• Title/Summary/Keyword: Electroplating method

Search Result 143, Processing Time 0.023 seconds

Influence of some additives on the process of Ni-W alloy electroplating

  • Wu, Yi-Yong;Kim, Dong-Soo;Chang, Do-Yon;Kwon, Sik-Chol
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2001.11a
    • /
    • pp.56-56
    • /
    • 2001
  • Ni-W alloy deposit is one of the best alternatives to hard chromium plating because of its good mechanical properties (high hardness, high strength, and good wear resistance). Ni-W alloy is deposited from weakly acidic or alkaline electrolytic bath with nickel sulfate, sodium tungstate or APT, and some kinds of organic hydroxy-acid complex and ammonia salts. W content of the deposit can be changed from 0 to 5Owt% and the coating with high W content is more attracted. But, meanwhile, the deposited layers are always found high internal stress, which cause them to become brittle and to bond insufficiently with the substrate. On the second hand, as the W content is incresed, the current efficiency reduced, which results in large quantities of hydrogen evolution and then produces bubbles on surface and pitting appearance In this paper, the influence of some additives on Ni-W alloy electroplating was investigated by means of compositional analysis and SEM. The initial results showed that 2-butyne-1,4-diol was the best brightener for Ni-W plating process. It could brighten and level deposit, but decreased the cathodic current efficiency. Its optimum concentration range is from O.lgjL to 0.5gjL. Besides, three kinds of additives including 2-butyne-1,4-diol were examined with Dagguchi method.

  • PDF

FCCL 제작 시 Cu Sputter 조건에 따른 Through Hole 특성 연구

  • Kim, Sang-Ho;Yun, Yeo-Wan
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2008.11a
    • /
    • pp.15-16
    • /
    • 2008
  • In case manufacturing COF, through hole should be made to be used for a pathway connecting the conductive layers of its both faces. In case Cu-plating inside of through hole with electroless plating way, contact between Cu and PI film gets bad to be fell apart from PI by the impact of applying to the electric devices. Therefore, after sputtering is applying on inner through hole, then a method to perform electroplating process. In this study, after changing sputtering condition to manufacture FCCL, we looked the changeability of the upper PI and inner hole Cu layers. Making use of RF Magnetron sputtering equipment, we coated Cu thin film and Cu-plated on it through electroplating. After cold-mounting the completed FCCL, we examined hole section through an optical microscope. From the result of test, with parameters deposition pressure and deposition time, both the thickness of the hole plated layer and PI plated upper layer increased at regular rate, increasing the thickness of Cu sputter layer. However, from the result of test in increasing RF-power, we could know the increment rate of hole plated layer is considerably greater than that of PI plated upper layer. Therefore, we finally acquired good result; if you want only to increase the plated layer of inner hole, it's much better to increase RF-power.

  • PDF

Characteristics of MEMS Probe Tip with Multi-Rhodium Layer (이중 로듐 층을 갖는 멤스 프로브 팁의 특성)

  • Park, Dong-Gun;Park, Yong-Joon;Lim, Seul-Ki;Kim, Il;Shin, Sang-Hun;Cho, Hyun-Chul;Park, Seung-Pil;Kim, Dong-Won
    • Journal of the Korean institute of surface engineering
    • /
    • v.45 no.2
    • /
    • pp.81-88
    • /
    • 2012
  • Probe tip, which should have not only superior electrical characteristics but also good abrasion resistance for numerous contacts with semiconductor pads to confirm their availability, is essential for MEMS probe card. To obtain good durability of probe tip, it needs thick and crack-free rhodium layer on the tip. However, when the rhodium thickness deposited by electroplating increased, unwanted cracks by high internal stress led to serious problem of MEMS probe tip. This article reported the method of thick Rh deposition with Au buffer layer on the probe tip to overcome the problem of high internal stress and studied mechanical and electrical properties of that. MEMS probe tip with double-Rh layer had good contact resistance and durability during long term touch downs.

Fabrication of High Aspect Ratio 100nm-Scale Nickel Stamper Using E-Beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating Patterns (광학 그레이팅의 사출성형제작을 위한 전자빔과 무반사 코팅층이 없는 크롬/퀄츠 마스크를 이용한 고종횡비 100nm 급 니켈 스탬퍼의 제작)

  • Seo, Young-Ho;Choi, Doo-Sun;Lee, Joon-Hyoung;Je, Tae-Jin;Whang, Kyung-Hyun
    • Transactions of the Korean Society of Mechanical Engineers A
    • /
    • v.28 no.11
    • /
    • pp.1794-1798
    • /
    • 2004
  • We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240$\pm$20nm and width of 116$\pm$6nm.

