• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.4
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• pp.140-144
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• 2004

CdTe thin films were grown on GaAs (100) substrates by hot wall epitaxy method. From the XRD measurements, it was found that CdTe/GaAs (100) film was grown as a single crystals with the different from growth plane of (III), and growth rate of CdTe thin films was found to be 30 $\AA/sec$ by SEM. To acquire a high quality CdTe thin film, the optimum temperature for the source and substrate are found to be $500^{\circ}C$ and $320^{\circ}C$, respectively, which was checked by PL.

• Proceeding of EDISON Challenge
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• 2017.03a
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• pp.428-432
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• 2017

Silicon 기반 Metal-oxide-semiconductor field-effect transistor (MOSFET)의 크기가 감소함에 따라 silicon자체의 물성적 한계가 나타나고 있다. 이를 극복하고자 III-V 화합물 반도체가 채널소자로서 각광받고 있다. 본 연구에서는 III-V 화합물반도체 중 $In_xGa_{1-x}As$는 Indium 조성에 따른 전자구조 및 n-type MOSFET의 소자 특성을 본다. Indium의 조성이 증가함에 따라 subband의 개수와 간격이 증가하게 되어 Density of state가 감소하게 된다. 이로 인하여 Indium의 조성이 증가함에 따라 $In_xGa_{1-x}As$ 채널 MOSFET에서 상대적으로 Fermi level을 더 많이 상승시키게 되어 potential barrier를 얇아지게 만들며 또한 에너지에 따른 전류 밀도를 넓게 분포하도록 만든다. 이로 인하여 단채널에서는 In 조성이 증가함에 따라 direct source-to-drain tunnelling current이 증가하게 된다. 이로 인하여 In 조성의 증가에 따라 subthreshold swing과 ON-state current가 저하된다.

• Journal of the Korean Vacuum Society
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• v.20 no.6
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• pp.461-467
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• 2011

The valence band maximum and the conduction band miminum of GaAs, GaSb, InAs, and InSb (constituent binaries of the quaternaty alloy $Ga_xIn_{1-x}Sb_yAs_{1-y}$) are calculated by using TB analytical approach method. The band alignment types of their heterojunctions are determined directly from their relative position of band edges (VBM and CBM). For example, the GaAs/InAs, GaAs/InSb, and GaSb/InSb are in a type-I, the GaAs/GaSb in a type-II, and the GaSb/InAs and InSb/InAs in a type-III, respectively. The composition dependent VBM and CBM for the $Ga_xIn_{1-x}Sb_yAs_{1-y}$ alloy are obtained by using the univeral tight binding method. For the alloyed heterojunctions, the band alignments can be controlled by changing the composition which induce a band type transition. For the alloy $Ga_xIn_{1-x}Sb_yAs_{1-y}$ lattice mathced to GaSb, the type-II band alignment in the region of $x{\leq}0.15$ is changed to the type-III in the region of $x{\geq}0.81$. On the other hand, the alloy $Ga_xIn_{1-x}Sb_yAs_{1-y}$ lattice mathced to InAs has the type-II band alignment in the region of $x{\leq}0.15$ and the type-III band alignment in the region of $x{\geq}0.81$, respectively.

• Journal of Food Hygiene and Safety
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• v.13 no.4
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• pp.377-382
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• 1998

