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A Study on Worker Exposure to Hexavalent Chromium in Plating 0peration (중소기업 도금공정에서의 6가 크롬 폭로에 관한 연구)

  • Cheong, Hoe Kyeong;Paik, Nam Won
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.3 no.2
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    • pp.152-165
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    • 1993
  • This study was performed at eleven small-sized plating factories located in Seoul, Incheon, Ansan, and Taejeon from July 21 to October 6, 1992. The major objectives of this study were to evaluate worker exposure to hexavalent chromium and local exhaust ventilation (L.E.V.) systems at the chromium plating operations. The most suitable L.E.V. systems for chromium plating tanks were designed as examples for recommendation to the industry. The results are summarized as follows. The range of chromium plating operations investigated included decorative, hard, and black chromium plating on several kinds of parts. Most of plating tanks were not equipped with proper control methods against emission of hexavalent chromium mists and workers were not wearing appropriate personal protectives. The ariborne hexavalent chromium concentrations showed an approximate lognormal distribution. The geometric means of both personal and area samples were within the Korean and ACGIH standards, $50{\mu}g/m^3$. However, in comparison with the NIOSH criterion, $1{\mu}g/m^3$, the geometric means of personal samples at two factories and the geometric means of area samples at two factories exceeded it. The geometric means of personal and area samples of high exposure groups (above the NIOSH criterion) were 7 and 27 times higher than those of low exposure groups (below the NIOSH criterion), respectively. The L.E.V. systems of high exposure groups were improperly designed, and the factory with the highest exposure level had no L.E.V. systems at all on chemical etching process. Whereas at factories of low exposure groups, mist control methods such as mist suppressants, tank cover, and/or auxillary L.E.V. systems were added to L.E.V systems. The evaluation of L.E.V. systems showed that there was no chromium plating operation satisfying the ACGIH criteria for capture velocity, slot velocity, and exhaust rate simultaneously. To increase performance of L.E.V. systems, it must be designed to minimize the impact of boundary layer separation. Push-pull ventilation hood and downward plenum ventilation hood were suggested for the Korean industry.

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The Impact of N-Ion Implantation on Deep-Level Defects and Carrier Lifetime in 4H-SiC SBDs (N-이온주입이 4H-SiC SBDs의 깊은 준위 결함 및 소수 캐리어 수명에 미치는 영향)

  • Myeong-cheol Shin;Geon-Hee Lee;Ye-Hwan Kang;Jong-Min Oh;Weon Ho Shin;San-Mo Koo
    • Journal of IKEEE
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    • v.27 no.4
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    • pp.556-560
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    • 2023
  • In this study, the impact of Nitrogen implantation process on deep-level defects and lifetime in 4H-SiC Epi surfaces was comparatively analyzed. Deep Level Transient Spectroscopy (DLTS) and Time Resolved Photoluminescence (TR-PL) were employed to measure deep-level defects and carrier lifetime. As-grown Schottky Barrier Diodes (SBDs) exhibited energy levels at 0.16 eV, 0.67 eV, and 1.54 eV, while for implantation SBD, defects at 0.15 eV were observed. This indicates a reduction in defects associated with energy levels Z1/2 and EH6/7, known as lifetime killers, as impurities from nitrogen implantation replace titanium and carbon vacancies.

Design of a Logic eFuse OTP Memory IP (Logic eFuse OTP 메모리 IP 설계)

  • Ren, Yongxu;Ha, Pan-bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.20 no.2
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    • pp.317-326
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    • 2016
  • In this paper, a logic eFuse (electrical Fuse) OTP (One-Time Programmable) memory IP (Intellectual Property) using only logic transistors to reduce the development cost and period of OTP memory IPs is designed. To secure the reliability of other IPs than the OTP memory IP, a higher voltage of 2,4V than VDD (=1.5V) is supplied to only eFuse links of eFuse OTP memory cells directly through an external pad FSOURCE coming from test equipment in testing wafers. Also, an eFuse OTP memory cell of which power is supplied through FSOURCE and hence the program power is increased in a two-dimensional memory array of 128 rows by 8 columns being also able to make the decoding logic implemented in small area. The layout size of the designed 1kb eFuse OTP memory IP with the Dongbu HiTek's 110nm CIS process is $295.595{\mu}m{\times}455.873{\mu}m$ ($=0.134mm^2$).

