• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.155-156
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• 2000

We propose a new in-situ fluorine passivation of poly-Si TFTs by excimer laser annealing to reduce the trap density and improve the reliability significantly. This improvement is due to the formation of stronger Si-F bonds than Si-H bonds which passivate the trap states.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.151-152
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• 2000

For excimer laser crystallization (ELC), energy density, number of pulses, beam uniformity, and condition of initial amorphous Si (a-Si) films are significant factors contributing the final microstructure and the performance of low-temperature polycrystalline Si TFTs. The process and equipment have been achieved a significant improvement, but still, environmental factors associated with initial amorphous Si (a-Si) films and process conditions need to be optimized.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.679-683
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• 2005

In this study, we investigate the characteristic of the poly-Si grain and morphology influenced by XeCl excimer laser system. The stable laser beam source is basic requested; the irradiation beam through optical lens module is more important which limit the grain size smaller than $0.5{\mu}m$. The homogenization lens designs control the poly-Si grain size; so we hardly get enlarge grain size by one laser irradiation scan.

• Proceedings of the KIEE Conference
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• 1987.11a
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• pp.405-407
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• 1987

We calculated the discharge resistance, which is determined by plasma dynamics, of the discharge pumped excimer lasers with charge-transfer type. And investigated the characteristic of discharge voltage and current using EMIP.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.246-249
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• 2009

A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.12-15
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• 2007

Excimer-laser-based crystallization is ideallysuited for forming crystalline Si films on glass substrates for use in active-matrix displays. In this paper, we will report on recent and significant technical advances in light sources and beam delivery systems targeted at enabling ultra-uniform mura-free low-temperature polycrystalline silicon active-matrix backplanes while simultaneously lowering production costs and increasing throughput.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2004.05b
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• pp.324-326
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• 2004

We have obtained ultra-short pulses with a wavelength of 616 nm from a Distributed Feedback Dye Laser pumped by excimer laser. Using the second harmonic generation, we obtained ultra-short pulse at 308nm in ultraviolet region and also performed amplification in 3 stages of XeCl amplifiers.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2006.05a
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• pp.368-370
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• 2006

자외선영역에서 발진하는 엑시머 레이저 장치의 가스 장수명화에 의한 고효율화 방안을 제안하였다. 가스수명에 대하여 불소$(F_2)$의 감소와 불순물 발생에 의한 출력 변화의 이론적 해석 결과를 보고한다.

• Proceedings of the Optical Society of Korea Conference
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• 1989.02a
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• pp.36-38
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• 1989

We have developed Magnetic Pulse Compression System to realize repetitive excimer laser excitation. The principle of this system is to use the large change in permiability owing to the nolinear characteristics of ferro-magnetic material (Metglas2605s-2 metal ribon). Prior to the laser operation, the MPC system was tested with a dummy load (5$\Omega$) and laser head. Laser head has a discharge volume of 1.0 (w) x 2.0 (h) x 20.0(1) cm. This MPC system compressed a 6.2us (FWHM), 80 A pulse into a 0.4us(FWHM), 1.3kA pulse.

• Bulletin of the Korean Chemical Society
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• v.6 no.3
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• pp.164-168
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• 1985

The fluorescence emission of polystyrene-acrylic acid copolymers containing $Eu^{3+}$ in tetrahydrofuran solution was investigated by spectrofluorimetry. The excimer emission increased linearly with the polymer concentration up to approximately $5{\times}10^{-3}$M. Benzene and toluene collisionally quenched the excimer fluorescence and thier rate constants of quenching were determined. Quenching efficiencies decreased in the order: naphthalene > toluene > benzene. Analyses of Rayleigh scattering and europium emission showed no measurable structural changes observed under the experimental conditions.