• 한국재료학회지
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• 제34권6호
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• pp.283-290
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• 2024

The aggressive scaling of dynamic random-access memory capacitors has increased the need to maintain high capacitance despite the limited physical thickness of electrodes and dielectrics. This makes it essential to use high-k dielectric materials. TiO₂ has a large dielectric constant, ranging from 30~75 in the anatase phase to 90~170 in rutile phase. However, it has significant leakage current due to low energy barriers for electron conduction, which is a critical drawback. Suppressing the leakage current while scaling to achieve an equivalent oxide thickness (EOT) below 0.5 nm is necessary to control the influence of interlayers on capacitor performance. For this, Pt and Ru, with their high work function, can be used instead of a conventional TiN substrate to increase the Schottky barrier height. Additionally, forming rutile-TiO₂ on RuO₂ with excellent lattice compatibility by epitaxial growth can minimize leakage current. Furthermore, plasma-enhanced atomic layer deposition (PEALD) can be used to deposit a uniform thin film with high density and low defects at low temperatures, to reduce the impact of interfacial reactions on electrical properties at high temperatures. In this study, TiO₂ was deposited using PEALD, using substrates of Pt and Ru treated with rapid thermal annealing at 500 and 600 ℃, to compare structural, chemical, and electrical characteristics with reference to a TiN substrate. As a result, leakage current was suppressed to around 10^-6 A/cm² at 1 V, and an EOT at the 0.5 nm level was achieved.

• 한국재료학회지
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• 제4권1호
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• pp.63-74
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• 1994

$SiO_{2}$초박막(ultrathin film)의 두께 조절 용이성, 두께 균일성, 공정 재현성 및 전기적 특성을 향상시키기 위해 실리콘을 $N_{2}O$분위기에서 열산화시켰다. $N_2O$분위기에서 박막 성장시 산화와 동시에 질화가 이루어지기 때문에 전기적 특성의 향상을 가져올 수 있었다. 질화 현상에 의해 형성된 Si-N결합 형성은 습식 식각율과 ESCA분석으로 확인할 수 있었다. $N_2O$분위기에서 성장된 $SiO_{2}$박막은 Fowler-Nordheim(FN)전도 기구를 보여주었으며, 절열파괴 특성과 누설 전류특성 및 산화막의 신뢰성은 건식 산화막에 비해서 우수하였다. 또한 계면 포획밀도는 건식 산화막에 비해 감소하였고, 전하를 주입했을 때 생성되는 계면 준위의 양 또는 크게 감소하였다. 산화막 내부에서의 전하 포획의 양도 감소하였고, 전하를 주입하였을 때 생성되는 전하 포획의 양도 감소하였다. 이와 같은 전기적인 특성의 향상은 산화막 내부에서 약하게 결합하고 있는 Si-O 결합들이 Si-N결합으로의 치환과 스트레스 이완에 의하여 감소하였기 때문이다.

• 대한화학회지
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• 제35권6호
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• pp.625-629
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• 1991

Lead Oxide를 2.5, 5.0, 7.5 및 10.0 mol%를 함유하는 Niobium Oxide-Lead Oxide계의 전기전도도를 2.0${\times}$$10^{-1}$${\sim}$1.0${\times}$$10^{-5}$ atm의 산소 부분압력하에서 700${\sim}$$1100^{\circ}C$의 온도에서 측정하였다. 본 계의 전기전도도는 PbO mol%가 증가함에 따라 감소하며 $10^{-5}$${\sim}$$10^{-1}$ $ohm^{-1}$ $cm^{-1}$ 범위에서 변하였다. 전기전도도의 활성화에너지는 약 1.70 eV이다. 전기전도도의 산소 부분압력 의존성은 높은 산소 부분압력에서는 이온 및 전자 전도성을 가진 혼합 전도체이고 낮은 산소 부분압력에서는 산소 부분압력의 -1/4승에 비례하는 의존성을 가진 n-type 전자 전도성을 나타내고 있다. 그 계의 결합구조와 전기전도 메카니즘을 얻어진 데이타와 관련시켜 논의하였다.

• 대한전자공학회논문지SD
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• 제48권7호
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• pp.10-16
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• 2011

본 논문에서는 고효율 고출력 무분극 GaN LED의 구현을 위하여 Mg이 도핑된 GaN spacer층 및 GaN quantum barrier(QB)층을 삽입한 구조를 제안하였다. 제안한 구조에 대한 물리적 해석을 위하여 일반적인 무분극 LED 에피구조와 본 연구에서 제안한 p-GaN spacer층 및 p-GaN QB층이 삽입된 무분극 LED 에피구조에 대해 상용화된 $SimuLED^{TM}$ 시뮬레이터를 이용하여 전기적/광학적 특성을 비교 분석하였다. 실험 결과, 본 연구에서 제안한 무분극 LED는 20 mA의 전류주입 하에서 동작전압($V_f$)이 일반적인 무분극 LED에 비해 약 3.7% 감소된 3.67 V의 전기적 특성을 갖는 것을 확인하였고, 광출력은 약 7% 향상된 2.13 mW의 광학적 특성을 갖는 구조임을 확인하였다. 또한, 내부양자효율(Internal quantum efficiency, IQE)과 광방출세기(emission peak intensity) 역시 각각 9.1% 및 170% 향상된 우수한 특성을 갖는 에피구조임을 확인하였다.

