• Title/Summary/Keyword: Fe thin film

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Magnetism and Magnetocrystalline Anisotropy of CoFe Thin Films: A First-principles Study (CoFe 박막의 자성과 자기결정이방성에 대한 제일원리계산)

  • Kim, Eun Gu;Jekal, So Young;Kwon, Oryong;Hong, Soon Cheol
    • Journal of the Korean Magnetics Society
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    • v.24 no.2
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    • pp.35-40
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    • 2014
  • We investigate magnetism and magnetocrystalline anisotropy of CoFe thin films, using VASP code in GGA. In this study Co-terminated and Fe-terminated 5-layer CoFe thin films are employed. The Co-terminated CoFe thin film shows two total energy minima at 2-dimensional lattice constants of $2.45{\AA}$ and $2.76{\AA}$. The film of $2.45{\AA}$ has fcc-like structure and the film of $2.76{\AA}$ has bcc-like structure similarly to a bulk CoFe alloy. And the fcc-like film is more stable by the energy difference of about 160 meV compared to the bcc-like film. The Fe-terminated CoFe film shows very complicated behaviour of total energy which is suspected to be closely related to its complex magnetic structure. The Co-terminated CoFe film of $2.76{\AA}$ shows perpendicular magnetocrystalline anisotropy (MCA), while the film of 2.45 does parallel MCA. The Fe-terminated CoFe film also exhibits similar MCA behaviour.

Fabrication of Fe3O4 Thin Film using Reactive DC Magnetron Sputtering (반응성 DC 마그네트론 스퍼터링으로 Fe3O4 박막 제조에 관한 연구)

  • Jung, Minkyung;Park, Sungmin;Park, Daewon;Lee, Seong-Rae
    • Korean Journal of Metals and Materials
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    • v.47 no.6
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    • pp.378-382
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    • 2009
  • We investigated the effects of deposition conditions on the fabrication of $Fe_{3}O_{4}$ thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated $Fe_{3}O_{4}$ film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the $Fe_{3}O_{4}$ film were298 emu/cc, $4.0{\times}10^{-2}{\Omega}cm$, and 125 K, respectively.

Magnetic Properties of Fe-System Thin Films with Non-equilibrium Phases (비평형 Fe계 박막의 자기 특성)

  • Kim, H.S.;Min, B.K.;Song, J.S.;Oh, Y.W.;Lee, W.J.;Lee, D.Y.;Kim, l.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.05b
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    • pp.13-16
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    • 2000
  • In this study, we have fabricated nonequilibrium $Fe_{85.6}Zr_{3.3}B_{5.7}Ag_{5.4}$ thin film, which contains an additional insoluble element Ag, by using DC magnetron sputtering method. We have investigated the magnetic properties of amorphous $Fe_{85.6}Zr_{3.3}B_{5.7}Ag_{5.4}$ thin film as a function of rotational field annealing(RFA). After deposition, the amorphous $Fe_{85.6}Zr_{3.3}B_{5.7}Ag_{5.4}$ thin film annealed by rotational field annealing method at $350^{\circ}C$ for an hour was founded to have high permeability of 8680 of 100 MHz, 0.2 mOe, low coercivity of 0.86 De and very low core loss of 1.3 W/cc at 1 MHz, 0.1T.

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Magnetisation reversal dynamics in epitaxial Fe/GaAs(001) and Fe/InAs(001) thin films

  • Lee, W. Y.;K. H. Shin;Kim, H. J.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2000.09a
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    • pp.230-238
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    • 2000
  • We present the magnetisation reversal dynamics of epitaxial Fe thin films grown on GaAs(001) and InAs(001) studied as a function of field sweep rate in the range 0.01-160 kOe/s using magneto-optic Kerr effect (MOKE). For 55 and 250 ${\AA}$ Fe/GaAs(001), we find that the hysteresis loop area A follows the scaling relation A ∝ H$\^$${\alpha}$/ with ${\alpha}$=0.03∼0.05 at low sweep rates and 0.33-0.40 at high sweep rates. For the 150 ${\AA}$ Fe/InAs(001) film, ${\alpha}$ is found to be ∼0.02 at low sweep rates and ∼0.17 at high sweep rates. The differing values of ${\alpha}$ are attributed to a change of the magnetisation reversal process with increasing sweep rate. Domain wall motion dominates the magnetisation reversal at low sweep rates, but becomes less significant with increasing sweep rate. At high sweep rates, the variation of the dynamic coercivity H$\sub$c/ is attributed to domain nucleation dominating the reversal process. The results of magnetic relaxation studies for easy-axis reversal are consistent with the sweeping of one or more walls through the entire probed region (∼100 $\mu\textrm{m}$). Domain images obtained by scanning Kerr microscopy during the easy cubic axis reversal process reveal large area domains separated by zigzag walls.

