• 제목/요약/키워드: Electrode fabrication

검색결과 862건 처리시간 0.029초

Optimal Porous Structure of MnO2/C Composites for Supercapacitors

  • Iwamura, Shinichiroh;Umezu, Ryotaro;Onishi, Kenta;Mukai, Shin R.
    • 한국재료학회지
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    • 제31권3호
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    • pp.115-121
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    • 2021
  • MnO2 can be potentially utilized as an electrode material for redox capacitors. The deposition of MnO2 with poor electrical conductivity onto porous carbons supplies them with additional conductive paths; as a result, the capacitance of the electrical double layer formed on the porous carbon surface can be utilized together with the redox capacitance of MnO2. However, the obtained composites are not generally suitable for industrial production because they require the use of expensive porous carbons and/or inefficient fabrication methods. Thus, to develop an effective preparation procedure of the composite, a suitable structure of porous carbons must be determined. In this study, MnO2/C composites have been prepared from activated carbon gels with various pore sizes, and their electrical properties are investigated via cyclic voltammetry. In particular, mesoporous carbons with a pore size of around 20 nm form a composite with a relatively low capacitance (98 F/g-composite) and poor rate performance despite the moderate redox capacitance obtained for MnO2 (313 F/g-MnO2). On the other hand, using macro-porous carbons with a pore size of around 60 nm increases the MnO2 redox capacitance (399 F/g-MnO2) as well as the capacitance and rate performance of the entire material (203 F/g-composite). The obtained results can be used in the industrial manufacturing of MnO2/C composites for supercapacitor electrodes from the commercially available porous carbons.

몰드 변압기의 절연 진단을 위한 로고우스키형 부분방전 센서의 설계 및 제작 (Design and Fabrication of Rogowski-type Partial Discharge Sensor for Insulation Diagnosis of Cast-Resin Transformers)

  • 이경렬;김성욱;길경석
    • 한국전기전자재료학회논문지
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    • 제35권6호
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    • pp.594-602
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    • 2022
  • Cast-resin transformers are widely installed in various electrical power systems because of their low operating cost and low influence on external environmental factors. However, when they have an internal defect during the manufacturing process or operation, a partial discharge (PD) occurs, and eventually destroys the insulation. In this paper, a Rogowski-type PD sensor was studied to replace commercial PD sensors used for the insulation diagnosis of power apparatus. The proposed PD sensor was manufactured with four different types of PCB-based winding structures, and it was analyzed in terms of the detection characteristics for standard calibration pulses and the changes of the output voltage according to the distance. The output increased linearly in accordance with the applied discharge amount. It was confirmed that the hexagon structure sensor had the highest sensitivity, because the winding cross-sectional area of the sensor was larger than others. In addition, as the distance from the defect increased, the output voltage of the sensors decreased by 7.32% on average. It was also confirmed that the attenuation rate according to the distance decreased as the input discharge amount increased. For the application of this new type sensor, PD electrode system was designed to simulate the void defect. Waveforms and PRPD patterns measured by the proposed PD sensors at DIV and 120% of DIV were the same as the results measured by MPD 600 based on IEC 60270. The proposed PD sensors can be installed on the inner wall of the transformer tank by coating its surfaces with a non-conductive material; therefore, it is possible to detect internal defects more effectively at a closer distance from the defect than the conventional sensors.

상보형 일렉트로크로믹 소자의 제조 및 특성 ( I ) (Characteristics and Fabrication of Complementary Electrochromic Device ( I ))

  • 이석윤;서동규;김영호;조동율;천희곤
    • 센서학회지
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    • 제6권1호
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    • pp.24-34
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    • 1997
  • 본 연구에서는 비정질 $WO_{3}$ 박막을 작용전극으로 $V_{2}O_{5}$ 박막과 NiO 박막을 각각의 대향전극으로 사용한 두 종류의 상보형 일렉트로크로믹 소자를 제작하고 그 특성을 조사 연구하였다. 그 결과 $100{\sim}150nm$ 두께로 진공증착된 $V_{2}O_{5}$ 박막을 대향전극으로 이용하여 제작된 $ITO/WO_{3}/LiClO_{4}-PC/V_{2}O_{5}/ITO$ 구조의 상보형 소자에서는 $1{\sim}2V$ 정도의 낮은 인가전압에서 광변조량이 $50{\sim}60%$를 나타내는 우수한 특성을 나타냈다. 그리고, RF 반응성 스퍼터링 방법으로 제작된 NiO 박막을 대향전극으로 이용한 $ITO/WO_{3}/LiClO_{4}-PC/NiO/ITO$ 구조의 경우 1.5V의 인가전압에 가시광선 영역(${\lambda}=550nm$)에서 약 25% 정도, 근적외선 영역(${\lambda}=850nm$)에서 약 30% 정도의 태양광을 변조할 수 있는 특성을 보였다.

