• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2005.05a
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• pp.30-34
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• 2005

This paper describes the design and manufacturing of a focused-ion-beam machining system which can make small features of nano size. We use a SIMION simulator in order to obtain the design data of an ion column. The simulation result shows that the focal length of ion beam decreases as the applied voltage of object lens increases. Finally, we obtained the good images of a mesh of 50 micrometers by using the adjustment of applied voltage, acceleration power, and dimension of each elements.

• Proceedings of the Optical Society of Korea Conference
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• 2003.02a
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• pp.282-283
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• 2003

광학 렌즈가 빛의 경로에 영향을 주는 것처럼 전자 렌즈는 전자들의 궤적에 영향을 준다. 광학 렌즈의 효과와 전자 렌즈의 효과는 유사성이 매우 높으며 광학에서 사용하는 용어를 전자광학에서 그대로 쓸 뿐만이 아니라 이미 잘 알려져 있는 광학 렌즈에 대한 원리를 전자렌즈 연구에 활용하고 있다. 이러한 유사성에도 불구하고 빛과 전자 그리고 광학 렌즈와 전자 렌즈 사이에는 근본적으로 다른 점이 있기 때문에 전자 렌즈에 대한 체계적인 연구가 요구되고 있다. (중략)

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.473-474
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• 2009

A miniaturized electrostatic column consists of a set of scan-deflector and lens components. Electrical noises of scan-deflectors have been classified by the applied voltage, and analyzed the noise effects of electron beam passing through the deflectors.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1713-1717
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• 2008

We have developed a nanoparticle focusing mask which can generate particle arrays directly on the large area with high resolution. Using this mask, nanomaterials are precisely deposited onto desired positions on a substrate surface. We obtained various sizes of arrays ranging from 80 nm to 6 ${\mu}m$ with silver and copper nanoparticles that are generated by a spark discharge and an evaporation-condensation method. The feather size is much smaller than that of mask openings due to the focusing effects, like electrostatic lens, caused by charge or electric potential on insulator mask surface, which also prevent a mask clogging. The particle array size depends on the size of mask open patterns and focusing effects near the mask relate to ion flow rate and electric potential. We have demonstrated that diverse size of arrays with high resolution could be obtained repeatedly using the same sized mask in atmosphere.

• Journal of the Korean institute of surface engineering
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• v.37 no.4
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• pp.220-225
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• 2004

A new ion beam extraction system is designed using a simple ion mass filter and a micro mass balance and a QMS based detecting system. A quadrupole Mass Filter is used for selective ion beam formation from inductively coupled high density plasma sources with appropriate electrostatic lens and final analyzing QMS. Also a quartz crystal microbalance is set between a QMF and a QMS to measure the etching and polymerization rate of the mass selected ion beam. An inductively coupled plasma was used as a ion/radical source which had an electron temperature of 4-8 eV and electron density of $4${\times}$10^{11}$＃/㎤. A computer interfaced system through 12bit AD-DA board can control the pass ion mass of the qmf by setting RF/DC voltage ratio applied to the quadrupoles so that time modulation of pass ion's mass is possible. So the direct measurements of ion - surface chemistry can be possible in a resolution of $1\AA$/sec based on the qcm's sensitivity. A full set of driving software and hardware setting is successfully carried out to get fundamental plasma information of the ICP source and analysed $Ar^{+}$ beam was detected at the $2^{nd}$ QMS.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.11
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• pp.1-7
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• 2018

In a microcolumn, a miniaturized electrostatic deflector is often adopted to scan an electron beam. Usually, a double octupole deflector is used because it can avoid excessive spherical aberrations by controlling the electron beam path close to the optical axis of the objective lens and has a wide scan field. Studies on microcolumns have been performed to improve the low throughput of an electron column through multiple column applications. On the other hand, as the number of microcolumns increases, the number of wires connected to the components of the microcolumn increases. This will result in practical problems during the process of connecting the wires to electronic controllers outside of the vacuum chamber. To reduce this problem, modified quadrupole and octupole deflectors were examined through simulation analysis by selecting an ultraminiaturized microcolumn with the Einzel lens eliminated. The modified deflectors were designed changing the size of each electrode of the conventional Si octupole deflector. The variations of the scan field and electric field strength were studied by changing the size of active electrodes to which the deflection voltage was to be applied. The scan field increased linearly with increasing deflection voltage. The scan field of the quadrupole deflector and the electric field strength at the center were calculated to be approximately 1.3 ~ 2.0 times larger than those of the octupole deflector depending on the electrode size.