• Title/Summary/Keyword: Dielectric-Barrier-Discharge Plasma

검색결과 204건 처리시간 0.034초

대기압 플라즈마 처리에 의한 TAC 필름의 표면에너지 변화 (The Surface Energy Change of TAC Film Treated by an Atmospheric Pressure Plasma)

  • 이창호;정도영;박영직;송현직;이광식
    • 조명전기설비학회논문지
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    • 제23권12호
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    • pp.184-190
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    • 2009
  • 표면의 친수성 작용기 형성과 접촉각 향상을 위하여 대기압 플라즈마를 이용하여 Tri-acetyl-cellulose(TAC) 필름에 대한 표면개질을 연구하였다. TAC 필름의 표면개질 목적으로 대기압에서 플라즈마를 발생시키기 위한 Dielectric barrier discharge(DBD) 구조의 플라즈마 반응기 내에서 이온화된 질소 플라즈마를 사용하였다. 플라즈마 처리 공정변수인 처리속도, 방전전력, 방전 갭 및 질소 가스 유속을 변화시켜가며 접촉각을 측정하여 접촉각과 표면에너지 변화를 검토하였다. 대기압 플라즈마 처리속도 100[mm/sec], 방전 전력 1.5[kW], 방전 갭 2[mm] 및 $N_2$ 가스유량 140[LPM] 에서 가장 높은 접촉각과 표면에너지 값을 보였다. 표면친수화의 정도는 플라즈마 방전 전력과 처리 시간에 의존하였다.

Dielectric barrier discharge 플라즈마 펄스 레이져 증착법을 통해 성장한 nitrogen 도핑 된 산화아연 박막의 광학적 특성 (Optical properties of nitrogen doped ZnO thin films grown by dielectric barrier discharge plasma-assisted pulsed laser deposition)

  • 이득희;김상식;이상렬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1256_1257
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    • 2009
  • We have grown, for the first time to our knowledge, N-doped ZnO thin films on sapphire substrate by employing novel dielectric barrier discharge in pulsed laser deposition (DBD-PLD). DBD guarantees an effective way for massive in-situ generation of N-plasma under the conventional PLD process condition. Low-temperature photoluminescence spectra of the N-doped ZnO film provided near band-edge emission after thermal annealing process. The emission peak was resolved by Gaussian fitting to find a dominant acceptor-bound exciton peak ($A^0X$) that indicates the successful p-type doping of ZnO with N.

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실리콘 산화막을 이용한 초소형 비열플라즈마 발생장치의 방전 및 오존발생특성 (Discharge and Ozone Generation Characteristics of a Micro-Size Nonthermal Plasma Generator Using Silicon Oxide Film)

  • 강정훈;태흥식;문재덕
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1816-1818
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    • 1996
  • A micro-size nonthermal plasma generator, using a $SiO_2$ film as a dielectric barrier, has been studied experimentally for a high frequency ac voltage in 2LPM oxygen gas fed. The $SiO_2$ film as a micro-size dielectric barrier was made by the wet oxidation of n-type Si wafer($220[{\mu}mt]$). It can be generated ozone, as a nonthermal plasma intensity parameter, at very low level of applied voltage about 1[kV] by using the micro-size dielectric barrier. As a result, in case that have no air gap spacing i.e. surface discharge case shows relatively higher ozone concentration rather than that case of the micro-airgap spacing.

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DBD 반응기에서 솔-젤 법으로 제조된 Pt/TiO2 촉매를 이용한 메탄의 플라즈마 전환반응 (Plasma Catalytic Methane Conversion over Sol-gel Derived Pt/TiO2 Catalyst in a Dielectric-barrier Discharge Reactor)

