• 제목/요약/키워드: Fused silica

검색결과 174건 처리시간 0.032초

식각액에 따른 용융실리카의 레이저 습식 식각가공 (Laser Induced Wet Etching of Fused Silica according to Etchant)

  • 이종호;이종길;전병희
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.245-249
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    • 2004
  • Transparent materials such as fused silica are important materials in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. However, these properties make it difficult to micromachine silica in micro-sized quantities. In this study, we fabricated a micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone, toluene, and pyrene-toluene solution were used as etchant. In the side of etch rate, toluene and pyrene-toluene solution were better than pyrene-acetone solution.

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식각액에 따른 용융실리카의 레이저 습식 식각 특성 비교 연구 (A Comparative Study on the Influence of Etchant upon the Etching Rate and Quality in Laser Induced Wet Etching of Fused Silica)

  • 이종호;이종길;전병희
    • 소성∙가공
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    • 제13권3호
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    • pp.268-272
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    • 2004
  • Transparent materials such as fused silica are widely utilized in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. In this study, we made a few micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone solution and toluene were used as etchant. In the side of etch rate, toluene solution was better than pyrene-acetone solution. But we made in wider range of energy density using pyrene-acetone solution. But pyrene-acetone solution gave us wider window of energy density for successful micro patterning.

KrF 엑시머 레이저를 이용한 용융실리카의 미세 습식 식각가공 (Micromachining of Fused Silica by KrF Excimer Laser Induced Wet Etching)

  • 백병선;이종길;전병희;김헌영
    • 소성∙가공
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    • 제11권7호
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    • pp.601-607
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    • 2002
  • Optically transparent materials such as fused silica, quartz and crystal have become important in the filed of optics and optoelectronics. Laser ablation continues to grow as an important technique for micromachining and surface modification of various materials, because many problems caused by direct contact between tools and workpiece can be avoided. Especially, laser ablation with excimer lasers enables fine micromachining of transparent materials such as fused silica, quartz and crystal, etc. In this study, laser-induced wet etching of fused silica in organic solution was conducted. KrF excimer laser was used as a light source and acetone solution of pyrene was used as etchant. Changing the number of laser pulses, micro holes of various depths are fabricated.

수도(水稻)에 대(對)한 합성규산물질(合成珪酸物質)의 효과(效果) (Effect of The Fused Siliceous Materials on Rice Plant)

  • 이윤환;한기학;임선욱
    • Applied Biological Chemistry
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    • 제14권3호
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    • pp.183-189
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    • 1971
  • 규산재료(珪酸材料)인 강사(江砂) 및 석영(石英)과 농용(農用) 소석회(消石灰)의 혼합(混合) 용융물(溶融物)에 대(對)한 규산질(珪酸質) 비료(肥料)로써의 효과(效果)를 구명(究明)코져 유효규산함량(有效珪酸含量)이 낮은 답토괴(畓土壞)에서 수도(水稻)에 대(對)해서 천연(天然) 규회석(珪灰石)을 대조(對照)로 시비처리(施肥處理)하여 시험(試驗)한 결과(結果) 1. 모래용융물(溶融物)이 석영용융물(石英溶融物)에 비(比)하여 N/2 염산가용규산함량(鹽酸可溶珪酸含量)이 높고 2% 구연산 가용규산함량(可溶珪酸含量)은 석영용융물(石英溶融物)이 모래용융물(溶融物)보다 높았다. 2. 벼의 규산흡수량(珪酸吸收量)은 석영용융물(石英溶融物)에서 가장 크고 모래용융물(溶融物)과 규회석(珪灰石)은 거의 같았으며 이용율(利用率)은 천연(天然) 규회석(珪灰石)이 가장 높고 석영용융물구(石英溶融物區)가 모래용융물구(溶融物區)보다 높았다. 3. 정조수량(正租收量)은 규산물질(珪酸物質)의 시용(施用)으로 수량구성요소중(收量構成要素中) 수당입수(穗當粒數), 등숙률(登熟率) 및 천입중(千粒重)의 증가(增加)로 증수(增收)되었으며 공시재료중(供試材料中) 석영용융구(石英溶融區)에서 가장 크게 증수(增收)하였으며 대조구(對照區)${\fallingdotseq}$모래용융물(溶融物) 100kg/10a<천연규회석(天然珪灰石)${\fallingdotseq}$모래용융물(溶融物) 300kg/10a${\fallingdotseq}$석영용융물(石英溶融物) 100kg/10a<모래용융물(溶融物) 500kg/10a${\fallingdotseq}$석영용융물(石英溶融物) 300kg/10a<석영용융물(石英溶融物) 500kg/10a의 순서(順序)이었다.

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HR polishing에 의한 광경화성수지 성형용 글래스 몰드의 투과율 및 표면품위 향상 (Improvement of Transmittance and Surface Integrity of Glass Mold for light-hardening polymer Using MR Polishing)

  • 이정원;김동우;조명우
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2009년도 춘계학술대회 논문집
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    • pp.78-83
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    • 2009
  • In general, Light-hardening polymer was used UV nanoimprint technology. A light-hardening polymer was had the problem of poor hardness, durability. In order to overcome the problem of polymer, inter change optical glass. However glass is very manufacture and a lowering of standars transmittance. In order to glass recover was necessary polishing process. The process is magnetorheological fluids polishing. MR polishing has been developed as a new precision finishing technique to obtain a fine surface. Hence, Magnetorheological fluids has been used for micro polishing to get micro parts. This polishing process guarantees high polishing quality by controlling the fluid density electrically. The applied material in experiments is fused silica glass. Fused silica glass is widely used in the optical field because of high degree of purity. For MR polishing experiments, MR fluid was composed with DI-water, carbonyl iron and nano slurry ceria. The wheel speed and electric current were chosen as the variables for analyzing the characteristics of MR polishing process. Outstanding surface roughness of Ra=1.58nm was obtained on the fused silica glass specimen. And originally glass transmittance was recover on the fused silica glass.

