• 분석과학
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• 제5권2호
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• pp.1067-1082
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• 1992

• 세라미스트
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• 제5권2호
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• pp.52-59
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• 2002

• 한국염색가공학회지
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• 제6권3호
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• pp.44-51
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• 1994

Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.

• 접착 및 계면
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• 제3권4호
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• pp.1-9
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• 2002

본 연구의 목적은 목분과 폴리프로필렌으로 제조한 목질-고분자 복합재료의 점탄성적 성질에 미치는 결합제, 기핵제의 영향에 대해 고찰하는데 있으며, 목분과 결합제간의 esterification 반응이 목질-고분자 복합재의 기계적 성질에 미치는 영향 또는 고찰하고자 한다. 복합재는 목분 60%와 폴리프로필렌 40%를 혼합하여 제조하였으며, DMTA (Dynamic mechanical thermal analysis)를 사용하여 damping peaks (than ${\delta}$), storage modulus (E'), loss modulus (E")를 측정하였다. 또한 XPS (X-ray Photolectron Spectroscopy)를 사용하여 목분에 MAPP를 처리하기 전과 후의 상태를 고찰하였다. DMA 시험은 온도범위 $-20{\sim}100^{\circ}C$에서 여러가지 주파수 (1, 5, 10, 25 HZ) 조건과, 승온속도 $5^{\circ}C/min$으로 실시하였다. 이 시험결과를 토대로 복합재의 활성화에너지를 구하여 결합제와 기핵제가 목분과 고분자물질간 계면의 성질에 미치는 영향을 고찰하였다.

• Bulletin of the Korean Chemical Society
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• 제31권10호
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• pp.2973-2979
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• 2010

The newly synthesized homogeneous chiral Co(III) salen complexes were anchored non-covalently on the acidic sites of mesoporous Al-SBA-15. The Bronsted and Lewis acidic sites are attributed to the immobilization of fluorine functionalized chiral salen complexes on the supports. XRD, BET, TEM, FT-IR and ESCA (XPS) analyses were performed to characterize the property of support, and the structure of new homogeneous and heterogeneous chiral Co salen catalyst. The homogeneous and heterogeneous catalysts could be applied in asymmetric ring opening of epichlorohydrine (ECH) by water. They showed very high enantioselectivity and a good yield up to 99% in the catalytic synthesis of optically active products.

• 한국염색가공학회지
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• 제20권6호
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• pp.26-34
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• 2008

Wool fabric having high moisture content were treated with fluorocarbon-based water and oil repellent finishing agents by pad-dry-cure system. Three types of finishing agents which were regular-type or nano-type were adapted to compare the surface chemical composition, water and oil repellent property, crease recovery angle, and durability to repeated laundering. From the surface chemical compositions resulted by ESCA and C1s curve-fitting, it was shown that the regular-type finishing agent were easily taken off from the finished wool fabrics after repeated laundering. On the other hand, the fluoroalkyl groups of nano-type finishing agents turned round from fabric surface to fiber internal after repeated laundering. The water repellency of the wool fabrics treated with regular-type agent had a little changes according to the treatment condition changes and sharply decreased with repeated laundering. However, these values when treated with nano-type agents increased with the concentration and cure temperature and were maintained after 20 times laundering. The wool fabrics treated with nano-type agent had a great oil repellency irrespective of treatment conditions. Furthermore, the wrinkle recovery values of the wool fabrics treated with nano-type agents were higher than those of the fabrics treated with regular-type agent and were unchanged after 20 times laundering.

• Macromolecular Research
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• 제12권6호
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• pp.586-592
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• 2004

Poly(glycidyl methacrylate)-grafted polyethylene microbeads (POPM) presenting epoxy groups were prepared by radiation-induced graft polymerization of glycidyl methacrylate on the polyethylene microbead. The obtained POPM was characterized by IR spectroscopic, X-ray photoelectrons spectroscopy (XPS), scanning electron microscope (SEM), and thermal analyses. Furthermore, the abundance of epoxy groups on the POPM was determined by titration and elemental analysis after amination. The epoxy group content was calculated to be in the range 0.29-0.34 mmol/g when using the titration method, but in the range 0.53-0.59 mmol./g when using elemental analysis (EA) after amination. The lipase was immobilized to the epoxy groups of the POPM under various experi­mental conditions, including changes to the pH and the epoxy group content. The activity of the lipase-immobilized POPM was in the range from 160 to 500 unit/mg-min. The activity of the lipase-immobilized POPM increased upon increasing the epoxy group content. The lipase-immobilized POPM was characterized additionally by SEM, elec­tron spectroscopy for chemical analysis (ESCA), and EA.

