• Title/Summary/Keyword: Electron Optical System

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Synthesis and Photoluminescence Properties of Dy3+- and Eu3+-codoped CaMoO4 Phosphors (Dy3+와 Eu3+ 이온이 동시 도핑된 CaMoO4 형광체의 합성과 발광 특성)

  • Kim, Junhan;Cho, Shinho
    • Journal of the Korean institute of surface engineering
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    • v.48 no.3
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    • pp.82-86
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    • 2015
  • $Dy^{3+}$- and $Eu^{3+}$-codoped $CaMoO_4$ Phosphors were synthesized by using the solid-state reaction method. The crystal structure, morphology, and optical properties of the resulting phosphor particles were investigated by using the X-ray diffraction, field-emission scanning electron microscopy, and photoluminescence spectroscopy. XRD patterns exhibited that all the synthesized phosphors showed a tetragonal system with a main (112) diffraction peak, irrespective of the content of $Eu^{3+}$ ions. As the content of $Eu^{3+}$ ions increased, the grains showed a tendency to agglomerate. The excitation spectra of the synthesized powders were composed of one strong broad band centered at 305 nm in the range of 220 - 350 nm and several weak peaks in the range of 350 - 500 nm resulting from the 4f transitions of activator ions. Upon ultraviolet excitation at 305 nm, the yellow emission line due to the $^4F_{9/2}{\rightarrow}^6H_{13/2}$ transition of $Dy^{3+}$ ions and the main red emission spectrum resulting from the $^5D_0{\rightarrow}^7F_2$ transition of $Eu^{3+}$ ions were observed. With the increase of the content of $Eu^{3+}$, the intensity of the yellow emission band gradually decreased while that of the red emission increased. These results indicated that the emission intensities of yellow and red emissions could be modulated by changing the content of the $Dy^{3+}$ and $Eu^{3+}$ ions incorporated into the host crystal.

A Fatigue Failure Analysis of Fractured Fixing Bolts of a Mobile Elevating Work Platform using Finite Element Methods (유한요소기법을 이용한 고소작업대의 파손된 고정볼트의 피로 파손 분석)

  • Choi, Dong Hoon;Kim, Jae Hoon
    • Journal of the Korean Society of Safety
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    • v.35 no.5
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    • pp.1-8
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    • 2020
  • Mobile elevating work platforms (MEWPs) consist of a work platform, extending structure, and chassis, and are used to move persons to working positions. MEWPs are useful but are composed of pieces of equipment, and accidents do occur owing to equipment defects. Among these defects, accidents caused by the fracture of bolts fixed to the extension structure and swing system are increasing. This paper presents a failure analysis of the fixing bolts of MEWP. Standard procedure for failure analysis was employed in this investigation. Visual inspection, chemical analysis, tensile strength measurement, microstructural characterization, fractography analysis by Optical Microscope(OM) and Scanning Electron Microscopy(SEM), and finite element analysis (FEA) were used to analyze the failure of the fixing bolts. Using this failure analysis approach, we found the root cause of failure and proposed a means for solving this type of failure in the future. First, the chemical composition of the fixing bolt is obtained by a spectroscopy chemical analysis method, which determined that the chemical composition matched the required standard. The tensile test showed that the tensile and yield strengths were within the required capacity. The stress analysis was carried out at five different boom angles, and it was determined that the fixing bolt of MEWP can withstand the loads at all the boom angles. The outcomes of the fatigue analysis revealed that the fixing bolt fails before reaching the design requirements. The results of the fatigue analysis showed primarily that the failure of the fixing bolt was due to fatigue. A visual inspection of the fractured section of the fixing bolt also confirmed the fatigue failure. We propose a method to prevent failure of the fixing bolt of the MEWP from four different standpoints: the manufacturer, safety certification authority, safety inspection agency, and owner.