Miniaturized gyroscopes using micromachining technology (마이크로머시닝 기술을 이용한 초소형 자이로센서의 연구동향)

  • Han, S.O.;Pak, J.H.
    • Proceedings of the KIEE Conference
    • /
    • 1996.07c
    • /
    • pp.1971-1973
    • /
    • 1996
  • In this paper various types of gyroscope fabricated by micromachining technologies were reviewed. Four common types of gyroscope reported in the past few years are beam, tuning fork, gimbal, and vibrating shell structure made by surface micromachining using sacrificial layer, bulk micromachining using RIE, or electroplating method. In the study of these new gyroscopes, the fabrication methods, advantages and disadvantages of each structure were examined as well as the direction of development in the future.

  • PDF

Abrief study on the corrosion of bronze roofing tile (납(Pb)도금(동개와)의 부식 연구)

  • Kim, Sa-Dug
    • 보존과학연구
    • /
    • s.15
    • /
    • pp.52-58
    • /
    • 1994
  • To protect corrosion of bronze roofing tile for Choson Royal Historic Museum, lead coating on tile was performed by electroplating method with thickness of $35\mum$. Lead coated tile samples were inverstigated what corrosion products were formed with color changes on them by testing Accelerated Weathering. No sulfides were formed on samples contacting with 300ppm sulfur dioxide and any color changes were not found. In Accelerated Weathering test, White hydrocerussite, basic lead carbonate($2PbCO_3Pb(OH)_2$) having protective structure made of compact adhering crystals.

  • PDF

Introduction of Selective Electrochemical Additive Manufacturing Technology and Consideration of Integration Method for PCB Mass Production Process (선택적 전기화학 3D 프린터 기술 소개 및 PCB 양산공정 적용방식 고찰)

  • Kim, Sung-Bin;Yoo, Bongyoung
    • Journal of the Korean institute of surface engineering
    • /
    • v.54 no.3
    • /
    • pp.158-163
    • /
    • 2021
  • Some studies on electrochemical additive manufacturing of metals were summarized in this technical report, and development status of selective electrochemical 3D printing technology was introduced. In order to apply it to the PCB mass production process, essential considerations how to overcome the fundamental problems, such as the sizing, process sequence and PCB process design have been described.

The Study on Development of Plating Technique on Electroless Ni/Au (무전해 니켈/금도금 기술 개발에 관한 연구)

  • Park Soo-Gil;Park Jong-Eun;Jung Seung-Jun;Yum Jae-Suk;Jun Sae-ho;Lee Ju-Seong
    • Journal of the Korean Electrochemical Society
    • /
    • v.2 no.3
    • /
    • pp.138-143
    • /
    • 1999
  • Recently, miniaturization of large scale integrated circuits (LSI) and printed circuit board (PCB) have become essential with the downsizing of electronic devices. Gold electroplating is applied of conductivity wiring or terminals for improvement of conductivity and corrosion resistance. However, electroplating is not applicable since the circuits are becoming finer and denser. Accordingly, electroless plating is recently highly attractive method because of the simplicity of the operation requiring no external source of current and no elaborate equipment. In this work, we tried to develop a plating technique on electroless Ni/Au plating. First, the electroless Ni plating was deposited on the PCB with agitation in the bath at $85^{\circ}C$. Then the Au layer was deposited on the Ni layer surface by same method at $90^{\circ}C$. The bonderability were tested in order to evaluate the stability of the electroless Ni/Au by gold wire or solder ball test.

Effect of Dispersion Method on Formation of Electroless Ni-CNT Coatings (분산법이 무전해 Ni-CNT 복합도금막 형성에 미치는 영향)

  • Bae, KyooSik
    • Journal of the Semiconductor & Display Technology
    • /
    • v.13 no.3
    • /
    • pp.51-55
    • /
    • 2014
  • Ni-CNT(Carbon Nanotubes) composite coating is often used for the surface treatment of mechanical/electronic devices to improve the properties of the Ni coating. For the Ni-CNT coating, the dispersion of CNT fibers is a critical process. In this study, ultrasonic treatment instead of the conventional ball milling was attempted as a dispersion method for the electroless Ni-CNT coating. SEM-EDX analysis was performed and contact angle, sheet resistance, and micro-hardness were measured. Results showed that the ultrasonic treatment was comparable to the ball milling, as a dispersion method, but the difference was negligible. However, combined ball milling and ultrasonic treatment(double treatment) showed much improved micro-hardness value, above 350Hv(close to the value obtained by the Ni-CNT electroplating). In addition, electroless Ni-CNT(double-treated) coatings formed on the thin Ni film deposited by the electroless plating(double coating) showed better mechanical properties. Thus, double treatment and double coating are suggested as an improved electroless Ni-CNT coating method.