• Title/Summary/Keyword: F-theta Lens

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Uniformity estimation mathod and application of thin film in Coating lenses (Coating 렌즈에서 박막의 균일성 평가 방법 및 적용)

  • Kim, Yong Geun;Park, Sang-An
    • Journal of Korean Ophthalmic Optics Society
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    • v.7 no.2
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    • pp.175-180
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    • 2002
  • Use spctrophotometer to estimate thin film uniformity of lens, Compare, and analyze thin film uniformity availability selecting two peaks of Reflectance(R%) measuring on spectrum. Wavelength dependence's Reflectance in position of center, middle and edge of lens etc... obtain thin film's thickness (t) from Wavelength region (${\lambda}_1,{\lambda}_2$) of two peaks of Reflectance. $$t=\frac{1}{2(n^2-\sin^2{\theta})^{1/2}}{\times}\frac{{\lambda}_1{\lambda}_2}{{\lambda}_2-{\lambda}_1}$$ If Reflectance pattern is uniformity value in position of center middle of lens, edge etc... thin film has uniformity. Applied thin film uniformity estimation method to 1st layer $MgF_2$(n=1.38) coating lens. It was about thin film's thickness difference 360nm. Can analyze coating lens' thin film uniformity easily from Reflectance relationship measurement about Wavelength dependence.

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DISCOVERY OF A STRONG LENSING GALAXY EMBEDDED IN A CLUSTER AT z = 1.62

  • WONG, KENNETH C.;TRAN, KIM-VY H.;SUYU, SHERRY H.;MOMCHEVA, IVELINA G.;BRAMMER, GABRIEL B.;BRODWIN, MARK;GONZALEZ, ANTHONY H.;HALKOLA, ALEKSI;KACPRZAK, GLENN G.;KOEKEMOER, ANTON M.;PAPOVICH, CASEY J.;RUDNICK, GREGORY H.
    • Publications of The Korean Astronomical Society
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    • v.30 no.2
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    • pp.389-392
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    • 2015
  • We identify a strong lensing galaxy in the cluster IRC 0218 that is spectroscopically confirmed to be at z = 1.62, making it the highest-redshift strong lens galaxy known. The lens is one of the two brightest cluster galaxies and lenses a background source galaxy into an arc and a counterimage. With Hubble Space Telescope (HST) grism and Keck/LRIS spectroscopy, we measure the source redshift to be $z_S=2.26$. Using HST imaging, we model the lens mass distribution with an elliptical power-law profile and account for the effects of the cluster halo and nearby galaxies. The Einstein radius is $^{\theta}E=0.38^{+0.02{\prime}{\prime}}_{-0.01}$ ($3.2^{+0.2}_{-0.1}kpc$) and the total enclosed mass is $M_{tot}(<^{\theta}_E)=1.8^{+0.2}_{-0.1}{\times}10^{11}M_{\odot}$. We estimate that the cluster environment contributes ~ 10% of this total mass. Assuming a Chabrier IMF, the dark matter fraction within $^{\theta}E$ is $f^{Chab}_{DM}=0.3^{+0.1}_{-0.3}$, while a Salpeter IMF is marginally inconsistent with the enclosed mass ($f^{Salp}_{DM}=-0.3^{+0.2}_{-0.5}$).

Optimization of Optics Design for 3D Laser Scanner (3차원 부품 레이저 용접용 스캐너 광학 최적설계)

