• 제목/요약/키워드: Exchange bias field

검색결과 57건 처리시간 0.022초

Spin Torque Nano-Oscillator with an Exchange-Biased Free Rotating Layer

  • You, Chun-Yeol
    • Journal of Magnetics
    • /
    • 제14권4호
    • /
    • pp.168-171
    • /
    • 2009
  • We propose a new type of spin torque nano-oscillator structure with an exchange- biased free rotating layer. The proposed spin torque nano-oscillator consists of a fixed layer and a free rotating layer with an additional anti-ferromagnetic layer, which leads to an exchange bias in the free rotating layer. The spin dynamics of the exchange-biased free rotating layer can be described as an additional exchange field because the exchange bias manifests itself by the existance of a finite exchange bias field. The exchange bias field plays a similar role to that of a finite external field. Hence, microwave generation can be achieved without an external field in the proposed structure.

Ferromagnetic Resonance and X-Ray Reflectivity Studies of Pulsed DC Magnetron Sputtered NiFe/IrMn/CoFe Exchange Bias

  • Oksuzoglu, Ramis Mustafa;Akman, Ozlem;Yildirim, Mustafa;Aktas, Bekir
    • Journal of Magnetics
    • /
    • 제17권4호
    • /
    • pp.245-250
    • /
    • 2012
  • Ferromagnetic resonance and X-ray specular reflectivity measurements were performed on $Ni_{81}Fe_{19}/Ir_{20}Mn_{80}/Co_{90}Fe_{10}$ exchange bias trilayers, which were grown using the pulsed-DC magnetron sputtering technique on Si(100)/$SiO_2$(1000 nm) substrates, to investigate the evolution of the interface roughness and exchange bias and their dependence on the NiFe layer thickness. The interface roughness values of the samples decrease with increasing NiFe thickness. The in-plane ferromagnetic resonance measurements indicate that the exchange bias field and the peak-to-peak line widths of the resonance curves are inversely proportional to the NiFe thickness. Furthermore, both the exchange bias field and the interface roughness show almost the same dependence on the NiFe layer thickness. The out-of plane angular dependent measurements indicate that the exchange bias arises predominantly from a variation of exchange anisotropy due to changes in interfacial structure. The correlation between the exchange bias and the interface roughness is discussed.

Annealing Temperature Dependence of Exchange Bias Effect in Short Time Annealed NiFe/NiMn Bilayer Thin Film by FMR Measurement

  • Yoo, Yong-Goo;Park, Nam-Seok;Min, Seong-Gi;Yu, Seong-Cho
    • Journal of Magnetics
    • /
    • 제10권4호
    • /
    • pp.133-136
    • /
    • 2005
  • The NiMn/NiFe bilayer structure which was short time annealed in order to induce unidirectional anisotropy were studied as a function of annealing temperature. The maximum exchange bias field of NiMn/NiFe bilayer was presented at $250^{\circ}C$ after short time annealing process with no external field. The appearance of exchange bias was due to phase transformation of NiMn layer. In plane angular dependence of a resonance field distribution which measured by FMR was analysed as a combined effect of unidirectional anisotropy and uniaxial anisotropy. The resonance field and the line width from FMR measurement were also analysed with annealing temperature.

강자성 공명에 의한 Exchange Bias 연구 (Exchange Bias Study by FMR Measurment)

  • 유용구;박남석;민성기;유성초
    • 한국자기학회지
    • /
    • 제15권5호
    • /
    • pp.265-269
    • /
    • 2005
  • 강자성 공명 측정을 통하여 다양한 층 구성을 갖는 교환 바이어스 박막들의 교환 결합 특성에 대해 연구하였다. 공명자기장의 각도의존 실험을 통하여 일축방향이방성 자기장과 일축이방성 자기장을 구하여 분석하였다. NiFe 단일 박막과 비교하여 교환 바이어스된 NiFe/IrMn, IrMn/NiFe/IrMn, NiFe/IrMn/CoFe 박막들은 큰 일축방향이방성 자기장을 나타내었으며, 일축이방성 자기장 또한 큰 값을 나타내었다. 그러나 NiFe/Cu/IrMn의 경우, Cu의 두께가 두꺼울 때는 매우 작은 일축방향이방성 자기장을 나타내었으며, NiFe 단일 박막과 비슷한 크기의 일축이방성 자기장을 나타내었다. NiFe/IrMn/CoFe 박막의 경우 NiFe와 CoFe 강자성층들에 의해 두 개의 공명 자기장이 나타났다. 그 외에 공명 자기장의 선폭에 관한 분석이 교환 바이어스 특성과 연관하여 논의되어졌다.