The study of growth and characterization of $AgInSe_2$ single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy(HWE)에 의한 $AgInSe_2$단결정 박막 성장과 특성에 관한 연구)

  • 홍광준
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.2
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    • pp.197-206
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    • 1999
  • The stochiometric mixture of evaporating materials for the $AgInSe_2$single crystal thin films were prepared from horizontal furnace. Using extrapolation method of X-ray diffraction patterns for the $AgInSe_2$polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $C_0$ were 6.092 $\AA$ and 11.688 $\AA$, respectively. To obtain the single crystal thin films of AgInSe$_2$, the mixed crystal was deposited on thoroughly etched semi-insulator GaAs(100) substrate by HWE system. The source and substrate temperature were fixed to $610^{\circ}C$ and $450^{\circ}C$ respectively, and the thickness of the single thin films was obtained to 3.8 $\mu\textrm{m}$. The crystallization of single crystal thin films was investigated by the photoluminescence (PL) and double crystal X-ray dirrfaction (DCXD). The Hall effect was measured by the method of van der Pauw and carrier density and mobility dependence on temperature were studied. The carrier density and mobility of $AgInSe_2$single crystal thin films deduced from Hall data are $9.58{\times}10^{22} electron/m^3,\; 3.42{\times}10^{-2}m^2/V{\cdot}s$ at 293 K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $AgInSe_2$single crystal thin film, the spin orbit coupling $\Delta$So and the crystal field splitting $\Delta$Cr were obtained to 0.29 eV and 0.12 eV at 20 K respectively. From PL peaks measured at 20 K, 881.1 nm (1.4071 eV) and 882.4 nm (1.4051 eV) mean $E_x^U$ the upper polariton and $E_x^L$ the lower polariton of the free exciton $(E_x)$, also 884.1 nm (1.402 eV) express $I_2 peak of donor-bound exciton emission and 885.9 nm (1.3995 Ev) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 887.5 nm (1.3970 eV) was analyzed to be PL peak due to DAP.

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A study of the photoluminescence of undoped ZnO and Al doped ZnO single crystal films on sapphire substrate grown by RF magnetron sputtering (RF 스퍼터링법으로 사파이어 기판 위에 성장한 ZnO와 ZnO : A1 박막의 질소 및 수소 후열처리에 따른 Photoluminescence 특성)

  • Cho, Jung;Yoon, Ki-Hyun;Jung, Hyung-Jin;Choi, Won-Kook
    • Korean Journal of Materials Research
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    • v.11 no.10
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    • pp.889-894
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    • 2001
  • 2wt% $Al_2O_3-doped$ ZnO (AZO) thin films were deposited on sapphire (0001) single crystal substrate by parellel type rf magnetron sputtering at 55$0^{\circ}C$. The as-grown AZO thin films was polycrystalline and showed only broad deep defect-level photoluminescence (PL). In order to examine the change of PL property, AZO thin films were annealed in $N_2$ (N-AZO) and $H_2$ (H-AZO) at the temperature of $600^{\circ}C$~$1000^{\circ}C$ through rapid thermal annealing. After annealed at $800^{\circ}C$, N-AZO shows near band edge emission (NBE) with very small deep-level emission, and then N-AZO annealed at $900^{\circ}C$ shows only sharp NBE with 219 meV FWHM. In Comparison with N-AZO, H-AZO exhibits very interesting PL features. After $600^{\circ}C$ annealing, deep defect-level emission was quire quenched and NBE around 382 nm (3.2 eV) was observed, which can be explained by the $H_2$passivation effect. At elevated temperature, two interesting peaks corresponding to violet (406 nm, 3.05 eV) and blue (436 nm, 2.84 eV) emission was firstly observed in AZO thin films. Moreover, peculiar PL peak around 694 nm (1.78 eV) is also firstly observed in all the H-AZO thin films and this is believed good evidence of hydrogenation of AZO. Based on defect-level scheme calculated by using the full potential linear muffin-tin orbital (FP-LMTO), the emission 3.2 eV, 3.05 eV, 3.84 eV and 1.78 eV of H-AZO are substantially deginated as exciton emission, transition from conduction band maximum to $V_{ Zn},$ from $Zn_i$, to valence band maximum $(V_{BM})$ and from $V_{o} to V_BM}$, respectively.

