• Bulletin of the Korean Chemical Society
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• 제34권1호
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• pp.99-106
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• 2013

Polyaniline-yttrium trioxide (PAni-$Y_2O_3$) composites were synthesized by the in-situ polymerization of aniline in the presence of $Y_2O_3$ The composite formation and structural changes in these composites were investigated by X-ray diffraction (XRD), Fourier transform infra red spectroscopy (FTIR), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The direct current (DC) electrical conductivity of the order of $0.51{\times}10^{-2}\;S\;cm^{-1}-0.283\;S\;cm^{-1}$ in the temperature range 300 K-473 K indicates semiconducting behavior of the composites. Room temperature AC conductivity and dielectric response of the composites were studied in the frequency range of 10 Hz to 1 MHz. The variation of AC conductivity with frequency obeyed the power law, which decreased with increasing weight percentage (wt %) of $Y_2O_3$. Studies on dielectric properties shows the relaxation contribution coupled by electrode polarization effect. The dielectric constant and dielectric loss in these composites depend on the content of $Y_2O_3$ with a percolation threshold at 20 wt % of $Y_2O_3$ in PAni. Electromagnetic interference shielding effectiveness (EMI SE) of the composites in the frequency range 100 Hz to 2 GHz was in the practically useful range of -12.2 dB to -17.2 dB. The observed electrical and shielding properties were attributed to the interaction of $Y_2O_3$ particles with the PAni molecular chains.

• 한국초전도ㆍ저온공학회논문지
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• 제8권1호
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• pp.45-48
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• 2006

In the response to the demand for electrical energy , much effort was given to develop and commercialize high temperature superconducting (HTS) power equipments has been made around the world. Especially, HTS transformer is one of the most promising devices . but the cryogenic insulation technology should be established during development Hence many types of dielectric tests should be carried out to understand the dielectric phenomena at cryogenic temperature and to gather various dielectric data. Among the many types dielectric tests . the characteristic of barrier effect were conducted using simulated electrode after analysing the insulating configuration of HTS transformer main winding. The influence of a barrier on the dielectric strength was measured according to the position of the harriet the number of the barrier and thickness or the barrier. It was shown that the effectiveness . namely the ratio of the breakdown voltage in presence of barrier to the voltage without barrier, is highest when the barrier is placed at the needle electrode side. On the contrary, in the case of having the barrier between the electrodes, the harrier was placed between the electrodes the characteristic was even improved slightly.

• Journal of Electrical Engineering and Technology
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• 제9권6호
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• pp.2070-2078
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• 2014

In this work, the frequency response of gate-all-around (GAA) Ge/GaAs heterojunction tunneling field-effect transistor (TFET) with hetero-gate-dielectric (HGD) and pnpn channel doping profile has been analysed by technology computer-aided design (TCAD) device-circuit mixed-mode simulations, with comparison studies among ppn, pnpn, and HGD pnpn TFET devices. By recursive tracing of voltage transfer curves (VTCs) of a common-source (CS) amplifier based on the HGD pnpn TFET, the operation point (Q-point) was obtained at $V_{DS}=1V$, where the maximum available output swing was acquired without waveform distortion. The slope of VTC of the amplifier was 9.21 V/V (19.4 dB), which mainly resulted from the ponderable direct-current (DC) characteristics of HGD pnpn TFET. Along with the DC performances, frequency response with a small-signal voltage of 10 mV has been closely investigated in terms of voltage gain ($A_v$), unit-gain frequency ($f_{unity}$), and cut-off frequency ($f_T$). The Ge/GaAs HGD pnpn TFET demonstrated $A_v=19.4dB$, $f_{unity}=10THz$, $f_T=0.487$ THz and $f_{max}=18THz$.

• 한국안광학회지
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• 제2권1호
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• pp.9-16
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• 1997

강유천체 $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정을 x=0.015, 0.021, 0.03의 조성에 대하여 Czochralski법으로 성장시켰으며, 성장시킨 단결정의 색상은 맑고 투명한 연한 노란색이었다. $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정의 유전완화에 관한 연구를 위한 측정은 주파수범위 100 Hz에서 10 MHz까지 온도범위 $20^{\circ}C$에서 $600^{\circ}C$까지 변화 시키면서 하였다. 측정결과 유전을 최대값이 되는 온도는 Ti 성분이 증가함으로 낮은 온도로 이동하였으며, 유전율의 최대값의 크기는 Ti 성분의 증가에 따라 감소하였다. $Pb_5Ge_{3-x}Ti_xO_{11}$ 단결정의 유전응답의 주파수 의존성은 완화시간 분포와, Debye 완화형태를 가졌으며, 유전적 거동은 캐리어가 우세한 반응의 특징을 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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• pp.41-44
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• 1997

Using the 2 probe mothods, AC coductivities, dielectric loss factors, capacitances, and impedances were investigated to study. The electrical and sensing properties for SnO$_2$ added ZnO. In air The electrical conductivity of SnO$_2$added ZnO decrease by increasing the content of SnO$_2$, and the relative dielectric constants for 0.05, 5, 7 SnO$_2$ added ZnO are 55, 20, 14, respectively. In 3000ppm CO Gas. relative dielectric constants for 3, 5mol% SnO$_2$ added ZnO are 163, 68, respectively.

