• Title/Summary/Keyword: Embossing process

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Camera Imaging Lens Fabrication using Wafer-Scale UV Embossing Process

  • Jeong, Ho-Seop;Kim, Sung-Hwa;Shin, Dong-Ik;Lee, Seok-Cheon;Jin, Young-Su;Noh, Jung-Eun;Oh, Hye-Ran;Lee, Ki-Un;Song, Seok-Ho;Park, Woo-Je
    • Journal of the Optical Society of Korea
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    • v.10 no.3
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    • pp.124-129
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    • 2006
  • We have developed a compact and cost-effective camera module on the basis of wafer-scale-replica processing. A multiple-layered structure of several aspheric lenses in a mobile-phone camera module is first assembled by bonding multiple glass-wafers on which 2-dimensional replica arrays of identical aspheric lenses are UV-embossed, followed by dicing the stacked wafers and packaging them with image sensor chips. This wafer-scale processing leads to at least 95% yield in mass-production, and potentially to a very slim phone with camera-module less than 2 mm in thickness. We have demonstrated a VGA camera module fabricated by the wafer-scale-replica processing with various UV-curable polymers having refractive indices between 1.4 and 1.6, and with three different glass-wafers of which both surfaces are embossed as aspheric lenses having $230{\mu}m$ sag-height and aspheric-coefficients of lens polynomials up to tenth-order. We have found that precise compensation in material shrinkage of the polymer materials is one of the most technical challenges, in orderto achieve a higher resolution in wafer-scaled lenses for mobile-phone camera modules.

Verification of Structural Dynamics Modification Using Surface Grooving Technique : Using Optimization with Fully Embossed HDD cover model (극한값으로부터의 최적화를 이용한 그루브를 통한 표면형상변형 동특성 변경법 검증)

  • Park, Mi-You;Sung, Rock-Hoon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.10 no.1
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    • pp.19-24
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    • 2009
  • Structural Dynamics Modification (SDM) is a very effective technique to improve structure's dynamic characteristics by adding or removing auxiliary structures, changing material properties and shape of structure. Among those of SDM technique, the method to change shape of structure has been mostly relied on engineer's experience and trial-and-error process which are very time consuming. In order to develop a systematic method to change structure shape, surface grooving technique is studied and successfully applied to HDD cover model. To verify Surface Grooving Technique, fully embossed HDD cover model was optimized. And comparing with previous optimization result, the effectiveness of this surface grooving technique was checked. The shape of groove and 1 st natural frequency were converged to the same result of previous optimization.

Deposition and Characterization of Antistiction Layer for Nanoimprint Lithography by VSAM (Vapor Self Assembly Monolayer) (기상 자기조립박막 법을 이용한 나노임프린트용 점착방지막 형성 및 특성평가)

  • Cha, Nam-Goo;Kim, Kyu-Chae;Park, Jin-Goo;Jung, Jun-Ho;Lee, Eung-Sug;Yoon, Neung-Goo
    • Korean Journal of Materials Research
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    • v.17 no.1
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    • pp.31-36
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    • 2007
  • Nanoimprint lithography (NIL) is a new lithographic method that offers a sub-10nm feature size, high throughput, and low cost. One of the most serious problems of NIL is the stiction between mold and resist. The antistiction layer coating is very effective to prevent this stiction and ensure the successful NIL results. In this paper, an antistiction layer was deposited by VSAM (vapor self assembly monolayer) method on silicon samples with FOTS (perfluoroctyltrichlorosilane) as a precursor for making an antistiction layer. A specially designed LPCVD (low pressure chemical vapor deposition) was used for this experiment. All experiments were achieved after removing the humidity. First, the evaporation test of FOTS was performed for checking the evaporation temperature at low pressure. FOTS was evaporated at 5 Tow and $110^{\circ}C$. In order to evaluate the temperature effect on antistiction layer, chamber temperature was changed from 50 to $170^{\circ}C$ with 0.1ml of FOTS for 1 minute. Good hydrophobicity of all samples was shown at about $110^{\circ}$ of contact angle and under $20^{\circ}$ of hysteresis. The surface energies of all samples calculated by Lewis acid/base theory was shown to be about 15mN/m. The deposited thicknesses of all samples measured by ellipsometry were almost 1nm that was similar value of the calculated molecular length. The surface roughness of all samples was not changed after deposition but the friction force showed relatively high values and deviations deposited at under $110^{\circ}$. Also the white circles were founded in LFM images under $110^{\circ}$. High friction forces were guessed based on this irregular deposition. The optimized VSAM process for FOTS was achieved at $170^{\circ}C$, 5 Torr for 1 hour. The hot embossing process with 4 inch Si mold was successfully achieved after VSAM deposition.