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Fabrication of Pd/poly 3C-SiC Schottky diode hydrogen sensors (Pd/다결정 3C-SiC 쇼트키 다이오드형 수소센서의 제작)

  • Chung, Dong-Yong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.236-236
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    • 2009
  • This paper describes the fabrication and characteristics of Schottky micro hydrogen sensors for high temperatures by using polycrystalline(poly) 3C - SiC thin film grown on Si substrates with thermal oxide layer using APCVD. Pd/poiy 3C-SiC Schottky diodes were made and evaluated by I-V and C-V measurements. Electric current density and barrier height voltage were $2\times10^{-3}\;A/cm^2$ and 0.58 eV, respectively. These devices could operate stably at about $400^{\circ}C$. According to $H_2$ concentrations, their barrier height($\Phi_{Bn}$) were changed 0.587 eV, 0.579 eV, 0.572 eV and 0.569 eV, respectively. the current was increased. Characteristics of implemented sensors have been investigated in terms of sensitivity, linearity of response, response rate and response time. Therefore, from these results, Pd/poly 3C-SiC Schottky devices have very high potential for high temperature chemical sensor applications.

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Some Cycle and Star Related Nordhaus-Gaddum Type Relations on Strong Efficient Dominating Sets

  • Murugan, Karthikeyan
    • Kyungpook Mathematical Journal
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    • v.59 no.3
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    • pp.363-375
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    • 2019
  • Let G = (V, E) be a simple graph with p vertices and q edges. A subset S of V (G) is called a strong (weak) efficient dominating set of G if for every $v{\in}V(G)$ we have ${\mid}N_s[v]{\cap}S{\mid}=1$ (resp. ${\mid}N_w[v]{\cap}S{\mid}=1$), where $N_s(v)=\{u{\in}V(G):uv{\in}E(G),\;deg(u){\geq}deg(v)\}$. The minimum cardinality of a strong (weak) efficient dominating set of G is called the strong (weak) efficient domination number of G and is denoted by ${\gamma}_{se}(G)$ (${\gamma}_{we}(G)$). A graph G is strong efficient if there exists a strong efficient dominating set of G. In this paper, some cycle and star related Nordhaus-Gaddum type relations on strong efficient dominating sets and the number of strong efficient dominating sets are studied.

Energy Loss of Hydrogen Atom due to Charge Exchange in Neutral Particle Energy Analyzer (중성입자 에너지 분석장치에서 전하교환용 탄소박막에 의한 수소원자의 에너지 손실특성)

