• Title/Summary/Keyword: Electron beam probe

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Creation of Electron Beam Probe in Scanning Electron Microscopy (주사 전자 현미경에서 전자빔 프르브 생성)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.5
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    • pp.52-57
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    • 2008
  • Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lenes and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. Backscattered electron provide an useful signal for composition and local specimen surface inclination. Secondary electron is used far the formation of surface imagination. The steady electron beam probe is very important for the imagination formation and the brightness. In this paper, we show the results of developed elements that create electron beam probe and the measured beam probe in various acceleration voltages by Faraday cup. These data are used to analysis and improve the performance of the system in the development.

Realization for Each Element for capturing image in Scanning Electron Microscopy (주사 전자 현미경에서 영상 획득에 필요한 구성 요소 구현)

  • Lim, Sun-Jong;Lee, Chan-Hong
    • Laser Solutions
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    • v.12 no.2
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    • pp.26-30
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    • 2009
  • Scanning Electron Microscopy (SEM) includes high voltage generator, electron gun, column, secondary electron detector, scan coil system and image grabber. Column includes electron lenses (condenser lens and objective lens). Condenser lens generates fringe field, makes focal length and control spot size. Focal length represents property of lens. Objective lens control focus. Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lens and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. In this paper, we describe the result of research to develop the core elements for low-resolution SEM.

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Electron Temperature, Plasma Density and Luminous Efficiency in accordance with Discharge Time in coplanar AC PDPs

  • Jeong, S.H.;Moon, M.W.;Oh, P.Y.;Jeong, J.M.;Ko, B.D.;Park, W.B.;Lee, J.H.;Lim, J.E.;Lee, H.J.;Han, Y.G.;Son, C.G.;Lee, S.B.;Yoo, N.L.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1203-1206
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    • 2005
  • Electron temperature and plasma density in coplanar alternating-current plasma display panels (AC-PDP's) have been experimentally investigated in accordance with discharge time by a micro-probe in this experiment. The resolution of a step mortor to move in micro-Langmuir probe is 10um.[1-3] The used gas in this experiment is He-Ne-Xe (4%) mixure gas. And sustain voltage is 320V which is above of firing voltage for degradation. The electron temperature and plasma density can be obtained from current-voltage (I-V) characteristics of micro Langmuir probe, in which negative to positive bias voltage was applied to the probe. And Efficiency is calculated by formula related discharge power and light emission. Those experiments operated as various discharge time ($0{\sim}72$ Hours). As a result of this experiment, Electron Temperature was increased from 2eV to 5eV after discharge running time of 20 hours and saturates beyond 20 hours. The plasma density is inversely proportional to the square root of electron temperature. So the plasma density was decreased from $1.8{\times}10^{12}cm^{-3}$ to $8{\times}10^{11}cm^{-3}$ at above discharge running time. And the Efficiency was reduced to 70% at 60hours of discharge running time.

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Enhanced Electromagnetic Properties of Nickel Nanoparticles Dispersed Carbon Fiber via Electron Beam Irradiation (전자선 안정화에 의한 니켈 나노 입자가 분산된 탄소섬유의 전자기적 특성 향상)

  • Lee, Yeong Ju;Kim, Hyun Bin;Lee, Seung Jun;Kang, Phil Hyun
    • Journal of Radiation Industry
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    • v.9 no.1
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    • pp.15-20
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    • 2015
  • Carbon fiber has received much attention owing to its properties, including a large surface-to-volume ratio, chemical and thermal stability, high thermal and electrical conductivity, and high mechanical strengths. In particular, magnetic nanopowder dispersed carbon fiber has been attractive in technological applications such as the electrochemical capacitor and electromagnetic wave shielding. In this study, the nickel-oxide-nanoparticle dispersed polyacrylonitrile (PAN) fibers were prepared through an electrospinning method. Electron beam irradiation was carried out with a 2.5 MeV beam energy to stabilize the materials. The samples were then heat-treated for stabilization and carbonization. The nanofiber surface was analyzed using a field emission scanning electron microscope (FE-SEM). The crystal structures of the carbon matrix and nickel nanopowders were analysed using X-ray diffraction (XRD). In addition, the magnetic and electrical properties were analyzed using a vibrating sample magnetometer (VSM) and 4 point probe. As the irradiation dose increases, the density of the carbon fiber was increased. In addition, the electrical properties of the carbon fiber improved through electron beam irradiation. This is because the amorphous region of the carbon fiber decreases. This electron beam effect of PAN fibers containing nickel nanoparticles confirmed their potential as a high performance carbon material for various applications.

