한국정보디스플레이학회:학술대회논문집
- 2000.01a
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- Pages.77-78
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- 2000
The Influence of Dry Etching Process by Charged Static Electricity on LCD Glass
- Kim, Song-Kwan (Department of Control & Instrumentation Engineering, University of Seoul) ;
- Yun, Hae-Sang (Department of Electronics Engineering, University of Chung woon) ;
- Hong, Mun-Pyo (AM LCD division strategic R & D group, Samsung Electronics Co.) ;
- Park, Sun-Woo (Department of Control & Instrumentation Engineering, University of Seoul)
- Published : 2000.01.13
Abstract
We verified the charged static electricity on LCD glass influences upon the etching uniformity of dry etching process by plasma. In the TFT-LCD manufacturing process, we mainly paid attention to eliminate the static electricity for TFT reliability. The static electricity caused the serious ununiformity of etching surface profile and etching rate in the dry etch process. Through our experiment on the made static electricity from -200V to -1000V, it was confirmed that the static electricity on LCD glass caused the etching rate variation of
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