Luminescence properties of asymmetric double quantum well composed of $Al_xGa_{l-x}As/AlAs/GaAs$ system ($Al_xGa_{l-x}As/AlAs/GaAs$계로 이루어진 비대칭 이중 양자우물 구조에서의 광 luminescsnce 특성 연구)

  • 정태형;강태종;이종태;한선규;유병수;이해권;이정희;이민영;김동호
    • Korean Journal of Optics and Photonics
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    • v.3 no.3
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    • pp.183-190
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    • 1992
  • Luminescence properties of asymmetric double quantum well structure composed of $Al_x/Ga_{1-x}$ /As AIAs/GaAs have been studied by steady state and time-resolved photoluminescence and phtoluminescence excitation spectroscopy at low temperature. Two quantum well samples with different barrier thickness (15$\AA$ and 150$\AA$) were prepared to investigate the dependence of tunneling characteristics on barrier thickness. The abscence of excitonic recombination peak from $Al_x/Ga_{1-x}$As well for the 15$\AA$ barrier sample indicates a very fast electron tunneling to GaAs well. Meanwhile, T-X transition between well and barrier is supposed to be a major route for the fast decay of luminescence from $Al_x/Ga_{1-x}$As well in the 150$\AA$ barrier sample. Time-resolved photduminescence from GaAs well of 15$\AA$ sample shows the exsitence of the rise with 100 ps which is attributed to the hole tunneling.

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Synthesis and characterization of CaZrO3:Pr3+ phosphor by skull melting method (스컬용융법에 의한 CaZrO3:Pr3+ 형광체 합성 및 특성분석)

  • Choi, Hyunmin;Kim, Youngchool;Seok, Jeongwon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.31 no.5
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    • pp.228-232
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    • 2021
  • Ca1-xZrO3:xPr phosphor with perovskite structure was successfully synthesized by using skull melting method. The crystal structure, morphology and optical properties of synthesized phosphor were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet fluorescence reaction and photoluminescence. The XRD results indicated that single crystals of CaZrO3:Pr3+ belongs to orthorhombic perovskite system. The synthesized phosphor could be excited by UV light (254 nm) and the emission spectra results indicated that green luminescence of CaZrO3:Pr3+ due to charge transfer transition 3P03H4, 3P13H5 and 3P03H5 at 506, 536 and 548 nm was dominant.

A Study on the bioactive surface modification of PEEK intervertebral fusion cage using various coating techniques (다양한 코팅 처리에 의한 PEEK 추간체유합보형재의 생체 활성 표면에 관한 연구)

  • Su-Bin Noh;Su-Zy Park;Mun-Hwan Lee
    • Journal of the Korean institute of surface engineering
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    • v.56 no.4
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    • pp.273-282
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    • 2023
  • In this study, the surface of Polyetheretherketone (PEEK) disks was modified to have a hydrophilic surface by applying a coating of Polyethylene glycol (PEG), Hyaluronic acid(HA), and Poly-Dopamine(PDA). The investigation aimed to examine whether the coated surfaces showed enhanced bioactivity for orthopedic applications compared to the pure PEEK. The microstructure, surface characteristics, and wettability of PEEK coated with PEG, HA, and PDA were analyzed using scanning electron microscopy(SEM), FT-IR spectrophotometer, Roughness Measurement System, Micro-Vickers, and Contact angle measurement. The mechanical properties were analyzed using a tensile testing machine, while the MTT assay for cell activity was analyzed using a microplate reader to measure optical density. According to the SEM and FT-IR results, the composition and crystal structure of PEG, HA and PDA coated surface were verified. Also, roughness, hardness, and contact angle were all improved in the coating group compared to the pure PEEK. We checked the HepG2 cell proliferation by using MTT assay on 7th days. In MTT assay results, HepG2 cell proliferation was increased with time, at 7 days, cell viability on discs coated with PDA was significantly higher than pure PEEK, PEG, HA coated group. PDA coated PEEK exhibited the highest surface roughness, hardness, contact angle, and cell activity. The mechanical properties were not affected by the presence of the coating.

Fabrication of the Plasma Focus Device for Advanced Lithography Light Source and Its Electro Optical Characteristics in Argon Arc Plasma (차세대 리소그래피 빛샘 발생을 위한 플라스마 집속 장치의 제작과 아르곤 아크 플라스마의 발생에 따른 회로 분석 및 전기 광학적 특성 연구)

