• 한국정보통신학회논문지
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• 제10권9호
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• pp.1663-1670
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• 2006

펄스 전기증착법에 의해 단결정 Fe 박막을 n-Si(111) 기판위에 직접 성장시켰다. CV 분석 을 통해 $Fe^{2+}n-Si(111)$ 계면은 쇼트키 장벽 형성에 따른 다이오드 특성을 가진다는 사실을 알 수 있었다. 또한 인가 전압에 따른 전기용량의 변화를 보여주는 Mott-Schottky chottky(MS) 관계식을 이용하여 전해질 내에서 n-Si(111) 기판의 flat-band potential(EFB)을 조사하였으며, 0.1M $FeCl_2$ 전해질 내에서 EFB와 산화-환원 전위는 각각 -0.526V 과 -0.316V 임을 알 수 있었다. Fe/n-Si(111) 계면반응 시, Fe 증착 초기 단계에서의 핵 형성과 성장 운동학은 과도전류 특성을 이용하여 조사하였으며, 과도전류 특성을 통해 Fe 박막의 성장모드는 "instantaneous nucleation and 3-dimensional diffusion limited growth"임을 알 수 있었다. 주파수가 300Hz, 최대 전압이 1.4V인 펄스 전압을 이용하여 n-Si(111) 기판위에 Fe를 직접 전기 증착 시켰으며, 형 성 된 Fe 박막은 단결정 ${\alpha}-Fe$로 Si 기판위에 ${\alpha}-Fe(110)/Si(111)$의 격자 정합성을 가지고 성장하였음을 XRD 분석을 통해 확인하였다.

• 한국진공학회지
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• 제10권1호
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• pp.16-21
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• 2001

4원 화합물 반도체인 $Ag_2CdSnSe_4$ 및 $Ag_2CdSnSe_4$:$CO^{2+}$ 단결정을 화학수송법으로 성장시켜 광학적 특성을 조사하였다. 성장된 결정들은 wurtzite 결정구조로서 격자상수는 각각 a = 4.357 $\AA$, c = 7.380 $\AA$($Ag_2CdSnSe_4$:$CO^{2+}$)이었다. 298k에서의 광 흡수 측정으로부터 구한 에너지 띠 간격은 순수한 $Ag_2$CdSnSe의 경우 1.21eV, cobalt 불순물로 첨가한 $Ag_2CdSnSe_4$의 경우 1.02ev이었으며, cobalt를 불순물로 첨가함에 따라 190meV의 에너지 띠 간격의 감소를 보였다. $Ag_2CdSnSe_4$ 결정의 광 흡수 스펙트럼에서 4개의 흡수 피크들을 관측하였으며, 이들 피크 들은 $T_d$결정장내에서 스핀 - 궤도결합효과에 의한 $Co^{2+}$ 이온의 분리된 준위사이의 전자전이에 의한 것으로 설명되었다.

• Investigative Magnetic Resonance Imaging
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• 제4권1호
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• pp.27-33
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• 2000

