• Title/Summary/Keyword: Electroless Ni-P

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Study on Thermal Stability of the Interface between Electroless Ni-W-P Deposits and BGA Lead-Free Solder (Sn-3.0Ag-0.5Cu) (BGA 무연솔더(Sn-3.0Ag-0.5Cu)와 무전해 Ni-W-P 도금층 계면의 열 안정성에 대한 연구)

  • Shin, Dong-Hee;Cho, Jin-Ki;Kang, Seung-Goon
    • Journal of the Microelectronics and Packaging Society
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    • v.17 no.1
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    • pp.25-31
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    • 2010
  • In this study, we investigated the morphology and thermal stability of interfacial phases in joint between lead free solder(Sn-3.0Ag-0.5Cu) and electroless Ni-W-P under bump metallizations(UBM) with different tungsten contents as a function of thermal aging. Content of phosphorus of each deposits was fixed at 8 wt.%, and content of tungsten was variated each 0, 3, 6 and 9 wt.%. Specimens were prepared by reflowing at $255^{\circ}C$, aging range was $200^{\circ}C$ and up to 2 weeks. After reflow process, in the electroless Ni(W)-P/solder joint, the interfacial intermetallic compound(IMC) was showed both $(Cu,Ni)_6Sn_5$ and $(Ni,Cu)_3Sn_4$. UBM and generated IMC at the interface of lead free solder was proportionally increased with aging time. The thickness of IMC was increased because the generation rate of $Ni(W)_3P$ decreased with increasing contents of W.

Diamond Films on Electroless Ni-P Plated WC-Co Substrates (무전해 Ni-P도금층/WC-Co기판 상에 다이아몬드 막 제조)

  • Kim, Jin-Oh;Kim, Hern;Park, Jeong-Il;Park, Kwang-Ja
    • Applied Chemistry for Engineering
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    • v.8 no.5
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    • pp.742-748
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    • 1997
  • Diamond films which have high hardness and thermal conductivity can be used to improve the performance of WC-Co as a cutting tool material. However, it is difficult to get such coatings of good uniformity and adhesiveness due to the surface characteristics of WC-Co. To get better coatings, some techniques, such as the surface treatment of substrate or the formation of interlayer between substrate and diamond film, have been tried. In the present work, the nickel interlayer is formed onto WC-Co by electroless Ni-P plating, which is introduced as a new method, and then diamond film is deposited on the interlayer. Formation and uniformity of three layers, i.e., substrate, electroless plate, and diamond film, and the adhesiveness of interlayers were studied. To investigate the effects of pretreatment on electroless plating, two different methods such as acid treatment and diamond powder treatment were used. The effects of heat treatment of the electroless plated surface on adhesiveness between the substrate and the interlayer were examined. It was found that as the temperature increases, the Ni crystals grow and then result in improved adhesiveness. Diamond film coatings of pure diamond phase were obtained at $800^{\circ}C$. It is concluded that the heat treated electroless Ni-P plating can be effectively used as a interlayer between WC-Co substrate and diamond film.

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Effect of Plating Condition and Plating Rate on the Magnetic Properties of Electroless Ni-Cu-P Deposits (무전해 Ni-Cu-P 도금층의 자성에 미치는 도금조건과 도금속도의 영향)

  • Oh, I.S.;Lee, T.H.
    • Journal of Power System Engineering
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    • v.10 no.3
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    • pp.58-66
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    • 2006
  • The effect of bath composition, plating condition and plating rate on the magnetic properties of electroless Ni-Cu-P deposits were investigated. With increasing $CuSO_4$ concentration in the bath, plating rate increased, while the Br value of deposits decreased Sharply. Plating rate increased up to 34% with the addition of 200ppm of NaF and 0.8ppm of Thiourea to the bath. Plating reaction had been ceased by the increase of pH above 11.3, bath temperature higher than $90^{\circ}C$ and under $70^{\circ}C$. The Br value of deposit was uniform with various concentration of complexing agent (Sodium citrate, Ethylenediamine) in the bath. The Br value of deposit was almost equal to that found by the addition of stabilizer(Thiourea) and accelerator(NaF). The Br value of deposit was uniform in plating time(120 min) and heat treatment temperature(below $200^{\circ}C$), and were confirmed to have adequate bath stability for practical use.

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A Study on the Electroless Ni-Cu-P Alloy Plating of Al Base Hard Disk(I)Effect on some Properties of Electroless Ni-Cu-P Deposits by Electrolyte and Heat Treatment Condition (알루미늄 기판의 무전해 니켈-구리-인 합금도금에 관한 연구(I) 전해액 및 열처리 조건이 무전해 니켈-구리-인 도금층의 제 물성에 미치는 영향)

  • 오이식;황용길
    • Journal of the Korean institute of surface engineering
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    • v.24 no.2
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    • pp.103-113
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    • 1991
  • Electroless Ni-Cu-P alloy plating of Al base hard disk was performed to investigate some properties according to the change of composition. It was found that the composition of Ni and Cu in deposits changed linearly with increasing the mole ratio of NiSO4.6H2O/CuSO4.5H2O. The increase in hardness by heat - treatment was confirmed to be associated with small size grained crystallization of the amorphous deposits. Acid resistance of all deposits layer. which had been heated up to 30$0^{\circ}C$, was found to be exellent when immersed in 1N-H2SO4 solution, and it showed more superior acid resistance with decreasing Cu content and with increasing P. The resistivity of the deposits heat treated became smaller at temperature more than 50$0^{\circ}C$, and it became largerly with increasing P content. Cu 44.1wt% alloy(C bath) showed the most superior non-magnetically stable characteristics after heat treatment. It was superiorly with higher temperature and with decreasing P content.