• 한국전자파학회:학술대회논문집
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• 한국전자파학회 2002년도 종합학술발표회 논문집 Vol.12 No.1
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• pp.132-135
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• 2002

A RF amplitude equalizer is designed to improve in-band flatness of Rf filters and/or systems using two dielectric resonators and a 90$^{\circ}$ hybrid. The equalizer has good return loss characteristics and V shaped S$_{21}$ response in passband which is suitable to compensate the ripple degradation due to insufficient quality factors of used resonators or narrow band width of filters or systems. After being connected to the equalizer, a 5-pole BPF at 1957MHz, which has 10 MHz bandwidth and 6㏈ ripple, shows only 1.8㏈ in-band ripple and good in- and out- band matched responses within used hybrid bandwidth without additional matching networks.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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• pp.104-108
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• 2005

We have studied electrode-optic characteristics of IPS (in-plane switching) mode with electrode on top substrate. Because the IPS mode does not have electrode on top substrate. it shows not only slow response time due to weak electric field but also slow discharging problem when electrostatic field is generated after fabricating the cell. To solve these problems. we have formed additional electrode including dielectric layer in the inner part of the cell and studied electrode-optic characteristics of new IPS cell by changing thickness of dielectric layer.

• 대한기계학회논문집A
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• 제26권6호
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• pp.1001-1007
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• 2002

To improve the performance of the PZT thin flms, each PZT and PT layer was alternately deposited on a Pt/Ti/Si$_3$N$_4$/SiO$_2$/Si substrate by a modified sol-gel solid precursor technique. For comparison, PZT thin films were also prepared with an identical method under the same conditions. XRD measurement revealed that the diffraction pattern of the multilayer film was due to the superimposition of the PZT and PT patterns. At 1㎑, a dielectric constant of 389 and 558, a dielectric loss of 1.2% and 1.1% were obtained for the PZT/PT and PZT thin films, respectively. If we consider the PT dielectric constant to be 260, it is clear that the dielectric constant of alternately deposited PZT/PT thin films was well adjusted. The PZT/PT thin film showed a low dielectric constant and a similar dielectric loss compared with those of the PZT film. The figures of merit on detectivity for the PZT/PT and PZT thin films were 20.3$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and 18.7$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and the figures of merit on voltage response were 0.038㎡/C and 0.028 ㎡/C, respectively. The high figures of merit for the PZT/PT film were ascribed to its relatively low dielectric constant when compared to the PZT thin films.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.381-381
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• 2010

$(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility inachieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFET channel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric films on p-Si (100) were grown by atomic layer deposition method, for which the conduction band offsets, valence band offsets and band gapswere obtained by using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The band gap, valence and conduction band offset values for $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric thin film, grown on Si substrate were about 5.34, 2.35 and 1.87 eV respectively. This band alignment was similar to that of $ZrO_2$. In addition, The dielectric function (k, $\omega$), index of refraction n and the extinction coefficient k for the $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films were obtained from a quantitative analysis of REELS data by comparison to detailed dielectric response model calculations using the QUEELS-$\varepsilon$(k, $\omega$)-REELS software package. These optical properties are similar with $ZrO_2$ dielectric thin films.

• 지질공학
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• 제28권4호
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• pp.715-726
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• 2018

제체의 누수를 탐지하는 방법으로서 물리탐사, 온도 계측, 광섬유 등 다양한 방법이 개발되어 왔다. 본 연구에서는 FDR 센서의 유전율상수를 이용한 누수 탐지의 가능성을 파악하기 위하여 취약부와 미취약부로 구성된 물리모형을 제작하였으며 유전율상수, 온도 및 간극수압 센서를 설치하였다. 누수가 형성됨에 따라 유전율상수는 미취약부보다 취약부에서 빠르게 변화되었다. 또한, 취약부에서 간극수압, 온도 및 유전율 상수를 비교하면 유전율 상수의 반응이 가장 빠르고 하류 계측 지점에서도 쉽게 인지되는 특성을 보였다. 이와 같은 특성을 고려할 때, 제체 하류 구간에서 분포형으로 유전율을 측정한다면 누수 탐지에 빠르고 효율적으로 대처할 수 있을 것으로 파악되었다.