Increment of the Exchange Coupling in Fe-Ni Alloy Thin Films Deposited with a Bias Magnetic Field

  • Han, Kyung-Hunn;Kim, Jung-Gi;Cho, Jae-Hun;Lee, Suk-Mock
    • Journal of Magnetics
    • /
    • 제11권2호
    • /
    • pp.77-82
    • /
    • 2006
  • The structure and magnetic properties of Fe-Ni films, deposited by DC magnetron sputtering on Si(111) wafer, have been studied. The spin wave stiffness constant is determined by Brillouin light scattering (BLS) and compared with the value obtained from magnetization measurements. The range of exchange interaction was determined as 0.4 atomic distances in the film deposited in a bias magnetic field, which is 1/2 that in the film grown in no bias magnetic field. The results show that the dimensions of exchange coupling increased by the sputtering in the magnetic field.

Co/IrMn 이층막의 자기적 특성과 Co 두께 및 어닐링의 영향 (Effects of Thickness of Ferromagnetic Co Layer and Annealing on the Magnetic Properties of Co/IrMn Bilayers.)

  • 정정규;이찬규;구본흔;이건환;야스노리하야시
    • 한국재료학회지
    • /
    • 제13권7호
    • /
    • pp.447-452
    • /
    • 2003
  • Effects of annealing and thickness of Co layer in Co/IrMn bilayers on the magnetic properties have been investigated. The highest interfacial exchange coupling energy($J_{K}$ = 0.12 erg/$\textrm{cm}^2$) was obtained for 10 nm Co layer thickness. Exchange bias field is inversely proportional to the magnetization, the thickness of the pinned layer, and the grain size of antiferromagnetic layer. Also it is related to the interfacial exchange energy difference, which is expected to depend on the surface roughness. These results almost agree with the random-field model of exchange anisotropy proposed by Malozemoff. Exchange bias field decreased slowly with increasing annealing temperature up to X$300^{\circ}C$. However, exchange bias field increased above $300^{\circ}C$.

Exchange Bias Coupling Depending on Uniaxial Deposition Field of Antiferromagnetic FeMn Layer

  • Lee, Sang-Suk;Hwang, Do-Guwn
    • Journal of Magnetics
    • /
    • 제15권1호
    • /
    • pp.17-20
    • /
    • 2010
  • The relationship between ferromagnet anisotropic magnetization and the antiferromagnet atomic spin configuration was investigated for various angles of the uniaxial deposition magnetic field of the FeMn layer in the Corning glass/Ta(5nm)/NiFe(7nm)/FeMn(25nm)/Ta(5nm) multilayer that was prepared by the ion beam sputter deposition. The exchange bias field ($H_{ex}$) obtained from the measurement of the easy-axis MR loop decreased to 40 Oe at the deposition field angle of $45^{\circ}$, and to 0 Oe at the angle of $90^{\circ}$. When the difference between the uniaxial axis between the ferromagnet NiFe and the antiferromagnet FeMn was $90^{\circ}$, the strong antiferromagnetic dipole moment of FeMn caused the weak ferromagnetic dipole moment of NiFe to rotate in the interface.