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Characteristics and Corrosion Behaviors of Quaternary (Co/Ni/P/Mn) Electroless Plating (4성분 무전해도금(Co/Ni/P/Mn)의 특성 및 부식거동)

  • Hur, Ho
    • Clean Technology
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    • v.20 no.2
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    • pp.136-140
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    • 2014
  • The quaternary alloy (Co/Ni/P/Mn) coatings were prepared using electroless plating on the polypropylene. Compositions of the quaternary alloys (Co/Ni/P/Mn) were controlled by the amount of agents. The composition by EDS, morphology with SEM, film thickness, and surface electrical resistance of the samples were measured. Higher phosphorous content samples give larger electric resistance, thus a relationship is admitted between P content and electric resistance. The corrosivity of the coatings were evaluated by electrochemical methods in the 3.5 wt% NaCl and 5.0 wt% $H_2SO_4$ solutions, respectively. It was concluded that phosphorous addition enhances resistivity in the corrosion.

A Study on the Functional Electroless Ni Plating for Controled Morphology on the CBN Powder (CBN분말상에 석출형상 제어를 위한 무전해 기능성 니켈합금도금에 관한 연구)

  • Chu, H.S.;Kim, D.K.
    • Journal of the Korean institute of surface engineering
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    • v.41 no.6
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    • pp.312-324
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    • 2008
  • In this study, the functional property as a super abrasive material was secured for CBN powder by the electroless Ni-P plating on the surface of the particle. The plating solution has been prepared to control the surface morphology by regulating surfactants and process conditions. The effects of processing parameters on the surface morphology of CBN powder was discussed. The results are summarized as follows; A stable plating tendency was achieved from 1 hour after quantitatively dropping reducing agent. It was observed that more than 50% of the weight gain was obtained by Ni-P coating on the surface of CBN super abrasive powder. The morphology of the Ni-P coating layer is consisted of botryoidal and spiky type and it could be controlled by regulating processing parameters. Superior characteristic in terms of surface morphology was found in the nonionic surfactant XL-80N. It was found that XL-80N considerably decreased surface tension of CBN powder and Ni-P alloy surface then enhance wettability as well as plating rate. Metal coated CBN powder as a raw material of resin bond wheel has been developed through this investigation.

Selective Contact Hole Filling by electroless Ni Plating (무전해 Ni 도금에 의한 선택적 CONTACT HOLE 충전)

  • 우찬희;권용환;김영기;박종완;이원해
    • Journal of the Korean institute of surface engineering
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    • v.25 no.4
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    • pp.189-206
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    • 1992
  • The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

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pH Effects of Electroless Ni Plating on ABS Plastics

  • Song, T.H.;Lee, J.K.;Ryoo, K.K.;Lee, Y.B.
    • Corrosion Science and Technology
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    • v.3 no.1
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    • pp.26-29
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    • 2004
  • Metal plated plastics are becoming more prevalent in materials of communication parts. A new technique MmSH is a process of injecting plastics to produce innovated physical properties compared to the conventional injection process. This study involves two ways of coating plastics Ni by electroless plating and varying bath and plasma treatment for improved adhesion strength between plating layer and surface. MmSH injection processed ASS with plasma treated after neutralization showed a superior adhesion force and a gloss and rate of deposition when it was in pH 7.5. On the other hand, conventional injection processed ASS was in pH 6.5.

Effects of Multi-Complex Agent Addition on Characteristics of Electroless Ni-P Solution (복합 착화제 첨가가 무전해 Ni-P 도금액의 특성에 미치는 영향)

  • Lee, Hong-Kee;Lee, Ho-Nyun;Jeon, Jun-Mi;Hur, Jin-Young
    • Journal of the Korean institute of surface engineering
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    • v.43 no.2
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    • pp.111-120
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    • 2010
  • In this study, the effects of multi-complex agents addition on characteristics of electroless Ni plating solution are investigated. The species and the concentration of complexing agents are major factors to control the deposition rate, P concentration, and surface morphology of plating films. Adipic acid increases the deposition rate in regardless of single- or mutli-complex agent addition. However, lactic acid effectively increases the deposition rate in case of multi-addition as the complex agents with adipic or sodium succinate acid. In addition, sodium citric acid and malic acid show good stabilizing effects of plating solution and lowering the deposition rate, because they have high complexibility. Therefore, it is suggested that the development of Ni-P plating solution suitable for diverse usages can be carried out systematically using the database from this study.

Cu-Ni-P Alloy Nano Powders Prepared by Electrical Wire Explosion (전기선폭발법에 의한 Cu-Ni-P 합금 나노 분말 제조)

  • Kim, Won-Baek;Park, Je-Shin;Suh, Chang-Youl;Lee, Jae-Chun;Kim, Jung-Hwan;Oh, Yong-Jun
    • Journal of Powder Materials
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    • v.14 no.2 s.61
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    • pp.108-115
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    • 2007
  • Cu-Ni-P alloy nano powders were fabricated by the electrical explosion of electroless Ni plated Cu wires. The effect of applied voltage on the explosion was examined by applying pulse voltage of 6 and 28 kV, The estimated overheating factor, K, were 1.3 for 6 kV and 2.2 for 28 kV. The powders produced with pulse voltage of 6 kV were composed of Cu-rich solid solution, Ni-rich solid solution, and $Ni_3P$ phase. While, those produced with 28 kV were complete Cu-Ni-P solid solution and small amount of $Ni_3P$ phase. The initial P content of 6.5 at.% was reduced to 2-3 at.% during explosion due to its high vapour pressure.