• Title/Summary/Keyword: Electrical insulator

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저밀도 폴리에틸렌의 고전계 파형에 대한 필름 두께 의존성 (Film Thickness Dependence of Ac High Field for Low Density Polyethylene)

  • 최용성;위성동;황종선;이경섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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    • pp.45-49
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    • 2008
  • Polyethylene is widely used as the insulator for power cable. To investigate the conduction mechanism for power cable insulation under ac high field, it is very important to acquire the dissipation current under actual running field. Recently, we have developed the unique system, which make possible to observe the nonlinear dissipation current waveform. In this system, to observe the nonlinear properties with high accuracy, capacitive current component is canceled by using inverse capacitive current signal instead of using the bridge circuit for canceling it. We have already reported that the dissipation currents of $40\;{\mu}m$ thick LDPE film at 10 kV/mm and over 140 Hz, it starts to show nonlinearity and odd number's harmonics were getting large. To investigate the conduction mechanis ms in this region, especially space charge effect, various kinds of estimation, such as time variations of instantaneous resistivity for one cycle, FFT spectra of dissipation current waveforms and so on, has been examined. As the results of these estimations, it was found that the dissipation current will depend on not only the instantaneous value of electric field but also the time differential of applied electric field due to taking a balance between applied field and internal field. Furthermore, two large peaks of dissipation current for each half cycle were observed under certain condition. In this paper, to clarify the reason why it shows two peaks for each half cycle, the film thickness dependences of dissipation current waveforms were observed by using the three different thickness LDPE films.

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HgCdTe MIS의 이중 절연막 특성에 관한 연구 (A study on the characteristics of double insulating layer)

  • 정진원
    • E2M - 전기 전자와 첨단 소재
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    • 제9권5호
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    • pp.463-469
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    • 1996
  • The double insulating layer consisting of anodic oxide and ZnS was formed for HgCdTe metal insulator semiconductor(MIS) structure. ZnS was evaporated on the anodic oxide grown in H$_{2}$O$_{2}$ electrolyte. Recently, this insulating mechanism for HgCdTe MIS has been deeply studied for improving HgCdTe surface passivation. It was found through TEM observation that an interface layer is formed between ZnS and anodic oxide layers for the first time in the study of this area. EDS analysis of chemical compositions using by electron beam of 20.angs. in diameter and XPS depth composition profile indicated strongly that the new interface is composed of ZnO. Also TEM high resolution image showed that the structure of oxide layer has been changed from the amorphous state to the microsrystalline structure of 100.angs. in diameter after the evaporation of ZnS. The double insulating layer with the resistivity of 10$^{10}$ .ohm.cm was estimated to be proper insulating layer of HgCdTe MIS device. The optical reflectance of about 7% in the region of 5.mu.m showed anti-reflection effect of the insulating layer. The measured C-V curve showed the large shoft of flat band voltage due to the high density of fixed oxide charges about 1.2*10$^{12}$ /cm$^{2}$. The oxygen vacancies and possible cationic state of Zn in the anodic oxide layer are estimated to cause this high density of fixed oxide charges.

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Measurement of Ion-induced Secondary Electron Emission Yield of MgO Films by Pulsed Ion Beam Method

  • Lee, Sang-Kook;Kim, Jae-Hong;Lee, Ji-Hwa;Whang, Ki-Woong
    • Journal of Information Display
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    • 제3권1호
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    • pp.17-21
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    • 2002
  • Measurement of the ion-induced secondary electron emission coefficient (${\gamma}_i$) for insulating films is hampered by an unavoidable charging problem. Here, we demonstrate that a pulsed ion beam technique is a viable solution to the problem, allowing for accurate measurement of ${\gamma}_i$ for insulating materials. To test the feasibility of the pulsed ion beam method, the secondary electron emission coefficient from n-Si(100) is measured and compared with the result from the conventional continuous beam method. It is found that the ${\gamma}_i$ from n-Si(100) by the ion pulsed beam measured to be 0.34, which is the same as that obtained by continuous ion beam. However, for the 1000 A $SiO_2$ films thermally deposited on Si substrate, the measurement of ${\gamma}_i$ could be carred out by the pulsed ion method, even though the continuous beam method faced charging problem. Thus, the pulsed ion beam is regarded to be one of the most suitable methods for measuring secondary electron coefficient for the surface of insulator materials without experiencing charging problem. In this report, the dependence of ${\gamma}_i$ on the kinetic energy of $He^+$ is presented for 1000 ${\AA}$ $SiO_2$ films. And the secondary electron emission coefficient of 1000 ${\AA}$ MgO e-beam-evaporated on $SiO_2/Si$ is obtained using the pulsing method for $He^+$ and $Ar^+$ with energy ranging from 50 to 200 eV, and then compared with those from the conventional continuous method.