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Mo/SiO2/Si(100)기판 위에 MOCVD법으로 성장시킨 AIN박막이용 GHz대역의 FBAR제작에 관한 연구 (Fabrication of GHz-Band FBAR with AIN Film on Mo/SiO2/Si(100) Using MOCVD)

  • 양충모;김성권;차재상;박구만
    • 조명전기설비학회논문지
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    • 제20권4호
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    • pp.7-11
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    • 2006
  • 본 논문에서는 $Mo/SiO_2/Si(100)$ 기판 위에 MOCVD(Metal-Organic-Chemical-Vapor Deposition)법을 이용하여 C축 방향으로 성장시킨 AIN(Aluminum Nitride) 박막을 이용하여 GHz대역 무선 통신에서 사용할 수 있는 FBAR(Film-Bulk-Acoustic Resonator)을 제작하였다. 제작된 공진부의 공진주파수와 반공진주파수는 각각 3.189[GHz]와 3.224[GHz]으로 측정되었으며, Q값(Quality Factor)과 유효한 전기기계 결합계수(${k_{eff}}^2$)는 각각 24.7과 2.65[%]로 평가되었다. AIN의 증착(Deposition) 조건은 $950[^{\circ}C]$의 기판표면(Substrate) 온도, 20Torr의 압력, 25000의 N/Al의 V/III비로 증착하였다. $4{\times}10^{-5}[\Omega{cm}]$의 Mo 하부전극 고유저항과 $Mo/SiO_2/Si(100)$ 기판 위에 AIN(0002) FWHM(Full-Width at Half-Maximum) 4를 갖는 C축 방향성의 AIN 박막을 성공적으로 성장시켰다. 따라서 증착된 AIN박막의 FWHM값은 GHz대역 무선 통신용 RF(Radio Frequency) 밴드 패스 필터 설계에 유용하게 사용될 것이다.

극성/무극성 6H-SiC 쇼트키 베리어 다이오드 제조 및 전기적 특성 연구 (A Study About Electrical Properties and Fabrication Schottky Barrirer Diode Prepared on Polar/Non-Polar of 6H-SiC)

  • 김경민;박성현;이원재;신병철
    • 한국전기전자재료학회논문지
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    • 제23권8호
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    • pp.587-592
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    • 2010
  • We have fabricated schottky barrier diode (SBDs) using polar (c-plane) and non polar (a-, m-plane) n-type 6H-SiC wafers. Ni/SiC ohmic contact was accomplished on the backside of the SiC wafers by thermal evaporation and annealed for 20minutes at $950^{\circ}C$ in mixture gas ($N_2$ 90% + $H_2$ balanced). The specific contact resistance was $3.6{\times}10^{-4}{\Omega}cm^2$ after annealing at $950^{\circ}C$. The XRD results of the alloyed contact layer show that formation of $NiSi_2$ layer might be responsible for the ohmic contact. The active rectifying electrode was formed by the same thermal evaporation of Ni thin film on topside of the SiC wafers and annealed for 5 minutes at $500^{\circ}C$ in mixture gas ($N_2$ 90% + $H_2$ balanced). The electrical properties of SBDs have been characterized by means of I-V and C-V curves. The forward voltage drop is about 0.95 V, 0.8 V and 0.8 V for c-, a- and m-plane SiC SBDs respectively. The ideality factor (${\eta}$) of all SBDs have been calculated from log(I)-V plot. The values of ideality factor were 1.46, 1.46 and 1.61 for c-, a- and m-plane SiC SBDs, respectively. The schottky barrier height (SBH) of all SBDs have been calculated from C-V curve. The values of SBH were 1.37 eV, 1.09 eV and 1.02 eV for c-, a- and m-plane SiC SBDs, respectively.

