• 제목/요약/키워드: FTO(Fluorine doped tin oxide)

검색결과 53건 처리시간 0.029초

Comparison of transparent conductive indium tin oxide, titanium-doped indium oxide, and fluorine-doped tin oxide films for dye-sensitized solar cell application

  • Kwak, Dong-Joo;Moon, Byung-Ho;Lee, Don-Kyu;Park, Cha-Soo;Sung, Youl-Moon
    • Journal of Electrical Engineering and Technology
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    • 제6권5호
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    • pp.684-687
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    • 2011
  • In this study, we investigate the photovoltaic performance of transparent conductive indium tin oxide (ITO), titanium-doped indium oxide (ITiO), and fluorine-doped tin oxide (FTO) films. ITO and ITiO films are prepared by radio frequency magnetron sputtering on soda-lime glass substrate at $300^{\circ}C$, and the FTO film used is a commercial product. We measure the X-ray diffraction patterns, AFM micrographs, transmittance, sheet resistances after heat treatment, and transparent conductive characteristics of each film. The value of electrical resistivity and optical transmittance of the ITiO films was $4.15{\times}10^{-4}\;{\Omega}-cm$. The near-infrared ray transmittance of ITiO is the highest for wavelengths over 1,000 nm, which can increase dye sensitization compared to ITO and FTO. The photoconversion efficiency (${\eta}$) of the dye-sensitized solar cell (DSC) sample using ITiO was 5.64%, whereas it was 2.73% and 6.47% for DSC samples with ITO and FTO, respectively, both at 100 mW/$cm^2$ light intensity.

Electrodeposition of Gold on Fluorine-Doped Tin Oxide: Characterization and Application for Catalytic Oxidation of Nitrite

  • Rahman, Md. Mahbubur;Li, Xiao-Bo;Lopa, Nasrin Siraj;Lee, Jae-Joon
    • Bulletin of the Korean Chemical Society
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    • 제35권7호
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    • pp.2072-2076
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    • 2014
  • Sub-micrometer size gold particles were electrodeposited on a transparent fluorine-doped tin oxide (FTO) from acetonitrile solution containing $AuCl_4{^-}$ and tetramethylammonium tetraflouroborate (TMATFB) for detecting $NO_2{^-}$. A series of two-electron ($2e^-$) and one-electron ($1e^-$) reductions of the $AuCl_4{^-}-AuCl_2{^-}-Au$ redox systems were observed at FTO and a highly stable and homogeneous distribution of Au on FTO (Au/FTO) was obtained by stepping the potential from 0 to -0.55 V (vs. Ag/$Ag^+$). The Au/FTO electrode exhibited sufficiently high catalytic activity toward the oxidation of $NO_2{^-}$ with a detection limit (S/N = 3) and sensitivity of 2.95 ${\mu}M$ and 223.4 ${\mu}A{\cdot}cm^{-2}{\cdot}mM^{-1}$, respectively, under optimal conditions. It exhibited an interference-free signal for $NO_2{^-}$ detection with excellent recoveries from real samples.

초음파 분무 열분해 증착 중 기판 회전 속도에 따른 플루오린 도핑 된 주석산화물 막의 전기적 및 광학적 특성 (Electrical and Optical Properties of Fluorine-Doped Tin Oxide Films Fabricated at Different Substrate Rotating Speeds during Ultrasonic Spray Pyrolysis Deposition)

  • 이기원;조명훈;안효진
    • 한국재료학회지
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    • 제34권1호
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    • pp.55-62
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    • 2024
  • Fluorine-doped tin oxide (FTO) has been used as a representative transparent conductive oxide (TCO) in various optoelectronic applications, including light emitting diodes, solar cells, photo-detectors, and electrochromic devices. The FTO plays an important role in providing electron transfer between active layers and external circuits while maintaining high transmittance in the devices. Herein, we report the effects of substrate rotation speed on the electrical and optical properties of FTO films during ultrasonic spray pyrolysis deposition (USPD). The substrate rotation speeds were adjusted to 2, 6, 10, and 14 rpm. As the substrate rotation speed increased from 2 to 14 rpm, the FTO films exhibited different film morphologies, including crystallite size, surface roughness, crystal texture, and film thickness. This FTO film engineering can be attributed to the variable nucleation and growth behaviors of FTO crystallites according to substrate rotation speeds during USPD. Among the FTO films with different substrate rotation speeds, the FTO film fabricated at 6 rpm showed the best optimized TCO characteristics when considering both electrical (sheet resistance of 13.73 Ω/□) and optical (average transmittance of 86.76 % at 400~700 nm) properties with a figure of merit (0.018 Ω-1).

