• Korean Journal of Optics and Photonics
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• v.20 no.1
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• pp.53-56
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• 2009

We applied an ellipsometric technique to get quantitative information about the thickness and refractive index of human Mesenchymal Stem Cells (hMSCs). The images of ellipsometric constants $\Delta$, $\Psi$ for the nucleus region and for the cell body region of hMSCs were obtained by using an Imaging Ellipsomter (IE) for their in vitro state. A numerical inversion method was applied to deduce the refractive index and the thickness of hMSCs from the measured $\Delta$, $\Psi$. Thus the images of the refractive index and those of the thickness of hMSCs for the nucleus region and for the cell body region are reported.

• Proceedings of the Materials Research Society of Korea Conference
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• 1994.05a
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• pp.134-134
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• 1994

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.3
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• pp.228-233
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• 2010

We studied the optical characteristics correlated with low dielectric constants of low-k SiOCH thin films through ellipsometry. The low-k SiOCH thin films were prepared by CCP-PECVD method using BTMSM(Bis-trimethylsilylmethane) precursors deposited on p-Si wafer. The Si-O-CHx, Si-O-Si, Si-CHx, CHx and Si-H bonding groups were specified by FTIR spectroscopic spectra, and the groups coupled with the nano-porous structural organic/inorganic hybrid-type of SiOCH thin films which has extremely low dielectric constant close to 2.0. The structural groups includes highly dense pore as well as ions in SiOCH thin films affecting to complex refraction characteristics of single layer on the p-Si wafer. The structural complexity originate the complex refractive constants of the films, and resulted the elliptical polarization of the incident linearly polarized light source of Xe-light source in the range from 190 nm to 2100 nm. Phase difference and amplitude ratio between s wave and p wave propagating through SiOCH thin film was studied. After annealing, the amplitude of p wave was reduced more than s wave, and phase difference between p and s wave was also reduced.

• Journal of the Optical Society of Korea
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• v.18 no.4
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• pp.350-358
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• 2014

The collapse of Langmuir monolayers of arachidic acid (AA) on water at various rates of molecular area compression has been investigated in situ by imaging ellipsometry (IE). The thickness of the collapsed AA molecules, which are inherently inhomogeneous, was determined by IE with a spatial resolution of a few microns. For the analysis, we determined the dielectric function of AA monolayers from 380 to 1690 nm by conventional spectroscopic ellipsometry. Compression rates ranged from 0.23 to $0.94{\AA}^2/min$. A change of multilayer domains was observed in the in situ IE images. Lower compression rates resulted in more uniform collapsed films. Our experimental results correspond with previous theoretical simulations.

• Korean Journal of Optics and Photonics
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• v.12 no.6
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• pp.472-478
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• 2001

We determined the optical constants and thickness of organic electroluminescence thin films using variable angle spectroscopic ellipsometry. Using the measured transmittance spectra and the spectroscopic ellipsomeoy data of the organic films on glass substrates in the optically transparent region, we determined the effective thickness and the refractive indices of organic thin films. Then by applying a numerical inversion method to variable angle spectro-ellipsometry data, we determined the complex refractive index at each wavelength including the optically absorbing region, as well as the thickness and surface micro-roughness of the organic thin films. The calculated transmittance spectra showed a tight agreement with the measured ones, confining the validity of the present model analysis.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.2
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• pp.240-248
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• 1998

The plasma chemical vapor deposition is one of the most utilized techniques for the diamond growth. As the applications of diamond thin films prepared by plasma chemical vapor deposition(CVD) techniques become more demanding, improved fine-tuning and control of the process are required. The important parameters in diamond film deposition include the substrate temperature, $CH_4/H_2$ gas flow ratio, total, gas pressure, and gas excitation power. With the spectroscopic ellipsometry, the substrate temperature as well as the various parameters of the film can be determined without the physical contact and the destructiveness under the extreme environment associated with the diamond film deposition. It is introduced how the real-time spectroscopic ellipsometry is used and the data are analyzed with the view of getting the growth condition and the accompanied features for a good quality of diamond films. And it is determined the important parameters during the diamond film growth, which include the final sample will be measured with Raman spectroscopy to confirm the diamond component included in the film.

• Transactions on Electrical and Electronic Materials
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• v.13 no.4
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• pp.196-199
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• 2012

CdS thin film was prepared on glass substrate by chemical bath deposition in an alkaline solution. The optical properties of CdS thin film were investigated using spectroscopic ellipsometry. The real (${\varepsilon}_1$) and imaginary (${\varepsilon}_2$) parts of the complex dielectric function ${\varepsilon}(E)={\varepsilon}_1(E)+i{\varepsilon}_2(E)$, the refractive index n(E), and the extinction coefficient k(E) of CdS thin film were obtained from spectroscopic ellipsometry. The normal-incidence reflectivity R(E) and absorption coefficient ${\alpha}(E)$ of CdS thin film were obtained using the refractive index and extinction coefficient. The critical points $E_0$ and $E_1$ of CdS thin film were shown in spectra of the dielectric function and optical constants of refractive index, extinction coefficient, normal-incidence reflectivity, and absorption coefficient. The dispersion of refractive index was analyzed by the Wemple-DiDomenico single-oscillator model.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.198-198
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• 2010

The low-k SiOCH thin films were prepared by CCP-PECVD method using BTMSM(Bis-trimethylsilylmethane) precursors deposited on p-Si wafer. The structural complexity originate the complex refractive constants of the films, and resulted the elliptical polarization of the incident linearly polarized light source of Xe-ramp in the range from 190nm to 2100nm. Phase difference and amplitude ratio between s wave and p wave propagating through SiOCH thin film was studied. After annealing, the amplitude of p wave was reduced more than s wave, and phase difference between p and s wave was also reduced.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.191-194
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• 2005

Evaluating methods of the polar and/or azimuthal anchoring strength coefficients by means of the renormalized transmission spectroscopic ellipsometry are demonstrated. The Anchoring strength coefficients can be evaluated from the measurement of ellipsometric parameters measured by the oblique incident transmission ellipsometry, where the effect of multiplebeam interference is eliminated. The device parameters such as the pretilt angle and cell gap can be determined simultaneously even in the case of the twisted nematic liquid crystal sample cells.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.250-253
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• 2009

Effective methods for monitoring the quality of polycrystalline silicon (poly-Si) films are discussed. Raman spectroscopy is typically used to determine crystallinity of poly-Si, but this method has limitations for data gathering on large substrates for mass production of poly-Si TFT backplanes. Spectroscopic ellipsometry is proposed as an alternative for fast and simple estimation of poly-Si quality on large substrates. By using both ellipsometry and Raman spectroscopy, it is possible to determine whether the quality and uniformity of the poly-Si films meet the criteria required for mass production of TFT backplanes for AMOLED panels.