• 한국전기전자재료학회논문지
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• 제13권11호
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• pp.895-900
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• 2000

In this paper, C-V characteristics based on the structure of GaAs MESFET’s has been proposed with wide range of applied voltages and temperatures. Small signal capacitance; gate-source and gate-drain capacitances are represented by analytical expressions which are classified into two different regions; linear and saturation regions with bias voltages. The expression contains two variables; the built-in voltage( $V_{vi}$ )and the depletion width(W). Submicron gate length MESFETs has been selected to prove the validity of the theoretical perdiction and shows good agreement with the experimental data over the wide range of applied voltages.

• 한국진공학회지
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• 제4권S2호
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• pp.75-78
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• 1995

Gas source molecular beam epitaxy have been used in the growth of InAlAsAnGaAs MSM-PD structure, in which InAlAs ultra thin layer was used as Schottky barrier enhancement material. High performance MSM-PDs have been constructed on the grown wafer. High breakdown voltage of >30V, low dark current density of $3pA/\mu \textrm{cm}^2$ at 10V bias and fast transient response of <20ps rise time / <40ps FWHM have been measured, which confirm the results that GSMBE is a superior method for the growth of materials with high layer and interfacial quality, especially for InP based InAIAdInGaAs system.

• 센서학회지
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• 제23권1호
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• pp.51-57
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• 2014

The evaporating materials for $MgGa_2Se_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $MgGa_2Se_4$ compounded polycrystal powder was deposited on thoroughly etched semi-insulated GaAs(100) substrate by the hot wall epitaxy (HWE) method system. The source and substrate temperatures of optimized growth conditions, were $610^{\circ}C$ and $400^{\circ}C$, respectively.The source and substrate temperatures were $610^{\circ}C$ and $400^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $MgGa_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=2.34\;eV-(8.81{\times}10^{-4}\;eV/K)T^2/(T+251\;K)$. After the as-grown $MgGa_2Se_4$ single crystal thin films was annealed in Mg-, Se-, and Ga-atmospheres, the origin of point defects of $MgGa_2Se_4$ single crystal thin films has been investigated by the photoluminescence (PL) at 10 K. The native defects of $V_{Mg}$, $V_{Se}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Se-atmosphere converted $MgGa_2Se_4$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $MgGa_2Se_4$/GaAs did not form the native defects because Ga in $MgGa_2Se_4$ single crystal thin films existed in the form of stable bonds.

• 한국정보통신학회논문지
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• 제21권1호
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• pp.82-89
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• 2017

본 연구에서는 소스 및 드레인 전극 재료에 따른 소자 열화를 분석하기 위해 Ni, Al, 및 ITO를 소스 및 드레인 전극 재료로 사용하여 InGaZnO 박막 트랜지스터를 제작하였다. 전극 재료에 따른 소자의 전기적 특성을 분석한 결과 Ni 소자가 이동도, 문턱전압 이하 스윙, 구동전류 대 누설전류 비율이 가장 우수하였다. 소스 및 드레인 전극 재료에 따른 소자 열화 측정결과 Al 소자의 열화가 가장 심한 것을 알 수 있었다. InGaZnO 박막 트랜지스터의 소자 열화 메카니즘을 분석하기 위하여 채널 폭과 스트레스 드레인 전압을 다르게 하여 문턱전압 변화를 측정하였다. 그 결과 채널 폭이 넓을수록 또 스트레스 드레인 전압이 높을수록 소자 열화가 많이 되었다. 측정결과로부터 InGaZnO 박막 트랜지스터의 소자 열화는 큰 채널 전계와 주울 열의 결합 작용으로 발생함을 알 수 있었다.

• 한국인터넷방송통신학회논문지
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• 제18권6호
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• pp.195-200
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• 2018

W-대역 송수신기를 위한 주파수 8체배기가 100-nm GaAs pHEMT 공정으로 설계 및 제작되었다. 제작된 체배기는 송수신기의 국부발진기 및 신호원으로 활용 가능하다. 공통-소스 2체배기를 3단 연결하여 10.75 GHz의 입력 신호를 83 GHz로 체배할 수 있다. 변환 이득 향상과 불요파 억제를 위하여 공통-소스 증폭기가 각 체배단 마다 포함되었다. 증폭기를 대역 필터로 활용하여 크고 복잡한 수동 필터 없이 충분한 불요파 억제도를 확보할 수 있다. 또한 각 증폭기 이득을 조정하여 변환 효율을 극대화하였다. 제작된 체배기는 80 - 84 GHz 대역에서 6 dBm 이상의 높은 출력을 보이며 20 dBc 이상의 우수한 불요파 억제 성능을 확보하였다.