Morphology Control of Nanostructured Graphene on Dielectric Nanowires

  • 김병성;이종운;손기석;최민수;이동진;허근;남인철;황성우;황동목
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.375-375
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    • 2012
  • Graphene is a sp2-hybridized carbon sheet with an atomic-level thickness and a wide range of graphene applications has been intensely investigated due to its unique electrical, optical, and mechanical properties. In particular, hybrid graphene structures combined with various nanomaterials have been studied in energy- and sensor-based applications due to the high conductivity, large surface area and enhanced reactivity of the nanostructures. Conventional metal-catalytic growth method, however, makes useful applications difficult since a transfer process, used to separate graphene from the metal substrate, should be required. Recently several papers have been published on direct graphene growth on the two dimensional planar substrates, but it is necessary to explore a direct growth of hierarchical nanostructures for the future graphene applications. In this study, uniform graphene layers were successfully synthesized on highly dense dielectric nanowires (NWs) without any external catalysts. We also demonstrated that the graphene morphology on NWs can be controlled by the growth parameters, such as temperature or partial pressure in chemical vapor deposition (CVD) system. This direct growth method can be readily applied to the fabrication of nanoscale graphene electrode with designed structures because a wide range of nanostructured template is available. In addition, we believe that the direct growth growth approach and morphological control of graphene are promising for the advanced graphene applications such as super capacitors or bio-sensors.

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Fabrication of Schottky Device Using Lead Sulfide Colloidal Quantum Dot

  • Kim, Jun-Kwan;Song, Jung-Hoon;An, Hye-Jin;Choi, Hye-Kyoung;Jeong, So-Hee
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.189-189
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    • 2012
  • Lead sulfide (PbS) nanocrystal quantum dots (NQDs) are promising materials for various optoelectronic devices, especially solar cells, because of their tunability of the optical band-gap controlled by adjusting the diameter of NQDs. PbS is a IV-VI semiconductor enabling infrared-absorption and it can be synthesized using solution process methods. A wide choice of the diameter of PbS NQDs is also a benefit to achieve the quantum confinement regime due to its large Bohr exciton radius (20 nm). To exploit these desirable properties, many research groups have intensively studied to apply for the photovoltaic devices. There are several essential requirements to fabricate the efficient NQDs-based solar cell. First of all, highly confined PbS QDs should be synthesized resulting in a narrow peak with a small full width-half maximum value at the first exciton transition observed in UV-Vis absorbance and photoluminescence spectra. In other words, the size-uniformity of NQDs ought to secure under 5%. Second, PbS NQDs should be assembled carefully in order to enhance the electronic coupling between adjacent NQDs by controlling the inter-QDs distance. Finally, appropriate structure for the photovoltaic device is the key issue to extract the photo-generated carriers from light-absorbing layer in solar cell. In this step, workfunction and Fermi energy difference could be precisely considered for Schottky and hetero junction device, respectively. In this presentation, we introduce the strategy to obtain high performance solar cell fabricated using PbS NQDs below the size of the Bohr radius. The PbS NQDs with various diameters were synthesized using methods established by Hines with a few modifications. PbS NQDs solids were assembled using layer-by-layer spin-coating method. Subsequent ligand-exchange was carried out using 1,2-ethanedithiol (EDT) to reduce inter-NQDs distance. Finally, Schottky junction solar cells were fabricated on ITO-coated glass and 150 nm-thick Al was deposited on the top of PbS NQDs solids as a top electrode using thermal evaporation technique. To evaluate the solar cell performance, current-voltage (I-V) measurement were performed under AM 1.5G solar spectrum at 1 sun intensity. As a result, we could achieve the power conversion efficiency of 3.33% at Schottky junction solar cell. This result indicates that high performance solar cell is successfully fabricated by optimizing the all steps as mentioned above in this work.

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광화학증착법에 의한 직접패턴 비정질 TiOx 박막의 제조 및 저항변화 특성 (Resistive Switching Characteristic of Direct-patternable Amorphous TiOx Film by Photochemical Metal-organic Deposition)

  • 황윤경;이우영;이세진;이홍섭
    • 마이크로전자및패키징학회지
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    • 제27권1호
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    • pp.25-29
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    • 2020
  • 광화학증착법 (PMOD; photochemical metal-organic deposition)을 이용하여 photoresist 및 etching 공정없이 pattern 된 TiOx resistive switching (RS) 소자를 제작 및 그 특성을 평가하였다. Ti(IV) 2-ethylhexanoate를 출발물질로 사용하였으며 UV 노출시간 10 min에 광화학반응이 완료됨을 FTIR 분석을 통하여 확인하였다. 200 ℃ 이하 저온공정에서 직접패턴 된 20 nm 두께의 비정질 TiOx 박막의 균일한 두께의 패턴형성을 Atomic Force Microscopy를 통하여 확인하였다. 별도의 상형성을 위한 후 열처리 공정 없이 4 ㎛ 선폭의 전극위에 형성된 20 nm 두께의 비정질 TiOx RS 소자는 4V 동작전압에서 on/off ratio 20의 forming-less RS 특성을 나타내었다. Electrochemical migration에 영향을 미치는 grain boundary가 없어 소자간 신뢰성 향상이 기대되며, flexible 기판 또는 저온공정이 요구되는 메모리 소자 공정에서 PMOD 공정이 응용될 수 있음을 보여준다. Selector를 이용하여 crossbar array 구조를 도입할 경우 매우 간단한 구조의 저비용 메모리 소자를 구현할 수 있을 것으로 기대 된다.