Hot Wall Epitaxy (HWE) 방법에 의한 CuGaTe$_2$ 단결정 박막 성장과 특성 (Growth and Characterization of CuGaTe$_2$ Sing1e Crystal Thin Films by Hot Wall Epitaxy)

  • 유상하;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.273-280
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    • 2002
  • The stochiometric mix of evaporating materials for the CuGaTe$_2$ single crystal thin films was prepared from horizontal furnance. For extrapolation method of X-ray diffraction patterns for the CuGaTe$_2$ polycrystal, it was found tetragonal structure whose lattice constant a$\_$0/ and c$\_$0/ were 6.025 ${\AA}$ and 11.931 ${\AA}$, respectively. To obtain the single crystal thin films, CuGaTe$_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were 670 $^{\circ}C$ and 410 $^{\circ}C$ respective1y, and the thickness of the single crystal thin films is 2.1 $\mu\textrm{m}$. The crystalline structure of single crystalthin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. The carrier density and mobility of CuGaTe$_2$ single crystal thin films deduced from Hall data are 8.72${\times}$10$\^$23/㎥, 3.42${\times}$10$\^$-2/㎡/V$.$s at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the CuGaTe$_2$ single crystal thin film, we have found that the values of spin orbit coupling Δs.o and the crystal field splitting Δcr were 0.0791 eV and 0/2463eV at 10K, respectively. From the PL spectra at 10K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0470eV and the dissipation energy of the donor -bound exciton and acceptor-bound exciton to be 0.0490eV, 0.00558eV, respectively.

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벗김강도 측정법에 의한 파워 모듈의 솔더접합 특성 평가 (Characterization of the Soldering Interface in Power Modules by Peel Strength Measurement)

  • 김남균;이희흥;방욱;서길수;김은동
    • 한국전기전자재료학회논문지
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    • 제16권12호
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    • pp.1142-1149
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    • 2003
  • The strength and characteristics of the soldering interface of the power semiconductor chip in a power module has been firstly surveyed by the peel strength measurement method. A power module is combined with several power chips which generally has 30∼400$\textrm{mm}^2$ chip area to allow several tens or bigger amps in current rating, so that the traditional methods for interface characterization like shear test could not be applied to high power module. In this study power diode modules were fabricated by using lead-tin solder with 10${\times}$10$\textrm{mm}^2$ or 7${\times}$7$\textrm{mm}^2$ soldering interface. The peel strengths of soldered interfaces were measured and then the microscopic investigation on the fractured surfaces were followed. The peel test indicated that the crack propagated either through the bulk of the soft lead-tin solder which has 55-60 kgf/cm peel strength or along the interface between the solder and the plated nickel layer which has much lower 22 kgf/cm strength. This study showed that the peel test would be a useful method to quantify the solderability as well as to recognize which is the worst interface or the softest material in a power module with a large soldering area.

$CuInS_2$ 단결정 박막 성장과 광전기적 특성 (Growth and Optoelectrical Properties for $CuInS_2$ Single Crystal Thin Film)

  • 홍광준;이상열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.230-233
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    • 2004
  • The stochiometric mix of evaporating materials for the $CuInS_2$ single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuInS_2$ polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.524\;{\AA}$ and $11.142\;{\AA}$, respectively. To obtain the single crystal thin films, $CuInS_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperature were 640 t and 430 t, respectively and the thickness of the single crystal thin films was $2{\mu}m$. Hall effect on this sample was measured by the method of van dot Pauw and studied on carrier density and temperature dependence of mobility. The carrier density and mobility deduced from Hall data are $9.64{\times}10^{22}/m^3,\;2.95{\times}10^{-2}\;m^2/V{\cdot}s$ at 293 K, respectively The optical energy gaps were found to be 1.53 eV at room temperature. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the thin film, we have found that the values of spin orbit coupling splitting ${\Delta}So$ and the crystal field splitting ${\Delta}Cr$ were 0.0211 eV and 0.0045 eV at 10 K, respectively. From PL peaks measured at 10K, 807.7nm (1.5350ev) mean Ex peak of the free exciton emission, also 810.3nm (1.5301eV) expresses $I_2$ peak of donor-bound exciton emission and 815.6nm (1.5201eV) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 862.0nm (1.4383eV) was analyzed to be PL peak due to donor-acceptor pair(DAP).