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Bonding And Anti-bonding Nature of Magnetic Semiconductor Thin Film of Fe(TCNQ:tetracyanoquinodimethane)

  • Jo, Junhyeon;Jin, Mi-jin;Park, Jungmin;Modepalli, Vijayakumar;Yoo, Jung-Woo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.294-294
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    • 2014
  • Developing magnetic thin films with desirable physical properties is a key step to promote research in spintronics. Organic-based magnetic material is a relatively new kind of materials which has magnetic properties in a molecular and microscopic level. These materials have been constructed by the coordination between 3d transition metal and organic materials producing long-range magnetic orders with a relatively high transition temperature. However, these materials were mostly synthesized as a form of powder, which is difficult to study for their physical properties as well as apply for electronic/spintronic devices. In this study, we have employed physical vapor deposition (PVD) to develop a new organic-based hybrid magnetic film that is achieved by the coordination of Fe and tetracyanoquinodimethane (TCNQ). The IR spectra of the grown film show modified CN vibration modes in TCNQ, which suggest a strong bonding between Fe and TCNQ. The thin film has both ferromagnetic and semiconducting behaviors, which is suitable for molecular spintronic applications. The high resolution photoemission (HRPES) spectra also show shift of 1s peak point of nitrogen and the carbon 1s peaks display traces of charge transfer from Fe to TCNQ as well as shake-up features, which suggest strong bonding and anti-bonding nature of coordination between Fe and TCNQ.

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A Study on Fabrication of Magnetic Thin Film Inductors for DC-DC Converter

  • Lee, Young-Ae;Kim, Sang-Gi;Do, Seung-Woo;Lee, Yong-Hyun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.225-225
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    • 2010
  • In this study, the optimum structure of a magnetic thin film inductor was designed for application of DC-DC converters. The $Ni_{81}Fe_{19}$ (at%) alloy was selected as a high-frequency($\geq$ MHz) magnetic thin film core material and deposited on various substrates (bare Si, $SiO_2$ coated Si) using a high vacuum RF magnetron sputtering system. As-deposited NiFe thin films show similar magnetic properties compared to bulk NiFe alloys, indicating that they have a good film quality. The optimum design of solenoid-type magnetic thin film inductors was performed utilizing a Maxwell computer simulator (Ansoft HFSS V7.0 for PC) and parameters obtained from the magnetic properties of magnetic core materials selected. The high-frequency characteristics of the inductance(L) and quality factor(Q) obtained for the designed inductors through simulation agreed well with those obtained by theoretical calculations, confirming that the simulated result is realistic. The optimum structure of high-performance ($Q{\geq}60$, $L\;=\;1{\mu}H$, efficiency${\geq}90%$), high-frequency (${\geq}5MHz$), and solenoid-type magnetic thin film inductors was designed successfully.

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Crystal orientation of $Ni_{81}Fe_{19}$ thin film prepared by facing targets sputtering method (대향타겟식 스퍼터법으로 제작한 $Ni_{81}Fe_{19}$박막의 결정배향성)

  • 김용진;박창옥;최동진;김경환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.185-188
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    • 2000
  • Crystal orientation of Ni$_{18}$ $Fe_{19}$ thin films prepared by facing targets sputtering system was investigated. FTS system can deposit a high quality thin film and control deposition conditions in wide range. T he crystallographic characteristics of Ni$_{18}$ $Fe_{19}$ thin films on variation of thickness and substrate tempera ture was investigated by XRD and AFM. As a result, we obtained Ni$_{18}$ $Fe_{19}$ thin films prepared at subst rate temperature room temperature, thickness 160nm and over revealed good crystal orientation to [111] direction.irection.

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Analysis of Microwave Permeability and Damping Constant in Amorphous CoFeHfO Thin Film (비정질 CoFeHfO 박막 재료의 마이크로파 투자율 및 감쇠상수 분석)

  • Kim, Dong-Young;Yoon, Seok-Soo
    • Journal of the Korean Magnetics Society
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    • v.19 no.4
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    • pp.147-151
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    • 2009
  • The saturation magnetization and uniaxial anisotropy constant were obtained from magnetization and torque curves measurement in high resistive CoFeHfO thin film. The measured results were used for the analysis of the microwave complex permeability based on Landau-Lifshitz-Gilbert (LLG) theory. The high resistive CoFeHfO thin films showed very low damping constants of ${\alpha}$ = 0.014. The results are interpreted in terms of various magnetic phase with very low damping constant, which were existing inside the CoFeHfO thin film, through the linewidth analysis of the ferromagnetic resonance signal with magnetic field.

Co-deposition of Si Particles During Electrodeposition of Fe in Sulfate Solution (황산철 도금액 중 Si 입자의 공석 특성)

  • Moon Sung-Mo;Lee Sang-Yeal;Lee Kyu-Hwan;Chang Do-Yon
    • Journal of the Korean institute of surface engineering
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    • v.37 no.6
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    • pp.319-325
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    • 2004
  • Fe thin films containing Si particles were prepared on metallic substrates by electrodeposition method in sulfate solutions and the content of codeposited Si particles in the films was investigated as a function of applied current density, the content of Si particels in the solution, solution pH, solution temperature and concentration of $FeSO_4$$7H_2$O in the solution. The amount of Si codeposited in the film was not dependent on the applied current density, solution pH and solution temperature, while it was dependent on the content of Si particles in the solution and the concentration of $FeSO_4$$7H_2$O in the solution. The amount of Si codeposited in the film increased with increasing content of Si particles in the solution but reached a maximum value of about 6 wt% when the content of Si particles in the solution exceeds 100 g/l. On the other hand, the content of Si codeposited in the film increased up to about 17 wt% with decreasing concentration of $FeSO_4$$7H_2$O in the solution. These results would be applied to the fabrication of very thin Fe-6.5 wt% Si sheets for electrical applications.