  • 김승수
    • Korean Chemical Engineering Research
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    • 제45권5호
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    • pp.455-459
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    • 2007
  • 배리어(dielectric-barrier discharge: DBD) 반응기에서 솔-젤 방법으로 제조한 $Pt/TiO_2$를 넣고 플라즈마 에너지를 사용하여 메탄전환반응 연구를 수행하였다. 제조된 촉매는 기존 금속산화물과는 다른 방법으로 환원을 하였으며, 플라즈마를 사용한 환원방법(plasma-assisted reduction: PAR)이라고 명명하였다. $Pt/TiO_2$ 촉매는 Pt 담지량 및 소성온도에 관계없이 20분 이내에 환원이 완료되었다. 3 wt% $Pt/TiO_2$ 촉매와 5 wt% $Pt/TiO_2$ 촉매를 $600^{\circ}C$에서 소성하여 PAR 방법으로 환원했을 때 메탄의 전환율은 40%로 가장 높았다. DBD 반응기에서 $Pt/TiO_2$ 촉매를 사용하였을 경우 촉매가 없을 때보다 $C_2H_6$, $C_3H_8$$C_4H_{10}$과 같은 알칸의 선택성의 매우 높게 나타났다.

Flexible Plasma Sheets

  • Cho, Guangsup;Kim, Yunjung
    • Applied Science and Convergence Technology
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    • 제27권2호
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    • pp.23-25
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    • 2018
  • With respect to the electrode structure and the discharge characteristics, the atmospheric pressure plasma sheet of a thin polyimide film is introduced in this study; here, the flexible plasma device of a dielectric-barrier discharge with the ground electrode and the high-voltage electrode formulated on each surface of a polyimide film whose thickness is approximately $100{\mu}m$, that is operated with a sinusoidal voltage at a frequency of 25 kHz and a low voltage from 1 kV to 2 kV is used. The streamer discharge is appeared along the cross-sectional boundary line between two electrodes at the ignition stage, and the plasma is diffused on the dielectric-layer surface over the high-voltage electrode. In the development of a plasma sheet with thin dielectric films, the avoidance of the insulation breakdown and the reduction of the leakage current have a direct influence on the low-voltage operation.

토마토 수경재배에서 플라즈마를 이용한 시들음병균(Fusarium oxysporum f. sp.) 불활성화 (Inactivation of Wilt Pathogen(Fusarium oxysporum f. sp.) using Plasma in Tomato Hydroponic Cultivation)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제33권5호
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    • pp.323-332
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    • 2024
  • Circulating hydroponic cultivation has the advantage of reducing soil and water pollution problems caused by discharge of fertilizer components because the nutrient solution is reused. However, cyclic hydroponic cultivation has a low biological buffering capacity and can cause outbreaks of infectious root pathogens. Therefore, it is necessary to develop technologies or disinfection systems to control them. This study used dielectric barrier discharge plasma, which generates various persistent oxidants, to treat Fusarium oxysporum f. sp., a pathogen that causes wilt disease. Batch and intermittent continuous inactivation experiments were conducted, and the results showed that the total residual oxidant was persistent in intermittent plasma treatment at intervals of 2-3 days, and F. oxysporum was treated efficiently. Intermittent plasma treatment did not inhibit the growth of tomatoes.

SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge

  • Jeong, Soo-Yeon;Kim, Ji-Hun;Hwang, Yong-Seuk;Kim, Gon-Ho
    • Transactions on Electrical and Electronic Materials
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    • 제7권4호
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    • pp.204-209
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    • 2006
  • Photo Resist (PR) ashing process was carried out with the atmospheric pressure- dielectric barrier discharge (ADBD) using $SF_6/N_2/O_2$. Ashing rate (AR) was sensitive to the mixing ratio of the oxygen and nitrogen of the blower type of ADBD asher. The maximum AR of 5000 A/min was achieved at 2% of oxygen in the $N_2$ plasma. With increasing the oxygen concentration to more than 2% in the $N_2$ plasma, the discharge becomes weak due to the high electron affinity of oxygen, resulting in the decrease of AR. When adding 0.5% of SF6 to $O_2/N_2$ mixed plasma, the PR AR increased drastically to 9000 A/min and the ashed surface of PR was smoother compared to the processed surface without $SF_6$. Carbon Fluorinated polymer may passivate the PR surface. It was also observed that the glass surface was not damaged by the fluorine.