사진식각법을 이용한 FET형 용존 $CO_{2}$ 센서의 수화젤막 및 가스 투과막 제작 (Fabrication of Hydrogel and Gas Permeable Membranes for FET Type Dissolved $CO_{2}$ Sensor by Photolithographic Method)

  • 박이순;김상태;고광락
    • 센서학회지
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    • 제6권3호
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    • pp.207-213
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    • 1997
  • $H^{+}$ 이온에 선택적으로 감응하는 field effect transistor(pH-ISFET)를 바탕소자로 하고, 그 gate 주위에 Ag/AgCl 기준전극을 형성한 다음, 이를 둘러싼 수화젤(hydrogel)막 및 기체투과막의 이중막 구조를 가진 용존이산화탄소($CO_{2(aq)}$) 센서소자를 사진식각(photolithography)법으로 제작하였다. PVA-SbQ 혹은 PVP-PVAc/감광제 형의 광가교형 감광액은 수화젤막 형성에 적합하지 않았으나, 2-hydroxyethyl methacrylate(HEMA) 및 acrylamide를 포함하는 광중합형 감광액을 사용할 경우에는 사진식각법에 의한 수화젤막이 좋은 해상도로 얻어졌다. 기체투과막은 urethane acrylate계 UV-oligomer를 주성분으로 한 감광액을 써서 사진식각법으로 수화젤막위에 형성할 수 있었다. 또한 수화젤막 및 기체투과막을 사진식각법으로 형성할 때 N,N,N',N'-tetramethyl ethplenediamine(TED) 을 $O_{2}$ quencher로서 감광액 중에 도입함으로써 UV 노광시에 polyester film을 부착하는 번거로운 공정을 생략할 수 있음을 알았다. 이렇게 제조된 $pCO_{2}$ 센서는 수용액 중에서 $10^{-3}{\sim}10^{0}\;mol/{\ell}$$CO_{2}$ 농도변화에 대하여 직선적인 검정곡선(calibration curve)을 얻을 수 있었다.

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SnO2 열산화감지막의 제작 및 특성 (Characteristics and Fabrication of Thermal Oxidized-SnO2)

  • 강봉휘;이덕동
    • 센서학회지
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    • 제11권6호
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    • pp.342-349
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    • 2002
  • 본 논문에서는 새로운 방식의 금속 산화물 감지막의 형성 기술에 대해서 제안을 하였다. Sn 증착을 위해 사용된 기판은 Pt 전극을 가진 실리콘 웨이퍼를 이용하였다. 증착 방식은 금속 Sn이 연속적인 막이 아닌 island로만 형성된 상태로 하였다. 제안된 방식의 최적의 Sn 증착 조건을 구하기위해 Pt 전극간의 저항이 $1\;k{\Omega}$, $5\;k{\Omega}$, $10\;k{\Omega}$$50\;k{\Omega}$이 되도록 Sn을 증착하여 시료를 제작하였다. 또한 일반적인 방식과 새롭게 제안된 방식의 시료를 비교하기 위해서 Sn 막의 두께가 $1,500\;{\AA}$인 시료를 준비하였다. 이것들을 $700^{\circ}C$의 산소분위기에서 3시간 동안 산화를 하여 $SnO_2$를 형성하였다. 산화물 감지막들의 특성 평가를 위해서 SEM, XRD 및 AFM을 이용하였다. 분석을 통하여 $10\;k{\Omega}$의 시료($300\;{\AA}$)가 최적의 감지막 증착 조건임을 알았다. 또한 제조된 감지막을 다양한 농도의 부탄, 프로판 및 일산화탄소에 대해서 동작온도 $250^{\circ}C$, $300^{\circ}C$$350^{\circ}C$의 경우에 대해서 측정하였다. 그 결과 촉매를 첨가하지 않았음에도 불구하고 모든 가스에 대한 높은 감도 특성을 나타내었다.