The Generalized Characteristics of Extinction Ratio for a Directional Coupler and Design of Compact 1310/1550 nm Demultiplexer (방향성 결합기 소멸비 특성의 일반화 경향과 파장분리기의 소형화 설계)

  • Choi, Chul-Hyun;O, Beom-Hoan;Lee, Seung-Gol;Park, Se-Geun;Lee, El-Hang
    • Korean Journal of Optics and Photonics
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    • v.16 no.5
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    • pp.446-449
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    • 2005
  • In a directional coupler, the design process requires repeated calculation of the characteristics of every changed structure, because it is generally difficult to expect the extinction ratio to be optimized over the entire variation of design parameters. In this paper, we systematically simulated the extinction ratio as a function of the design parameters, and analyzed the general tendency of that characteristic. In other words, we could find the generalized extinction ratio curve if the separation distance is normalized by the waveguide width. Here, the extinction ratio is shown to be increased as the normalized frequency (v) and the ratio (d) of the separation distance over the waveguide width were increased. For various structures with same ratio d, all corresponding extinction ratio curves as a function of v coincide with each other. We showed the usefulness of the generalized extinction ratio curve by applying it to the design and the fabrication of 1310/l550 nm demultiplexer, as it was convenient to design a shorter directional coupler with targeted extinction ratio from this curve.

A Study on Scarf Design Using Eco Printing -Focused on the Researcher's Works- (에코 프린팅(Eco Printing)을 활용한 스카프디자인 연구 -연구자의 작품을 중심으로-)

  • Jeong, In Suk;Kang, Ki Yong
    • The Journal of the Korea Contents Association
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    • v.17 no.11
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    • pp.221-228
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    • 2017
  • This paper aimed to find out the eco-friendly approach enabling to directly print patterns and dye colors on fabrics using leaves of plants. In the research process, I found out the 'eco-printing' which could effectively express unique colors and patterns of plants. While eco-printing can design the patterns and colors of plants in nature using the leaves of plant(Eucalyptus), it is difficult to implement because it is not systematically and academically investigated including the dictionary definition in Korea until now. Thus, I tried to define the eco-printing and natural dyeing using leaves or flowers of plants enabling to get natural patterns and colors and do the experimental research and production using the leaves of Eucalyptus. The leaves of Eucalyptus were arranged on a wool scarf and a silk scarf, tied and applied pressure to them and made pigments penetrate into fabrics by heating or steaming them. This approach is to directly print the patterns using the shapes of plants on fabrics unlike the existing approaches dyeing by extracting dyeing solution from natural materials. Furthermore, the change of colors was attempted by using the color fixers. In accordance with the results of this experimental research, the scarf design differentiated from the existing products could be acquired. It was identified that eco-printing could induce the color variables depending on the conditions of each material and environment. For improving the color variables, various kinds of fabrics and divers kinds of materials which can be easily acquired in a daily life will be investigated and compared. Furthermore, it is expected that the experimental research and production techniques on eco-printing be utilized when starting natural dyeing and the scope of natural dyeing be more expanded.

Evaluation of incremental sheet forming characteristics for 3D-structured aluminum sheet - part 2 (3D 구조 알루미늄 판재의 점진판재성형 특성 평가 (제2보))

  • Kim, Young-Suk;Do, Van-Cuong;Ahn, Dae-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.16 no.3
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    • pp.1585-1593
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    • 2015
  • 3D-structured (embossed) aluminum sheets have been used in the heat insulation purpose for automative exhaust parts because of increasing their surface areas and stiffness reinforcement imposed in making the embossing pattern. However, there are many restrictions in press forming of the embossed sheet compared with the flat sheet (non-embossed one) because of its difference in the mechanical properties and the geometrical 3-dimensional shape. In this paper we investigated the deformation characteristic of embossed aluminum sheet in the incremental sheet forming process which has frequently used in the design verification and the trial manufacturing of sheet products. The single point incremental forming (SPIF) experiments for the rectangular cone forming using the CNC machine with a chemical wood-machined die and a circular tool shape showed that the formability of the embossed sheet are better than that of the flat sheet in view of the maximum angle of cone forming. This comes from the fact that the embossed sheet between the tool and the elastic die wall is plastically compressed and the flatted area contributes to increase the plastic deformation. Also the tool path along the outward movement from the center showed a better formability than that of the inward movement from the edge. However the surface quality for the tool path along the outward movement evaluated from the surface deflection is inferior than that of the tool path along the inward movement.

Compact Design and Fabrication of 'Improved QS-MMI' Demultiplexer (Improved QS-MMI' 1.31/1.55μm 파장분리기의 최적화 설계 및 제작)

  • Kim, Nam-Kook;Kim, Jang-Kyum;Choi, Chul-Hyun;O, Beom-Hoan;Lee, Seung-Gol;Park, Se-Gun;Lee, El-Hang
    • Korean Journal of Optics and Photonics
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    • v.16 no.3
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    • pp.248-253
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    • 2005
  • We designed and fabricated a compact multi-mode interference (MMI) wavelength demultiplexer using the concept of 'Improved Quasi-State' modes. The output power and extinction ratio were improved by utilizing modal phase error which is specially occurred in low-index contrast. For a designed demultiplexer, the mode propagation analysis with effective index approximation shows significant improvement of extinction ratio to -25 dB for both $1.31{\mu}m\;and\;1.51{\mu}m$ wavelength region and the split-length was reduced about 1/5 of other MMI devices. The fabricated device shows successful characteristics for both 1.31 and $1.55{\mu}m$ wavelengths. These results demonstrate the potential of low-index materials system and the embossing process for photonic integrated circuits.