목적: 전자상자성 공명(Electron Paramagnetic Resonance EPR)을 사용하여, 현재 상용되고 있는 세가지 상자성 자기공명 조영제, Gd-DTPA, Gd-DTPA-BMA, Gd-DOTA의 전자스핀 이완시간 $T_{le}$를 결정하고자 한다. 대상 및 방법: 본 연구에 사용된 상자성 자기공명 조영제는 Gd-DTPA(Magnevist), Gd-DTPA-BMA(OMNISCAN), Gd-DOTA(Dotarem)이다. 이들 자기공명 조영제들은 2:1 부피 비율의 메탄올과 물의 혼합용액에 희석하여 저온의 glassy상태에서 EPR스펙트럼을 얻었으며, 또한 주어진 영 자기장 갈라지기 (zero-field splitting, ZFS)변수를 $3{\times}3$ 텐서량으로 계산하는 컴퓨터 시뮬레이션 프로그램 'GEN'을 사용하여, 이들 조영제들에 대한 각각 다른 ZFS변수를 가지는 시뮬레이션 스펙트럼을 만들었다. 이 결과들과 McLachlan의 평균이완율 이론을 적용하여 전자스핀 이완시간이 결정되었다. 결과: 상자성 자기공명 조영제 Gd-DTPA, Gd-DTPA-BMA, Gd-DOTA의 전자 횡축 스핀이완시간($T_{2e}$)은 각각 0.113ns, 0.147ns, 1.81ns, g-value는 1,9737, 1.9735, 1.9830, 전자스핀 이완시간($T_{le}$)는 18.70ns, 33.40ns, $1.66{\mu}s$로 결정되었다. 결론: 실험 결과로부터 상자성 자기공명 조영제의 ZFS변수가 클수록 짧은 전자스핀 이완시간 $T_{le}$를 가진다는 일반적인 사실을 재 확인할 수 있었다. 본 연구에 사용된 3가지 자기 공명 조영제들 중에는 화학적으로 환상구조 배위자를 갖는 Gd-DOTA가 가장 긴 전자스핀 이완시간 $T_{le}$를 가지는 것으로 나타나서 일반적으로 환상구조 배위자를 갖는 조영제들이 선상구조 배위자를 갖는 조영제에 비해 전자적인 성질은 우수한 것으로 나타났고 결론적으로 상자성 조명제가 물분자의 자기이완시간에 미치는 영향을 평가하고 고효율 상자성 자기 공명 조영제 개발에는 정확한 ZFS변수 결정이 매우 중요하다는 것을 알 수 있었다.

• 한국전기전자재료학회논문지
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• 제33권5호
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• pp.393-399
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• 2020

A series of phosphors, SrWO₄:5 mol% Dy³⁺, SrWO₄:5 mol% Sm³⁺, and SrWO₄:5 mol% Dy³⁺:x Sm³⁺ (x＝1~15 mol%), were prepared using a facile co-precipitation. The crystal structure, morphology, photoluminescence properties, and application in anti-counterfeiting fields were investigated. The crystalline structures of the prepared phosphors were found to be tetragonal systems with the dominant peak occurring at the (112) plane. The excitation spectra of the Dy³⁺ singly-doped SrWO₄ phosphors were composed of an intense charge-transfer band centered at 246 nm in the range of 210~270 nm and two weak peaks at 351 nm and 387 nm due to the ⁶H_15/2→⁶P_7/2 and ⁶H_15/2→⁴I_13/2 transitions of Dy³⁺ ions, respectively. The wavelength of 246 nm was optimum for exciting the luminescence of Dy³⁺ and Sm³⁺ co-doped SrWO₄ phosphors. The emission spectra consisted of two intense blue and yellow emission bands at 480 nm and 573 nm corresponding to the ⁴F_9/2→⁶H_15/2 and ⁴F_9/2→⁶H_13/2 transitions of Dy³⁺, and two strong emission peaks at 599 nm and 643 nm originating from the ⁴G_5/2→⁶H_7/2 and ⁴G_5/2→⁶H_9/2 transitions of Sm³⁺, respectively. As the concentration of Sm³⁺ ions increased, the emission intensities of Dy³⁺ rapidly decreased, while the emission intensities of Sm³⁺ gradually increased. These results suggest that the color of the emission light can be tuned from yellow to white by changing the concentration of Sm³⁺ ions at a fixed 5 mol% Dy³⁺. Furthermore, the fluorescent security inks were synthesized for use in anti-counterfeiting applications.

• 한국전기전자재료학회논문지
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• 제15권11호
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• pp.923-932
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• 2002

A stoichiometric mixture of evaporating materials for CdIn$\_$2/S$\_$4/ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, CdIn$\_$2/S$\_$4/ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by hot wall epitaxy(HWE) system. The source and substrate temperatures were 630 $\^{C}$ and 420 $\^{C}$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of CdIn$\_$2/S$\_$4/ single crystal thin films measured from Hall effect by van der Pauw method are 9.01$\times$10$\^$16/ cm$\^$-3/ and 219 ㎠/V$.$s at 293 K, respectively. From the optical absorption measurement, the temperature dependence of energy band gap on CdIn$\_$2/S$\_$4/ single crystal thin films was found to be Eg(T) ＝ 2.7116 eV - (7.74 $\times$ 10$\^$-4/ eV) T$\^$2//(T＋434). After the as-grown CdIn$\_$2/S$\_$4/ single crystal thin films was annealed in Cd-, S-, and In-atmospheres, the origin of point defects of CdIn$\_$2/S$\_$4/ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of V$\_$cd/, V$\_$s/, Cd$\_$int/ and S$\_$int/ obtained by PL measurements were classified as donors or accepters type. And we concluded that the heat-treatment in the S-atmosphere converted CdIn$\_$2/S$\_$4/ single crystal thin films to an optical p-type. Also, we confirmed that In in CdIn$\_$2/S$\_$4/GaAs did not from the native defects because In in CdIn$\_$2/S$\_$4/ single crystal thin films existed in the form of stable bonds.

