• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05c
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• pp.15-17
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• 2002

Leakage inductance and temperature rise are two of the more impotent problems facing the magnetic core technology of today's high frequency transformers. Excessive leakage inductance increases the stress on the switching transistors and limits the duty-cycle, and excessive temperature rise can lead the design limitation of high frequency transformer with high current. The flat transformer technology provides a very good solution to the problems of leakage inductance and thermal management for high frequency power. The critical magnetic components and windings are optimized and packaged within a completely assembled module. The turns ratio in a flat transformer is determined as the product of the number of elements or modules times the number of primary turns. The leakage inductance increase proportionately to the number of elements, but since it is reduced as the square of the turns, the net reduction can be very significant. The flat transformer modules use cores which have no gap. This eliminates fringing fluxes and stray flux outside of the core. The secondary windings are formed of flat metal and are bonded to the inside surface of the core. The secondary winding thus surrounds the primary winding, so nearly all of the flux is captured.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.53-54
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• 2005

We report on plasma damage free-sputtering technologies for organic light emitting diodes (OLEDs), organic thin rim transistor (OTFT) and flexible displays by using a box cathode sputtering (BCS) method. Specially designed BCS system has two facing targets generating high magnetic fields ideally entering and leaving the targets, perpendicularly. This target geometry allows the formation of high-density plasma between targets and enables us to realize plasma damage free sputtering on organic layer without protection layer against plasma. The OLED with top cathode prepared by BCS shows electrical and optical characteristics comparable to OLED with thermally evaporated Mg-Ag cathode. It was found that TOLED with ITO or IZO top cathode layer prepared by BCS has much lower leakage current density ($1\times10^{-5}$ mA/cm2 at -6V) than that ($1\times10^{-1}\sim10^{\circ}mA/cm^2$)of OLED prepared by conventional DC sputtering system. This indicates that BCS technique is a promising electrode deposition method for substituting conventional thermal evaporation and dc/rf sputtering in fabrication process of organic based optoelectronics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.9
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• pp.979-982
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• 2004

The ZnO thin films were prepared by the FTS (facing target sputtering) system, which enables to provide high density plasma and a high deposition rate at a low working gas pressure. We introduced the AZO thin film in order to improve the crystallographic properties of ZnO thin film because of the AZO(ZnO:Al) thin film has an equal crystal structure to the ZnO thin film. ZnO/AZO thin films were deposited at a different oxygen gas flow ratio, R.T. 2mTorr working pressure and a 0.8A sputtering current. The film thickness and c-axis preferred orientation of ZnO/AZO/glass thin films were measured by ${\alpha}$-step and an x-ray diffraction (XRD) instrument. In the results, we could prepare the ZnO thin film with c-axis preferred orientation of about 6$^{\circ}$ on substrate temperature R.T. at O$_2$ gas flo rate 0.5.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.151-154
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• 2003

AlN/Al/SiO$_2$/Si thin films for application to FBAR(Film Bulk Acoustic Resonator) devices were prepared by FTS(Facing Targets sputtering system) apparatus which provides a stable discharge at low gas pressures and can deposit high quality thin films because of the substrate located apart from the plasma. The AlN thin films were deposited on a $SiO_2(1{\mu}m)/Si(100)$ substrate using an Al bottom electrode. The process parameters were fixed such as sputering power of 200W, working pressures of 1mTorr and AlN thin film thickness of 800nm, respectively and crytallographic characteristics of AlN thin films were investigated as a function of $N_2$ gas flow rate$[N_2/(N_2+Ar)]$. Thickness of AlN thin films were measured by $\alpha$-step, the crystallographic characteristics and c-axis preferred orientation were evaluated by XRD.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.140-143
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• 2002

In this study, we prepared ZnO/glass and $ZnO/SiO_{2}/Si$ thin film by Facing Targets Sputtering (FTS) system for Film Bulk Acoustic Resonator (FBAR). When the ZnO thin film applied to piezoelectric thin film, it requires good c-axis preferred orientation. And c-axis orientation has a remarkable difference with preparation conditions. Therefore, c-axis orientation must be significantly evaluated according to changing deposition conditions. Moreover, in order to prepare ZnO thin film with good crystallographic properties and progressive of efficiency of product process, the ZnO thin film should have to prepared as low temperature as possible. In this work, we prepared ZnO thin films on slide glass and $SiO_{2}/Si$ substrate. And the crystallographic characteristics of ZnO thin films on sputtering conditions were investigated by alpha-step and X-ray diffraction.

