• Title/Summary/Keyword: Dielectric response

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Electrical Conductivity, Dielectric Behavior and EMI Shielding Effectiveness of Polyaniline-Yttrium Oxide Composites

  • Faisal, Muhammad;Khasim, Syed
    • Bulletin of the Korean Chemical Society
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    • v.34 no.1
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    • pp.99-106
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    • 2013
  • Polyaniline-yttrium trioxide (PAni-$Y_2O_3$) composites were synthesized by the in-situ polymerization of aniline in the presence of $Y_2O_3$ The composite formation and structural changes in these composites were investigated by X-ray diffraction (XRD), Fourier transform infra red spectroscopy (FTIR), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The direct current (DC) electrical conductivity of the order of $0.51{\times}10^{-2}\;S\;cm^{-1}-0.283\;S\;cm^{-1}$ in the temperature range 300 K-473 K indicates semiconducting behavior of the composites. Room temperature AC conductivity and dielectric response of the composites were studied in the frequency range of 10 Hz to 1 MHz. The variation of AC conductivity with frequency obeyed the power law, which decreased with increasing weight percentage (wt %) of $Y_2O_3$. Studies on dielectric properties shows the relaxation contribution coupled by electrode polarization effect. The dielectric constant and dielectric loss in these composites depend on the content of $Y_2O_3$ with a percolation threshold at 20 wt % of $Y_2O_3$ in PAni. Electromagnetic interference shielding effectiveness (EMI SE) of the composites in the frequency range 100 Hz to 2 GHz was in the practically useful range of -12.2 dB to -17.2 dB. The observed electrical and shielding properties were attributed to the interaction of $Y_2O_3$ particles with the PAni molecular chains.

Cryogenic Insulation Technique for HTS Transformer (고온초전도 변압기용 극저온 절연기술)

  • Kim, Sang-Hyun;Cheon, Hyeon-Gweon
    • Progress in Superconductivity and Cryogenics
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    • v.8 no.1
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    • pp.45-48
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    • 2006
  • In the response to the demand for electrical energy , much effort was given to develop and commercialize high temperature superconducting (HTS) power equipments has been made around the world. Especially, HTS transformer is one of the most promising devices . but the cryogenic insulation technology should be established during development Hence many types of dielectric tests should be carried out to understand the dielectric phenomena at cryogenic temperature and to gather various dielectric data. Among the many types dielectric tests . the characteristic of barrier effect were conducted using simulated electrode after analysing the insulating configuration of HTS transformer main winding. The influence of a barrier on the dielectric strength was measured according to the position of the harriet the number of the barrier and thickness or the barrier. It was shown that the effectiveness . namely the ratio of the breakdown voltage in presence of barrier to the voltage without barrier, is highest when the barrier is placed at the needle electrode side. On the contrary, in the case of having the barrier between the electrodes, the harrier was placed between the electrodes the characteristic was even improved slightly.

Evaluation of Radio-Frequency Performance of Gate-All-Around Ge/GaAs Heterojunction Tunneling Field-Effect Transistor with Hetero-Gate-Dielectric by Mixed-Mode Simulation

  • Roh, Hee Bum;Seo, Jae Hwa;Yoon, Young Jun;Bae, Jin-Hyuk;Cho, Eou-Sik;Lee, Jung-Hee;Cho, Seongjae;Kang, In Man
    • Journal of Electrical Engineering and Technology
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    • v.9 no.6
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    • pp.2070-2078
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    • 2014
  • In this work, the frequency response of gate-all-around (GAA) Ge/GaAs heterojunction tunneling field-effect transistor (TFET) with hetero-gate-dielectric (HGD) and pnpn channel doping profile has been analysed by technology computer-aided design (TCAD) device-circuit mixed-mode simulations, with comparison studies among ppn, pnpn, and HGD pnpn TFET devices. By recursive tracing of voltage transfer curves (VTCs) of a common-source (CS) amplifier based on the HGD pnpn TFET, the operation point (Q-point) was obtained at $V_{DS}=1V$, where the maximum available output swing was acquired without waveform distortion. The slope of VTC of the amplifier was 9.21 V/V (19.4 dB), which mainly resulted from the ponderable direct-current (DC) characteristics of HGD pnpn TFET. Along with the DC performances, frequency response with a small-signal voltage of 10 mV has been closely investigated in terms of voltage gain ($A_v$), unit-gain frequency ($f_{unity}$), and cut-off frequency ($f_T$). The Ge/GaAs HGD pnpn TFET demonstrated $A_v=19.4dB$, $f_{unity}=10THz$, $f_T=0.487$ THz and $f_{max}=18THz$.