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습도가 InP 턴넬 MIS 소자의 전기적 특성에 미치는 영향 (Humidity Effects on the Electrical Properties of InP Tunnel MIS Diodes)

  • 임한조;정상구;김현남
    • 대한전자공학회논문지
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    • 제21권4호
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    • pp.52-57
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    • 1984
  • InP표면에 화확적 방법으로 성장시킨 산화막을 금속과 n-InP사이에 삽입시켜 제작한 InP 턴넬 MIS(m etal-insulator-semiconductor)소자의 전기적 특성과 그 불안정성을 조사하였다. 성장된 박막은 In2O3와 P2O5가 혼합된 형태를 이루고 있었으며, 그 두께는 약 200A°으로 추정되었다. 이 MIS다이오em의 순방향전류와 역방향전류는 진공중에서의 약간의 열처리로도 증가하였으며, 다습한 분위기에서는 감소되는 현상이 관측 되었다. 이와 같은 전류-전압 특성곡선의 변화 및 그 불안정성은 수분의 흡수에 따른 산화박막의 물리 화학적 특성과 경계면 상태밀도의 변차에 기인되는 현상임을 논의하였다.

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유중 용존수소 감지를 위한 Pd/Pt Gate MISFET 센서의 제조와 그 특성 (Fabrication and Characteristics of Pd/Pt Gate MISFET Sensor for Dissolved Hydrogen in Oil)

  • 백태성;이재곤;최시영
    • 센서학회지
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    • 제5권4호
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    • pp.41-46
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    • 1996
  • 변압기 절연유중 용존수소를 감지하기 위해 Pd/Pt 게이트 MISFET 센서를 제조하고 그 특성을 조사하였다. 동일 칩안에 내장형 히터와 온도측정용 다이오드를 제조하고 MISFET의 전압 드리프트를 줄이기 위해 차동형구조로 하였다. 수소유입 드리프트를 줄이기 위해, 양쪽 FET의 게이트 절연층을 실리콘 산화막과 실리콘 질화막의 2중 구조로 하였다. 수소감지막의 블리스터를 줄이기 위해 Pd/Pt 2중 금속층을 증착하였다. 제조된 센서의 변압기 절연유에 대한 수소감지 특성은 40mV/10ppm 감도와 0.14mV/day 안정도를 보였다.

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MIM 구조를 갖는 Al2O3/HfO2/Al2O3 캐패시터의 정합특성 분석 (Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3)

  • 장재형;권혁민;정의정;곽호영;권성규;이환희;고성용;이원묵;이성재;이희덕
    • 한국전기전자재료학회논문지
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    • 제25권1호
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    • pp.1-5
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    • 2012
  • In this paper, matching characteristic of MIM (metal-insulator-metal) capacitor with $Al_2O_3/HfO_2/Al_2O_3$ (AHA) structure is analyzed. The floating gate capacitance measurement technique (FGMT) was used for analysis of matching characteristic of the MIM capacitors in depth. It was shown that matching coefficient of AHA MIM capacitor is 0.331%${\mu}m$ which is appropriate for application to analog/RF integrated circuits. It was also shown that the matching coefficient has a more strong dependence on the width than length of MIM capacitor.

Cycloaliphatic계 에폭시 절연재료의 옥외성능에 미치는 충전재 및 첨가물의 영향 (Effect of Filler and Additive on Performance of Cycloalipatic Epoxy Used for Outdoor Insulators)

  • 연복희;박충렬;허창수;심대섭
    • 조명전기설비학회논문지
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    • 제16권4호
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    • pp.30-37
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    • 2002
  • 본 논문은 옥외용 절연재료로 사용되는 싸이클로알리파틱계 에폭시 재료의 여러 가지 컴파운드 비에 따른 내후성, 내트래킹 및 염무시험 결과를 나타낸 것이다. 시험 결과, 내후성 시험 동안의 자외선 조사로 인하여 표면에 결합쇄의 절단으로 표면 발수성 손실이 나타났다. 자외선 차단제와 산화안정제 및 실리콘 오일 첨가제가 포함된 시료에서 내후성이 우수한 것으로 나타났으며, 충전재 중 ATH가 포함된 시료에서 내트래킹성의 향상을 확인하였다. 염무시험에서는, 에폭시 수지 내에 실리콘 오일 성분이 포함된 시료가 누설전류 억제 효과를 나타내었다. 본 논문을 통하여 옥외용 절연재료로 사용되는 싸이클로알리파틱 절연재료의 옥외성능에 실리콘 오일성분이 표면에너지를 낮추고 발수성을 오랜 기간 유지할 수 있어 옥외 성능에 바람직함을 알 수 있었다.