• 제목/요약/키워드: Excimer laser

검색결과 365건 처리시간 0.024초

니켈 전주도금을 위한 PET의 엑시머 레이저 어블레이션 (The excimer laser ablation of PET for nickel electroforming)

  • 신동식;이제훈;서정;김도훈
    • 한국레이저가공학회지
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    • 제6권2호
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    • pp.35-41
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    • 2003
  • In this study, manufacturing of polymer master and mold insert for micro injection molding was investigated. Ablation by excimer laser radiation could be used successfully to make 3-D microstructure of PET. The mechanism for ablative decomposition of PET with KrF excimer laser(λ: 248nm, pulse duration: 5ns) was explained by photochemical process. And this process showed PET to be adopted in polymer master for nickel mold insert. Nickel electroforming by using laser ablated PET master was preferable for replication method. Finally, it was shown that excimer laser ablation can substitute for X-ray lithography of LIGA process in microstructuring.

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Excimer Laser응용 실리콘 결정화 공정에 대한 In-Situ 광학적 연구 (An In-Situ Optical Study on Silicon Crystallization Process Using an Excimer Laser)

  • 김우진;윤창환;박승호;김형준
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.1407-1411
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    • 2003
  • Due to the heat confinement in the shallow region of the target for a short time scale, pulsed laser annealing has received increasing interest for the fabrication of poly-Si thin film transistors(TFTs) on glass as a low cost substrate in the flat panel displays. The formation and growth mechanisms of poly silicon(poly-Si) grains in thin films are investigated using an excimer laser crystallization system. To understand the crystallization mechanism, the grain formations are observed by FESEM analysis. The optical reflectance and transmittance during the crystallization process are measured using HeNe laser optics. A two-step ELC(Excimer Laser Crystallization) process is applied to enhance the grain formation uniformity.

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전주금형 제작을 위한 폴리머의 엑시머 레이저 어블레이션 (Excimer Laser Ablation of Polymer for Electroformed Mold)

  • 이제훈;신동식;서정;김도훈
    • 한국정밀공학회지
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    • 제21권12호
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    • pp.13-20
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    • 2004
  • Manufacturing process for the microfluidic device can include such sequential steps as master fabrication, electroforming, and injection molding. The laser ablation using masks has been applied to the fabrication of channels in microfluidic devices. In this study, manufacturing of polymer master and mold insert for micro injection molding was investigated. Ablation of PET (polyethylene terephthalate) by the excimer laser radiation could be used successfully to make three dimensional master fur nickel mold insert. The mechanism fur ablative decomposition of PET with KrF excimer laser $({\lambda}: 248 nm, pulse duration: 5 ns)$ was explained by photochemical process, while ablation mechanism of PMMA (polymethyl methacrylate) is dominated by photothermal process, the .eaction between PC (polycarbonate) and KrF excimer laser beam generate too much su.face debris. Thus, PET was adopted in polymer master for nickel mold insert. Nickel electroforming using laser ablated PET master was preferable for replication method. Finally, it was shown that excimer laser ablation can substitute for X-ray lithography of LIGA process in microstructuring.

엑사이머 레이저를 이용한 마이크로렌즈 제작 (Microlens Fabrication by Using Excimer Laser)

  • 김철세;김재도;윤경구
    • 한국정밀공학회지
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    • 제20권2호
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    • pp.33-39
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    • 2003
  • A new microlens fabrication technique, the excimer laser lithography is developed. This bases on the pulsed laser irradiation and the transfer of a chromium-on-quartz reticle on to the polymer surface with a proper projection optics system. An excimer laser lithography system with 1/4 and 1/20 demagnification ratios was constructed first, and the photoablation characteristics of the PMMA and Polyimide were experimentally examined using this system. For two different shapes of microlenses, a spherical lens and a cylindrical lens, fabrication techniques were investigated. One for the spherical lens is a combination of the mask pattern projection and fraction effect. The other for the cylindrical lens is a combination of the mask pattern projection and the relative movement of a specimen. The result shows that various shapes of micro optical components can be easily fabricated by the excimer laser lithography.