  • Lee S.B.;Moon M.W.;Oh P.Y.;Song K.B.;Lim J.E.;Hong Y.J.;Yi W.J.;Choi E.H.
    • Journal of the Korean Vacuum Society
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    • v.15 no.4
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    • pp.380-386
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    • 2006
  • In this study, we had designed and fabricated the plasma focus device which can generate the light source for EUV(Extreme Ultra Violet) lithography. And we also have investigated the basic electrical characteristics of currents, voltages, resistance and inductance of this system. Voltage and current signals were measured by C-dot and B-dot probe, respectively. We applied various voltages of 1.5, 2, 2.5 and 3 kV to the anode electrode and observed voltages and current signals in accordance with various Ar pressures of 1 mTorr to 100 Torr in diode chamber. It is observed that the peak values of voltage and current signals were measured at 300 mTorr, where the inductance and impedance were also estimated to be 73 nH and $35 m{\Omega}$ respectively. The electron temperature has been shown to be 13000 K at the diode voltage of 2.5 kV and this gas pressure of 300 mTorr. It is also found that the ion density Ni and ionization rate 0 have been shown to be $N_i = 8.25{\times}10^{15}/cc$ and ${\delta}$= 77.8%, respectively by optical emission spectroscopy from assumption of local thermodynamic equilibrium(LTE) plasma.

Optical Properties of MgMoO4:Dy3+,Eu3+ Phosphors Prepared with Different Eu3+ Molar Ratios (Eu3+ 이온의 몰 비 변화에 따른 MgMoO4:Dy3+,Eu3+ 형광체의 광학 특성)

  • Kim, Jung Dae;Cho, Shinho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.3
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    • pp.186-191
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    • 2016
  • The effects of $Eu^{3+}$ doping on the structural, morphological, and optical properties of $MgMoO_4:Dy^{3+},Eu^{3+}$ phosphors prepared by solid-state reaction technique were investigated. XRD patterns exhibited that all the synthesized phosphors showed a monoclinic system with a dominant (220) diffraction peak, irrespective of the content of $Eu^{3+}$ ions. The surface morphology of $MgMoO_4:Dy^{3+},Eu^{3+}$ phosphors was studied using scanning electron microscopy and the grains showed a tendency to agglomerate as the content of $Eu^{3+}$ ions increased. The excitation spectra of the phosphor powders were composed of a strong charge transfer band centered at 294 nm in the range of 230~340 nm and two intense peaks at 354 and 389 nm, respectively, arising from the $^6H_{15/2}{\rightarrow}^6P_{7/2}$ and $^6H_{15/2}{\rightarrow}^4M_{21/2}$ transitions of $Dy^{3+}$ ions. The emission spectra of the $Mg_{0.85}MoO_4$:10 mol% $Dy^{3+}$ phosphors without incorporating $Eu^{3+}$ ions revealed a strong yellow band centered at 573 nm resulting from the $^4F_{9/2}{\rightarrow}^6H_{13/2}$ transition of $Dy^{3+}$. As the content of $Eu^{3+}$ was increased, the intensity of the yellow emission was gradually decreased, while that of red emission band located at 614 nm began to appear, approached a maximum value at 10 mol%, and then decreased at 15 mol% of $Eu^{3+}$. These results indicated that white light emission could be achieved by controlling the contents of the $Dy^{3+}$ and $Eu^{3+}$ ions incorporated into the $MgMoO_4$ host crystal.

[O2/N2] Plasma Etching of Acrylic in a Multi-layers Electrode RIE System (다층 RIE Electrode를 이용한 아크릴의 O2/N2 플라즈마 건식 식각)

  • Kim, Jae-Kwon;Kim, Ju-Hyeong;Park, Yeon-Hyun;Joo, Young-Woo;Baek, In-Kyeu;Cho, Guan-Sik;Song, Han-Jung;Lee, Je-Won
    • Korean Journal of Materials Research
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    • v.17 no.12
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    • pp.642-647
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    • 2007
  • We investigated dry etching of acrylic (PMMA) in $O_2/N_2$ plasmas using a multi-layers electrode reactive ion etching (RIE) system. The multi-layers electrode RIE system had an electrode (or a chuck) consisted of 4 individual layers in a series. The diameter of the electrodes was 150 mm. The etch process parameters we studied were both applied RIE chuck power on the electrodes and % $O_2$ composition in the $N_2/O_2$ plasma mixtures. In details, the RIE chuck power was changed from 75 to 200 W.% $O_2$ in the plasmas was varied from 0 to 100% at the fixed total gas flow rates of 20 sccm. The etch results of acrylic in the multilayers electrode RIE system were characterized in terms of negatively induced dc bias on the electrode, etch rates and RMS surface roughness. Etch rate of acrylic was increased more than twice from about $0.2{\mu}m/min$ to over $0.4{\mu}m/min$ when RIE chuck power was changed from 75 to 200 W. 1 sigma uniformity of etch rate variation of acrylic on the 4 layers electrode was slightly increased from 2.3 to 3.2% when RIE chuck power was changed from 75 to 200 W at the fixed etch condition of 16 sccm $O_2/4\;sccm\;N_2$ gas flow and 100 mTorr chamber pressure. Surface morphology was also investigated using both a surface profilometry and scanning electron microscopy (SEM). The RMS roughness of etched acrylic surface was strongly affected by % $O_2$ composition in the $O_2/N_2$ plasmas. However, RIE chuck power changes hardly affected the roughness results in the range of 75-200 W. During etching experiment, Optical Emission Spectroscopy (OES) data was taken and we found both $N_2$ peak (354.27 nm) and $O_2$ peak (777.54 nm). The preliminarily overall results showed that the multi-layers electrode concept could be successfully utilized for high volume reactive ion etching of acrylic in the future.