• Current Optics and Photonics
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• 제4권6호
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• pp.509-515
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• 2020

A practical single photon source for fiber-based quantum information processing is still lacking. As a possible 1.55-㎛ quantum-dot single photon source, an InGaAsP/InP-air-aperture micropillar cavity is investigated in terms of fabrication tolerance. By properly modeling the processing uncertainty in layer thickness, layer diameter, surface roughness and the cavity shape distortion, the fabrication imperfection effects on the cavity quality are simulated using a finite-difference time-domain method. It turns out that, the cavity quality is not significantly changing with the processing precision, indicating the robustness against the imperfection of the fabrication processing. Under thickness error of ±2 nm, diameter uncertainty of ±2%, surface roughness of ±2.5 nm, and sidewall inclination of 0.5°, which are all readily available in current material and device fabrication techniques, the cavity quality remains good enough to form highly efficient and coherent 1.55-㎛ single photon sources. It is thus implied that a quantum dot contained InGaAsP/InP-air-aperture micropillar cavity is prospectively a practical candidate for single photon sources applied in a fiber-based quantum information network.

• 농업과학연구
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• 제10권2호
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• pp.242-248
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• 1983

상치종자(種子)에 광질(光質), 생장조절물질(生長調節物質), soduim hypochlorite침지처리하여 발아시험(發芽試驗)한 결과(結果)는 다음과 같다. 1. 자연광(自然光) 및 적색광하(赤色光下)에서 GA 및 BA는 발아(發芽)를 촉진(促進)시켰으며, 청색광(靑色光)이나 ABA는 발아(發芽)를 억제(抑制)시켰다. 2. 생장조절물질(生長調節物質)의 복합처리시(複合處理時) GA 농도(濃度)가 높아질수록 발아율(發芽率)은 상승(上乘)하며 암흑하(暗黑下)에서는 BA농도(濃度) 10ppm에서 발아율상승효과(發芽率上乘效果)가 컸다. 3. Sodium hypochlorite 20분(分) 이상(以上) 침지처리로 암흑하(暗黑下)에서도 85%이상(以上)의 발아율(發芽率)을 보였다. 4. ABA하(下)에서도 sodium hypochlorite 침지처리로 발아율상승효과(發芽率上乘效果)를 볼 수 있었다.

• 반도체디스플레이기술학회지
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• 제4권1호
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• pp.43-48
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• 2005

Metaloganic chemical vapor deposition, also known as metalorganic vapor phase epitaxy has become one of the main techniques for growing thin, high purity films for compound semiconductors such as GaAs, InP, and InGaAsP. In this study, the distribution of growth rate and composition of InGaAsP, InGaP, and InGaAs films are studied using computational method. The influences of process parameters such as pressure, temperature and precursors' partial pressure on the growth rate and composition distributions are analyzed. The film growth rate is increased in the upstream part according to the increase of temperature but not in the downstream part. The Ga composition in InGaAsP film shows an asymptotic behavior for temperature variation but As composition varies significantly within the temperature range considered in the present study. The overall film growth rates of InGaP, InGaAs and InGaAsP are decreased with increasing the Ga/In ratios of the source gases. Pressure variation does not seem to be a significant parameter to the film growth. Film growth characteristics of tertiary films such as InGaP and InGaAs show similar trends to the quaternary film, InGaAsP.

• 신재생에너지
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• 제5권3호
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• pp.22-25
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• 2009

For increasing the output voltage, six SMD(surface mount device) type AlGaAs/GaAs solar cells were connected in series. The electrical properties of the array were measured and compared with one sun (100 mW/$cm^2$) and indoor light (480 lux) conditions. Under one sun condition, output power was 21.57 mW and it was $14.67\;{\mu}W$ under indoor light condition. Under the indoor light condition, the intensity of the light is very low compared to one sun condition. Thus the Voc(open circuit voltage) and Isc (short circuit current) of the sample under indoor light condition decreased very much compared to that of under the one sun condition. This kind of solar cell power supply can be used as a power source for ubiquitous sensor network (USN).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.85-86
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• 2006

Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=19501 eV-(879{\times}10^{-4} eV/K)T^2/(T+250 K)$.