• 제목/요약/키워드: Dry Rate

검색결과 3,067건 처리시간 0.028초

Physical and Chemical Management Practices for Improving Water Quality in Channel Catfish Ictalurus punctatus Aquaculture

  • Seo, Jin-Won
    • 한국양식학회지
    • /
    • 제15권1호
    • /
    • pp.49-60
    • /
    • 2002
  • Research on practices for improving water quality in channel catfish Ictalurus punctatus ponds was conducted at the Auburn University Fisheries Research Station, Auburn, Alabama, in 1998 and 1999. The objective of this two-year study was to determine better management practices to enhance water quality and improve production efficiency. In the first year, oxidation of bottom soil by drying, tilling, and applying sodium nitrate was performed (dry-till and dry-till with sodium nitrate treatments). The second year, based on the results obtained during the first year, precipitation of phosphorus (P) from water by applying gypsum was compared to the dry-till treatment (dry-till and dry-till with gypsum treatments). Control ponds were not subjected to bottom drying, tilling, sodium nitrate, or gypsum treatment. Channel catfish fingerings were stocked at 15,000/ha. In the first year, water in ponds from dry-till and dry-till with sodium nitrate treatments had lower concentrations (P < 0.01) of soluble reactive P, nitrate ($NO_{3} ^{-}) and nitrite ($NO_{2} ^{-}) nitrogen (N), total ammonia ($NH_3$) nitrogen, total suspended solids and turbidity, and higher values of pH, Secchi disk visibility, total alkalinity, total hardness, and calcium ($Ca^{2+}) hardness than water in control ponds. Ponds of the dry-till treatment also had lower concentrations (P < 0.01) of total P and total N than control ponds. Total fish production and survival rate did not differ among the treatments (P > 0.05). The findings suggested that drying and tiling pond bosoms between crops could achieve water quality improvement. Applying sodium nitrate to dry, tilled pond bosoms did not provide water quality improvement. In the second year, the treatment with the best results from the first year, dry-till, was compared with a dry-till with gypsum treatment. Enough gypsum was applied to give a total hardness of about 200 mg/L, and gypsum was reapplied as needed to maintain the hardness. Compared to the control, dry-till and dry-till with gypsum treatments had lower concentrations (P < 0.01) of total and soluble reactive P, total N, and total $NH_3$-N, and higher concentrations (P < 0.01) of dissolved oxygen. Ponds of the duty-till with gypsum treatment also had lower concentrations (P < 0.01) of chlorophyll $\alpha$, chemical oxygen demand, and total alkalinity than the control. Total fish production and survival rate did not differ (P > 0.05) among the treatments. These findings suggest that drying and tilling pond bosoms between crops and treating low hardness waters with gypsum could achieve water Quality improvement.

연맥의 사초특성 및 품질에 미치는 파종량 및 파종기의 영향 (Seeding Rate and Planting Date Effects on Forage Performance and Quality of Spring Oats)