VLS 합성법을 이용한 ZnO 나노구조의 특성 (ZnO Nanostructure Characteristics by VLS Synthesis)

  • 최유리;정일현
    • 공업화학
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    • 제20권6호
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    • pp.617-621
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    • 2009
  • Zinc oxide (ZnO)을 금(Au)과 fluorine-doped tin oxide (FTO) 촉매로 산화실리콘($SiO_2$) 기판에 산화아연입자 20 nm, $20{\mu}m$를 각각 사용하여 기체-액체-고체(VLS) 합성법으로 성장시켰다. 나노로드의 표면특성, 화학조성, 그리고 결정특성을 엑스레이회절(X-ray diffraction (XRD)), 에너지 분산형 X선 분광기(Energy-dispersive X-ray spectroscopy (EDX)), 표면 방출주사현미경(Field-emission scanning electron microscope (FE-SEM))으로 분석하였다. ZnO의 입자 크기 뿐만 아니라 결정형태가 성장에 크게 영향을 미쳤다. ZnO의 모든 나노구조가 6방정계(六方晶系), 단일결정구조를 가지고 있었다. 최적온도는 $1030^{\circ}C$, 입자크기는 20 nm이다. 그러므로 Au 대신 플루오린 첨가 도핑으로 전기음성도가 증가된 FTO 증착에 의해서 생성된 나노로드는 경제성 있는 대체물질로서의 가치가 있을 것으로 사료된다.

초음파 분무 열분해법을 이용한 NiCrAl 합금 폼에 코팅된 불소 도핑된 주석 산화물의 영향 (Influence of Fluorine-Doped Tin Oxide Coated on NiCrAl Alloy Foam Using Ultrasonic Spray Pyrolysis Deposition)

  • 신동요;배주원;구본율;안효진
    • 한국재료학회지
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    • 제27권7호
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    • pp.392-397
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    • 2017
  • Fluorine-doped tin oxide (FTO) coated NiCrAl alloy foam is fabricated using ultrasonic spray pyrolysis deposition (USPD). To confirm the influence of the FTO layer on the NiCrAl alloy foam, we investigated the structural, chemical, and morphological properties and chemical resistance by using USPD to adjust the FTO coating time (12, 18, and 24 min). As a result, when an FTO layer was coated for 24 min on NiCrAl alloy foam, it was found to have an enhanced chemical resistance compared to those of the other samples. This improvement in the chemical resistance of using USPD NiAlCr alloy foam can be the result of the existence of an FTO layer, which can act as a protection layer between the NiAlCr alloy foam and the electrolyte and also the result of the increased thickness of the FTO layer, which enhances the diffusion length of the metal ion.

초음파 분무 열 분해법을 통해 제조된 불소 도핑 된 주석 산화물 나노 입자의 전기화학적 특성 (Electrochemical Properties of Fluorine-Doped Tin Oxide Nanoparticles Using Ultrasonic Spray Pyrolysis)

  • 이도영;이정욱;안건형;류도형;안효진
    • 한국재료학회지
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    • 제26권5호
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    • pp.258-265
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    • 2016
  • Fluorine-doped tin oxide (FTO) nanoparticles have been successfully synthesized using ultrasonic spray pyrolysis. The morphologies, crystal structures, chemical bonding states, and electrochemical properties of the nanoparticles are investigated. The FTO nanoparticles show uniform morphology and size distribution in the range of 6-10 nm. The FTO nanoparticles exhibit excellent electrochemical performance with high discharge specific capacity and good cycling stability ($620mAhg^{-1}$ capacity retention up to 50 cycles), as well as excellent high-rate performance ($250mAhg^{-1}$ at $700mAg^{-1}$) compared to that of commercial $SnO_2$. The improved electrochemical performance can be explained by two main effects. First, the excellent cycling stability with high discharge capacity is attributed to the nano-sized FTO particles, which are related to the increased electrochemical active area between the electrode and electrolyte. Second, the superb high-rate performance and the excellent cycling stability are ascribed to the increased electrical conductivity, which results from the introduction of fluorine doping in $SnO_2$. This noble electrode structure can provide powerful potential anode materials for high-performance lithiumion batteries.

