Deposition and Characterization of Antistiction Layer for Nanoimprint Lithography by VSAM (Vapor Self Assembly Monolayer) |
Cha, Nam-Goo
(Division of Materials and Chemical Engineering, Hanyang University)
Kim, Kyu-Chae (Division of Materials and Chemical Engineering, Hanyang University) Park, Jin-Goo (Division of Materials and Chemical Engineering, Hanyang University) Jung, Jun-Ho (Precision Machining Group, Korea Institute of Machinery & Materials) Lee, Eung-Sug (Precision Machining Group, Korea Institute of Machinery & Materials) Yoon, Neung-Goo (Sorona Inc., Ltd.) |
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