• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.195-195
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• 2012

Recently, graphene based solution-gated field-effect transistors (SGFETs) have been received a great attention in biochemical sensing applications. Graphene and reduced graphene oxide (RGO) possess various advantages such as high sensitivity, low detection limit, label-free electrical detection, and ease of fabrication due to their 2D nature and large sensing area compared to 1D nanomaterials- based nanobiosensors. Therefore, graphene or RGO -based SGFET is a good potential candidate for sensitive detection of protons (H+ ions) which can be applied as the transducer in various enzymatic or cell-based biosensing applications. However, reports on detection of H+ ions using graphene or RGO based SGFETs have been still limited. According to recent reports, clean graphene grown by CVD or exfoliation is electrochemically insensitive to changes of H+ concentration in solution because its surface does not have terminal functional groups that can sense the chemical potential change induced by varying surface charges of H+ on CVD graphene surface. In this work, we used RGO -SGFETs having oxygen-containing functional groups such as hydroxyl (OH) groups that effectively interact with H+ ions for expectation of increasing pH sensitivity. Additionally, we also investigate RGO based SGFETs for bio-sensing applications. Hydroloytic enzymes were introduced for sensing of biomolecular interaction on the surface of RGO -SGFET in which enzyme and substrate are acetylcholinesterase (AchE) and acetylcholine (Ach), respectively. The increase in H+ generated through enzymatic reaction of hydrolysis of Ach by AchE immobilized on RGO channel in SGFET could be monitored by the change in the drain-source current (Ids).

• Electrical & Electronic Materials
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• v.16 no.9
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• pp.64.1-64
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• 2003

A metal-ferroelectric [SrBi$_2$Ta$_2$O$\_$9/ (SBT)-high-k-insulator(PrOx)-semiconductor(Si) structure has been fabricated and evaluated as a key part of metal-ferroelectric-insulator-semiconductor-field-effect-transistor MFIS-FET memory, aiming to improve the memory retention characteristics by increasing the dielectric constant in the insulator layer and suppressing the depolarization field in the SBT layer. A 20-nm PrOx film grown on Si(100) showed both a high of about 12 and a low leakage current density of less than 1${\times}$ 10e-8 A/$\textrm{cm}^2$ at 105 MV/cm. A 400-nm SBT film prepared on PrOx/Si shows a preferentially oriented (105) crystalline structure, grain size of about 130 nm and subface roughness of 3.2 nm. A capacitance-voltage hysteresis is confirmed on the Pt/SBT/PrOx/Si diode with a memory window of 0.3V at a sweep voltage width of 12 V. The memory retention time was about 1 104s, comparable to the conventional Pt/SBT/SiO$\_$x/N$\_$y/(SiO$\_$N/)/Si. The gradual change of the capacitance indicates that some memory degradation mechanism is different from that in the Pt/SBT/SiON/Si structure.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.7
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• pp.83-89
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• 1989

Ferroelectric $PbTiO_3$ thin film is deposited with rf sputtering at substrate temperature of $100-150^{\circ}C$. It is found that this has pyrochlore structure of amorphous type by X-ray diffractive analysis. Thermal annealing has excellent characteristics at $550^{\circ}C$ and laser annealing has best crystalline structure in case of scanning with 50 watts. Interface states in MFST and MFOST structure with a $PbTiO_3$ ferroelectric thin film gate have been investigated from analysis of C-V data. The interface states density has been drastically reduced by inserting an oxide layer between ferroelectric and semiconductor. The observed effect increase feasibility of employing ferroelectric thin films such as nonvolatile memory field effect transistor, IR optical FET, and Image Devices with a ferroelectric layer.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.616-616
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• 2013

