• 한국세라믹학회지
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• 제38권10호
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• pp.953-957
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• 2001

완화형 강유전체인 $Pb(Mg_{1/3}Nb_{2/3})O_3$계의 상전이 주파수의존성을 조사하기 위해 낮은 전계와 높은 전계 하에서 측정된 물성들을 1 Hz부터 100 kHz에 이르는 주파수 범위에서 비교 분석하였다. $-40{\sim}90^{\circ}C$의 상전이 온도범위에 걸쳐 1 V/mm의 낮은 전계에서 측정된 유전특성의 온도의존성을 구하였고, 수 kV/mm의 강전계 하에서 측정된 유전이력곡선의 기울기로부터 계산된 유전상수의 온도의존성 및 초전전류의 온도의존성을 검토하였다. 모든 실험적 결과와 Vogel-Fulcher 관계식은 비교적 잘 일치되었다. 본 연구를 통하여 유전완화현상은 약전계 조건 뿐 아니라 강전계 조건 하에서도 동일한 거동을 보이는 것을 확인할 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.93-96
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• 2002

In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

• 대한전자공학회논문지SD
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• 제38권11호
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• pp.765-770
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• 2001

고온 급속 열처리시킨 LiNbO₃/AIN/Si(100) 구조를 이용하여 MFIS 소자를 제작하고, 비휘발성 메모리 동작 가능성을 확인하였다. 고유전율 AIN 박막 위에 Pt 전극을 증착시켜 제작한 MIS 구조에서 측정한 1MHz C-V 특성곡선에서는 히스테리시스가 전혀 없고 양호한 계면특성을 보였으며, 축적 영역으로부터 산출한 비유전율 값은 약 8 이었다. Pt/LiNbO₃/AIN/Si(100) 구조에서 측정한 1MHz C-V 특성의 축적영역에서 산출한 LiNbO₃ 박막의 비유전율 값은 약 23 이었으며, ±5 V의 바이어스 범위 내에서의 메모리 윈도우는 약 1.2 V이었다. 이 MFIS 구조에서의 게이트 누설전류밀도는 ±500 kV/cm의 전계 범위 내에서 10/sup -9/ A/㎠ 범위를 유지하였다. 500 kHz의 바이폴러 펄스를 인가하면서 측정한 피로특성은 10/sup 11/ cycle 까지 초기값을 거의 유지하는 우수한 특성을 보였다.

• 한국세라믹학회지
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• 제24권6호
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• pp.586-592
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• 1987

The role of the strain energy and phase stability in the diffuse phase transition have been investigated in the highly disordered solid solution, (Pb1-xBax)(Zr0.4Ti0.6)O3 (0.2 x 0.4). X-ray diffraction analysis indicates that tetragonality (c/a) decreases with the increasing Ba content. Also as the Ba content increases, phase transition becomes more diffuse and at the same time dielectric relaxation as a function of measured frequencies in the 1KHz-10MHz range occurs very pronouncedly. In the Ba content range, 0.2 x 0.35, hysteresis loops are routinely observed and the loop is observed to narrow shape as the Ba content increases but becomes very slim at 40mol% Ba content. Moreover thermal analysis shows that there is no abrupt change in the thermal expansion coefficient below the apparent transition temperature at which dielectric constant becomes maximum. From the above results, it has been concluded that creation of the strain energy due to the distorthion that occurred during the phase transition suppresses diffuse phase transition.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 추계학술대회 논문집 학회본부
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• pp.196-198
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• 1994

The dielectric and electrical properties of $Pb(Mg_{1/3}Nb_{2\3})O_3-PbTiO_3-BaTiO_3$ have been investigated. Perovskite crystalline phase of the specimens are confirmed by XRD at $1270^{\circ}C$. The curie temperature is around $40^{\circ}C$ with the amount of $BaTiO_3$ and $PbTiO_3$. Every specimens shows the slim loop hysteresis curves which is electrostrictive characteristic. The strain vs. applied voltage characteristics exhibits nonlinear relationship, and the specimen of 0.85PMN-0.125PT-0.025BT shows the largest strain.

