• Title/Summary/Keyword: Electric Field Uniformity

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Research to Achieve Uniform Plasma in Multi-ground Capacitive Coupled Plasma

  • Park, Gi-Jeong;Lee, Yun-Seong;Yu, Dae-Ho;Lee, Jin-Won;Lee, Jeong-Beom;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.247.1-247.1
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    • 2014
  • The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

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Electricla Properties of Xe Plasma Flat Lamp (Xe 플라즈마 평판 램프의 전기적 특성)

  • Choi, Yong-Sung;Cho, Jae-Cheol;Hong, Kyung-Jin;Lee, Woo-Sun;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.12a
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    • pp.35-38
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    • 2006
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

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Improvement of Field Uniformity in a Reverberation Chamber with Various Numbers of a 2D CRD (2D CRD 수에 따른 전자파 잔향실 내의 필드 균일성 개선)

  • Kim, Jin-Bok;Rhee, Joong-Geun;Kim, Jung-Hoon;Rhee, Eu-Gene
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.47 no.4
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    • pp.18-24
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    • 2010
  • This paper presents the improvement of the field uniformity in a reverberation chamber which can be substitute an anechoic chamber for the electromagnetic interference (EMI) and immunity test. Nowadays, there are many EMI issues due to the increasing use of wireless local area network (LAN), digital multimedia broadcasting (DMB), and mobile internet. With this reason, this paper studied the field characteristics in a reverberation chamber for 2.3 GHz band. In this paper, the finite difference time domain (FDTD) method is used to analyze the field characteristics in a reverberation chamber. To improve the field uniformity in the reverberation chamber, this paper adopted a 2D cubical residue diffuser (CRD) with varying the disposition and number of CRD. For each case, the tolerance and standard deviation of the electric field strength are evaluated. In comparison with the reverberation chamber without any CRD, the reverberation chamber with two CRDs showed improved results; 1.98 dB improvement in standard deviation and 3.6 dB improvement in tolerance.

Improved Field Uniformity Characteristics in a Reverberation Chamber with a CRD (CRD를 이용한 전자파 잔향실 내 전기장 균일도 향상)

  • Son, Yong-Ho;Rhee, Joong-Geun;Kim, Jung-Hoon
    • Journal of the Institute of Electronics Engineers of Korea TC
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    • v.44 no.12
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    • pp.79-84
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    • 2007
  • This paper presents an improved field uniformity in a reverberation chamber, that can be alternatively used for the analysis and the measurement of electromagnetic interference and immunity, with a designed CRD(Cubical Residue Diffuser) that have various dimensions. The Schroeder type CRD is designed for $1\sim3$ GHz band and the FDTD(Finite Difference Time Domain) method is used to analyze the field characteristics. At 2 GHz, the standard deviation of test volume in the reverberation chamber is the smallest and has a good field distribution with a CRD of $40\sim80%$ dimension of one side of the reverberation chamber. The Electric field uniformity gets worse when the dimension of a CRD is either below 40 % or above 80 % of the side wall. The result shows that the standard deviation of the test volume in the reverberation chamber with a CRD of 44 % dimension is improved by 1 dB compared with that of the reverberation chamber with a CRD of 100 % dimension.

Characteristics of Carbon Nanotube FED

  • Uemura, Sashiro;Yotani, Junko;Nagasako, Takeshi;Kurachi, Hiroyuki;Yamada, Hiromu;Ezaki, Tomotaka;Maesoba, Tsuyoshi;Nakao, Takehiro;Ito, Masaaki;Saito, Yahachi;Yumura, Motoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.860-865
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    • 2004
  • Field emission display(FED) using carbon nanotubes (CNT) as field emitters is expected to large-area panels with high luminance and low power consumption. In order to perform the uniform luminance with low driving voltage, we introduced a new electrode to apply higher electric potential over the CNT cathode in 2003.[1] In the study, we described the luminance uniformity of the panel and the improvement of emission uniformity by increasing the emission-site density. The luminance uniformity of the several ideal dots which were selected over the display area in the panel was 2.8%. [2] The CNT cathode was irradiated by excimer-laser, which was effective to improve emission uniformity and lower driving voltage. A prototype of CNT-FED character display was performed for middle size message displays. The prototype panel had 48 x 480-dots and the resolution was 1-mm. The panel realized high luminance at low power consumption. It will be important characteristics for legible and ubiquitous displays. [3]

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Development of an Inspection System of Contact Light Emitting Device for Quality Control

