• 제목/요약/키워드: Electron hole recombination

검색결과 105건 처리시간 0.025초

전계발광 소자에서 정공 차단 물질로서의 4,4',4'-trifluoro-triazine의 특성 (The Characteristices of the 4,4',4'-trifluoro-triazine as a hole Blocking Material in Electroluminescent Devices)

  • 신지원;신동명;손병청
    • 한국응용과학기술학회지
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    • 제17권2호
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    • pp.120-125
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    • 2000
  • The tfTZ(4,4',4''-trifluoro-triazine) was used as a hole blocking material for the electroluminescent devices(ELDs) in this study. In general, the holes are outnumbered the electrons in hole transport and emitting layers because the hole transport is more efficient in most organic ELDs. The hole blocking layer are expected to control the excess holes to increase the recombination of holes and electrons and to decrease current density. The former study using the 2,4,6-triphenyl-1,3,5-triazine(TTA) as hole blocking layer showed that the TTA did not form stable films with vapor deposition technique. The tfTZ can generate stable evaporated films, moreover the fluorine group can lower the highest occupied molecular orbital(HOMO) level, which produces the energy barrier for the holes. The tfTZ has high electron affinities according to the data by the Cyclic-Voltammety(CV) method, which is developed for the measurement of HOMO and lowest occupied molecular orbital(LUMO) level of organic thin films. The lowered HOMO level is made the tfTZ to be applied for a hole blocking layer in ELDs. We fabricated multilayer ELDs with a structure of ITO/hole blocking layer(HBL)/hole transporting layer(HTL)/emitting layer/electrode. The hole blocking properties of this devices is confirmed from the lowered current density values compared with that without hole blocking layer.

GaN 기반 발광 다이오드(LED)의 특성 분석 (Characteristic analysis of GaN-based Light Emitting Diode(LED))

  • 이재현;염기수
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 춘계학술대회
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    • pp.686-689
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    • 2012
  • 본 논문에서는 ISE-TCAD를 이용하여 GaN 기반의 LED특성을 분석하였다. LED는 GaN 버퍼층을 기반으로 GaN 장벽과 InGaN 양자우물로 구성된 활성 영역, AlGaN EBL(Electron Blocking Layer)과 AlGaN HBL(Hole Blocking Layer)로 이루어져 있다. Auger 재결합률, 양자 우물의 폭과 수, EBL의 Al 몰분율의 변화에 따른 LED의 출력 전력 특성을 분석하고 효율 개선을 위한 몇 가지 기준을 제시하였다.

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EML에서 Ir(ppy)3와 CBP의 도핑 위치에 따른 녹색 인광 OLED 특성 변화 연구

  • 임기원;최병덕
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.229.2-229.2
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    • 2016
  • 본 연구에서는 Host와 Dopant $Ir(ppy)_3$의 도핑 위치 변화에 따른 bottom emission 인광 OLED를 제작하여 발광 효율 및 특성을 분석하였다. 소자의 EML은 $Ir(ppy)_3/CBP$$CBP/Ir(ppy)_3$ 순으로 증착하여 제작하였다. $Ir(ppy)_3/CBP$은 낮은 구동 전압에서 큰 전류밀도와 큰 luminance을 측정하였고, 반대로 $CBP/Ir(ppy)_3$은 높은 구동 전압에서 $CBP/Ir(ppy)_3$은 큰 전류밀도와 큰 luminance가 측정되었다. 이는 $Ir(ppy)_3/CBP$에서 HTL과 EML 사이에 hole direct injection이 발생으로 Hole이 증가하지만 charge balance 불일치로 roll-off가 발생하고, $CBP/Ir(ppy)_3$에서 electron direct injection에 의한 electron 증가로 charge balance가 향상된다. EL spectrum 측정에서 $Ir(ppy)_3$은 파장 512nm 발광이 일어나고, CBP와 NPB은 각각 파장 380nm, 433nm로 분석된다. 각 물질의 triplet의 전달은 energy level이 큰 곳에서 작은 곳으로 전달되는데 이러한 이유로 전압에 따른 recombination zone 변화로 각 물질에서 나오는 파장의 intensity가 달라지는 것을 확인하였다. $Ir(ppy)_3/CBP$은 낮은 전류 밀도에서는 CBP의 영향으로 380nm 파장대가 크고, 높은 전류 밀도에서는 $Ir(ppy)_3$의 영향으로 512nm 파장대가 크게 나오는 것을 확인했고, $CBP/Ir(ppy)_3$에서는 낮은 전류 밀도에서 512nm 파장대가 커지고, 큰 전류 밀도에서는 CBP에서 NPB로의 triplet 에너지 전달의 증가로 433nm 파장대가 커지는 것을 확인하였다.