Optimal Electron Beam Characteristics by Lenses Analysis Using Scanning Electron Microscopy (주사전자현미경 렌즈의 해석을 통한 최적의 빔 특성 연구)

  • Bae, Jinho;Kim, Dong Hwan
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.39 no.1
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    • pp.1-9
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    • 2015
  • This paper presents a design method for optimizing the focused beam characteristics, which are mainly determined by the condenser lenses in a scanning electron microscopy (SEM) design. Sharply reducing the probe diameter of electron beams by focusing the condenser lens (i.e., the rate of condensation) is important because a small probe diameter results in high-performance demagnification. This study explored design parameters that contribute to increasing the SEM resolution efficiently using lens analysis and the ray tracing method. A sensitivity analysis was conducted based on those results to compare the effects of these parameters on beam focusing. The results of this analysis on the design parameters for the beam characteristics can be employed as basic key information for designing a column in SEM.

Multiple Electron Beam Lithography for High Throughput (생산성 향상을 위한 멀티빔 리소그라피)

  • Choi, Sang-Kook;Yi, Cheon-Hee
    • Korean Journal of Optics and Photonics
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    • v.16 no.3
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    • pp.235-238
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    • 2005
  • A Multiple electron beam lithography system with arrayed microcolumns has been developed for high throughput applications. The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. The arrayed microcolumns based on of Single Column Module (SCM) concept has been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 250 eV to 300 eV for the generation of nano patterns. Probe beam current at the sample was measured about >1 nA at a total beam current of $0.5\;{\mu}A$ and a working distance of $\~1\;mm$. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

Study on the Structural Design of an Ultra-miniaturized Microcolumn with a Built-in Electrostatic Octupole Stigmator (정전형 8중극 비점수차 보정기가 내장된 극초소형 마이크로컬럼의 구조 설계 연구)

  • Tae Sik Oh
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.3
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    • pp.52-61
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    • 2023
  • We designed a novel ultra-miniaturized microcolumn structure having an stigmator to significantly improve throughput per unit time, which is the biggest disadvantage of microcolumns. We adopted the structure of the stigmator in the form of an electrostatic octupole electrode, and used an electrostatic quadrupole deflector with a relatively simple structure considering the increase in wiring due to the introduction of the stigmator. We have dramatically reduced the effect of astigmatism that occurs when the electron beam probe is scanned to the periphery of the target by introducing the stigmator between the control electrode and the deflector. As our numerical analysis simulation results, the field of view obtained as a result of this study is about 46.3% improved compared to our previous study, and the electron beam probe size of less than 10 nm was achieved in the entire field of view.

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Measurement of Electron Temperature and Plasma Density in Coplanar AC Plasma Display Panels.

  • Cho, Il-Ryong;Moon, Min-Yook;Ryu, Chung-Gon;Choi, Myung-Chul;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.748-751
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    • 2003
  • The electron temperature and plasma density in coplanar alternating-current plasma display panels (AC-PDPs) have been experimentally investigated by a micro Langmuir probe and the high speed discharge images in this experiment.

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Correction for Na Migration Effects in Silicate Glasses During Electron Microprobe Analysis (전자현미분석에서 발생하는 규산염 유리 시료의 Na 이동 효과 보정)

  • Hwayoung, Kim;Changkun, Park
    • Korean Journal of Mineralogy and Petrology
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    • v.35 no.4
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    • pp.457-467
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    • 2022
  • Electron bombardment to silicate glass during electron probe microanalysis (EPMA) causes outward migration of Na from the excitation volume and subsequent decrease in the measured X-ray count rates of Na. To acquire precise Na2O content of silicate glass, one should use proper analytical technique to avoid or minimize Na migration effect or should correct for decreases in the measured Na X-ray counts. In this study, we analyzed 8 silicate glass standard samples using automated Time Dependent Intensity (TDI) correction method of Probe for EPMA software that can calculate zero-time intercept by extrapolating X-ray count changes over analysis time. We evaluated an accuracy of TDI correction for Na measurements of silicate glasses with EPMA at 15 kV acceleration voltage and 20 nA probe current electron beam, which is commonly utilized analytical condition for geological samples. Results show that Na loss can be avoided with 20 ㎛-sized large beam (<0.1 nA/㎛2), thus silicate glasses can be analyzed without TDI correction. When the beam size is smaller than 10 ㎛, Na loss results in large relative errors up to -55% of Na2O values without correction. By applying TDI corrections, we can acquire Na2O values close to the reference values with relative errors of ~ ±10%. Use of weighted linear-fit can reduce relative errors down to ±6%. Thus, quantitative analysis of silicate glasses with EPMA is required for TDI correction for alkali elements such as Na and K.