• 한국전기전자재료학회논문지
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• 제16권8호
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• pp.736-739
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• 2003

We prepared the chalcogenide As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/, Se$\_$75/Ge$\_$25/ thin film. Holographic grating was formed by the He-Ne laser( λ =633 nm). Annealing at 100$^{\circ}C$ and 200$^{\circ}C$ has been used to change the optical property of chalcogenide thin films for holographic grating formation. As the results, large variation of the optical property was generated at the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ chalcogenide film. Diffraction efficiency of the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ film has been enhanced about three times

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회B
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• pp.2568-2573
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• 2008

A drop impact on the liquid film/pool generates several phenomena such as the drop floating, bouncing, formation of vortex ring, jetting, bubble entrapment and splashing. These phenomena depend on the impact velocity, the drop size, the drop properties and the liquid film/pool thickness. These parameters can be summarized by four main dimensionless parameters; Weber number, Ohnesorge number, Froude number and non-dimensional film/pool thickness. In the present study, the phenomena of the splashing and bubble entrapment due to the drop impact on the liquid film/pool were numerically investigated by using a Level Set method for the sharp interface tracking of two distinct phases. After the drop impact, the splashing phenomena with the crown formation and spreading were predicted. Under the specific conditions, the bubble entrapment at the base of the collapsing cavity due to the drop impact was also observed. The numerical results were compared to the available experimental data showing good agreements.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.333-333
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• 2011

We studied the H/D exchange kinetics of pure and acid dopped water-ice film by using the techniques of reactive ions scattering (RIS) and low energy sputtering (LES) with low kinetic energy cesium ion beam (<35 eV). From RIS, neutral water isotopomers were detected in the form of cesium-molecule ion clusters, $CsX^+$ (X= $H_2O$, HDO, $D_2O$). Ionic species, like $H_3O^+$, $DH_2O^+$, $D_2HO^+$, $D_3O^+$, adsorbed on the surface were ejected via LES process. Those techniques allowed us to trace the isotopomeric populations of water-ice film. To show the catalytic effect of excess proton in the H/D exchange reaction, our study was conducted with two types of water-ice films. In film 1, about 0.5 BL of $H_2O$ was adsorbed on HCl (0.1 ML) dopped $D_2O$ (8 BL) film. In film 2, similar amount of $H_2O$ used in film 1 was adsorbed on pure $D_2O$ film. Kinetic data were obtained from each film type for 90-110 K (film 1) and 110-130 K (film 2) and fitted with numerically integrated lines. Through the Arrhenius plot of kinetic coefficient deduced from fitting of the H/D exchange reaction, the activation energy of film 1 and 2 were estimated to be $10{\pm}3kJmol^{-1}$ and $17{\pm}4kJmol^{-1}$. This activation barrier difference could be understood from detailed pictures of H/D exchange. In film 2, both the formation of ion pair, $H_3O^+$ and OH. and proton transfer were needed for the H/D exchange. However, in film 1, only proton transfer was necessary but ion pair formation was not, so this might reduce the activation energy.

• 한국표면공학회지
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• 제53권2호
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• pp.59-66
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• 2020

Effects of Na₂SiO₃ concentration added into 0.1 M NaOH + 0.05 M NaF solution on the formation behavior and properties of PEO films on AZ91 Mg alloy were investigated under 1200 Hz of alternating current (AC) by voltage-time curves, in-situ observation of arc generation behavior and measurements of film thickness, surface roughness and micro vickers hardness. In the absence of Na₂SiO₃ in the 0.1 M NaOH + 0.05 M NaF solution, about 4 ㎛ thick PEO film was formed within 1 min and then PEO film did not grow but white spots were formed by local burning. Addition of Na₂SiO₃ up to 0.2 M caused more increased formation voltage and growth of PEO film with uniform generation of arcs. Addition of Na₂SiO₃ from 0.2 M to 0.4 M showed nearly the same voltage-time behavior and uniform arc generation. Addition of Na₂SiO₃ more than 0.5 M resulted in a decrease of formation voltage and non-uniform arc generation due to local burning. PEO film growth rate increased with increasing added Na₂SiO₃ concentration but maximum PEO film thickness was limited by local burning if added Na₂SiO₃ concentration is higher than 0.5 M. Surface roughness of PEO film increased with increasing added Na₂SiO₃ concentration and appeared to be proportional to the PEO film thickness. PEO film hardness increased with increasing added Na₂SiO₃ concentration and reached a steady-state value of about 930 H_V at more than 0.5 M of added Na₂SiO₃ concentration.