• Proceedings of the KSR Conference
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• 2009.05a
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• pp.365-370
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• 2009

LCA is a tool to support for making decisions by offering information of environmental aspects of products or services. It can be used to make decisions to consumers and NGOs as well as government and enterprises. LCA evaluates the environmental aspects throughout the entire life cycle of a product. Therefore it can quantify and assess environmental impacts from raw material acquisition, manufacturing, distribution, use and disposal to end of life and recycling. The demands of the recycling rate increase and the use of suitable materials for RoHS, REACH, WEEE, ELV which are linked trade with environmental regulation have increased the worldwide. Global warming is the critical challenge of the world facing. And under post-Kyoto protocol each country has to prepare for target reduction, so it became essential to save energy and resources. In addition that, the carbon mark has been run as the way of showing example of CO2 reduction in domestic and it will be extended gradually. And also through the introduction of Eco-label, environmentally-friendly product will be promoted. When those systems are operated, global warming gases (i.e. CO2) can be calculated throughout the entire life of the products by LCA. And the environmental impacts such as harmful material emission in the process of manufacturing, energy consumption, distribution and so on, can also be assessed. Therefore, The basic concepts of LCA technique and various cases and the practical application in the future will be review in this study.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.471-472
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• 2008

The properties of Al doped ZnO (AZO) thin flim for solar cells with various input currents were studied in this paper. Using facing target sputtering with 2wt.% AZO targets, TCO films were deposited on glass(corning 2948) substrate at room temperature. AZO thin films were deposited by 0.2A, 0.4A, 0.6A and 0.8A at the thickness of 300nm. Electrical, optical and structural of thin films investigated by a Hall effect measurement (Ecopia), an UV-VIS spectrometer(HP) and a X-ray diffractometer (Rigaku). As a results, all thin films showed transmittance about 80%, respectively and resistivity was $7.67\times10^{-4}\Omega$-cm at 0.6A.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.8
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• pp.711-715
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• 2003

In this study, we prepared ZnO/glass and ZnO/SiO$_2$/Si thin film by Facing Targets Sputtering (FTS) system for Film Bulk Acoustic Resonator (FBAR). When the ZnO thin film applied to piezoelectric thin film, it requires good c-axis preferred orientation. And c-axis orientation has a remarkable difference with preparation conditions. Therefore, c-axis orientation must be significantly evaluated as a function of deposition conditions. Moreover, in order to prepare ZnO thin film with good crystallographic properties and progressive of efficiency of product process, the ZnO thin film should be prepared as low temperature as possible. In this work, we prepared ZnO thin films on slide glass and SiO$_2$/Si substrate. And the crystallographic characteristics of ZnO thin films on sputtering conditions were investigated by alpha-step and X-ray diffraction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.587-590
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• 2003

The first attention in designing a transformer for low temperature rise should be to reduce losses. Leakage inductance and temperature rise are two of the more impotent problems facing the magnetic core technology of today's high frequency transformers. Excessive leakage inductance increases the stress on the switching transistors and limits the duty-cycle, and excessive temperature rise can lead the design limitation of high frequency transformer with high current. The flat transformer technology provides a very good solution to the problems of leakage inductance and thermal management for high frequency power. The critical magnetic components and windings are optimized and packaged within a completely assembled module. The turns ratio in a flat transformer is determined as the product of the number of elements or modules times the number of primary turns. The leakage inductance increase proportionately to the number of elements, but since it is reduced as the square of the turns, the net reduction can be very significant. The flat transformer modules use cores which have no gap. This eliminates fringing fluxes and stray flux outside of the core. The secondary windings are formed of flat metal and are bonded to the inside surface of the core. The secondary winding thus surrounds the primary winding, so nearly all of the flux is captured.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.2
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• pp.169-174
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• 2024

In this study, the structural, electrical, and optical properties of AZO films of various thicknesses are compared. The AZO films were deposited on a glass substrate by FTS (Facing-Target-Sputtering) This research was conducted to find the optimal thickness for Transparent Conductive Oxide (TCO). AZO has suitable properties for TCO such as low resistivity, and high transmittance. Thin films of all thicknesses showed a transmittance of over 80% in the visible light region and electrical properties improved as thickness increased. It was confirmed that the film of 300 nm thick had the best performance due to its low resistivity, and uniform surface. This research is expected to help find optimal conditions in various fields where TCO is used, such as solar cells, displays, and sensors in the future.