• 한국결정성장학회지
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• 제10권3호
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• pp.258-263
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• 2000

마이크로파 열처리공정이 여러 가지 CuO 조성을 가진 $Li_2O-2SiO_2$-xCuO 유리의 전기전도도와 결정화 거동에 미치는 영향을 조사하기 위하여 재래식 열처리 공정과 비교하였다. 각기 재래식과 마이크로파 가열법으로 열처리하였을 때, 시편들의 전기전도도는 CuO 함량이 증가할수록 증가하였고, 각 조성에서 마이크로파로 열처리된 시편이 재래식으로 열처리된 시편에 비하여 높은 전기전도도를 보였다. 또한 X-선 회절 실험 결과, 마이크로파 열처리는 $Li_2Si_2O_5$ , $Li_2Cu_5(Si_2O_7)_2$및 $Li_2Cu_O_3$상의 결정화 정도를 향상시켜주었다. $Li_2O-2SiO_2$-1.3CuO(30 mo1% CuO) 유리를 $500^{\circ}C$에서 30분 동안 재래식과 마이크로파로 열처리한 후 상온에서 측정한 시편들의 전기전도도는 각기 $0.11{\times}10^{-4}(\Omega \textrm {cm})^{-1}$과 $0.68{\times}10^{-4}(\Omega \textrm {cm})^{-1}$이었다. 마이크로파 에너지는 시편들의 결정화를 향상시키고, 전기전도도 값도 증가시킨다고 판단되었다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권8호
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• pp.340-346
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• 2002

Capacitor material utilized in the downsizing passive devices and integration of passive devices requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. common capacitor materials, $Al_2O_3$, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$, TaN and et al., used until recently have reached their physical limits in their application to integration of passive devices. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism. This study presents the dielectric properties $Ta_2O_{5}$ MIM capacitor structure Processed by $O_2$ RTA oxidation. X-ray diffraction patterns showed the existence of amorphous phase in $600^{\circ}C$ annealing under the $O_2$ RTA and the formation of preferentially oriented-$Ta_2O_{5}$ in 650, $700^{\circ}C$ annealing and the AES depth profile showed $O_2$ RTA oxidation effect gives rise to the $O_2$ deficientd into the new layer. The leakage current density respectively, at 3~1l$\times$$10_{-2}$(kV/cm) were $10_{-3}$~$10_{-6}$(A/$\textrm{cm}^2$). In addition, behavior is stable irrespective of applied electric field. the frequency vs capacitance characteristic enhanced stability more then $Ta_2O_{5}$ thin films obtained by $O_2$ reactive sputtering. The capacitance vs voltage measurement that, Vfb(flat-band voltage) was increase dependance on the $O_2$ RTA oxidation temperature.

• 한국전기전자재료학회논문지
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• 제36권3호
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• pp.275-279
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• 2023

La_0.7Sr_0.3-xMg_xMnO₃ (LSMMO) (x=0.05~0.20) specimens are fabricated by a solid phase sintering method, and the sintering temperature and time are 1,300℃ and 2 hours, respectively. The dependence of the crystalline structure according to the amount of Mg²⁺ contents is not observed, and all specimens show a polycrystalline rhombohedral crystal structure, the X-ray diffraction (110) peaks move to the high angle side with increasing the amount of Mg²⁺ contents. LSMMO specimens exhibit a granule-shaped microstructure with an average grain size of 1 ㎛ or less. Resistivity gradually decrease as the amount of Mg²⁺ contents increased. And in the La_0.7Sr_0.1Mg_0.2MnO₃ specimen, resistivity and B_25/65-value are 36.7 Ω-cm and 394 K at room temperature, respectively. LSMMO specimens show a variable-range hopping (VRH) electrical conduction mechanism, and the negative temperature of coefficient of resistance (NTCR) is approximately 0.37~0.38%/℃.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.993-994
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• 2008