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Titania-fused Silica의 유전특성 분석 (Permittivity Properties of Titania-fused Silica)

  • 김한준;이래덕;시며노프;한상옥
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1803-1805
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    • 1999
  • The thermal expansion coefficient of the titania-fused silica glass$(TiO_2-SiO_2)$ called KLR-1.1 is known to $0{\pm}0.03$ ppm/K, while that of normal fused-silica glasses is about +0.5 ppm/K at room temperature. To analysis the dielectric properties of the KLR-1.1, the sample with diameter of 30 mm and thinkness of 1 mm is covered with gold film. Its relative permittivity and dissipation factor of KLR-1.1 is evaluated to $4.011{\pm}0.012(1\sigma)$ and $(4.86{\pm}0.02){\times}10^{-4}(1{\sigma})$ at 1 kHz respectively. The measurement techniques used and results are more discussed in this paper.

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레이저습식각을 이용한 용융실리카의 미세구멍가공 (Micro-drilling of Fused Silica by Laser Induced Wet Etching)

  • 백병선;이종길;전병희
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1344-1348
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    • 2003
  • It is generally known to be difficult to etch a surface of a transparent material such as fused silica by conventional laser ablation in which the surface is simply irradiated with a laser beam. A lot of studies have been done to provide a method capable of efficiently etching transparent materials without defects such as cracks. One of the promising methods or the micro-machining of optically transparent materials is laser induced etching. In this study, micro-drilling of fused silica by laser induced wet etching was conducted. KrF excimer and YAG laser were used as light sources. Acetone solution pyrene and ethanol solution of rhodamine were used as etchant.

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MR Fluid Jet Polishing 시스템에 의한 Fused Silica Glass 연마특성 고찰 (Investigation of Polishing Characteristics of Fused Silica Glass Using MR Fluid Jet Polishing)

  • 이정원;조용규;조명우
    • 한국생산제조학회지
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    • 제21권5호
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    • pp.761-766
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    • 2012
  • Abrasive fluid jet polishing processes have been used for the polishing of optical surfaces with complex shapes. However, unstable and unpredictable polishing spots can be generated due to the fundamental property of an abrasive fluid jet that it begins to lose its coherence as the jet exits a nozzle. To solve such problems, MR fluid jet polishing has been suggested using a mixture of abrasives and MR fluid whose flow properties can be readily changed according to imposed magnetic field intensity. The MR fluid jet can be stabilized by imposed magnetic fields, thus it can remain collimated and coherent before it impinges upon the workpiece surface. In this study, MR fluid jet polishing characteristics of fused silica glass were investigated according to injection time and magnetic field intensity variations. Material removal rates and 3D profiles of the generated polishing spots were investigated. From the results, it can be confirmed that the developed MR fluid polishing system can be applied for stable and predictable precise polishing of optical parts.

Powder blasting을 이용한 Fused silica glass의 마이크로 채널 가공 및 특성 평가에 관한 연구 (Evaluation of micro-channel characteristics of fused silica glass using powder blasting)

  • 이정원;김태민;신봉철
    • Design & Manufacturing
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    • 제14권1호
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    • pp.36-41
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    • 2020
  • Recently, due to the development of MEMS technology, researches for the production of effective micro structures and shapes have been actively conducted. However, the process technology based on chemical etching has a number of problems such as environmental pollution and time problems due to multi-process. Various processes to cope with this process are being studied, and one of the mechanical etching processes is the powder blasting process. This process is a method of spraying fine particles, which has the advantage of being an effective process in manufacturing hard brittle materials. However, it is also a process that adversely affects the material surface roughness and material properties due to the impact of the injection of fine particles. In this study, after fabricating micro-channels in fused silica glass with excellent optical properties among the hard brittle materials, we used the nano indentation system to analyze the micro parts using nano-particles as well as machinability and surface roughness analysis of the processed surface. The analysis was performed for the effective processing of powder blasting.

Thermal Instability of La0.6Sr0.4MnO3 Thin Films on Fused Silica

  • Sun, Ho-Jung
    • 한국재료학회지
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    • 제21권9호
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    • pp.482-485
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    • 2011
  • $La_{0.6}Sr_{0.4}MnO_3$ (LSMO) thin films, which are known as colossal magnetoresistance materials, were prepared on fused silica thin films by conventional RF magnetron sputtering, and the interfacial reactions between them were investigated by rapid thermal processing. Various analyses, namely, X-ray diffraction, transmission electron microscopy combined with energy adispersive X-ray spectrometry, and secondary ion mass spectrometry, were performed to explain the mechanism of the interfacial reactions. In the case of an LSMO film annealed at $800^{\circ}C$, the layer distinction against the underplayed $SiO_2$ was well preserved. However, when the annealing temperature was raised to $900^{\circ}C$, interdiffusion and interreaction occurred. Most of the $SiO_2$ and part of the LSMO became amorphous silicate that incorporated La, Sr, and Mn and contained a lot of bubbles. When the annealing temperature was raised to $950^{\circ}C$, the whole stack became an amorphous silicate layer with expanded bubbles. The thermal instability of LSMO on fused silica should be an important consideration when LSMO is integrated into Si-based solid-state devices.