Semi-Permanent Hydrophilization of Polyester Textile by Polymerization and Oxidation Using Atmospheric Pressure Dielectric Barrier Discharge (APDBD)

  • Se Hoon Shin;Yoon Kee Kim
    • 한국재료학회지
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    • 제33권4호
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    • pp.115-123
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    • 2023
  • In this paper, we report and discuss the semi-permanently hydrophilic (SPH) treatment of polyester fabric using plasma polymerization and oxidation based on atmospheric pressure dielectric barrier discharge (APDBD) technology. SiOxCy(-H) was coated on polyester fabric using Hexamethylcyclotrisiloxane (HMCTSO) as a precursor, and then plasma oxidation was performed to change the upper layer of the thin film to SiO2-like. The degradation of hydrophilicity of the SPH polyester fabrics was evaluated by water contact angle (WCA) and wicking time after repeated washing. The surface morphology of the coated yarns was observed with scanning electron microscopy, and the presence of the coating layer was confirmed by measuring the Si peak using energy dispersive x-ray spectroscopy. The WCA of the SPH polyester fabric increased to 50 degrees after 30 washes, but it was still hydrophilic compared to the untreated fabric. The decrease in hydrophilicity of the SPH fabric was due to peeling of the SiOxCy(-H) thin film coated on polyester yarns.

DBD (Dielectric Barrier Discharge) Plasma Device for Biomedical Applications

  • 김윤중;김중길;정종윤;한국희;이민경;차덕봉;한상호;박경순;조광섭
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.461-461
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    • 2012
  • 미생물 처리에 적용하기 위한 저주파 Dielectric Barrier Discharge (DBD) Plasma Device를 고안하였다. 현재 생의학적으로 광범위하게 사용되는 Plasma Jet Device는 가스를 주입해 주어야 한다. 그러나 Plasma Jet Device의 노즐로부터 배출되는 가스는 Media의 흔들림과 증발 유발시키며 미생물에게 영향을 미친다. 가스 배출에 의한 영향을 없애기 위해 가스 주입이 없는 Plasma 발생 장치를 제작 하고, 미생물에 적용하여 그 효과를 관찰하였다. 본 실험에 사용된 Plasma 발생 장치는 대기 중에서 방전된다. 가스의 주입 없이 낮은 방전 전압과 균일한 플라즈마의 발생을 위해 Plasma 발생 장치의 접지 전극으로 Mesh를 사용 하였다. 본 Plasma 발생 장치로 발생된 Plasma를 곰팡이(Fusariumgraminearum)에 조사한 결과, 조사 시간이 길어짐에 따라 배양된 곰팡이의 Colony 수가 Plasma를 조사하지 않은 경우에 비해 줄어드는 것을 확인할 수 있었다. 또한 각각의 곰팡이 Colony의 크기도 줄어들었다.

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반응표면분석법을 이용한 수처리용 플라즈마 공정 설계의 최적화 (Optimization of Design of Plasma Process for Water Treatment using Response Surface Method)

  • 김동석;박영식
    • 한국물환경학회지
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    • 제27권5호
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    • pp.617-624
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    • 2011
  • In order to confirm the creation of the OH radical which influences to RNO bleaching processes, it experimented using laboratory reactor of dielectric barrier discharge plasma (DBDP). The experiments performed in about 4 kind process variables (diameter of ground electrode, diameter of discharge electrode, diameter of quartz tube and effect of air flow rate) which influence to process. In order to examine optimum conditions of design factors as shown in Box-Behnken experiment design, ANOVA analysis was conducted against four factors. The actual RNO removal at optimized conditions under real design constraints were obtained, confirming Box-Behnken results. Optimized conditions under real design constraints were obtained for the highest desirability at 1, 1 mm diameter of ground and discharge electrode, 6 mm diameter of quartz tube and 5.05 L/min air flow rate, respectively.