분무열분해법에 의하여 제조한 FTO 투명전도막의 F/Sn 비율에 따른 전기, 광학적 특성과 XPS 분석 (Electrical and optical properties of FTO transparent conducting oxide film by spray pyrolysis and its XPS analysis based on F/Sn ratio)

  • 송철규;김창열;허승헌;류도형;좌용호
    • 한국재료학회지
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    • 제17권7호
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    • pp.376-381
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    • 2007
  • Fluorine-doped tin oxide (FTO) thin film was coated on aluminosilicate glass at $450^{\circ}C$ by spray pyrolysis method. In the range of 0-2.7 molar ratio of F/Sn, the variations of electrical conductivity and visible light transmission were investigated. At the F/Sn ratio of 1.765, the film showed the lowest electrical resistivity value of $3.0{\times}10^{-4}{\Omega}\;cm$, the highest carrier concentration of $2.404{\times}10^{21}/cm^3$, and about $8\;cm^2/V{\cdot}sec$ of electronic mobility. The FTO film showed a preferred orientation of (200) plane parallel to the substrate. X-ray photoelectron spectroscopy analysis results indicated that the contents of $Sn^{4+}-O$ bonding are the highest at 1.765 of F/Sn molar ratio.

펄스형 Nd:YAG 레이저를 이용한 FTO 식각에 대한 연구 (A Study on the Scribing of FTO using Pulsed Nd:YAG Laser)

  • 김희제;박성준;손민규;이동길;이경준
    • 전기학회논문지
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    • 제57권8호
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    • pp.1407-1411
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    • 2008
  • In material processing, a laser system with optimal laser parameters has been considered to be significant. Especially, the laser scribing technology is thought to be very important for fabricating DSSC(Dye sensitized solar eel!) modules with good quality. Moreover, the $TEM_{00}$ mode laser beam is the most dominant factor to decide the IPCE(Incident photon to current conversion efficiency) characteristics. In order to get the $TEM_{00}$ mode, a pin-hole is inserted within a simple pulsed Nd:YAG laser resonator. And the spatial field distribution is measured by using three size pin-hole diameters of 2.0, 6.0mm respectively. At that moment, each case has the same laser beam energy by adjusting the discharge voltage and pps(pulse per second). From those results, it is known that the pin-hole size of 2.0mm has the perfect $TEM_{00}$ mode. In addition, at the charging voltage of 1000V, 10pps and the feeding speed of 1.11mm/sec, the SEM photo of FTO(Fluorine-doped tin oxide) thin film layers shows the best scribing trace.

Characterization of Morphology Controlled Fluorine-doped SnO2 Thin Films

  • An, Ha-Rim;An, Hye-Lan;Ahn, Hyo-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.453.1-453.1
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    • 2014
  • Fluorine-doped tin oxide (FTO), which is commonly used in dye-sensitized solar cells (DSSCs), is a promising material of transparent conducting oxides (TCOs) because of advantages such as high chemical stability, high resistance, high optical transparency (>80% at 550nm), and low electrical resistivity (${\sim}10-4{\Omega}{\cdot}cm$). Especially, dye-sensitized solar cells (DSSCs) have been actively studied since Gratzel's research group required FTO substrate as a charge collector. When FTO substrates are used in DSSCs, photo-injected electrons may experience recombination at interface between dye-bonded semiconductor oxides ($TiO_2$) on FTO substrate and the electrolyte. To solve these problems, one is that because recombination at FTO substrate cannot be neglected, thin $TiO_2$ layer on FTO substrate as a blocking layer was introduced. The other is to control the morphology of surface on FTO substrate to reduce a loss of electrons. The structural, electrical, and optical characteristics of morphology controlled-FTO thin films as TCO materials were analyzed by X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), Hall Effect Measurement, and UV spectrophotometer. The performance of DSSCs fabricated with morphology controlled FTO substrates was performed using Power Conversion Efficiency (PCE). We will discuss these results in detail in Conference.

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Effect of Oxygen Flux on FTO Thin Films Using DC and RF Sputtering

  • Park, Eun Mi;Lee, Dong Hoon;Suh, Moon Suhk
    • Applied Science and Convergence Technology
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    • 제24권2호
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    • pp.41-46
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    • 2015
  • Transparent conductive oxides (TCOs) are essential material in optoelectronics such as solar cells, touch screens and light emitting diodes. Particularly TCOs are attractive material for infrared cut off film due to their high transparency in the visible wavelength range and high infrared reflectivity. Among the TCO, Indium tin oxide has been widely used because of the high electrical conductivity and transparency in the visible wavelength region. But ITO has several limitations; expensive and low environmental stability. On the other hands, fluorine doped tin oxide (FTO) is well known for low cost, weather ability and stable in acidic and hydrogen. In this study, two different magnetron sputtering techniques with RF and DC modes at room temperature deposition of FTO thin film was conducted. The change of oxygen content is influence on the topography, transmittance and refractive index.