• Journal of Sensor Science and Technology
• /
• v.13 no.2
• /
• pp.90-95
• /
• 2004

Protein and gene detection have been growing importance in medical diagnostics. Field effect transistor (FET) - type biosensors have many advantages such as miniaturization, standardization, and mass-production. In this work, we have fabricated metal-oxide-semiconductor (MOS) FET that operates as molecular recognitions based electronic sensor. Measurements were taken with the devices under phosphate buffered saline solution. The drain current ($I_{D}$) was decreased after forming self-assembled mono-layers (SAMs) used to capture the protein, which resulted from the negative charges of SAMs, and increased after forming protein by 11.5% at $V_{G}$ = 0 V due to the positive charges of protein.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.11-11
• /
• 2007

1차원 구조체인 반도체 나노선은 앙자제한효과 (quantum confinement effect) 등을 이용하여 고밀도/고효율의 소자 개발이 기대되고 있다. GaN는 상온에서 3.4 eV의 밴드갭 에너지를 갖는 III-V 족 반도체 재료로써 박막의 경우 광전자 소자로 폭넓게 응용되고 있다. 최근 GaN 나노선의 합성에 성공하면서 발광소자, 고효율의 태양전지, HEMT 등으로의 응용을 위한 많은 연구가 활발히 이루어지고 있다. 하지만, 아직까지 GaN 나노선의 전기적 특성을 제어하는 기술은 확립되지 않고 있다. 본 연구에서는 Vapor solid (VS)법을 이용하여 GaN 나노선을 합성하였으며, GaN 분말과 함께 $Mg_2N_3$ 분말을 첨가하여 (Ga,Mg)N 나노선을 성공적으로 합성하였다. 합성시에 GaN와 Mg 소스간의 거리 변화를 통해 Mg 도핑농도를 제어하고자 하였다. 이 같은 방법으로 합 된 (Ga,Mg)N 나노선의 Mg 도핑농도에 따른 결정학적 특성을 알아보고, (Ga,Mg)N 나노선을 이용하여 소자를 제작한 후 그 전기적 특성을 살펴보고자 한다. X-ray diffraction (XRD)과 high-resolution transmission electron microscopy (HRTEM), EDX를 이용하여 합성된 나노선의 결정학적 특성과 Mg의 도핑 농도를 확인하였다. Photo lithography와 e-beam lithography법을 이용하여 (Ga,Mg)N 나노선 field-effect transistor (FET)를 제작하고, channel current-drain voltage ($I_{ds}-V_{ds}$) 와 channel current-gate voltage ($I_{ds}-V_g$) 측정을 통해 (Ga,Mg)N 나노선이 도핑 농도에 따라 n형에서 p형으로 전기적 특성이 변화함을 확인하였다.

• Korean Journal of Materials Research
• /
• v.10 no.4
• /
• pp.270-275
• /
• 2000

The Pt/YMnO$_3$/Y$_2$O$_3$/Si structure for metal/ferroelectric/insulator/semiconductor(MFIS)-FET was fabricated and effect of $Y_2$O$_3$layer on the properties of MFIS structure was investigated. The $Y_2$O$_3$ thin films on p-type Si(111) substrate deposited by Pulsed Laser Deposition were crystallized along (111) orientation irrespective of the deposition temperatures. Ferroelectric YMnO$_3$ thin films deposited directly on p-type Si (111) by MOCVD resulted in Mn deficient layer between Si and YMnO$_3$. However, YMnO$_3$ thin films having good quality and stoichiometric composition can be obtained by adopting $Y_2$O$_3$ buffer layer. The memory window of the $Y_2$O$_3$thin films with YMnO$_3$ film is greater than that of the YMnO$_3$ thin films without $Y_2$O$_3$ film after the annealing at 85$0^{\circ}C$ in vacuum ambient(100mtorr). The memory window is 1.3V at an applied voltage of 5V.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2014.02a
• /
• pp.179.2-179.2
• /
• 2014

Carbon nanotubes (CNT)-metal contacts play an important role in nanoelectronics applications such as field-effect transistor (FET) devices. Using Al and (10,0) CNT, we have recently showed that the CNT-metal contacts mediated via topological defects within CNT exhibits intrinsically low contact resistance, thanks to the preservation of the sp2 bonding network at the metal-CNT contacts.[1] It is well-established that metals with good wetting property such as Pd consistently yield good contacts to both metallic and semiconducting CNTs. In this work, the electronic and charge transport properties of the interfaces between capped CNT and Pd will be investigated based on first-principles computations and compared with previous results obtained for the Al electrodes.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2010.05a
• /
• pp.25.1-25.1
• /
• 2010

본 연구에서는 절연막에 삽입시킨 실리콘 나노와이어 유연소자를 제작하고 그 소자의 전기적 특성을 분석하여 유연소자로서의 적합성을 평가하였다. 최근 반도체 및 디스플레이 등이 다양한 현장에 응용되면서 유연성을 이용한 소자의 필요성이 대두되고 있다. 이러한 요구를 바탕으로 나노와이어를 유연소자에 적용시키기 위하여 삽입방법을 이용하여 field-effect transistor(FET) 소자를 제작하였다. 유연소자의 기판으로는 polyimide(PI) 및 poly(ethylene 2,6 naphtahalate)(PEN)을 사용하였고, 절연막은 poly-4-vinylphenol(PVP)을 이용하였으며 이때, 나노와이어는 무전해 식각법으로 합성한 실리콘 나노와이어를 사용하였다. 이렇게 제작된 유연소자를 휨 상태 및 삽입된 정도에 따른 전기적 특성을 비교하였고 휨 테스트를 통하여 소자의 안정성을 분석하였다. 전기적 특성은 I-V 측정을 통하여 Ion/Ioff ratio, 이동도, subthreshold swing, threshold voltage값 등을 평가하였다.