박막 자기 저항 헤드용 자기교환 결합 NiFe/TbCo박막 (Magnetic exchange coupled NiFe/TbCo thin films for thin film magnetoresistive heads)

  • 오장근;조순철;안동훈
    • 한국자기학회지
    • /
    • 제3권4호
    • /
    • pp.293-297
    • /
    • 1993
  • 자기 저항 헤드용 자기 교환 결합 $NiFe/TbCo/Sio_{2}$ 박막을 RF diode 스퍼터링 방법을 이용하여 제조하고, 그 자기적 특성을 측정하였다. TbCo 박막은 Co 타겟 위에 Tb 조각을 부착한 복합 타겟을 사용하였다. 30%의 Tb 면적을 갖는 타겟으로 제조된 NiFe($400\AA$)/TbCo($1500\AA$)/$SiO_{2}$($500\AA$) 시편은 기판 바이어스를 인가하지 않았을 때 25 Oe, 기판 바이어스-55 V를 인가했을 때 12 Oe의 교환자장을 나타냈다. 기판 바이어스 -55 V 이하에서 유효 수평 보자력으 TbCo 층의 수직 보자력에 거의 비례하였고, 28%의 Tb 면적비를 갖는 시편에서도 같은 경향을 나타내었다. 그러나, 교환 자장은 기판 바이어스가 인가되지 않은 경우에 4 Oe로, -55 V에서 7 Oe로 각각 감소하 였다. 1000 W, Tb 면적비 36%에서 증착된 시편에서 100 Oe 정도의 교환 자장을 얻었으며, 보자력은 3 Oe로 작았다. 그리고, NiFe의 두께가 두꺼워짐에 따라 교환 자장의 크기가 감소하였다.

  • PDF

Exchange Coupling in NiFe/Ni Bilayer Fabricated By Electrodeposition

  • Kim, D.Y.;Jeon, S.J.;Kim, K.W.;Yoon, S.S.
    • Journal of Magnetics
    • /
    • 제16권2호
    • /
    • pp.97-100
    • /
    • 2011
  • Bilayers of soft NiFe (150 nm-420 nm) on hard Ni (150 nm) were prepared by electrodeposition. The process of magnetization reversal in the NiFe/Ni bilayers was then investigated. The hysteresis loop generated by a magnetization reversal of soft NiFe under a positive saturation state of a hard Ni layer shows a shift along the negative field axis, which is clear evidence for the exchange spring effect in the NiFe/Ni bilayers. The dependence of the coercive field $H_c$ and exchange bias field Hex on the thickness of the NiFe layer was also investigated. As the NiFe thickness increases from 150 nm to 420 nm, both $H_c$ and $H_{ex}$ decrease rapidly from $H_c$= 51.7 Oe and $H_{ex}$ = 12.2 Oe, and saturate to $H_c$ = 5.8 Oe and $H_{ex}$ = 3.5 Oe.

이온 빔 증착법으로 제작한 NiFe/FeMn/NiFe 3층박막의 버퍼층 Si에 따른 결정성 및 교환결합세기 향상 (Enhancement of Crystallinity and Exchange Bias Field in NiFe/FeMn/NiFe Trilayer with Si Buffer Layer Fabricated by Ion-Beam Deposition)

  • 김보경;김지훈;황도근;이상석
    • 한국자기학회지
    • /
    • 제12권4호
    • /
    • pp.132-136
    • /
    • 2002
  • 유리기관 위에 이온 빔 증착(ion beam deposition ; IBD)법으로 제작한 버퍼층(buffer layer) Si의 두께에 따른 [NiFe/FeMn/NiFe]3층박막의 결정성과 교환결합세기(exchange bias field ; H$_{ex}$)를 조사하였다. 버퍼층 Si는 NiFe층을 fcc(111)로 매우 우세하게 초기에 결정성장 시켰다. Si/NiFe 위의 증착된 FeMn층은 ${\gamma}$-fcc(111)구조로 성장함에 따라 안정되고 큰 H$_{ex}$를 가졌고, 버퍼 110 Oe로 거의 일정하였으며, 상부 FeMn/NiFe 이중구조의 H$_{ex}$는 300 Oe까지 증가하였다. 버퍼층이 Ta일 경우와 비교해서 Si일 때 H$_{ex}$와 결정성이 향상되었다.이 향상되었다.