Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.07a
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- Pages.151-154
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- 2003
A study on the crystallographic properties of AlN/Al/SiO$_2$ /Si thin film for FBAR
FBAR용 AlN/Al/SiO$_2$ /Si 박막의 결정학적 특성에 관한 연구
- Kim, G.H. (Gyeongwon Univ.) ;
- Keum, M.J. (Gyeongwon Univ.) ;
- Choi, H.W. (Gyeongwon Univ.) ;
- Kim, K.H. (Gyeongwon Univ.)
- Published : 2003.07.10
Abstract
AlN/Al/SiO