• Transactions on Electrical and Electronic Materials
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• 제1권1호
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• pp.26-31
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• 2000

The ~1540 nm $^4$ $I_{13}$ 2/ longrightarro $w^4$ $I_{15}$ 2/ emissions of E $r^{3+}$ in Er-implanted GaN annealed at temperatures in the 400 to 100$0^{\circ}C$ range were investigated to gain a better understanding of the formation and dissociation processes of the various E $r^{3+}$ sites and the recovery of damage caused by the implantation with increasing annealing temperature ( $T_{A}$).The monotonic increase in the intensity of the broad defect photoluminescence(PL) bands with incresing $T_{A}$ proves that these are stable radiative recombination centers introduced by the implantation and annealing process. Theser centers cannot be attributed to implantation-induced damage that is removed by post-implantation annealing. Selective wavelength pumpling of PL spectra at 6K reveals the existence of at least nine different E $r^{3+}$ sites in this Er-implanted semiconductor. Most pf these E $r^{3+}$ PL centers are attributed to complexed of Er atoms with defects and impurities which are thermally activated at different $T_{A}$. Only one of the nine observed E $r^{3+}$ PL centers can be pumped by direct 4f absorption and this indicates that it is highest concentration E $r^{3+}$ center and it represents most of the optically active E $r^{3+}$ in the implanted sample. The fact that this E $r^{3+}$ center cannot be strongly pumped by above-gap light or broad band below-gap absorption indicates that it is an isolated center, i.e not complexed with defects or impurities, The 4f-pumped P: spectrum appears at annealing temperatures as low as 40$0^{\circ}C$, and although its intensity increase monotonically with increasing $T_{A}$ the wavelengths and linewidths of its characteristic peaks asre unaltered. The observation of this high quality E $r_{3+}$PL spectrum at low annealing temperatures illustrates that the crystalline structure of GaN is not rendered amorphous by the ion implantation. The increase of the PL intensities of the various E $R_{3+}$sites with increasing $T_{A}$is due to the removal of competing nonradiative channels with annealing. with annealing.annealing.

• 한국전기전자재료학회논문지
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• 제20권10호
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• pp.829-838
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• 2007

The stochiometric mix of evaporating materials for the $CdGa_2Se_4$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CdGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $630^{\circ}C$ and $420^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD).The carrier density and mobility of $CdGa_2Se_4$ single crystal thin films measured from Hall effect by van der Pauw method are $8.27{\times}10^{17}\;cm^{-3},\;345\;cm^2/V{\cdot}s$ at 293 K. respectively. The temperature dependence of the energy band gap of the $CdGa_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $Eg(T)\;=\;2.6400\;eV\;-\;(7.721{\times}10^{-4}\;eV/K)T^2/(T+399\;K)$. After the as-grown single crystal $CdGa_2Se_4$ thin films were annealed in Cd-, Se-, and Ga -atmospheres, the origin of point defects of single crystal $CdGa_2Se_4$ thin films has been investigated by PL at 10 K. The native defects of $V_{Cd}$, $V_{Se}$, $Cd_{int}$, and $Se_{int}$ obtained by PL measurements were classified as donors or accepters. We concluded that the heat-treatment in the Cd-atmosphere converted single crystal $CdGa_2Se_4$ thin films to an optical p-type. Also, we confirmed that Ga in $CdGa_2Se_4/GaAs$ did not form the native defects because Ga in single crystal $CdGa_2Se_4$ thin films existed in the form of stable bonds.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.50-50
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• 2008