This study was carried out to measure the contents of moisture, crude ash, crude fat, total amino acid, with amino acid composition, vitamin C, ${\beta}-carotene$, vitamin E, total catechins, EGCG, EGC, ECG, EC, GA, caffeine, theobromine and theophylline of the green tea I, II, III, oolong, and black tea. The content of crude fat of green tea I, II, III, oolong, and black teas was 1.1, 2.5, 4.9, 0.8 and 1.2% respectively, total amino acid content was 0.87, 0.78, 0.60, 0.63 and 1.05% respectively, and theanine content was 0.52, 0.48, 0.31, 0.41 and 0.61%, respectively. Total amino acid content of green tea increased in the order of green tea I> green tea II> green tea III, and among the teas, the content of theanine was the highest in the amino acids present. The content of vitamin C of green teal, II, III, oolong, and black tea was 101.6, 87.5, 95.9, 99.1 and 108.0 mg%, respectively, ${\beta}-carotene$ content was 270, 268, 481, 80 and 181 ppm, respectively. Among the ${\alpha}-,\;{\beta}-,\;{\gamma}-\;and\;{\delta}-tocopherol$, the content of ${\alpha}-tocopherol$ was the highest in vitamin E present, and ${\beta}-\;and\;{\delta}-tocopherol$ were not detected in the samples of green teal, II, III, oolong, and black teas. The total catechins of green teal, II, III, oolong, and black teas was 10.5, 10.4, 7.2, 8.4 and 1.8% respectively, and among them, EGCG content was the highest. The content of EGC increased in the order of green tea I > green tea III > green tea II > oolong tea> black tea. The contents EGCG and ECG increased in the order of oolong tea> green tea I > green tea II> green tea III> black tea, and the highest contents of EGCG and ECG were observed in the samples of oolong tea. The content of GA was 0.01, 0.02, 0.05, 0.13 and 0.31%, respectively, and the highest contents of GA, caffeine and theobromine were observed in the sample of black tea. The highest content of theophylline, however, was observed in the sample of green tea I.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.451-451
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• 2013

현재 세계적으로 에너지 공급원의 다변화가 시급한 실정이며 그 후보로 태양에너지, 풍력 및 수력에너지와 같은 신재생 에너지에 대한 연구분야가 부각되고 있다. 전체 에너지 중 신재생 에너지의 비중은 빠르게 증가되고 있으며, 그 중에서도 태양광에너지의 분야가 가장 활발히 연구되고 있다. 특히, III-V족 화합물 반도체 태양전지는 직접 천이형 밴드갭을 가지고 있어 기존 실리콘 태양전지에 비해 광 흡수율이 높은 장점을 가지고 있다. 따라서 본 연구에서는 Molecular Beam Epitaxy (MBE)장치를 이용하여 성장온도에 따른 p-n접합 GaAs 태양전지 구조를 제작하여, 광전변환 효율과 결함구조 관련성을 조사하였다. 먼저 Si이 $1{\times}10^{18}cm^{-3}$으로 도핑된 n형 GaAs기판위에 성장온도 $480^{\circ}C$와 $590^{\circ}C$에서 Be을 $5{\times}10^{18}cm^{-3}$ 도핑한 p 형 GaAs를 200 nm 두께로 각각 성장하여, 2개의 p-n 접합 GaAs 태양전지 구조를 제작하였다. 시료의 전기적 특성과 결함상태는 Capacitance-Voltage (C-V) 와 Deep Level Transient Spectroscopy (DLTS)를 사용하여 조사하였다. DLTS 측정을 위해 p-형의 GaAs박막 위에 Au(300 nm)/Pt(30 nm)/Ti(30 nm)를 e-beam evaporator로 증착한 후, 직경 $300{\mu}m$의 메사 에칭으로 p-n접합 다이오드 구조를 제작하였다. 본 연구를 통해 GaAs p-n접합구조 성장온도에 따른 광전변환 효율과 결함상태와의 물리적인 연관성을 논의할 것이다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.232-232
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• 2010

Recently light emitting diodes (LEDs) have been expected as the new generation light sources because of their advantages such as small size, long lifetime and energy-saving. GaN, as a wide band gap material, is widely used as a material of LEDs and GaN nanorods are the one of the most widely investigated nanostructure which has advantages for the light extraction of LEDs and increasing the active area by making the cylindrical core-shell structure. Lately GaN nanorods are fabricated by various techniques, such as selective area growth, vapor-liquid-solid (VLS) technique. But these techniques have some disadvantages. Selective area growth technique is too complicated and expensive to grow the rods. And in the case of VLS technique, GaN nanorods are not vertically aligned well and the metal catalyst may act as the impurity. So we just tried to grow the GaN nanorods on Si substrate without catalyst to get the vertically well aligned nanorods without impurity. First we deposited the AlN buffer layer on Si substrate which shows more vertical growth mode than sapphire substrate. After the buffer growth, we flew trimethylgallium (TMGa) as the III group source and ammonia as the V group source. And during the GaN growth, we kept the ammonia flow stable and periodically changed the flow rate of TMGa to change the growth mode of the nanorods. Finally, as the optimization, we changed the various growth conditions such as the growth temperature, the working pressure, V/III ratio and the doping level. And we are still in the process to reduce the diameter of the nanorods and to extend the length of the nanorods simultaneously. In this study, we focused on the shape changing of GaN nanorods with different growth conditions. So we confirmed the shape of the nanorods by scanning electron microscope (SEM) and carried out the Photoluminescence (PL) measurement and x-ray diffraction (XRD) to examine the crystal quality difference between samples. Detailed results will be discussed.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1997.10a
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• pp.149-154
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• 1997

