• 한국전자파학회논문지
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• 제18권11호
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• pp.1291-1298
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• 2007

종래의 DGS를 이용한 초고주파 회로의 메탈 패키징(metal packaging)시 존재했던 DGS의 접지면 접촉 문제를 해결하고자, 본 논문에서는 이중 기판 결함 접지 구조 구조를 제안하고, 이를 1:4 비대칭 전력 분배기에 적용한 응용예를 제시한다. 이중 기판에 구현된 사각형 DGS는 종래와 같이 마이크로스트립 선로의 특성 임피던스를 표준형 선로보다 크게 증가시킨다. 이중 기판 DGS 구조를 형성하기 위하여 제2유전체 기판이 DGS가 구현된 기판면의 바닥 접지면에 접합된다. 따라서 제2유전체 기판이 메탈 패키지 바닥면에 장착되므로, DGS가 직접 패키지 접촉되는 것을 막을 수 있다. 초고주파 회로 응용예를 보이기 위해, 이중 기판 DGS를 이용하여 패키지 접지 문제를 해결한 1:4 비대칭 전력 분배기의 설계 및 측정 결과가 제시되는데, 시뮬레이션과 측정 결과에 있어서 잘 일치하는 특성을 보인다.

• 한국재료학회지
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• 제27권3호
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• pp.161-165
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• 2017

In this paper, synthesis of terephthalate intercalated Zn-Al: Layered double hydroxides (LDHs) was studied. We designed freestanding Zn-Al: carbonate LDH nanosheets for a facile exchange technique. The as-prepared Zn-Al carbonate LDHs were converted to terephthalate intercalated Zn-Al:LDHs by ion exchange method. Initially, Al-doped ZnO (AZO) thin films were deposited on p-Si (001) by facing target sputtering. For synthesis of free standing carbonate Zn-Al:LDH, we dipped the AZO thin film in naturally carbonated water for 3 hours. Further, Zn-Al: carbonate LDH nanosheets were immersed in terepthalic acid (TA) solution. The ion exchange phenomena in the terephthalate assisted Zn-Al:LDH were confirmed using FT-IR analysis. The crystal structure of terephthalate intercalated Zn-Al:LDH was investigated by XRD pattern analysis with different mole concentrations of TA solution and reaction times. The optimal conditions for intercalation of terephthalate from carbonated Zn-Al LDH were established using 0.3 M aqueous solution of TA for 24 hours.

• 한국표면공학회지
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• 제51권6호
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• pp.365-371
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• 2018

1D core-shell nanostructures have attracted great attention due to their enhanced physical and chemical properties. Specifically, oriented single-crystalline $TiO_2$ nanorods or nanowires on a transparent conductive substrate would be more desirable as the building core backbone. However, a facile approach to produce such structure-based hybrids is highly demanded. In this study, a three-step hydrothermal method was developed to grow NiMn-layered double hydroxide-decorated $TiO_2$/carbon core-shell nanorod arrays on transparent conductive fluorine-doped tin oxide (FTO) substrates. XRD, SEM, TEM, XPS and Raman were used to analyze the obtained samples. The in-situ fabricated hybrid nanostructured materials are expected to be applicable for photoelectrode working in water splitting.

• 한국세라믹학회지
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• 제32권7호
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• pp.761-768
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• 1995

Double layered BaTiO3 thin films with high dielectric constant as well as good insulating property were prepared for the application to low voltage driving thin film electroluminescent (TFEL) device. BaTiO3 thin films were formed by rf-magnetron sputtering technique. Amorphous and polycrystalline BaTiO3 thin films were deposited at the substrate temperatures of room temperature and 55$0^{\circ}C$, respectively. Two kinds of films prepared under these conditions showed high resistivity and high dielectric constant. The figure of merit (=$\varepsilon$r$\times$Eb.d) of polycrystalline BaTiO3 thin film was very high (8.43$\mu$C/$\textrm{cm}^2$). The polycrystalline BaTiO3 showed a substantial amount of leakage current (I), under the high electric field above 0.5 MV/cm. The double layered BaTiO3 thin film, i.e., amorphous BaTiO3 layer coated polycrystalline BaTiO3 thin film, was prepared by the new stacking method and showed very good dielectric and insulating properties. It showed a high dielectric constant fo 95 and leakage current density of 25 nA/$\textrm{cm}^2$ (0.3MV/cm) with the figure of merit of 20$\mu$C/$\textrm{cm}^2$. The leakage current density in the double layered BaTiO3 was much smaller than that in polycrystalline BaTiO3 under the high electric field. The saturated brightness of the devices using double layered BaTiO3 was about 220cd/$m^2$. Threshold voltage of TFEL devices fabricated on double layered BaTiO3 decreased by 50V compared to the EL devices fabricated on amorphous BaTiO3.

• Journal of electromagnetic engineering and science
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• 제10권3호
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• pp.86-91
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• 2010

In this paper, a double-layered frequency selective surface(FSS) superstrate was built and tested. The unit cell of the proposed FSS consists of a ring slot and a dipole-shaped structure and shows a complementary frequency response. Each unit cell is printed on two sides of a substrate. By using these double-layered structures, the first resonant frequency of the pass-band can be lowered. As a result, the size of the unit cell is minimized and the spacing between the other cells is reduced. The proposed FSS-dipole composite antenna is designed for the gain enhancement of wide-band code division multiple access(WCDMA) frequency bands(1.92~2.17 GHz) with a low quality factor(Q=0.17). To verify the gain enhancement performance of the FSS, an FSS-dipole composite antenna was created. Although the FSS layer enhances the gain of the primary radiation source of the dipole antenna, the FSS-dipole complex antenna cannot show a uniform gain over the entire desired frequency band. The experimental results show a gain enhancement of 3 dBi with an FSS superstrate in the WCDMA frequency band.