Electrochromic (EC) devices are capable of reversibly changing their optical properties upon charge injection and extraction induced by the external voltage. The characteristics of the EC device, such as low power consumption, high coloration efficiency, and memory effects under open circuit status, make them suitable for use in a variety of applications including smart windows and electronic papers. Coloration due to reduction or oxidation of redox chromophores can be used for EC devices (e-paper), but the switching time is slow (second level). Recently, with increasing demand for the low cost, lightweight flat panel display with paper-like readability (electronic paper), an EC display technology based on dye-modified $TiO_2$ nanoparticle electrode was developed. A well known organic dye molecule, viologen, was adsorbed on the surface of a mesoporous $TiO_2$ nanoparticle film to form the EC electrode. On the other hand, ZnO is a wide bandgap II-VI semiconductor which has been applied in many fields such as UV lasers, field effect transistors and transparent conductors. The bandgap of the bulk ZnO is about 3.37 eV, which is close to that of the $TiO_2$ (3.4 eV). As a traditional transparent conductor, ZnO has excellent electron transport properties, even in ZnO nanoparticle films. In the past few years, one-dimension (1D) nanostructures of ZnO have attracted extensive research interest. In particular, 1D ZnO nanowires renders much better electron transportation capability by providing a direct conduction path for electron transport and greatly reducing the number of grain boundaries. These unique advantages make ZnO nanowires a promising matrix electrode for EC dye molecule loading. ZnO nanowires grow vertically from the substrate and form a dense array (Fig. 1). The ZnO nanowires show regular hexagonal cross section and the average diameter of the ZnO nanowires is about 100 nm. The cross-section image of the ZnO nanowires array (Fig. 1) indicates that the length of the ZnO nanowires is about $6\;{\mu}m$. From one on/off cycle of the ZnO EC cell (Fig. 2). We can see that, the switching time of a ZnO nanowire electrode EC cell with an active area of $1\;{\times}\;1\;cm^2$ is 170 ms and 142 ms for coloration and bleaching, respectively. The coloration and bleaching time is faster compared to the $TiO_2$ mesoporous EC devices with both coloration and bleaching time of about 250 ms for a device with an active area of $2.5\;cm^2$. With further optimization, it is possible that the response time can reach ten(s) of millisecond, i.e. capable of displaying video. Fig. 3 shows a prototype with two different transmittance states. It can be seen that good contrast was obtained. The retention was at least a few hours for these prototypes. Being an oxide, ZnO is oxidation resistant, i.e. it is more durable for field emission cathode. ZnO nanotetropods were also applied to realize the first prototype triode field emission device, making use of scattered surface-conduction electrons for field emission (Fig. 4). The device has a high efficiency (field emitted electron to total electron ratio) of about 60%. With this high efficiency, we were able to fabricate some prototype displays (Fig. 5 showing some alphanumerical symbols). ZnO tetrapods have four legs, which guarantees that there is one leg always pointing upward, even using screen printing method to fabricate the cathode.

• Molecules and Cells
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• 제43권4호
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• pp.408-418
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• 2020

The sinus node (SN) is located at the apex of the cardiac conduction system, and SN dysfunction (SND)-characterized by electrical remodeling-is generally attributed to idiopathic fibrosis or ischemic injuries in the SN. SND is associated with increased risk of cardiovascular disorders, including syncope, heart failure, and atrial arrhythmias, particularly atrial fibrillation. One of the histological SND hallmarks is degenerative atrial remodeling that is associated with conduction abnormalities and increased right atrial refractoriness. Although SND is frequently accompanied by increased fibrosis in the right atrium (RA), its molecular basis still remains elusive. Therefore, we investigated whether SND can induce significant molecular changes that account for the structural remodeling of RA. Towards this, we employed a rabbit model of experimental SND, and then compared the genome-wide RNA expression profiles in RA between SND-induced rabbits and sham-operated controls to identify the differentially expressed transcripts. The accompanying gene enrichment analysis revealed extensive pro-fibrotic changes within 7 days after the SN ablation, including activation of transforming growth factor-β (TGF-β) signaling and alterations in the levels of extracellular matrix components and their regulators. Importantly, our findings suggest that periostin, a matricellular factor that regulates the development of cardiac tissue, might play a key role in mediating TGF-β-signaling-induced aberrant atrial remodeling. In conclusion, the present study provides valuable information regarding the molecular signatures underlying SND-induced atrial remodeling, and indicates that periostin can be potentially used in the diagnosis of fibroproliferative cardiac dysfunctions.

• 한국세라믹학회지
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• 제41권11호
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• pp.858-863
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• 2004

본 연구는 입방정 L $a_{2}$ 3/Ti $O_{2.84}$ 세라믹스의 전기전도율, 열기전력 그리고 자기적 특성에 대하여 조사하였다. 350 K 이하의 은도영역에서의 입방정 L $a_{2}$ 3/Ti $O_{2.84}$ 세라믹스의 열기전력은 음으로 나타났다 열기전력은 온도의 증가와 더불어 선형적으로 증가하여 A+BT의 형태로 표현가능 하였으며, Emin과 Wood가 제안한 모델과 잘 일치하였다. 이와 같은 열기전력의 온도의존성은 L $a_{2}$ 3/Ti $O_{2.84}$ 세라믹스의 전도 carrier가 small polaron임을 의미한다. L $a_{2}$ 3/Ti $O_{2.84}$ 세라믹스는 실온 이하의 특정온도에서 variable range hopping에서 small polaron hopping으로 변화하였다. 저온영역에서는 직류전도 기구해석은 Mott의 접근방식을 이용하였다. Mott의 보조변수 해석결과 Fermi면에서의 상태밀도 [N( $E_{F}$)]는 3.18${\times}$$10^{20}$ $cm^{-3}$e $V^{-1}$이었으며, 무질서에너지 $W_{d}$는 0.93로 고온에서의 활성화 에너지 보다 매우 크다. 200K와 300K온도 범위에서 log($\sigma$T)와 1/T의 직선 관계가 존재 하였으며, small polaron의 hopping energy는 0.15 eV였다.