  • Choi, Hae Woon
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.19 no.6
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    • pp.96-101
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    • 2020
  • In this paper, we present the results of our research to perform 3D laser scanning functions by adding a focusing lens to a conventional 2D laser scanner. For the optical design, the ray-tracing technique was used along with a total of four lenses as the variable incident focusing lens, the collimating lens, and the F-Theta lens. As design variables, the curvature of the incident focusing lens (Lens #1) was assumed to be us, l mm and sumed mm, and the incident angles were set at 0cidenus, l. In addition, the distance between the focusing lens and the collimating lens was set to vary from 5 mm to 15 mm. When the incident focal length was varied from 5 mm to 15 mm, the exit focal length was calculated to vary from 67.5 mm to 56.8 mm for the lens with R = 100 mm and from 108.5 mm to 99.0 mm for the lens with R = 150 mm. When the incident angle was 0°, the focal aberration was only slightly observable at 10㎛ in both the x- and y-direction. At 7.5° was the focal aberration of approximately 20~50㎛ was measured at 20㎛. To investigate the chromatic aberration of the designed optical device, the distortion of the focus was observed when the 550 nm beam was simulated on lens designed for a 980 nm wavelength.

Ultra Precision Machining Technique for Optical System Parts (초정밀 가공기를 활용한 광학계 부품 가공기술)

  • Yang, Sun-Choel;Kim, Sang-Hyuk;Huh, Myung-Sang;Chang, Ki-Soo;Park, Soon-Sub;Won, Jong-Ho;Kim, Geon-Hee
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.11 no.2
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    • pp.13-19
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    • 2012
  • Ultra Precision Machining Techniques, such as manufacturing Micro Lens Array(MLA), off-axis mirror, $F-{\theta}$ lens for laser printer, are achieved, based on technologies in consequence of development of modern high-precision machining mechanism. Above all, FTS(Fast Tool Servo) and STS(Slow Tool Servo) are more innovative technologies for reducing time and development costs. In this paper, it is described that MLA machining technique by FTS, off-axis mirror machining technique by STS, optics for observing space, and development of infrared aspheric lens for a thermal imaging microscope.

Analysis of surface-relief profile for TPHK(Telecentric Paraxial Holographic Kinoform) as a fourier-transform lens using exact raytracking (광선추적법에 의한 푸리에변환 렌즈로서의 TPHK(Telecentric Paraxial Holographic Kinoform)의 표면양각형태에 대한 분석)

  • 김성우;조두진
    • Korean Journal of Optics and Photonics
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    • v.9 no.2
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    • pp.51-58
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    • 1998
  • We investigated surface-relief profiles of the TPHK(telecentric paraxial holographic kinofrm) used as a Fourier-transform lens employing exact geometrical raytracing. For the TPHK of F/8 and focal length of 15 mm, we consider the cases where the thickness of the substrate is 0 and 50 ${\mu}{\textrm}{m}$, dividing the surface-relif profiles into fifty steps from plano-convex to convexplano shapes and varying the angle of incidence($0^{\circ},{2.5}^{\circ},5^{\circ}$). In order to identify appropriate surface-relief profiles, we employ, as criteria of performance, rms spot size, rms deviation from $f{\sin}{\theta}$, peak position and FWHM(full width at half maximum), number of rays abandoned from raytracing etc., which are determined from the result of exact raytracing. It is found that the profile with 80% of its relief thickness facing the image plane gives the best performance regardless of the presence of substrate.

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DPSS UV laser projection ablation of 10μm-wide patterns in a buildup film using a dielectric mask (Dielectric 마스크 적용 UV 레이저 프로젝션 가공을 이용한 빌드업 필름 내 선폭 10μm급 패턴 가공 연구)

  • Sohn, Hyonkee;Park, Jong-Sig;Jeong, Su-Jeong;Shin, Dong-Sig;Choi, Jiyeon
    • Laser Solutions
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    • v.16 no.3
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    • pp.27-31
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    • 2013
  • To engrave high-density circuit-line patterns in IC substrates, we applied a projection ablation technique in which a dielectric ($ZrO_2/SiO_2$) mask, a DPSS UV laser instead of an excimer laser, a refractive beam shaping optics and a galvo scanner are used. The line/space dimension of line patterns of the dielectric mask is $10{\mu}m/10{\mu}m$. Using a ${\pi}$ -shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam; and a telecentric f-${\theta}$ lens focuses it to a $115{\mu}m{\times}105{\mu}m$ flat-top beam on the mask. The galvo scanner before the f-${\theta}$ lens moves the beam across the scan area of $40mm{\times}40mm$. An 1:1 projection lens was used. Experiments showed that the widths of the engraved patterns in a buildup film ranges from $8.1{\mu}m$ to $10.2{\mu}m$ and the depths from $8.8{\mu}m$ to $11.7{\mu}m$. Results indicates that it is required to increase the projection ratio to enhance profiles of the engraved patterns.