Dielectric Relaxation of Pb5Ge3-xTixQ11 Single Crystals (Pb5Ge3-xTixQ11 단결정의 유전완화현상)

  • Lee, Chan Ku;Kim, Douk Hoon
    • Journal of Korean Ophthalmic Optics Society
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    • v.2 no.1
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    • pp.9-16
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    • 1997
  • Ferroelectric $Pb_5Ge_{3-x}Ti_xO_{11}$(x=0, 0.015, 0.021, 0.03) single crystals were obtained from the melt by the Czochralski method. Grown crystals were pale brownish yellow and fully transparent. The dielectric relaxation of the $Pb_5Ge_{3-x}Ti_xO_{11}$ single crystals has been studied in the frequency range from 100 Hz to 10 MHz between $20^{\circ}C$ and $600^{\circ}C$. From the results of the these measurements. the temperature of the permittivity maximum was shifted to low temperature with increasing Ti content and the permittivity maximum decreased with increasing Ti content. The frequency dependent dielectric response of $Pb_5Ge_{3-x}Ti_xO_{11}$ single crystals exhibits a Debye type relaxation, with a distribution of relaxation times. Dielectric behavior is characteristic of carrier-dominated response.

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CO Gas Response Characteristic of ZnO-SnO$_2$Composite (ZnO-SnO$_2$복합체의 일산화탄소 가스감응 특성)

  • 김태원;최우성;정승우
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.04a
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    • pp.41-44
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    • 1997
  • Using the 2 probe mothods, AC coductivities, dielectric loss factors, capacitances, and impedances were investigated to study. The electrical and sensing properties for SnO$_2$ added ZnO. In air The electrical conductivity of SnO$_2$added ZnO decrease by increasing the content of SnO$_2$, and the relative dielectric constants for 0.05, 5, 7 SnO$_2$ added ZnO are 55, 20, 14, respectively. In 3000ppm CO Gas. relative dielectric constants for 3, 5mol% SnO$_2$ added ZnO are 163, 68, respectively.

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A design of V-shape RE Equalizer using dielectric resonator (유전체 공진기를 이용한 대역 평탄도 개선용 V-shape RF Equalizer의 설계)

  • 신재완;정중성;황희용;김윤조;류재수;정승환;윤상원
    • Proceedings of the Korea Electromagnetic Engineering Society Conference
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    • 2002.11a
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    • pp.132-135
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    • 2002
  • A RF amplitude equalizer is designed to improve in-band flatness of Rf filters and/or systems using two dielectric resonators and a 90$^{\circ}$ hybrid. The equalizer has good return loss characteristics and V shaped S$_{21}$ response in passband which is suitable to compensate the ripple degradation due to insufficient quality factors of used resonators or narrow band width of filters or systems. After being connected to the equalizer, a 5-pole BPF at 1957MHz, which has 10 MHz bandwidth and 6㏈ ripple, shows only 1.8㏈ in-band ripple and good in- and out- band matched responses within used hybrid bandwidth without additional matching networks.

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Electro-optic characteristic of homogeneously aligned LCD driven by an oblique field (경사 전기장 구동에 의한 수평배열 액정 디스플레이의 전기광학특성 연구)

  • Park, Sang-Hyun;Lee, Ji-Youn;Lee, Seung-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05a
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    • pp.104-108
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    • 2005
  • We have studied electrode-optic characteristics of IPS (in-plane switching) mode with electrode on top substrate. Because the IPS mode does not have electrode on top substrate. it shows not only slow response time due to weak electric field but also slow discharging problem when electrostatic field is generated after fabricating the cell. To solve these problems. we have formed additional electrode including dielectric layer in the inner part of the cell and studied electrode-optic characteristics of new IPS cell by changing thickness of dielectric layer.

