• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.33.1-33.1
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• 2018

pH is expressed mathematically as $pH=-{\log}[H^+]$, is a measure of the hydrogen ion concentration, [$H^+$] to specify the acidity or basicity of an aqueous solution. The pH scale usually ranges from 0 to 14. Every aqueous solution can be measured to determine its pH value. The pH values below 7.0 express the acidity, above 7.0 are alkalinity and pH 7.0 is a neutral solution. The solution pH can be determined by indicator or by measurement using pH sensor, which measuring the voltage generated between a glass electrode and a reference electrode according to the Nernst Equation. The pH value of solutions depends on the temperature and the activity of contained ions. In nickel electroless plating process, the controlled pH value in some limited ranges are extremely important to achieve optimal deposition rate, phosphorus content as well as solution stability. Basically, nickel electroless plating solution contains of $Ni^{2+}ions$, reducing agent, buffer and complexing agents. The plating processes are normally carried out at $82-92^{\circ}C$. However, the change of its pH values with temperatures does not follow any rule. Thus, the purpose of study is to understand the relationship between pH and temperature of some based solutions and electroless nickel plating solutions. The change of pH with changing temperatures is explained by view of the thermal dynamic and the practical measurements.

• 한국표면공학회지
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• 제48권5호
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• pp.199-204
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• 2015

Recently, fuel cell is a good alternative for energy source. Separator is a important component for fuel cell. In this study, The surface of separator was modified for corrosion resistance and electric conductivity. Reduced graphene oxide (rGO) was made by Staudenmaier's method. Nickel, phosphorus and rGO were coated on 6061 aluminum alloy as a separator of proton exchange membrane fuel cell by composite electroless plating. Scanning electron microscope, energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy were used to examine the morphology of Ni-P-rGO. Surface images were shown that the rGO was dispersed on the surface of Ni-P electroless plating, and nickel was combined with the un-reduced oxygen functional group of rGO.

• 마이크로전자및패키징학회지
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• 제17권1호
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• pp.75-80
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• 2010

다공성 탄소전극기지 위의 무전해 니켈도금에 관한 연구를 하였다. 다공성 탄소전극기지로는 다공도가 20 ${\mu}m$ 이상인 것과 16~20 ${\mu}m$ 인 것을 사용하였다. 소수성인 탄소 표면은 $60^{\circ}C$ 이상의 암모니아 용액에 침적함으로써 그 표면 성질이 친수성으로 변화 되었고, 40분 이상 침적 시 접촉각이 $20^{\circ}$ 이하까지 측정 되었다. 도금욕의 pH가 증가됨에 따라 탄소기지 위에 도금된 니켈 도금층의 인의 석출량은 감소하였으며 니켈 도금층이 결정질 구조를 갖는 현상이 관찰되었다. 도금층의 두께는 pH가 증가함에 따라 증가하였다. 활성화 처리를 위한 $PdCl_2$의 농도에 따른 도금층의 두께 변화는 없었으나, 도금에 필요한 $PdCl_2$의 최소농도는 5 ppm 이상인 것으로 나타났다.

• 마이크로전자및패키징학회지
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• 제17권1호
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• pp.55-61
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• 2010

본 연구에서는 무연솔더볼 접합부의 신뢰성평가를 위해 굽힘충격 시험법을 사용하였다. 시험 방법의 표준화를 위하여 시험 시의 주파수, +/-진폭의 크기 등을 각각 변화하여 가면서 각 조건이 결과치에 미치는 영향을 분석하고 굽힘충격 시험을 위한 최적조건을 도출하였다. 굽힘충격 시험을 위한 최적조건은 주파수 10 Hz, 진폭은 (+12/-1)~(+15/-1)의 범위이었다. 시험에 사용된 PCB 표면처리는 Cu-OSP(Organic Solderability Preservative)와 ENIG(Electroless Nickel Immersion Gold) 및 ENEPIG(Electroless Nickel, Electroless Palladium, Immersion Gold)의 3종류를 사용하였고, 솔더 접합계면과 파단면을 관찰한 결과 Cu-OSP와 ENIG의 경우 금속간 화합물 층을 따라서 균열이 발생하여 파단이 일어났으나, ENEPIG의 경우에는 주로 솔더 영역에서만 균열이 생성되고 성장하였다.

• Corrosion Science and Technology
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• 제7권1호
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• pp.61-67
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• 2008

In this paper, electrochemical and microstructural characteristics of nickel-plated Alloy 600 were investigated in order to identify the performance of electroless Ni-plating on Alloy 600 in high-temperature aqueous condition with the comparison of electrolytic nickel-plating. For high temperature corrosion test of nickel-plated Alloy 600, specimens were exposed for 770 hours to typical PWR primary water condition. During the test, open circuit potentials (OCP's) of all specimens were measured using a reference electrode. Also, resistance to flow accelerated corrosion (FAC) test was examined in order to check the durability of plated layers in high-velocity flow environment at high temperature. After exposures to high flow rate aqueous condition, the integrity of surfaces was confirmed by using both scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). For the field application, a remote process for electroless nickel-plating was demonstrated using a plate specimen with narrow gap on a laboratory scale. Finally, a practical seal design was suggested for more convenient application.