  • 김수곤;김종덕;박형수;김동암
    • 한국초지조사료학회지
    • /
    • 제19권3호
    • /
    • pp.233-240
    • /
    • 1999
  • 가을철 봄 연맥의 생산을 위해 파종량과 파종기간의 관계를 이해하는 것은 매우 중요하다. 따라서, 본시험은 파종량 및 파종시기가 사초용 연맥 (Avena sativa L.)의 사초특성 및 사료가치에 어떠한 영향을 미치는가를 알아보기 위하여 1997년 8월 15일부터 10월 24일까지 서울대학교 농업생명과학대학 부속실험목장의 사초시험 포장에서 실시되었으며, 파종량은 ha당 150, 200 및 250kg을 주구로 하고, 파종시기(월/일) 인 8/15, 8/22, 8/29, 9/5를 세구로 하는 분할구 시험법으로 3반복 설계 배치하였으며, 결과를 요약하면 다음과 같다. 건물 함량(DM%)은 파종시기가 늦어짐에 따라 9월 5일 파종기(24.8%)를 제외한 다른 파종기는 유의적으로 감소하였으며(P<0.01), 8월15일 파종시는 23.0%, 22일은 21.5%, 29일은 20.5%가 됐다. 연맥의 건물 함량에 대하여 파종량 및 파종시기간에는 유의적인 교호작용이 있었다(P<0.01). 조단백질(CP) 함량은 파종시기가 늦어짐에 따라 15.6%에서 27.9%로 유의적으로(P<0.01) 증가됐다. 연맥의 조단백질 함량에 대하여 파종량 및 파종시기간에 유의적인 교호작용이 있었다(P<0.01). ADF 및 NDF 함량은 파종시기가 빠른 것이 높게 나타났으며(P<0.01), 파종량에 있어서는 유의성이 인정되지 않았다. In vitro 건물 소화율은 파종량이 많고 파종시기가 늦은 것이 높게 나타났다(P<0.01). Ha당 평균건물 수량은 2,647kg에서 615kg으로 나타나 파종시기가 늦어짐에 따라 유의적으로 계속 감소하였으며(P<0.01), 파종량간에 있어서는 유의성이 인정되지 않았다. 연맥의 평균 건물수량에 대하여 파종량 및 파종시기간에는 고도의 유의적인 교호작용이 있었다. 평균 조단백질 수량은 ha당 171kg에서 410kg으로 나타나 파종시기가 늦어짐에 따라 계속 증가하였으며, 파종량에 있어서는 파종량이 많을수록 유의성이 인정되었다(P<0.01). 따라서 연맥의 평균 조단백질 수량에 대하여 파종량 및 파종시기간에는 유의적인 교호작용이 있었다(P<0.01). In vitro 가소화 건물(IVDDM)수량은 파종시기가 늦어짐에 따라 계속 감소하였으며(P<0.01), 파종량에 있어서는 유의성이 인정되지 않았다. 이상의 연구결과 우리나라에서 사초용 연맥의 수량 증수 및 사료가치의 향상을 위해 파종량은 ha당 200kg, 파종시기는 8월29일 이전이라고 생각된다.

  • PDF

급속 건식 열산화 방법에 의한 초박막 SiO2의 성장과 특성 (Growth and Properties of Ultra-thin SiO2 Films by Rapid Thermal Dry Oxidation Technique)

  • 정상현;김광호;김용성;이수홍
    • 한국전기전자재료학회논문지
    • /
    • 제17권1호
    • /
    • pp.21-26
    • /
    • 2004
  • Ultra-thin silicon dioxides were grown on p-type(100) oriented silicon employing rapid thermal dry oxidation technique at the temperature range of 850∼1050 $^{\circ}C$. The growth rate of the ultra-thin film was fitted well with tile model which was proposed recently by da Silva & Stosic. The capacitance-voltage, current-voltage, characteristics were used to study the electrical properties of these thin oxides. The minimum interface state density around the midgap of the MOS capacitor having oxide thickness of 111.6 $\AA$ derived from the C-V curve was ranged from 6 to 10${\times}$10$^{10}$ /$\textrm{cm}^2$eV.

The Influence of Dry Etching Process by Charged Static Electricity on LCD Glass

  • Kim, Song-Kwan;Yun, Hae-Sang;Hong, Mun-Pyo;Park, Sun-Woo
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
    • /
    • pp.77-78
    • /
    • 2000
  • We verified the charged static electricity on LCD glass influences upon the etching uniformity of dry etching process by plasma. In the TFT-LCD manufacturing process, we mainly paid attention to eliminate the static electricity for TFT reliability. The static electricity caused the serious ununiformity of etching surface profile and etching rate in the dry etch process. Through our experiment on the made static electricity from -200V to -1000V, it was confirmed that the static electricity on LCD glass caused the etching rate variation of $1.5%{\sim}15%$. We recommend the etching process equipment for LCD manufacturing have to establish the soft X-ray exposure module system for eliminating the static electricity inside the loading and unloading chamber.

  • PDF

마찰속도와 마찰력의 변화에 따른 세라믹 용사 코팅재의 마모특성 (Wear Characteristics on Friction Velosity and Force of Plasma Sprayed Ceramic Coating Layer)

  • 김귀식;김성익
    • 동력기계공학회지
    • /
    • 제6권4호
    • /
    • pp.56-61
    • /
    • 2002
  • This study is to investigate the wear behaviors of thermally sprayed ceramic coating by a pin-on-disk wear testing machine. The test specimens were plasma sprayed TiO2 coating material on carbon steel substrate(S45C) with Ni-4.5%Al alloy bond coating. Wear characteristics, friction coefficient and wear rates, were conducted at the three kinds of loads and velosities. Wear environments were dry and lubrication friction. The friction coefficients of TiO2 coating specimen in dry friction were almost same according to increase the friction velocity. The wear rate increased when the friction force is high. In lubrication friction, the wear hardly occured and friction coefficient was about 0.1. The adhesiveness of TiO2 in lubrication friction is larger than that in dry one.