그래핀(Graphene)은 열전도도가 높고 전자 이동도(200,000 cm2V-1s-1)가 우수한 전기적 특성을 가지고 있어 전계 효과 트랜지스터(Field effect transistor; FET), 유기 전자 소자(Organic electronic device)와 광전자 소자(Optoelectronic device) 같은 반도체 소자에 응용 가능하다. 최근에는 아크 방출(Arc discharge method), 화학적 기상 증착법(Chemical vapor deposition; CVD), 이온-조사법(Ionirradiation)등을 이용한 이종원자(Hetero atom)도핑과 화학적 처리를 이용한 기능화(Functionalization)등의 방법으로 그래핀의 전도도를 향상시킬 수 있었다. 그러나 이러한 방법들은 기판의 표면을 거칠게 하며, 그래핀에 많은 결함들이 발생한다는 단점이 있다. 이러한 단점을 극복하기 위해 자가조립 단층막법(Self-assembled monolayers; SAMs)을 이용하여 기판을 기능화한 후 그 위에 그래핀을 전사하면, 자가조립 단층막의 기능기에 따라 그래핀의 일함수를 조절 가능하고 운반자 농도나 도핑 유형을 변화시켜 소자의 전기적 특성을 최적화 할 수 있다 [1-3]. 본 연구에서는 PET(polyethylene terephthalate) 기판에 SAMs를 이용하여 유연하고 투명한 그래핀 전극을 제작하였다. 산소 플라즈마와 3-Aminopropyltriethoxysilane (APTES)를 이용하여 PET 기판 표면 위에 하이드록실 기(Hydroxyl group; -OH)와 아민 기(Amine group; -NH2)를 순차적으로 기능화 하였고, 그 위에 화학적 기상 증착법을 이용하여 합성한 대면적의 균일한 그래핀을 전사하였다. PET 기판 위에 NH2 그룹이 존재하는 것을 접촉각 측정(Contact angle measurement)과 X-선 광전자 분광법(Xray photoelectron spectroscopy: XPS)을 통해 확인하였으며, NH2그룹에 의해 그래핀에 도핑 효과가 나타난 것을 라만 분광법(Raman spectroscopy)과 전류-전압 특성곡선(I-V characteristic curve)을 이용하여 확인하였다. 본 연구 결과는 유연하고 투명한 기판 위에 안정적이면서 패턴이 가능하기 때문에 그래핀을 기반으로 하는 반도체 소자에 적용 가능할 것이라 예상된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.376.1-376.1
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• 2014

그래핀은 차세대 2차원 물질로서 지금까지 활발히 연구되어 왔으나 밴드갭이 없기 때문에 전자소자로서의 응용이 매우 제한적이다. 최근에 그래핀을 대체할 수 있는 물질로서 Transition Metal Dichalcogenides (TMDs)가 주목을 받고 있다. 특히, TMDs 중에서 $MoS_2$는 bulk일 때 indirect한 1.2 eV인 밴드 갭을 갖고 있으나, layer가 줄어들면서 direct한 1.8 eV인 밴드갭을 가진다. 국내외 여러 연구 그룹에서 $MoS_2$를 이용하여 제작한 Field Effect Transistor (FET)는 high-$\small{K}$ gate가 산입되지 않은 경우에 on-off ratio와 mobility가 각각 $10^6$와 약 $3cm^2/Vs$로 나타나고 있다. 이와 같이 아주 우수한 전기적, 광학적 특성을 갖는 소자 응용성을 가지고 있다. 최근까지의 연구결과들은 대부분 mechanical exfoliation method (MEM) 로 제작된 $MoS_2$ monolayer를 이용하였으나, 이 방법은 large scale 및 layer controllable에는 적합하지 않다. 본 연구에서는 대면적의 집적회로 응용에 적합한 chemical vapor deposition법을 이용하여 $MoS_2$를 성장하였다. 높은 결정성을 위해 sulphur (powder purity 99.99%)와 molybdenum trioxide(powder purity 99.9%)를 이용하고, Ar 가스 분위기에서 sulphur powder 및 molybdenum trioxide powder를 각각 $130^{\circ}C$ 및 $1000^{\circ}C$로 유지하며 $MoS_2$ 박막을 성장하였다. 성장된 $MoS_2$ 박막은 Atomic force Microscopy (AFM)을 통해 박막의 단차와 roughness을 확인하였다. 또한, X-ray Diffraction (XRD) pattern 분석으로 박막의 결정성을 확인하였으며, Raman Spectroscopy, X-ray Photoelectron Spectroscopy (XPS), Photoluminescence (PL) 측정으로 광학적 특성을 분석하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.127-127
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• 2014

인체 내 소량의 생체성분(혈액, 소변 등)을 감지하는 바이오센서 기술은 질병 진단뿐만 아니라 예방 및 관리로 의료서비스 확대, 개인 맞춤형 진료 및 의료비 감소 효과를 가져올 수 있는 기술이다. 광바이오센서는 광학적인 측정방법을 이용하여 다양한 생화학물질들의 상호 반응을 검출해 낼 수 있는 바이오센서로 현재 활발하게 연구가 진행되고 있다. 광 바이오센서는 생체성분 내에 존재하는 전하를 가진 많은 이온들 및 Salt 농도 등에 영향을 받지 않기 때문에 나노 와이어를 이용한 FET (field-effect transistor)형 바이오센서에 비해 많은 장점을 가지고 있다. 일반적으로 광 바이오센서는 형광물질, 인광물질, 발색물질, 방사선 물질 등의 발광물질을 인식물질에 표지하여 인식물질과 분석물질과의 반응유무를 표지된 발광물질의 광학 신호를 감지하여 분석물질을 검출해내는 표지식 광 바이오센서 기술이 상용화되고 있다. 그러나 이러한 분석 방법은 민감도는 우수하지만 분석 시간이 매우 느리고, 고가의 분석 장비 및 복잡한 제조 공정 등의 단점들을 가지고 있다. 이러한 단점들을 극복하기 위하여 생화학 반응 유무를 표지물질 없이 광학적 방식으로 직접 측정할 수 있는 비표지식 광 바이오센서 기술이 최근 들어 많이 연구되고 있다. 본 논문에서는 광파장 이하의 주기를 가진 주기적 공진 격자 표면에서 일어나는 바이오 항원-항체 반응에 대한 공진 반사 파장을 측정하여 생체성분 내에 존재하는 바이오 항원을 고감도로 검출할 수 있는 비표지식 공진반사광 바이오센서 기술을 소개하고자 한다. 공진반사광 바이오센서를 이용하여 human serum내에 존재하는 심근경색 마커인 troponin I (cTnI), creatine kinase MB (CK-MB), myoglobin (MYO)을 0.1 ng/mL 이하의 농도까지 고감도로 측정할 수 있었다.