  • Kim, Kye-Ryung;Kim, Wan;Lee, Yong-Hyun;Kang, Hee-Dong
    • Journal of Sensor Science and Technology
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    • v.7 no.3
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    • pp.179-187
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    • 1998
  • A neutral particle energy analyzer, which has the carbon stripping foil and the $90^{\circ}$ cylindrical electrostatic deflection plate, was designed and constructed for measuring of ion temperature in plasma. The energy calibration and energy resolution were studied in detail for a hydrogen ion at the $0.5{\sim}3.0\;keV$ energy using a duoplasmatron ion source. An energy of hydrogen ion to the deflection plate voltage at the peak ion count rate could be fitted by the expression $E_{o}(keV)$=3.83V(kV). The measured energy resolution, which was about 2 % at the energy of 3.0 keV and 9 % at the energy of 0.5keV, was better for the increased hydrogen ion energy. For the charge exchanged hydrogen atom due to the carbon stripping foil, the energy calibration, energy loss and resolution were measured to the $0.5{\sim}2.0{\mu}g/cm^{2}$ thickness of the carbon stripping foil. An energy of the charge exchanged hydrogen atom as a function of the deflection plate voltage and carbon foil thickness could be fitted by the expression $E_{o}(keV)=(0.53d+4.4){\cdot}V(kV)$. The energy loss was $0.23{\sim}0.89\;keV $ to the $0.5{\sim}2.0{\mu}g/cm^{2}$ carbon foil thickness and the $0.5{\sim}3.0\;keV$ energy of the incident neutral hydrogen atom, it could be fitted by the expression ${\Delta}E=(0.12d+0.27){\cdot}{E_{o}}^{1/2}(keV)$. The measured energy resolution for the neutral hydrogen atom, which was between 7 % and 35 % in this experiment region, was increased for the increasing neutral hydrogen atom energy and the decreasing carbon stripping foil thickness.

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Charge Pumping Method를 이용한 N-type MOSFET의 Interface Trap(Dit) 분석

  • Go, Seon-Uk;Kim, Sang-Seop;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.328.1-328.1
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    • 2014
  • MOSFET degradation의 대부분은 hot-carrier injection에 의한 interface state (Dit)의 생성에서 비롯되며 따라서 본 연구에서는 신뢰성에 대한 한 가지 방법으로 Charge pumping method를 이용하여 MOSFET의 interface trap(Dit)의 변화를 측정하였다. 소스와 드레인을 ground로 묶고 게이트에 펄스를 인가한 후 Icp를 측정하여 Dit를 추출하였다. 온도를 293~343 K까지 5 K씩 가변했을 때 293K의 Icp(${\mu}A$)는 0.12 nA 313 K는 0.112 nA 343 K는 0.926 nA이며 Dit (cm-1/eV-1)는 $1.61{\times}10^{12}$ (Cm-2/eV-1) $1.49{\times}10^{12}$ (Cm-2/eV-1) $1.23{\times}10^{12}$ (Cm-2/eV-1)이다. 측정결과 Dit는 Icp가 높은 지점에서 추출되며 온도가 높아지게 되면 Icp전류가 낮아지고 Dit가 줄어드는 것을 볼 수 있다. 온도가 올라가게 되면 carrier들이 trap 준위에서 conduction band 위쪽에 이동하게 되어서 interface에 trap되는 양이 작아지게 된다. 그래서 이때 Icp를 이용해 추출한 Dit 는 실제로 trap의 양이 줄어든 것이 아니라 Thermal excess 현상으로 인해 측정되는 Icp의 양이 줄어든 것으로 분석할 수 있다.

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OPTICAL AND NIR PHOTOMETRY OF OPEN CLUSTER NGC 7790

  • LEE JUNG-DEOK;LEE SANG-GAK
    • Journal of The Korean Astronomical Society
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    • v.32 no.2
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    • pp.91-107
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    • 1999
  • We present BVRI CCD photometry and near-infrared K photometry of the intermediate-aged open cluster NGC 7790. The reddening, E(B - V) = 0.54 $\pm$ 0.05 and the distance modulus, (m - M)o = 12.45 $\pm$ 0.10 for the cluster were determined by zero-age-main-sequence fitting and theoretical isochrone fitting using not only (V, B - V), (V, V - 1), (V, V - R) but also (V, V - K) color-magnitude diagrams. The reddening corresponded approximately to the average value derived from previous studies, while the distance modulus was found to be almost midway between the CCD photometric results of Romeo et al. (1989) and those of Mateo & Madore (1988). We have used four colors to distinguish members from field stars. The expected colors were calculated using the derived distance modulus, and were then were compared with the observed colors (B - V), (V - 1), (V - R), and (V - K). Thus, a color excess E(B - V) for each star was determined which could give the minimum difference between the calculated and observed colors. Single and binary members of the cluster were determined on the basis of the E(B - V) distribution of stars.

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