  • PDF

Mower Conditioner와 건조제 처리에 의한 속성 양질 혼파목초 건초조제 효과 (Effect of Mower Conditioner and Chemical Dry Agents on the Field Drying Rate of Mixed Pasture Plants Hay)

  • 서성;정의수;김종근;김원호;강우성;이효원
    • 한국초지조사료학회지
    • /
    • 제18권3호
    • /
    • pp.259-266
    • /
    • 1998
  • A field experiment was carried out to determine the effects of mechanical and chemical drying agents at mowing on the field drying rate and hay quality of orchardgrass dominant pasture plants. The mower conditioner /chemical drying agent ($K_2CO_3$ 2% conditioning, $K_2CO_3$ 2% + conditioning and control) were treated at different harvest stages (late boot, heading and bloom stage) for hastening hay manufacture in 1996. After field dry, four square bales were made by hay baler, and the visual estimation and nutritive value of hay were evaluated after storing two months. The field drying rate of pasture plants was higher with delayed stage of harvest, and mechanical and mechanical + chemical, but chemical alone was very low. In mower conditioning, the duration of field dry was shortened by 0.5 to 1 day compared with $K_2CO_3$ and 1.5 to 2 days compared with control. The dry matter loss of hay was reduced by late harvest and mechanical, and mechanical + chemical, but the score by chemical alone was very low. The visual score (leafiness, green color, odor and softness) of hay after storage was high in mechanical and mechanical + chemical, but the score by chemical alone was very low. Nutritive value (ADF, NDF, digestibility, and relative feed value) of hay was also high with treatment of mechanical and mechanical + chemical, but the quality by chemical alone was similar compared with control. The quality of hay was very low when harvested at bloom stage. In conclusion, mower conditioning can enhance the field drying rate of orchardgrass dominant pasture plants, however the drying efficiency of chemical drying agent was very low. Harvesting at early heading to heading stage was recommened for manufacture of high quality hay.

  • PDF

벼 휴립건답직파 절수재배시 완효성비료 효과 (Effect of Latex Coated Urea on Growth and Yield in Rige Direct Dry Seeding for Water-saving Rice Culture)

  • 최원영;최민규;김상수;이재길;이문희
    • 한국작물학회지
    • /
    • 제47권3호
    • /
    • pp.221-225
    • /
    • 2002
  • 본 연구는 벼 휴립건답직파 절수재매시 완효성비료의 효과를 알아보기 위하여 질소비료를 표준시비(N-160kg/ha) 대비 완효성비료(LCU: 18-12-13%)를 기비로 100%와 80% 시용구 및 기비로 60% 시용하고 속효성비료인 요소로 분얼비 또는 수비로 20%씩 각각 시용하여 시험한 결과를 요약하면 다음과 같다. 1. 생육기간중 지상부 생육은 LCU 100%에서 가장 컸고, LCU 시비량간에는 시비량이 많을수록 컸다. 2. 시비질소의 흡수량은 LCU 100%에서 가장 높았고 질소 시비효율은 LCU 60% + 수비(요소) 20% 시용구에서 가장 높았다. 3. 처리간 수량구성요소를 보면 $m^2$당 수수와 $m^2$당 립수는 LCU 100%에서 가장 많았고, 등숙비율과 현미 천립중은 비슷하였는데, 쌀 수량은 관행인 속효성 시비구 대비 LCU 100%에서 7% 증수되었다. 따라서 벼 휴립건담직파재배에서 관개수 부족시 절수재배가 필요하여 이때에 완효성비료로 시비할 경우 표준시비량(N-160kg/ha) 수준으로 시비해야 할 것으로 생각된다.