The Optical Properties of B2O3-Bi2O3-PbO-SiO2 Glass System (B2O3-Bi2O3-PbO-SiO2계 유리의 광학적인 특성)

  • Joung, Maeng Sig;Kim, Hong Seon;Lee, Su Dae
    • Journal of Korean Ophthalmic Optics Society
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    • v.5 no.2
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    • pp.167-173
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    • 2000
  • Four glasses of $B_2O_3-Bi_2O_3-PbO-SiO_2$ (BBPS) system were prepared by melting the appropriate amounts of reagent grade oxides of $B_2O_3$, $Bi_2O_3$, PbO, and $SiO_2$ in an open crucible. The differential thermal analysis showed crystallization temperature decreased with increasing $Bi_2O_3$ or PbO content in the sample. The structures of glasses system were studied using scanning electron microscopy and Fourier transform-Infra red (FT-IR) spectroscopy. The UV cut-off and refractive index were found to be sensitive to the $Pb^{+2}$ and $Bi^{+3}$ content in the glasses. The behavior of the IR spectra of the glasses in the BP series was consistent with a role of $Bi_2O_3$ as a network former. In the BP series of glasses, the result of IR spectrum indicated that PbO behaved as a network former.

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A Study on the Extraction of Monasil PCA using Liquid CO2 (액체 이산화탄소 이용한 Monasil PCA 추출에 대한 연구)

  • Cho, Dong Woo;Oh, Kyoung Shil;Bae, Won;Kim, Hwayong;Lee, Kab-Soo
    • Korean Chemical Engineering Research
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    • v.50 no.4
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    • pp.684-689
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    • 2012
  • Poly(acrylic acid) (PAA) microspheres is one of the widely-used polymeric materials for the bio-field application and the electric materials. For the synthesis of PAA microspheres, the polymerization technique using surfactants is applied. After the synthesis, the purification and separation processes are required for the removal of surfactant. When general organic solvents were used, many problems, such as huge amount of waste solvent, additional separation processes, and the possibility of residual media, were occurred. Thus, High-pressure Soxhlet extraction using liquid $CO_2$ was developed to solve these problems. In this study, High-pressure Soxhlet extraction of the synthesized PAA microspheres using liquid $CO_2$ was conducted for the removal of Monasil PCA which is used for the dispersion polymerization of acrylic acid in compressed liquid Dimethyl ether (DME). The morphology of the extracted PAA particles was checked by field emission scanning electron microscopy (FE-SEM) and the residual concentration of Monasil PCA was analyzed by inductively coupled plasma - Optical Emission Spectrometer (ICP-OES). For studying the effect of the solvent effect, Soxhlet extraction was conducted using n-hexane, liquid DME, and liquid $CO_2$. In case of n-hexane, some extracted PAA microspheres were produced. However, deformation was also occurred due to the high thermal energy of n-hexane vapor. Liquid DME could not remove Monasil PCA. When using liquid $CO_2$, the extracted PAA microspheres which were free for the residual solvent were produced without deformation. For finding the optimum operating condition, high-pressure Soxhlet extraction was conducted for 8 hours with changing the temperature of reboiler and condenser. When the extractor temperature is $19.6{\pm}0.2^{\circ}C$ and the pressure is $51.5{\pm}0.5$ bar, the best removal efficiency was obtained.