface were set to be the [010] direction and the (100) plane of the β-Ga2O3 crystal, respectively. The spectra measured by Raman an alysis could exhibit the crystal phase an d impurity dopin g in the β-Ga2O3 ingot, and the crystallinity quality and crystal direction were analyzed using high-resolution X-ray diffraction (HRXRD). The crystal quality and various properties of as-grown β-Ga2O3 ribbon was systematically analyzed in order to investigate the spatial variation in entire crystal grown by EFG method.

Enhancing Electrical Properties of Sol-Gel Processed IGZO Thin-Film Transistors through Nitrogen Atmosphere Electron Beam Irradiation (질소분위기 전자빔 조사에 의한 졸-겔 IGZO 박막 트랜지스터의 전기적 특성 향상)

  • Jeeho Park;Young-Seok Song;Sukang Bae;Tae-Wook Kim
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.3
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    • pp.56-63
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    • 2023
  • In this paper, we studied the effect of electron beam irradiation on sol-gel indium-gallium-zinc oxide (IGZO) thin films under air and nitrogen atmosphere and carried out the electrical characterization of the s ol-gel IGZO thin film transistors (TFTs). To investigate the optical properties, crystalline structure and chemical state of the sol-gel IGZO thin films after electron beam irradiation, UV-Visible spectroscopy, X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) were carried out. The sol-gel IGZO thin films exhibited over 80% transmittance in the visible range. The XRD analysis confirmed the amorphous nature of the sol-gel IGZO films regardless of electron beam irradiation. When electron beam irradiation was conducted in a nitrogen (N2) atmosphere, we observed an increased proportion of peaks related to M-O bonding contributed to the improved quality of the thin films. Sol-gel IGZO TFTs subjected to electron beam exposure in a nitrogen atmosphere exhibited enhanced electrical characteristics in terms of on/off ratio and electron mobility. In addition, the electrical parameters of the transistor (on/off ratio, threshold voltage, electron mobility, subthreshold swing) remained relatively stable over time, indicating that the electron beam exposure process in a nitrogen atmosphere could enhance the reliability of IGZO-based thin-film transistors in the fabrication of sol-gel processed TFTs.

Development of an Automated Synthesizer for the Routine Production of Ga-68 Radiopharmaceuticals (임상용 Ga-68 표지 방사성의약품의 합성을 위한 자동합성장치 개발)

  • Jun Young PARK;Jeongmin SON;Won Jun KANG
    • Korean Journal of Clinical Laboratory Science
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    • v.55 no.4
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    • pp.253-260
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    • 2023
  • The germanium-68/gallium-68 (68Ge/68Ga) generator has high spatial utilization and requires little maintenance, making it economical and easy to produce. Thus, the frequency of use of 68Ga radiopharmaceuticals is rapidly increasing worldwide. Therefore, this study attempted to develop an automated synthesizer for the routine clinical application of 68Ga radiopharmaceuticals. The automated synthesizer was based on a fixed tubing system and the structure was designed after adjusting the position of the parts to reflect the synthesis method. Using various components that can be supplied in Korea, the automated synthesizer was manufactured at a much lower price cost than that of a commercialized automated synthesizer sold by companies. 68Ga-DOTA-[Tyr3]-octreotide (68Ga-DOTATOC) was synthesized to evaluate the performance of the automated synthesizer. 68Ga-DOTATOC could be synthesized with about 65% of non-decay corrected yield, and the synthesized 68Ga-DOTATOC met all quality control standards. We have synthesized 68Ga-DOTATOC more than 100 times, and only faced a few problems caused by mechanical errors. In this study, we successfully developed a simple automated synthesizer for 68Ga radiopharmaceuticals with high reproducibility. As various 68Ga radiopharmaceuticals have recently been developed, it is expected that the automated synthesizer developed in this study will be useful for routine clinical use.

Comparison of Electrical Properties of β-Gallium Oxide (β-Ga2O3) Power SBDs with Guard Ring Structures (Guard Ring 구조에 따른 β-산화갈륨(β-Ga2O3) 전력 SBDs의 전기적 특성 비교)

  • Hoon-Ki Lee;Kyujun Cho;Woojin Chang;Jae-Kyoung Mun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.2
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    • pp.208-214
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    • 2024
  • This reports the electrical properties of single-crystal β-gallium oxide (β-Ga2O3) vertical Schottky barrier diodes (SBDs) with a different guard ring structure. The vertical Schottky barrier diodes (V-SBDs) were fabricated with two types guard ring structures, one is with metal deposited on the Al2O3 passivation layer (film guard ring: FGR) and the other is with vias formed in the Al2O3 passivation layer to allow the metal to contact the Ga2O3 surface (metal guard ring: MGR). The forward current values of FGR and MGR V-SBD are 955 mA and 666 mA at 9 V, respectively, and the specific on-resistance (Ron,sp) is 5.9 mΩ·cm2 and 29 mΩ·cm2. The series resistance (Rs) in the nonlinear section extracted using Cheung's formula was 6 Ω, 4.8 Ω for FGR V-SBD, 10.7 Ω, 6.7 Ω for MGR V-SBD, respectively, and the breakdown voltage was 528 V for FGR V-SBD and 358 V for MGR V-SBD. Degradation of electrical characteristics of the MGR V-SBD can be attributed to the increased reverse leakage current caused by the guard ring structure, and it is expected that the electrical performance can be improved by preventing premature leakage current when an appropriate reverse voltage is applied to the guard ring area. On the other hand, FGR V-SBD shows overall better electrical properties than MGR V-SBD because Al2O3 was widely deposited on the Ga2O3 surface, which prevent leakage current on the Ga2O3 surface.

3C-SiC/Si 에피층 성장과 Ga 불순물 효과

  • 박국상;김광철;김선중;서영훈;남기석;이형재;나훈균;김정윤;이기암
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1997.10a
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    • pp.141-144
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    • 1997
  • High quality 3C-SiC epilayer was grown on Si(111) at 125$0^{\circ}C$ using chemical vapor deposition(CVD) technique by pyrolyzing tetramethylsilane(TMS). 3C-SiC epilayer was doped by tetramethylgallium(TMGa) during the CVD growth. The crystallinity of 3C-SiC was significantly enhanced by doping the gallium impurity.

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Meltback Micro-lens Array for New Optical devices

  • Hahm, S.H.;Yoo, T.K.;Kwon, Y.S.
    • Proceedings of the Optical Society of Korea Conference
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    • 1990.02a
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    • pp.207-210
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    • 1990
  • The mechanisms of the meltback etching and regrowth processes are studied experimentally. The depth and time of the meltback is poltted with the experimental data and fitted with some functions. The method to reduce the anisotropy and elliminate the gallium is lands are also developed. It is possible to fabricate the AlGaAs micro-lens array by the use of the process and apply it to a new optical devices.

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Electrical characteristics of p-PEDOT/n-GZO heterojunction (p-PEDOT/n-GZO heterojunction의 전기적 특성)

  • Lee, Jae-Sang;Park, Dong-Hoon;Koo, Sang-Mo;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1332_1333
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    • 2009
  • The electrical properties of an inorganic/organic heterojunction has been investigated by spin coating the p-type polymer poly(3,4 ethylenedioxythiophene) : poly(styrenesulfonate) (PEDOT:PSS) on an n-type gallium doping zinc oxide (GZO) film. Current-voltage (I-V) characteristics of the fabricated heterojunction diodes have a good rectifying characteristics. The barrier height is calculated 0.8 eV.

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