광소자 및 새로운 개념의 전력소자 응용을 위하여 Wide Bandgap 반도체에 대한 관심이 급증되고 있다. 특히 직접천이형인 GaN는 청색 발광소자 응용 및 고출력, 고주파용 전력소자 응용에 이상적인 전자물성을 갖고 있다. 따라서 본 연구에서는 GaCl$_3$와 NH$_3$를 source gas로 하는 CVPE법을 사용하여 (0001) sapphire와 비교하였다. 기판의 증착온도 104$0^{\circ}C$에서 source gas의 III/V flow rate를 2로 분석하여 45분간 성장시킨 경우 그 증착속도는 약 40 $\mu\textrm{m}$/hr 정도였으며, 이 때 XRD을 향상시키기 위하여 증착이전에 기판의 표면에 증착온도에서 NH$_3$를 이용한 nitridation 처리를 하였으며, 그 처리시간이 3분일 때 XRD의 FWHM 특성이 가하여 조사한 결과 363 nm에서 peak가 검출되었다. 본 연구에서는 양질의 GaN 박막성장을 위한 증착조건 인자중 source gas의 flow rate가 가장 중요한 변수임을 적정 온도 범위가 75$0^{\circ}C$ 근처로 조사되었다. 실험과 모사결과의 박막 증착 최적온도의 차이는 GaN 증착시의 반응 Kinetics가 느리기 때문인 것으로 해석된다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.3
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• pp.214-219
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• 2002

In order to elucidate the crystallographic orientation dependence of electrical properties of carbon (C)-doped GaAs epilayers, C incorporation into GaAs epilayers on high-index GaAs substrates with various crystallographic orientations from (100) to (111)A has been performed by a low pressure metalorganic chemical vapor deposition using C tetrabromide ($CBt_4$) as a C source. The hole concentration of C-doped GaAs epilayers rapidly decreases with a hump at (311)A with increasing the offset angle. Although the growth temperature and the V/III ratio are varied, the crystallographic orientation dependence of hole concentration show a same trend. The above behaviors indicate that the bonding strength of As sites on a glowing surface plays an important role in the C incorporation into the high-index GaAs substrates.

• Korean Journal of Materials Research
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• v.13 no.11
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• pp.717-720
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• 2003

Heavily $p^{ ＋}$-typed ($10^{20}$ $cm^{-3}$ ) GaAs epilayers have been grown on high-index GaAs substrates with various crystallographic orientations from (100) to (111)A by a low-pressure metalorganic chemical vapor deposition. Carbon (C) tetrabromide (CBr$_4$) was used as a C source. At moderate growth temperatures and high V/III ratios, the hole concentration of C-doped GaAs epilayers shows the crystallographic orientation dependence. The bonding strength of As sites on a growing surface plays an important role in the C incorporation into the high-index GaAs substrates.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.460-460
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• 2013

본 연구는 Si (111) 기판위에 Ga 분자선량을 변화시켜 GaN 박막을 molecular beam epitaxy 법으로 성장하고, Schottky 장벽 다이오드를 제작한 후에 deep level transient spectroscopy (DLTS) 법을 통하여 깊은 준위 결함에 대하여 조사하였다. 성장 시 Ga 분자선량은, 그리고 Torr로 달리하여 V/III 비율을 변화시켰고, Schottky 장벽 다이오드 제작을 위하여 e-beam evaporator를 사용하여 metal을 증착하였다. Schottky 접촉에는 Ni (20 nm)/Au (100 nm)를 증착하였고, ohmic 접촉에는 Ti (20 nm)/Au (100 nm)를 증착하고 I-V, C-V 그리고 DLTS를 측정하였다. DLTS 신호를 통해 GaN 박막 성장 과정에서 형성되는 깊은 결함의 종류를 확인하였으며, 열처리 등의 처리 및 측정 조건변화에 따른 결함의 거동과 종류 및 원인에 대하여 분석 설명하였다.