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A Study on Flow Characteristics of PBK40 for Glass Lens Forming Process Simulation Using a Plate Heating Type (Plate 가열방식 유리렌즈 성형공정해석을 위한 PBK40 소재의 유동 특성에 관한 연구)

  • Chang, Sung-Ho;Yoon, Gil-Sang;Shin, Gwang-Ho;Lee, Young-Min;Jung, Woo-Chul;Kang, Jeong-Jin;Jung, Tae-Sung;Kim, Dong-Sik;Heo, Young-Moo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.4 s.193
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    • pp.115-122
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    • 2007
  • Recently, remarkable progress has been made in both technology and production of optical elements including aspheric lens. Especially, requirements for machining glass materials have been increasing in terms of limitation on using environment, flexibility of material selection and surface accuracy. In the past, precision optical glass lenses were produced through multiple processes such as grinding and polishing, but mass production of aspheric lenses requiring high accuracy and having complex profile was rather difficult. In such a background, the high-precision optical GMP process was developed with an eye to mass production of precision optical glass parts by molding press. This GMP process can produce with precision and good repeatability special form lenses such as camera, video camera, aspheric lens for laser pickup, $f-\theta$ lens for laser printer and prism, and me glass parts including diffraction grating and V-grooved base. GMP process consist a succession of heating, forming, and cooling stage. In this study, as a fundamental study to develop molds for GMP used in fabrication of glass lens, we conducted a glass lens forming simulation. In prior to, to determine flow characteristics and coefficient of friction, a compression test and a compression farming simulation for PBK40, which is a material of glass lens, were conducted. Finally, using flow stress functions and coefficient of friction, a glass lens forming simulation was conducted.

The Study of Micro Fabrication using Picosecond Laser Ablation (피코초 레이저 어블레이션을 이용한 미세 가공 연구)

  • Noh, Ji-Whan;Sohn, Hyon-Kee;Suh, Jeong;Lee, Jae-Hoon
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.2
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    • pp.25-28
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    • 2010
  • The micro fabrication on the mold material using picosecond laser ablation processing has been studied. We used the two kind of system with picosecond laser. First one is two mirror type scanner and telecentric f-theta lens. Second one is X-Y stage and objective lens. By using these system, the $100{\mu}m$ size chess patterning and $2{\mu}m$ size patterning was fabricated. Especially $2{\mu}m$ size patterning on the mold material can be used as the decorative rainbow color logo for industrial field. In this paper, it is proved the picosecond laser is effective tool for the laser ablation processing.

The Test of Mechanism Operation for 3D Printer Using Polygon Mirror (폴리곤 미러를 이용한 3D 프린터 기구부 동작 테스트)

  • Kwon, Dong-hyun;Heo, Sung-uk;Lim, Ji-yong;Oh, Am-suk;Kim, Wan-sik
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2016.10a
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    • pp.735-737
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    • 2016
  • In this paper, we conducted a test of the 3D printer injection method and LSU (Laser Scanning Unit) feature a fusion of the polygon mirror scanning system that is the core mechanism operation for 3D printers for office laser printers SLA system. These tests ensure that the laser was operating and control well was confirmed that a certain point is output to the X-axis by means of a laser module and a polygon mirror. And confirmed after the F-theta lens is incident on the fixed laser power of the beam, and correction according to the correction beam on the mirror reflection was confirmed jineunji the focus according to the Z-axis upper plate.

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A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser (355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구)

  • Oh, J.Y.;Shin, B.S.;Kim, H.S.
    • Laser Solutions
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    • v.10 no.2
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    • pp.17-24
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    • 2007
  • We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

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