• 한국인쇄학회지
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• 제7권1호
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• pp.16-30
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• 1989

The anodixed aluminium film by sulfuric acid - method has many pores, the inner, called barrier layers, is active. They have strong absorption of dye. on be other, the absorption of dye is lost by Sealing, the surface is not dyed. We make IMAGE FORMATION on the film by the chemical behavior. This study made sure whether ion absorption is not in the barrier layer by IRRS and ESCA, considerated the mechanism of inage formation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1988년도 추계학술대회 논문집
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• pp.91-94
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• 1988

This paper is investigated on the diffraction grating formation of the amorphous As-Se-S-Ge films. AS$\_$40/Se$\_$15/S$\_$36/Ge$\_$10/ film of thickness 0.76 $\mu\textrm{m}$ has achieved a high diffraction efficiency of 4.6%. In this film, high diffraction efficiency is increased to 18% by chemical etching.

• 한국재료학회지
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• 제24권11호
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• pp.632-638
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• 2014

We investigated the effects of DMAB (Borane dimethylamine complex, C2H10BN) in electroless Ni-B film with addition of DMAB as reducing agent for electroless Ni plating. The electroless Ni-B films were formed by electroless plating of near neutral pH (pH 6.5 and pH 7) at $50^{\circ}C$. The electroless plated Ni-B films were coated on screen printed Ag pattern/PET (polyethylene terephthalate). According to the increase of DMAB (from 0 to 1 mole), the deposition rate and the grain size of electroless Ni-B film increased and the boron (B) content also increased. In crystallinity of electroless Ni-B films, an amorphization reaction was enhanced in the formation of Ni-B film with an increasing content of DMAB; the Ni-B film with < 1 B at.% had a weak fcc structure with a nano crystalline size, and the Ni-B films with > 5 B at.% had an amorphous structure. In addition, the Ni-B film was selectively grown on the printed Ag paste layer without damage to the PET surface. From this result, we concluded that formation of electroless Ni-B film is possible by a neutral process (~green process) at a low temperature of $50^{\circ}C$.

• 한국염색가공학회지
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• 제33권3호
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• pp.147-152
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• 2021

Bulk polymerization was used to produce poly(vinyl acetate) with different molecular weights, which were then saponified to prepare poly(vinyl alcohol) (PVA) with different molecular weights. With P_n of 2,060 and 3,240, the optimum film formation concentrations of PVA were found 7.5wt.% and 6.5wt.%, respectively. The drawing characteristics of the PVA film prepared at the optimum film formation concentrations were experimented, as well as the thermal characteristics of the PVA film based on the drawing ratio were observed. When the drawing velocity was fixed, it was found that the drawing ratios of all samples decreased as the heat band gap increased, and the melting temperature of the PVA film slightly increased as the drawing ratio increased regardless of the P_n of PVA.

• Journal of Information Display
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• 제8권2호
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• pp.25-31
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• 2007

MgO thick film for ac-PDPs was formed via electrophoresis deposition process and its effect on luminance and luminance efficiency were evaluated. The electrophoresis deposition process of MgO thick film was optimized through parametric study and defects levels in MgO powders was evaluated using cathodoluminescence spectra measurements. The results demonstrate a possibility of using MgO thick film as electron emission layer for ac-PDPs.

• E2M - 전기 전자와 첨단 소재
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• 제8권5호
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• pp.619-625
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• 1995

Polycrystalline CdTe thin film has been studied for photovoltaic application due to the 1.45 eV band gap energy ideal for solar energy conversion and high absorption coefficient. The formation of low resistance contact to p-CdTe is difficult because of large work function(>5.5eV). Common methods for ohmic contact to p-CdTe are to form a p+ region under the contact by in-diffusion of contact material to reduce the barrier height and modify a p-CdTe surface layer using chemical treatment. In this study, the surface chemical treatment of p CdTe was carried out by H$\_$3/PO$\_$4/+HNO$\_$3/ or K$\_$2/Cr$\_$2/O$\_$7/+H$\_$2/SO$\_$4/ solution to provide a Te-rich surface. And various thin film contact materials such as Cu, Au, and Cu/Au were deposited by E-beam evaporation to form ohmic contact to p-CdTe. After the metallization, post annealing was performed by oven heat treatment at 150.deg. C or by RTA(Rapid Thermal Annealing) at 250-350.deg. C. Surface chemical treatments of p-CdTe thin film improved metal/p-CdTe interface properties and post heat treatment resulted in low contact resistivity to p-CdTe.Of the various contact metal, Cu/Au and Cu show low contact resistance after oven and RTA post-heat treatments, respectively.