• Journal of Broadcast Engineering
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• v.18 no.6
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• pp.884-894
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• 2013

In this paper, we investigate the characteristics of power amplifiers and simplified memoryless non-linear power amplifier models for energy efficient communication system. First, we present the transfer function of GaAs FET (Gallium Arsenide Field Effect Transistor) that is widely used for high power amplifier. From those investigations, we introduce the instantaneous efficiencies and methods of amplification by assuming that the saturated current is constant, while perfect linearity is exploited under knee voltage. Then, we discuss four non-linear power amplifier models in a baseband signal processing. Finally, we explain the specified total power consumption model in a base station to achieve the resonable analysis for energy efficient communication.

• Journal of IKEEE
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• v.14 no.4
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• pp.257-262
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• 2010

We design a CMOS front-end with wide variable gain and low power consumption for 5.25 GHz band. To obtain wide variable gain range, a p-type metal-oxide-semiconductor field-effect transistor (PMOS FET) in the low noise amplifier (LNA) section is connected in parallel. For a mixer, single balanced and folded structure is employed for low power consumption. Using this structure, the bias currents of the transconductance and switching stages in the mixer can be separated without using current bleeding path. The proposed front-end has a maximum gain of 33.2 dB with a variable gain range of 17 dB. The noise figure and third-order input intercept point (IIP3) are 4.8 dB and -8.5 dBm, respectively. For this operation, the proposed front-end consumes 7.1 mW at high gain mode, and 2.6 mW at low gain mode. The simulation results are performed using Cadence RF spectre with the Taiwan Semiconductor Manufacturing Company (TSMC) $0.18\;{\mu}m$ CMOS technology.)

• Transactions on Electrical and Electronic Materials
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• v.12 no.6
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• pp.262-266
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• 2011

A simulation study of a current-mode direct current (DC)-DC boost converter is presented in this paper. This converter, with a fully-integrated power module, is implemented by using bipolar complementary metal-oxide semiconductor (BiCMOS) technology. The current-sensing circuit has an op-amp to achieve high accuracy. With the sense metal-oxide semiconductor field-effect transistor (MOSFET) in the current sensor, the sensed inductor current with the internal ramp signal can be used for feedback control. In addition, BiCMOS technology is applied to the converter, for accurate current sensing and low power consumption. The DC-DC converter is designed with a standard 0.35 ${\mu}m$ BiCMOS process. The off-chip inductor-capacitor (LC) filter is operated with an inductance of 1 mH and a capacitance of 12.5 nF. Simulation results show the high performance of the current-sensing circuit and the validity of the BiCMOS converter. The output voltage is found to be 4.1 V with a ripple ratio of 1.5% at the duty ratio of 0.3. The sensing current is measured to be within 1 mA and follows to fit the order of the aspect ratio, between sensing and power FET.

• Journal of Sensor Science and Technology
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• v.29 no.1
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• pp.14-18
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• 2020

This study investigates the nitrogen dioxide (NO₂) sensing characteristics of an Si MOSFET gas sensor with a tungsten trioxide (WO₃) sensing layer deposited using the sputtering method. The Si MOSFET gas sensor consists of a horizontal floating gate (FG) interdigitated with a control gate (CG). The WO₃ sensing layer is deposited on the interdigitated CG-FG of a field effect transistor(FET)-type gas sensor platform. The sensing layer is deposited with different thicknesses of the film ranging from 100 nm to 1 ㎛ by changing the deposition times during the sputtering process. The sensing characteristics of the fabricated gas sensor are measured at different NO₂ concentrations and operating temperatures. The response of the gas sensor increases as the NO₂ concentration and operating temperature increase. However, the gas sensor has an optimal performance at 180℃ considering both response and recovery speed. The response of the gas sensor increases significantly from 24% to 138% as the thickness of the sensing layer increases from 100 nm to 1 ㎛. The sputtered WO₃ film consists of a dense part and a porous part. As reported in previous work, the area of the porous part of the film increases as the thickness of the film increases. This increased porous part promotes the reaction of the sensing layer with the NO₂ gas. Consequently, the response of the gas sensor increases as the thickness of the sputtered WO₃ film increases.