• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.395-398
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• 2002

The spherical aberration and optical integer (f) of the electron gun's main lens in color CRT is obtained, using electron beam trajectory. A spherical aberration is obtained from the relation between the object plane and the image of a beam trajectory. To analyze beam profile, 3rd and 1st order coefficient were obtained and used. It is shown that, in practice, they are applied to electron gun design.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.429-430
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• 2010

• Journal of the Semiconductor & Display Technology
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• v.6 no.3
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• pp.25-33
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• 2007

A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.16 no.8
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• pp.719-731
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• 1991

This paper introduces a relatively simple computer simulation method for analyzing trajectory of electron beam in cylindrical electrode of the CRT, which outputs the cutoff voltag, beam current, spot size and plots out the trajectory, rom the input data on physical construction and applied voltages of electron gun. In order to improve computing speed in obtaining potential distibution, the authors have ivided the space into seveal setos and allocated different mesh sizes epending on the acuracy required to each sector and applied the finite difference method in calculation. The plot of trajectoy obtained from the simulation provided useful insight into the focusing mechanism of the CRT. The computed and measured result including beam curent. spot sizs and cutoff voltages for several model guns have ageed within eperimental error. The simulation program enables the designer to compare the effects of varied electrode shpe without the epense of building an actual gun and may be appli in esigning and implementing the electron gun assemply.

• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.1-6
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• 2003

An axial electron beam gun system, which emits the electron beam power of 50 kW, has been manufactured. The electron beam gun consists of two parts. One is the electron beam generation part. including the filament, cathode, and anode. The maximum beam current is 2 A and the acceleration voltage is 25 kV. The other part includes the focusing-, deflection-, and scanning coils. The beam diameter and ham trajectory can be controlled by these coils. The characteristic of each part is measured ior the optimum condition of evaporation process. Moreover, Helmholtz coil is installed inside the vacuum chamber to adjust the incident angel of the beam to the melting surface for the maximum evaporation. We report on the evaporation rates for zirconium(Zr) and gadolinium(Gd) metals which have the high melting temperatures.

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.43-48
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• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.139-140
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• 2000

The origin of the display current in the surface conduction electron emitter displays has been verified in the calculation of the electron trajectory. Some electrons move directly toward the display surface as an anode current which is generated due to the inertial force of electron motion along the curved electric field lines with a small curvature near the fissure area..

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.3
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• pp.1319-1326
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• 2011

We have investigated the characteristics of the electron beam (e-beam) in the miniaturized free electron laser module by using the commercial 3D simulation tool OPERA. The e-beam was made parallel before entering the slit-type wiggler by the negative bias applied to the central electrode of the electron lens. With respect to the different structures of the wiggler, we obtained the inner distributions of the electrical potential and the electric field, which was, in turn, used to calculate the trajectory of the e-beam in the wiggler.

• Proceedings of the KWS Conference
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• 2001.10a
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• pp.121-124
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• 2001

The main characteristic of the Electron Beam Welding technique is its high energy density which produces thin and deep welds with very little distortion. High accelerated electrons, focused in a beam of 0.5 ∼ 2mm diameter, produce narrow welds with deep penetration. The result is a small HAZ as well as a low and uniform distortion which is predictible within very narrow limits. But the small diameter of the EB increases the requirements for the equipment control system for centering the beam on the welding joint in order to avoid any lack of fusion. Therefore, in this paper, we introduce the system developed at our company and the quality of welding zone, the detail function of system.

• Proceedings of the KIEE Conference
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• 1992.07b
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• pp.942-944
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• 1992

The free electron laser (FEL) is driven by electron beams with energies ranging from hundreds of kilovolt to hundreds of megavolt. Therefore the efficiency of FEL strongly depends on the beam quality. In this paper we examined the relation between applied voltage and magnetic field at the magnetically insulated cylindrical cold cathode for the high quality electron beam by the numerical analysis. As a result, we knew that the beam widening strongly depended on applied magnetic field and voltage.