KrF 엑시머 레이저를 이용한 용융실리카의 미세 습식 식각가공 (Micromachining of Fused Silica by KrF Excimer Laser Induced Wet Etching)

  • 백병선;이종길;전병희;김헌영
    • 소성∙가공
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    • 제11권7호
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    • pp.601-607
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    • 2002
  • Optically transparent materials such as fused silica, quartz and crystal have become important in the filed of optics and optoelectronics. Laser ablation continues to grow as an important technique for micromachining and surface modification of various materials, because many problems caused by direct contact between tools and workpiece can be avoided. Especially, laser ablation with excimer lasers enables fine micromachining of transparent materials such as fused silica, quartz and crystal, etc. In this study, laser-induced wet etching of fused silica in organic solution was conducted. KrF excimer laser was used as a light source and acetone solution of pyrene was used as etchant. Changing the number of laser pulses, micro holes of various depths are fabricated.

New Technology for Creation of LTPS with Excimer Laser Annealing

  • Herbst, Ludolf;Simon, Frank;Rebhan, Ulrich;Osmanow, Rustem;Fechner, Burkhard
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.319-321
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    • 2004
  • We report on progress in developing high-power excimer lasers as well as UV-optics for creating low-temperature poly silicon (LTPS). A new high-power excimer laser offers 315 Watts with high pulse to pulse energy stability. Larger substrates can now be processed in better quality with either the SLS process or the new optics for line beam excimer laser annealing.

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엑시머 레이저를 이용한 PDMS 트랜스퍼 몰드의 제작 (Development of PDMS Transfer Mold using Excimer Laser)

  • 신동식;이제훈;서정
    • 한국레이저가공학회:학술대회논문집
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    • 한국레이저가공학회 2006년도 추계학술발표대회 논문집
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    • pp.96-102
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    • 2006
  • In this study, manufacturing of polymer master, PDMS(poly dimethylsiloxane) transfer mold, and mold insert was investigated for laser LIGA(LIthography Calvanoformung Abformtechnik). Initially, ablation by excimer laser radiation was used successfully to make 3-D microstructure of PET. After then, the PDMS transfer mold was replicated using ablated PET. Finally, epoxy resin tooling on replicated PDMS transfer mold was executed for making mold insert. From these facts we can conclude that excimer laser ablation of polymer and fabricaiton of PDMS transfer mold are reasonable tools to substitute for X-ray lithography of LIGA process in microstructuring.

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Excimer laser annealing of sol-gel derived PZT thin films

  • 도영호;강민규;오승민;강종윤;윤석진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.20-20
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    • 2010
  • The effect of excimer laser annealing on the structural and dielectric behaviors of $PbZr_{0.52}Ti_{0.48}O_3$ (PZT) thin films has been investigated. The amorphous PZT thin films were prepared on Pt/Ti/$SiO_2$/Si substrates by a sol-gel method. The PZT precursor was prepared from lead acetate, zirconium acetylacetonate, and titanium isopropoxide. The starting materials were dissolved in n-propanol and 1,3-propanediol. After, the amorphous PZT thin films were laser-annealed (using KrF excimer laser) as a function of the laser energy density and the number of laser pulse. Structural properties of PZT thin films are characterized by using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The dielectric characterization was done on a RT66A test system and a Agilent 4294A impedance analyzer. The PZT thin films show that excimer laser irradiation drastically improved the crystallization and dielectric properties of the PZT thin films, depending on the energy density and the pulse number.

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n-GaAs 구조에서의 ArF excimer laser annealing에 따른 Photoreflectance 특성 연구 (A Photoreflectance Study of ArF Excimer Laser Annealing and Furnace Annealing)

  • 김기홍;유재인;심준형;배인호;임진환;김진희;유재용
    • 한국진공학회지
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    • 제16권2호
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    • pp.141-144
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    • 2007
  • n-GaAs의 시료를 furnace annealing 처리와 laser annealing 처리를 한 후, PR 방법으로 비교 조사하였다. 시료는 Furnace annealing을 5 분간 $400{\sim}800^{\circ}C$에서 처리한 시료와 ArF excimer laser($30{\sim}50\;W$)로 5 분간 Laser annealing 처리 한 시료로 준비하였다. Furnace로 annealing을 한 경우에 주 신호(정점)는 1.43 eV에서 관측되었는데 비해 laser로 annealing 한 샘플은 1.42 eV로 0.01 eV가 더 작게 관측되었다. 이는 laser annealing이 furnace annealing 보다 표면과 내면에서 일어나는 열처리 효과가 더 고르게 일어나가 때문이다.