  • Lee, Jun-Ho;Kwon, Hyung-Kee;Ryu, Young-Kee
    • 제어로봇시스템학회:학술대회논문집
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    • 2001.10a
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    • pp.118.3-118
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    • 2001
  • CLED (Contact Light Emitting Device) has three layers consisting of a transparent electrode, a light emitting layer and a substrate. When the substrate of the CLED comes in contact with a fingerprint under AC input voltage, it makes an electric field between the fingerprint and the device. Due to the electric field, the light is emitted along the ridgeline of the fingerprint. The intensity along the ridge on the surface of the CLED increase in proportion to the electric field. To achieve uniform performance of fingerprint verification devices, inspection system of CLED for quality control were required. In this research, we proposed the factors for quality controls such as dimensions of the CLED, uniformity ...

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A Study on the widthwise thickness uniformity of HTS wire using thickness gradient deposition technology

  • Gwantae Kim;Insung Park;Jeongtae Kim;Hosup Kim;Jaehun Lee;Hongsoo Ha
    • Progress in Superconductivity and Cryogenics
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    • v.25 no.4
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    • pp.24-27
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    • 2023
  • Until now, many research activities have been conducted to commercialize high-temperature superconducting (HTS) wires for electric applications. Most of all researchers have focused on enhancing the piece length, critical current density, mechanical strength, and throughput of HTS wires. Recently, HTS magnet for generating high magnetic field shows degraded performance due to the deformation of HTS wire by high electro-magnetic force. The deformation can be derived from widthwise thickness non-uniformity of HTS wire mainly caused by wet processes such as electro-polishing of metal substrate and electro-plating of copper. Gradient sputtering process is designed to improve the thickness uniformity of HTS wire along the width direction. Copper stabilizing layer is deposited on HTS wire covered with specially designed mask. In order to evaluate the thickness uniformity of HTS wire after gradient sputtering process, the thickness distribution across the width is measured by using the optical microscope. The results show that the gradient deposition process is an effective method for improving the thickness uniformity of HTS wire.

Crystallization of Amorphous Silicon Films Using Joule Heating

  • Ro, Jae-Sang
    • Journal of the Korean institute of surface engineering
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    • v.47 no.1
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    • pp.20-24
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    • 2014
  • Joule heat is generated by applying an electric filed to a conductive layer located beneath or above the amorphous silicon film, and is used to raise the temperature of the silicon film to crystallization temperature. An electric field was applied to an indium tin oxide (ITO) conductive layer to induce Joule heating in order to carry out the crystallization of amorphous silicon. Polycrystalline silicon was produced within the range of a millisecond. To investigate the kinetics of Joule-heating induced crystallization (JIC) solid phase crystallization was conducted using amorphous silicon films deposited by plasma enhanced chemical vapor deposition and using tube furnace in nitrogen ambient. Microscopic and macroscopic uniformity of crystallinity of JIC poly-Si was measured to have better uniformity compared to that of poly-Si produced by other methods such as metal induced crystallization and Excimer laser crystallization.

Fabrication of CNT Electron Source for Field Emission Displays

  • Nakata, S.;Sawada, T.;Fujikawa, M.;Nishimura, K.;Abe, F.;Hosono, A.;Watanabe, S.;Yamamuro, T.;Shen, Z.;Suzuki, Y.;Okuda, S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1012-1015
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    • 2005
  • We have developed the technique of fabricating triode structure with simple stacking method using a polymer insulator that is suitable for large panel and the activation method after the fabrication. By the techniques, a test panel was manufactured and proves good emission property and uniformity.

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Effect of Surface Morphology and Adhesion Force on the Field Emisson Properties of Carbon Nanotube Based Cathode (탄소나노튜브 캐소드의 전계방출 특성에 대한 표면 형상과 부착력의 영향)

  • Jung, Hyuk;Cho, You-Suk;Kang, Young-Jin;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.18 no.5
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    • pp.277-282
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    • 2008
  • The effects of the field emission property in relation to the surface morphology and adhesion force were investigated. The single-wall-nanotube-based cathode was obtained by use of an in-situ arc discharge synthesis method, a screen-printing method and a spray method. The morphologies of the formed emitter layers were very different. The emission stability and uniformity were dramatically improved by employing an in-situ arc discharge synthesis method. In this study, it was confirmed that the current stability and uniformity of the field emission of the cathode depend on the surface morphology and adhesion force of the emitters. The current stability of the field emission device was also studied through an electrical aging process by varying the current and electric field.