• 열처리공학회지
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• 제15권3호
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• pp.118-126
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• 2002

TiCN thin films were deposited on tool steels at $510^{\circ}C$ by PECVD from a $TiCl_4+N_2+CH_4+H_2+Ar$ gaseous mixture. The microstructures and preferred orientation were investigated. The micro-scratch tests were performed using a system equipped with an acoustic emission sensor. Critical loads were determined to evaluate the adhesion of TiCN to substrate. The influences of the microstructures of substrates, double layered coatings, and coatings after nitriding(duplex coating) were investigated. The experimental results showed that the microstructures of substrates and double layered coating did not affect the critical loads considerably. By the duplex coating, critical loads were not always increased. In some cases, duplex coatings decreased critical loads significantly despite of absence of black layer. In this study, we tried to relate the results of scratch test to the residual stress analysis. Nitriding before the coating reduces the tensile residual stress in the film, which gives rise to low critical load in scratch test.

• 폴리머
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• 제39권3호
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• pp.514-521
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• 2015

본 연구는 자동차, 건축, 디스플레이 부품 접합 등에 사용되는 다층구조형 양면 점착테이프에 대한 것으로 UV 경화에 의해 제조된 아크릴폼 기재에 용제 건조형 점착제(AD)를 양면에 붙이고 피착제 종류에 따른 박리강도와 전단접착강도를 고찰하였다. AD 종류와 기재 조성에 따른 접착력 변화 및 피착재로 사용한 플라스틱에 대한 접착력을 고찰한 결과, AD의 분자량(MW)이 증가할수록 박리강도 및 전단접착강도가 증가하였으나 약 65만 이상의 MW를 가진 AD는 접착력이 감소하는 거동을 보였다. 양면 점착테이프에 사용된 AD층 두께가 얇을수록 온도감소와 함께 높은 물성 값을 보였다. 기재와 AD와의 계면접합 특성은 MW 615000(AD-4)을 사용한 것이 가장 우수하였으며, MW가 615000보다 낮으면 기재인 아크릴 폼과의 계면이 분리되는 결과를 보였다. 따라서 본 연구에서 검토한 다층구조형 양면 점착테이프는 표면에너지가 낮은 플라스틱 부품 및 곡면 부위에 적용가능한 산업분야에 유용하게 사용될 수 있을 것으로 판단된다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1129-1132
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• 1995

In the preparation of the layered $BaTiO_3$ thin films with high performance, the new stacking method using the continuous cooling of the substrate was introduced. Amorphous/polycrystalline $BaTiO_3$ layered structure was confirmed by SEM and index of refraction. The layered $BaTiO_3$ thin films formed by the new stacking method showed such a high dielectric constant that the layered structure could not be explained by a stacking structure of the two defined layers but could only be explained by multi-layered structure, i.e. amorphous/micro crystalline/polycrystalline structure. The layered $BaTiO_3$ thin film with a thickness of 240 nm showed higher capacitance per unit area and breakdown strength than the double layered $BaTiO_3$ thin film prepared by the conventional stacking method. And well defined ferroelectric hysteresis leer was observed in the layered $BaTiO_3$ thin film with a thickness of 200 nm.

• 전자공학회논문지A
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• 제30A권1호
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• pp.44-50
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• 1993

In an attempt to improve the electrical characteristics of tantalum pentoxide dielectric film, silicon substrate was reacted with a nitrogen plasma to form a silicon nitride of 50.angs. and then tantalum pentoxide thin films were formed by reactive sputtering in the same chamber. Breakdown field and leakage current density were measured to be 2.9 MV/cm and 9${\times}10^{8}\;A/cm^{2}$ respectively in these films whose thickness was about 180.angs.. With annealing at rectangular waveguides with a slant grid are investigated here. In particular, 900.deg. C in oxygen ambient for 100 minutes, breakdown field and leakage current density were improved to be 4.8 MV/cm and 1.61.6${\times}10^{8}\;A/cm^{2}$ respectively. It turned out that the electrical characteristics could also be improved by oxygen plasma post-treatment and the conduction mechanism at high electric field proved to be Schottky emission in these double-layered films.

• 연구논문집
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• 통권31호
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• pp.127-133
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• 2001

In chromium electrodeposition, crack is inevitably accompanied by chromium layer. Behavior of crack formation and crack density were different from the plating conditions such as current density, temperature, waveform of applied current and so on. And cracks have an influence on the corrosion resistance of chromium deposit, because corrosion occurs through the network of cracks between deposit and substrate. Therefore, many researches have been achieved in order to remove the cracks in chromium deposit. Formation of double layers, Cr/Cr and Ni/Cr were investigated to increase corrosion resistance of chromium deposit in this study. As pretreatment prior to outer chromium coating, acid pickling and current control method were examined. Cracks in cross-section of each sample were observed with SEM and CASS(Copper modified acetic acid salt spray) test was performed to evaluate corrosion resistance. It was found that corrosion resistance of Cr/Cr and Ni/Cr double layers were superior to Cr or Ni single layer from the results of CASS test.