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Pyroelectric Peyformance Evaluation of Pure PZT and Alternately Deposited PZT/PT Thin Films (PZT 순수박막과 PZT/PT 교차박막의 적외선 감지 특성 비교)

  • Ko, Jong-Soo;Kwak, Byung-Man
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.6
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    • pp.1001-1007
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    • 2002
  • To improve the performance of the PZT thin flms, each PZT and PT layer was alternately deposited on a Pt/Ti/Si$_3$N$_4$/SiO$_2$/Si substrate by a modified sol-gel solid precursor technique. For comparison, PZT thin films were also prepared with an identical method under the same conditions. XRD measurement revealed that the diffraction pattern of the multilayer film was due to the superimposition of the PZT and PT patterns. At 1㎑, a dielectric constant of 389 and 558, a dielectric loss of 1.2% and 1.1% were obtained for the PZT/PT and PZT thin films, respectively. If we consider the PT dielectric constant to be 260, it is clear that the dielectric constant of alternately deposited PZT/PT thin films was well adjusted. The PZT/PT thin film showed a low dielectric constant and a similar dielectric loss compared with those of the PZT film. The figures of merit on detectivity for the PZT/PT and PZT thin films were 20.3$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and 18.7$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and the figures of merit on voltage response were 0.038㎡/C and 0.028 ㎡/C, respectively. The high figures of merit for the PZT/PT film were ascribed to its relatively low dielectric constant when compared to the PZT thin films.

Band alignment and optical properties of $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ gate dielectrics thin films on p-Si (100)

  • Tahir, D.;Kim, K.R.;Son, L.S.;Choi, E.H.;Oh, S.K.;Kang, H.J.;Heo, S.;Chung, J.G.;Lee, J.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.381-381
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    • 2010
  • $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films as gate dielectrics have been proposed to overcome the problems of tunneling current and degradation mobility inachieving a thin equivalent oxide thickness. An extremely thin $SiO_2$ layer is used in order to separate the carrier in MOSFET channel from the dielectric field fluctuation caused by phonons in the dielectric which decreases the carrier mobility. The electronic and optical properties influenced the device performance to a great extent. $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric films on p-Si (100) were grown by atomic layer deposition method, for which the conduction band offsets, valence band offsets and band gapswere obtained by using X-ray photoelectron spectroscopy and reflection electron energy loss spectroscopy. The band gap, valence and conduction band offset values for $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ dielectric thin film, grown on Si substrate were about 5.34, 2.35 and 1.87 eV respectively. This band alignment was similar to that of $ZrO_2$. In addition, The dielectric function (k, $\omega$), index of refraction n and the extinction coefficient k for the $(ZrO_2)_{0.66}(HfO_2)_{0.34}$ thin films were obtained from a quantitative analysis of REELS data by comparison to detailed dielectric response model calculations using the QUEELS-$\varepsilon$(k, $\omega$)-REELS software package. These optical properties are similar with $ZrO_2$ dielectric thin films.

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Physical Model Experiment on the Seepage Characteristics through a Dam by using FDR Sensor (FDR 센서를 활용한 제체 누수특성의 실내 모형 실험 연구)

  • Kim, Gyoo-Bum;Im, Eunsang;Ryu, Ho-Cheol;Hwang, Chan-ik;Kim, Hyeong-Jong
    • The Journal of Engineering Geology
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    • v.28 no.4
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    • pp.715-726
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    • 2018
  • Various methods, such as geophysical exploration, temperature measurement, and fiber optics, have been developed for detecting the seepage at a dam. In this study, in order to investigate the possibility of leakage detection using dielectric constant of FDR sensor, a physical model consisting of weak and no-weak zones is fabricated and the sensors for dielectric constant, temperature and pore water pressure measurements are installed. As a leakage happens, the dielectric constant changes more rapidly through a weak zone than no-weak zone. In addition, comparing three factors (dielectric constant, temperature, and pore water pressure), the response of dielectric constant to seepage is fast and it is easily recognized even at the end measurement point. Considering these features, it is concluded that it could be possible to cope with the leakage detection quickly and efficiently if the dielectric constant is measured at the downstream slope of a dam.