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Photocatalytic Performance of Graphene-TiO2 Hybrid Nanomaterials Under Visible Light

  • Park, Jaehyeung
    • 한국전기전자재료학회논문지
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    • 제32권2호
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    • pp.161-164
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    • 2019
  • This study describes the development of graphene-$TiO_2$ conjugates for the enhancement of the photocatalytic efficiency of $TiO_2$. Graphene-based hybrid nanomaterials have attracted considerable attention because of the unique and advantageous properties of graphene. In the proposed hybrid nanomaterial, graphene serves as an electron acceptor to ensure fast charge transfer. Effective charge separation can, therefore, be achieved to slow down electron-hole recombination. This results in an enhancement of the photocatalytic activity of $TiO_2$. In addition, increased adsorption and interactions with the adsorbed reagents also lead to an improvement in the photocatalytic activity of graphene-$TiO_2$ hybrid nanomaterials. The acquired result is encouraging in that the photocatalytic activity of $TiO_2$ was initiated using visible light (630 nm) instead of the typical UV light.

스크린 프린팅 방법으로 제작한 ZnS:(Cu, AL) 박막의 CNT 불순물 첨가에 의한 광학적 특성에 관한 연구 (Luminescence Characteristic of CNT Element in ZnS:(Cu, Al) Thin Film Fabricated by a Screen Printing Method)

  • 손봉균;신준하;배재민;이재범;김종수;이상남
    • 한국인쇄학회지
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    • 제29권1호
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    • pp.23-33
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    • 2011
  • This experimental focus to characterize luminescence properties related to CNT (Carbon Nano Tube) element dispersedly implanted in ZnS-based phosphor thin film panel fabricated by a screen printing method. More specifically FE-SEM measurements, L-V(Luminescence vs. Voltage) and photo luminescence were carried out to determine an optimum value of CNT concentration and film thickness for the thin film structure of CNT-ZnS:(Cu, Al) by the screen printing method. We confirmed that an optimum value of CNT concentration in the ZnS:(Cu, Al) film panel is about 0.75 wt% resulting that the electric conductivity is 1.6 times higher than that of pure CNT sample and showing that the luminescence intensity is increasing until the optimum concentration. Clearly, CNT is presenting in the luminescence process providing a pathway for the creation of hot electron and a channel for the electron-hole recombination but overly inserted CNT may hinder to produce the hot electron for making an avalanching process. In case of the overly doped CNT 1.0 wt% in the ZnS-based phosphor, the luminescence intensity is decreasing although the electric conductivity is exponentially increasing. Based on these results, we realized that hot electron occurred by the external electric field or exciton arose by the external photon source are reduced dramatically over the critical value of CNT concentration because CNT element provide various isolated residues in the composites of ZnS based phosphor rather than pathway or channel for the D-A(Donnor to Acceptor) pair transition or the radiative recombination of electron-hole.

TPD 첨가에 따른 poly(3-alkylthiophene)의 발광특성 (Emission Characteristics of Poly(3-alkylthiophene) with TPD Addition)

  • 서부완;김주승;구할본;이경섭;박복기;조재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.308-311
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    • 2000
  • The organic electroluminescene (EL) device has gathered much interested because of its potential in materials and simple device fabrication. We fabricated EL device which have a mixed single emitting layer containing N,N'-diphenyl-N,N'-(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine [TPD] and poly(3-hexylthiophene) [P3HT]. The molar ratio between P3HT and TPD chaged with 1:1, 3:1, 5:1, 3:2 and 5:2. EL intensity of ITO/P3HT+TPD/Mg:In devices is enhanced by addition of TPD into P3HT. This can be explained that the energy transfer occurs from TPD to P3HT. Recombination probability increases in emitting layer because that TPD as hole transport material plays a role more injection hole and Mg:In (3.7eV) electrode has low work function make easily electron injection. ITO/P3HT+TPD(5:2)/Mg:In devices emit orange-red light at 28V.