• 마이크로전자및패키징학회지
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• 제29권3호
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• pp.63-71
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• 2022

본 연구에서는 Sn-Ag-Cu (SAC)솔더와 electroless nickel autocatalytic gold (ENAG) 표면처리 간 계면반응 및 낙하충격 신뢰성을 연구하였다. ENAG 솔더 접합부의 특성은 다른 Ni계 표면처리인 electroless nickel immersion gold(ENIG)와 electroless nickel electroless palladium immersion gold (ENEPIG)와 비교 평가 하였다. SAC솔더와 Ni계 표면처리 계면에서는 (Cu, Ni)6Sn5 intermetallic compound (IMC)가 형성되었다. IMC 두께는 SAC/ENAG와 SAC/ENEPIG는 1.15 ㎛, 1.12 ㎛로 비슷하였고, SAC/ENIG는 IMC 두께가 2.99 ㎛로 SAC/ENAG보다 2배 정도 높았다. 또한 솔더 접합부의 IMC두께는 무전해 Ni(P) 도금액의 metal turnover (MTO)조건에 영향을 받는 다는 것을 알 수 있었고, MTO가 0에서 3으로 증가하면 IMC두께가 증가함을 알 수 있었다. 전단강도는 SAC/ENEPIG의 접합강도가 가장 높았고, SAC/ENAG, SAC/ENIG 순이었다. 또한, MTO가 증가하면, 전단강도가 낮아짐을 알 수 있었다. 취성파괴도 SAC/ENEPIG가 세가지 접합부 중 가장 낮았으며, SAC/ENAG, SAC/ENIG 순이였고, 마찬가지로 MTO가 증가하면 취성파괴가 높아짐을 알 수 있었다. 낙하충격 시험에서도 0 MTO조건이 3 MTO조건보다 높은 평균파괴횟수를 갖는 것을 확인하였고, 평균파괴횟수도 SAC/ENEPIG, SAC/ENAG, SAC/ENIG순으로 높았다. 낙하 충격 후 파단면을 관찰한 결과 크랙은 IMC와 Ni(P)층 사이에서 진행되었다.

• 한국표면공학회지
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• 제55권2호
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• pp.102-119
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• 2022

Gold plating is used as a coating of connecter in printed circuit boards, ceramic integrated circuit packages, semiconductor devices and so on, because the film has excellent electric conductivity, solderability and chemical properties such as durability to acid and other chemicals. As increasing the demand for miniaturization of printed circuit boards and downsizing of electronic devices, several types of electroless gold plating solutions have been developed. Most of these conventional gold plating solutions contain cyanide compounds as a complexing agent. The gold film obtained from such baths usually satisfies the requirements for electronic parts mentioned above. However, cyanide bath is highly toxic and it always has some possibility to cause serious problems in working environment or other administrative aspects. The object of this investigation was to develop a cyanide-free electroless gold plating process that assures the high stability of the solution and gives the excellent solderability of the deposited film. The investigation reported herein is intended to establish plating bath composition and plating conditions for electroless gold plating, with thiomalic acid as a complexing agent. At the same time, we have investigated the solution stability against nickel ion and pull strength of solder ball. Furthermore, by examining the characteristics of the plated Au plating film, the problems of the newly developed electroless Au plating solution were improved and the applicability to various industrial fields was examined. New type electroless gold-plating bath which containing thiomalic acid as a complexing agent showing so good solution stability and film properties as cyanide bath. And this bath shows the excellent stability even if the dissolved nickel ion was added from under coated nickel film, which can be used at the neutral pH range.

• 마이크로전자및패키징학회지
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• 제27권3호
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• pp.29-34
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• 2020

본 연구에서는 무전해 니켈 도금액 pH 변화에 따른 electroless nickel immersion gold (ENIG)/Sn-3.0wt.%Ag-0.5wt.%Cu(SAC305) 솔더 접합부 취성 파괴 거동에 대하여 평가하였다. ENIG 표면처리를 위한 무전해 니켈 도금액의 pH는 4.0에서 5.5로 변화 시켰다. 무전해 니켈 도금 후 Ni-P 표면 관찰 결과, 도금액의 pH가 낮아질수록 Ni-P 층 nodule 표면에 핀홀이 증가하였다. 솔더링 후 접합부 계면에서는 (Cu,Ni)6Sn5 금속간화합물이 형성되었으며, 무전해 니켈 도금액의 pH가 증가할수록 솔더접합부의 계면 금속간화합물의 두께는 증가하였다. 고속전단 시험을 통하여 ENIG/SAC305 솔더 접합부의 취성파괴 거동을 확인하였으며, 무전해 니켈 도금액의 pH가 증가할수록 솔더접합부의 전단강도는 감소하는 경향을 보였다. 또한, 솔더 접합부의 취성 파괴율은 pH가 5일 때 가장 높은 값을 보였다.

• 한국표면공학회지
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• 제15권2호
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• pp.57-67
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• 1982

Electroless Ni-plating is often utilized in industries due to its physical and mechanical characteristics in contrast to conventional electroplatings. Thus, electroless Ni-plating will be broadly applicated in many fields. However, The physial and mechanical properties of this depositss depend largely on the structure and P content of film and heat treatment. And here discused about the important results of those past research.

• 한국세라믹학회지
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• 제26권1호
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• pp.73-80
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• 1989

Preparation and characteristics of electroless Ni-P and Ni-B systems for semiconducting ceramics have been investigated as a function of deposit rate, reducing agent and pH variation. The effect of DMAB as ruducing agent is greater than that of sodium hypophosphite. The nickel electrode prepared from the nickel-phosphorus system with sodium hypophosphite shows low contact resistance of 0.99ohm compared with the resistance of 10chm in the electrode prepared from the nickel-boron system with DMAB. The contact resistance increases with increasing pH valuein the nickel-phosphorus system with sodium hypophosphite. The ratio of Ni to P is about 76.0/24.0 for the contact resistance of 0.99ohm in the above system.