• Journal of the Korean Institute of Telematics and Electronics
• /
• v.16 no.2
• /
• pp.24-34
• /
• 1979

In this paper characteristics of the Ebers-Mull , charge control and Linvill iumped models are reviewed. A 1%eery for systematically modeling solid state device by F.A Lind helm and D. J. Hamilton is discussed in detail. Nonlinear and linear modeds for the junction field effect transistor are derived from the systematic modeling theory. Computer program for the transient analysis is develooped and application of the program to the RC amplifler shows guod results.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.195.2-195.2
• /
• 2013

플라즈마 중합 증착기술을 이용하여 ppMMA (plasma polymerized methyl methacrylate) 및 ppS (plasma polymerized styrene) 박막을 제작하고, ppMMA를 게이트 절연층, polymer electret인 ppS를 메모리층으로 한 전계효과트랜지스터 기반 유기 메모리 소자를 제작하였다. 메모리층인 ppS의 두께를 각각 30, 60, 90 nm로 달리한 유기 메모리 소자가 C-V 및 I-V 특성에서 나타내는 히스테리시스 현상을 분석하여 메모리 특성을 평가했으며, 메모리층의 두께 변화에 따른 유기 메모리 소자의 성능을 비교분석하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2012.05a
• /
• pp.220-220
• /
• 2012

저밀도 알곤 유도결합플라즈마(Ar-ICP) 를 적용한 그래핀 클리닝 연구를 보고한다. 알곤 축전결합플라즈마(Ar-CCP)는 높은 이온포격에너지 (수백 eV) 로 인하여 그래핀의 C-C $sp_2$ bonding을 쉽게 파괴하고 defect을 형성시킨다. 그러나 저밀도 ($n_i$ < $5{\times}10^8cm^{-3}$) Ar-ICP 에 노출된 그래핀은 낮은 이온포격에너지, 이온밀도로 인하여 defect 이 형성되지 않고 residue 제거가 가능하였다. Graphene 이 집적된 back-gated field effect transistor (G-FET) 가 저밀도 Ar-ICP 에 노출될 경우 resist residue 제거로 인하여 $V_{dirac}$ 이 0 V 방향으로 이동하고 mobility 가 증가하는 것을 확인하였다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.382-383
• /
• 2013

Gate-controlled spin-orbit interaction parameter is a key factor for developing spin-Field Effect Transistor (Spin-FET) in a quantum well structure because the strength of the spin-orbit interaction parameter decides the spin precession angle [1]. Many researches show the control of spin-orbit interaction parameter in n-type quantum channels, however, for the complementary logic device p-type quantum channel should be also necessary. We have calculated the spin-orbit interaction parameter and the effective mass using the Shubnikov-de Haas (SdH) oscillation measurement in a GaSb two-dimensional hole gas (2DHG) structure as shown in Fig 1. The inset illustrates the device geometry. The spin-orbit interaction parameter of $1.71{\times}10^{11}$ eVm and effective mass of 0.98 $m^0$ are obtained at T=1.8 K, respectively. Fig. 2 shows the gate dependence of the spin-orbit interaction parameter and the hole concentration at 1.8 K, which indicates the spin-orbit interaction parameter increases with the carrier concentration in p-type channel. On the order hand, opposite gate dependence was found in n-type channel [1,2]. Therefore, the combined device of p- and n-type channel spin transistor would be a good candidate for the complimentary logic device.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.22 no.12
• /
• pp.1009-1013
• /
• 2009

In this study, we have been synthesized the dielectric layer using pure organic and organic-inorganic hybrid precursor on flexible substrate for improving of the organic thin film transistors (OTFTs) and, design and fabrication of organic thin-film transistors (OTFTs) using small-molecule organic semiconductors with pentacene as the active layer with record device performance. In this work OTFT test structures fabricated on polymerized substrates were utilized to provide a convenient substrate, gate contact, and gate insulator for the processing and characterization of organic materials and their transistors. By an adhesion development between gate metal and PI substrate, a PI film was treated using $O_2$ and $N_2$ gas. The best peel strength of PI film is 109.07 gf/mm. Also, we have studied the electric characteristics of pentacene field-effect transistors with the polymer gate-dielectrics such as cyclohexane and hybrid (cyclohexane+TEOS). The transistors with cyclohexane gate-dielectric has higher field-effect mobility, $\mu_{FET}=0.84\;cm^2/v_s$, and smaller threshold voltage, $V_T=-6.8\;V$, compared with the transistor with hybrid gate-dielectric.