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moving-photocarrier-grating 기술을 이용한 디지털 X-선 변환물질 a-Se:As의 수송변수 (Transport parameters in a-Se:As films for digital X-ray conversion material using the moving-photocarrier-grating technique)

  • 박창희;남상희;김재형
    • 대한방사선기술학회지:방사선기술과학
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    • 제28권4호
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    • pp.267-272
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    • 2005
  • moving photocarrier grating 기술을 이용하여 디지털 X-선 변환물질 a-Se:As 필름에서 As 첨가효과에 관하여 연구하였다. 이 방법은 시료를 조사하기 위하여 주파수를 변화시킨 2개 레이저 빔의 중첩으로 얻어진 움직이는 간섭패턴을 이용한다. 시료의 수송변수는 시료에서 변조 방향으로 유도되는 grating-속도에 의존하는 전류밀도로부터 얻어진다. As 첨가에 따른 a-Se 필름의 전자와 정공 이동도 그리고 재결합 수명을 구하였다. 전자의 이동도는 결함 상태 때문에 As 첨가에 따라 감소하는 반면, 특히 a-Se 필름에 0.3% As 첨가할 때 정공 이동도와 재결합 수명이 증가하였다. MPG 기술로 얻은 As가 첨가된 a-Se 필름의 수송성질을 a-Se:As로 제작한 X-선 디텍터의 X-선 감도와 비교하였다. 실험결과 0.3% As가 첨가된 a-Se으로 제작한 X-선 디텍터가 가장 우수한 X-선 감도를 나타내었다.

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TiO2 코팅과 CaO 첨가에 따른 독성물질 제거에 관한 연구 (A study on the removing of contaminants by TiO2 coating and CaO additive)

  • 우인성;이건덕;황명환;이홍주
    • 대한안전경영과학회지
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    • 제15권3호
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    • pp.127-132
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    • 2013
  • This study shows an air-purification test by the UV lamp on which TiO2 catalyst is deposited with glass fiber in the reactor chamber. This test was based on the fundamental data of air-purifier as assessing a removing ability on various contaminants such as CH3COOH, NH3, NO and SO2 as variation of the TiO2 coating, the wave of UV lamp, and the additive CaO. As a result, the highest decomposing removal ratio was shown when 5-times coated glass fiber was used. It can be due to the recombination reaction of electrons and electron-hole in the loaded CaO. Thus, the decomposing removal ratio increased as the recombination ratio decreased. In addition, it was confirmed that the decomposing removal ratio lowered when CaO was considerably deposited because it hided the lamp of OH-1 radical.

중금속 오염이 n형 실리콘 태양전지의 전기적 특성에 미치는 영향에 대한 연구 (Influence of Metallic Contamination on Photovoltaic Characteristics of n-type Silicon Solar-cells)

  • 김일환;박준성;박재근
    • Current Photovoltaic Research
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    • 제6권1호
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    • pp.17-20
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    • 2018
  • The dependency of the photovoltaic performance of p-/n-type silicon solar-cells on the metallic contaminant type (Fe, Cu, and Ni) and concentration was investigated. The minority-carrier recombination lifetime was degraded with increasing metallic contaminant concentration, however, the degradation sensitivity of recombination lifetime was lower at n-type than p-type silicon wafer, which means n-type silicon wafer have an immunity to the effect of metallic contamination. This is because heavy metal ions with positive charge have a much larger capture cross section of electron than hole, so that reaction with electrons occurs much more easily. The power conversion efficiency of n-type solar-cells was degraded by 9.73% when metallic impurities were introduced in the silicon bulk, which is lower degradation compared to p-type solar-cells (15.61% of efficiency degradation). Therefore, n-type silicon solar-cells have a potential to achieve high efficiency of the solar-cell in the future with a merit of immunity against metal contamination.

Synthesis of Praseodymium-Doped TiO2 Nanocatalysts by Sol-Microwave and Their Photocatalytic Activity Study

  • Huang, Fengping;Wang, Shuai;Zhang, Shuang;Fan, Yingge;Li, Chunxue;Wang, Chuang;Liu, Chun
    • Bulletin of the Korean Chemical Society
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    • 제35권8호
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    • pp.2512-2518
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    • 2014
  • The praseodymium-doped $TiO_2$ photocatalyst samples, which could degrade methyl orange under UV irradiation, were prepared by sol-microwave method for improving the photocatalytic activity of $TiO_2$. The resulting materials were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), Transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), Raman spectra, Fourier transform infrared spectra (FTIR) and Ultraviolet-visible diffuse reflectance spectra (UV-vis DRS). It was found Pr doping retarded the growth of crystalline size and the phase transformation from anatase to rutile, and narrowed the band gap energy. Praseodymium doping brought about remarkable improvement in the photoactivity. The optimal dopant amount of Pr was 2% by molar of cement and the calcination temperature was $500^{\circ}C$ for the best photocatalytic activity. The improvement of photocatalytic activity was ascribed to the occurrence of lattice distortion and the effective containment of the recombination of the electron-hole by $Pr^{3+}$.