ZnO has been extensively studied for optoelectronic applications such as blue and ultraviolet (UV) light emitters and detectors, because it has a wide band gap (3.37 eV) anda large exciton binding energy of ~60 meV over GaN (~26 meV). However, the fabrication of the light emitting devices using ZnO homojunctions is suffered from the lack of reproducibility of the p-type ZnO with high hall concentration and mobility. Thus, the ZnO-based p-n heterojunction light emitting diode (LED) using p-Si and p-GaN would be expected to exhibit stable device performance compared to the homojunction LED. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducibleavailability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices with low defect density. However, the electroluminescence (EL) of the device using n-ZnO/p-GaN heterojunctions shows the blue and greenish emissions, which are attributed to the emission from the p-GaN and deep-level defects. In this work, the n-ZnO:Ga/p-GaN:Mg heterojunction light emitting diodes (LEDs) were fabricated at different growth temperatures and carrier concentrations in the n-type region. The effects of the growth temperature and carrier concentration on the electrical and emission properties were investigated. The I-V and the EL results showed that the device performance of the heterostructure LEDs, such as turn-on voltage and true ultraviolet emission, developed through the insertion of a thin intrinsic layer between n-ZnO:Ga and p-GaN:Mg. This observation was attributed to a lowering of the energy barriers for the supply of electrons and holes into intrinsic ZnO, and recombination in the intrinsic ZnO with the absence of deep level emission.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.111-112
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• 2005

To obtain the single crystal thin films, $CuInSe_2$, mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wail epitaxy (HWE) system. The source and substrate temperatures were 620$^{\circ}C$ and 410$^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobilily of $CuInSe_2$ single crystal thin films measured with Hall effect by van der Pauw method are $9.62\times10^{16}$ $cm^{-3}$ and $296cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the CulnSe$_2$ obtained from the absorption spectra was well described by the Varshni's relation E$_g$(T) = 1.1851 eV - ($8.99\times10^{-4}$ ev/K)T$_2$/(T + 153K). After the as-grown $CuInSe_2$ single crystal thin films was annealed in Cu-, Se-, and In-atmospheres the origin of point defects of $CuInSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The nat ive defects of V$_{Cu}$, $V_{Se}$, Cu$_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuInSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that In in $CuInSe_2$/GaAs did not form the native defects because In in $CuInSe_2$ single crystal thin films existed in the form of stable bonds.

• 한국자기학회지
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• 제6권6호
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• pp.405-410
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• 1996

방사광 광전자분광법을 이용하여 $Co_{x}Pd_{100-x}$ 합금박막들(x = 0, 25, 40, 65)의 가전자띠 스펙트럼들을 측정하고, Co 3d 전자와 Pd 4d 전자들에 의한 각각의 부분스펙트럼 무게분포(partial spectral weight distribution : PSW)를 결정하였다. Co-Pd 합금박막에서의 Co 3d PSW는 수직자기이방성을 나타내는 영역에 해당하는 Co 함량 25% 이하에서 순수 Co 박막의 스펙트럼과 상당히 다른 구조를 보인 반면, Co 함량이 약 40% 이상이 되면 순수 Co 박막의 PES스펙트럼과 거의 일치하였다. Co 함량이 25% 이하의 Co 3d PSW에서 관찰된 페르미준위 근처의 봉우리 구조와 결합에너지 2 eV 근처의 어깨구조는 혼성에 의한 Co 3d 전자구조의 변화를 반영한다. 따라서 Co 3d 전자와 Pd 4d 전자 간의 혼성상호작용이 수직자기이방성의 결정에 중요한 역할을 하는 것으로 추측되었다. Co-Pd 합금박막에서의 Pd 4d PSW는 순수 Pd 스펙트럼에 비하여 그 폭이 넓고, 주 봉우리의 결합에너지가 크며, 페르미준위에서의 스펙트럼의 세기가 작게 관찰되었다. 그리고 Pd 함량이 감소함에 따라 Pd 4d PSW의 반치폭이 증가하였는데, 이러한 결과는 Co-Pd 합금이 형성될 때의 무질서 효과 또는 Co 3d 전자와 Pd 4d 전자간의 혼성상 호작용으로 인한 Pd 4d 전자구조의 변화를 반영하는 것으로 추측되었다.