• ETRI Journal
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• 제13권4호
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• pp.70-79
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• 1991

$In_1-x$$GA_X$$As_y$$P_1-y$ has a very wide range of applications in optoelectronic devices especially for optical communications because $In_1-x$$GA_X$$As_y$$P_1-y$ has the bandgap of the lowest dispersion ($1.3\mum$) and the lowest loss ( $1.55\mum$) of the optical fiber by changing the composition. The quality of $In_1-x$$GA_X$$As_y$$P_1-y$ epitaxial layer is believed to have a significant effect on the performance of device. The OMVPE growth conditions for the latticematched $In_1x$$GA_X$$As_y$$P_1-y$/InP were investigated. Effects of growth conditions such as V/III ratio, growth temperature, and Ga source material on the electrical and optical properties were studied. The composition, electrical and optical properities of $In_1-x$$GA_X$$As_y$$P_1-y$ were characterized using double crystal X-ray diffractometer (DCD), photoluminescence (PL), XPS(ESCA) and Hall measurement.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.38.1-38.1
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• 2009

Plasma etching is an essential process for electronic device industries and the particulate contamination during plasma etching has been interested as a big issue for the yield of productivity. The oxynitride glasses have a merit to prevent particulate contamination due to their amorphous structure and plasma etching resistance. The YSiAlON oxynitride glasses with increasing nitrogen content were manufactured. Each oxynitride glasses were fluorine-plasma etched and their plasma etching rate and surface roughness were compared with reference materials such as sapphire, alumina and quartz. The reinforcement mechanism of plasma etching resistance of the YSiAlON glasses studied by depth profiling at plasma etched surface using electron spectroscopy for chemical analysis. The plasma etching rate decreased with nitrogen content and there was no selective etching at the plasma etched surface of the oxynitride glasses. The concentration of silicon was very low due to the generation of SiF4 very volatile byproduct and the concentration of aluminum and yttrium was relatively constant. The elimination of silicon atoms during plasma etching was reduced with increasing nitrogen content because the content of the nitrogen was constant. And besides, the concentration of oxygen was very low on the plasma etched surface. From the study, the plasma etching resistance of the glasses may be improved by the generation of nitrogen related structural groups and those are proved by chemical composition analysis at plasma etched surface of the YSiAlON oxynitride glasses.

• 공업화학
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• 제21권4호
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• pp.435-439
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• 2010

Pt-$MoO_3$ 혼합전극을 20 mM의 $H_2PtCl_6$ 수용액과 10 mM Mo-Peroxo 전해질을 이용하여 전기화학적 증착법에 의해 합성하였다. Pt와 증착 순서를 바꿔가며 혼합 전극을 합성하여 같은 양의 Pt가 증착된 순수한 Pt전극과 메탄올 산화반응 특성을 비교하였다. SEM (Scanning Electron Microscopy) 분석을 통하여 합성된 박막의 표면입자의 형태를 확인하였으며, X-선 회절(X-ray Diffraction)분석과 광전자 분광기(X-ray Photoelectron Spectroscopy; Thermo-scientific, ESCA 2000)분석을 통해 합성된 전극의 결정성과 산화가를 각각 조사하였다. 메탄올 산화에 대한 전기화학적 촉매활성과 안정성을 평가한 결과 Pt를 증착한 후 $MoO_3$를 증착한 전극의 경우, 순수한 Pt전극에 비해 높은 촉매활성과 안정성을 나타내었는데, Pt와 $MoO_3$의 접촉이 좋을 경우 $MoO_3$가 조촉매로 작용해 메탄올 산화반응의 활성이 증가함을 확인하였다.