Study on Calibration Methods of Discharge Coefficient of Sonic Nozzles using Constant Volume Flow Meter

  • 정완섭;신진현;강상백;박경암;임종연
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
    • /
    • pp.17-17
    • /
    • 2010
  • This paper address technical issues in calibrating discharge coefficients of sonic nozzles used to measure the volume flow rate of low vacuum dry pumps. The first challenging issue comes from the technical limit that their calibration results available from the flow measurement standard laboratories do not fully cover the low vacuum measurement range although the use of sonic nozzles for precision measurement of gas flow has been well established in NMIs. The second is to make an ultra low flow sonic nozzlesufficient to measure the throughput range of 0.01 mbar-l/s. Those small-sized sonic nozzles do not only achieve the noble stability and repeatability of gas flow but also minimize effects of the fluctuation of down stream pressures for the measurement of the volume flow rate of vacuum pumps. These distinctive properties of sonic nozzles are exploited to measure the pumping speed of low vacuum dry pumps widely used in the vacuum-related academic and industrial sectors. Sonic nozzles have been standard devices for measurement of steady state gas flow, as recommended in ISO 9300. This paper introduces two small-sized sonic nozzles of diameter 0.03 mm and 0.2 mm precisely machined according to ISO 9300. The constant volume flow meter (CVFM) readily set up in the Vacuum center of KRISS was used to calibrate the discharge coefficients of the machined nozzles. The calibration results were shown to determine them within the 3% measurement uncertainty. Calibrated sonic nozzles were found to be applicable for precision measurement of steady state gas flow in the vacuum process. Both calibrated sonic nozzles are demonstrated to provide the precision measurement of the volume flow rate of the dry vacuum pump within one percent difference in reference to CVFM. Calibrated sonic nozzles are applied to a new 'in-situ and in-field' equipment designed to measure the volume flow rate of low vacuum dry pumps in the semiconductor and flat display processes.

  • PDF

Water film covering characteristic on horizontal fuel rod under impinging cooling condition

  • Penghui Zhang;Bowei Wang;Ronghua Chen;G.H. Su;Wenxi Tian;Suizheng Qiu
    • Nuclear Engineering and Technology
    • /
    • 제54권11호
    • /
    • pp.4329-4337
    • /
    • 2022
  • Jet impinging device is designed for decay heat removal on horizontal fuel rods in a low temperature heating reactor. An experimental system with a fuel rod simulator is established and experiments are performed to evaluate water film covering capacity, within 0.0287-0.0444 kg/ms mass flow rate, 0-164.1 kW/m2 heating flux and 13.8-91.4℃ feeding water temperature. An effective method to obtain the film coverage rate by infrared equipment is proposed. Water film flowing patterns are recoded and the film coverage rates at different circumference angles are measured. It is found the film coverage rate decreases with heating flux during single-phase convection, while increases after onset of nucleate boiling. Besides, film coverage rate is found affected by Marangoni effect and film accelerating effect, and surface wetting is significantly facilitated by bubble behavior. Based on the observed phenomenon and physical mechanism, dry-out depth and initial dry-out rate are proposed to evaluate film covering potential on a heating surface. A model to predict film coverage rate is proposed based on the data. The findings would have reliable guide and important implications for further evaluation and design of decay heat removal system of new reactors, and could be helpful for passive containment cooling research.

High rate dry etching of Si in fluorine-based inductively coupled plasmas

  • Cho, Hyun;Pearton, S.J.
    • 한국결정성장학회지
    • /
    • 제14권5호
    • /
    • pp.220-225
    • /
    • 2004
  • Four different Fluorine-based gases ($SF_6/,NF_3, PF_5,\; and \; BF_3$) were examined for high rate Inductively Coupled Plasma etching of Si. Etch rates up to ~8$\mu\textrm{m}$/min were achieved with pure $SF_6$ discharges at high source power (1500 W) and pressure (35 mTorr). A direct comparison of the four feedstock gases under the same plasma conditions showed the Si etch rate to increase in the order $BF_3$ < $NF_3$< $PF_5$ < $SF_6$. This is in good correlation with the average bond energies of the gases, except for $NF_3$, which is the least strongly bound. Optical emission spectroscopy showed that the ICP source efficiently dissociated $NF_3$, but the etched Si surface morphologies were significantly worse with this gas than with the other 3 gases.