• 전자공학회논문지A
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• 제32A권12호
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• pp.101-107
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• 1995

To improve the leakage current, we developed two step sputtering method where PZT thin film in first deposited at room temperature followed by 600.deg. C deposition. The method used an amorphous PZT layer deposited at room temperature to keep a stable interface during sputtering at high temperature. PZT thin films were deposited on Pt/Ti/SiO$_{2}$/Si substrate at room temperature and 600.deg. C sequentially. The effect of the layer deposited at room temperature was investigated with regard to I-V characteristics and P-E hysteresis loop. In the case of the sample with the layer deposited at room temperature, both leakage current and dielectric constant were decreased. The thicker the layer deposited at room temperature was, the lower dielectric constant was. However, leakage current was indepenent of the variation of the thickness ratio. The sample with 200$\AA$ of the layer deposited at room temperature showed the most promising results in both dielectric constant and leakage current.

• 한국전기전자재료학회논문지
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• 제17권11호
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• pp.1178-1185
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• 2004

In the atmosphere of $N_2$ gas, BaZ $r_{0.08}$ $Ti_{0.92}$ $O_3$ polycrystal was grown by floating zone technique using BaZ $r_{0.08}$ $Ti_{0.92}$ $O_3$ ceramics as a feed and SrTi $O_3$(1l0) single cystal as a seed. The dielectric constant and loss at 10 kHz, 100 kHz, and 1 MHz for the as-grown sample were measured as a function of temperature in the temperature range between -10$0^{\circ}C$ and 150 $^{\circ}C$ to find a dielectric peak with frequency dispersion at Curie point. The hysteresis loop showed that the grown sample had very small polarization which was 0-0.01 $\mu$C/$\textrm{cm}^2$ for the applied dc-electric fields from -7 kV/cm to +7 kV/cm. However, the normal hysteresis loop was appeared after oxygen annealing. The electric-field dependence of the dielectric constant for both the as-grown and the post-annealed samples was studied by measuring the dielectric constants as a function of the biased-electric fields and their tunability was figured out from it at room temperature(27 $^{\circ}C$) and cryotemperature( -73$^{\circ}C$). Tunability for the as-grown sample was 51 % and the figure of merit 20.4 at 10kHz with the biased electric-field of 12 kV/cm. The tunability for the grown sample may be increased up to 80 % if the electric field of 25 kV/cm is applied. Tunability for the post-annealed sample was 41 % and the figure of merit 10.3 at 10 kHz with the biased electric-field of 12 kV /cm. Post-annealing improved the crystallinity of the as-grown sample but decreased its tunability.ability.

• 전자공학회논문지A
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• 제33A권2호
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• pp.87-95
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• 1996

We have studied the effects of La concentration on the optical and electrical properties of lead lanthanum titanate (PLT) thin films by using sol-gel method. Both the optical and electrical properties are greatly affected by the La concentration. The refreactiv eindices of the films varied from 2.23 to 1.93 with varying La concentration in the range from 15 to 33 mol%. The dielectric constants of the films vary form 340 to 870 with varying La concentration in the range form 15 to 33 mol%. Hysteresis loop becomes slimmer with the increase of La concentration form 15 to 28mol% and little fatter again with the increase of La concentration form 28 to 33 mol%. Among the films investigated in this research, PLT(28) thin film shows the best dielectric properties for the application to the dielectrics of ULSI DRAM's. At the frequency of 100Hz, the dielectric constant and the loss tangent of PLT(28) thin films are 940 and 0.08 respectively. Its leakage current density at 1.5${\times}10^{5}$V/cm is 1${\times}10^{-6}A/cm^{2}$. The comparision between the simulated and the experimental curves for the switching transient characteristics shows that PLT (28) thin films behaves like normal dielectrics.

• 한국전기전자재료학회논문지
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• 제13권1호
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• pp.60-65
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• 2000

The structural and electrical characteristics of PLZT thin films fabricated onto Pt/Ti/SiO\ulcorner/Si substrates by a pulsed laser deposition were investigated to develop the high dielectric thin films were fabricated with different energy density by pulsed laser deposition. This PLZT thin films of 5000 thickness were crystallized at 600 $^{\circ}C$, 200 mTorr O\ulcorner pressure for 2 J/$\textrm{cm}^2$ laser energy density, the arain structure was transformed from planar to columnar grain. It was clearly noted from the SEM observations that oxygen pressured laser powers affect microstructures of the PLZT thin films. 14/50/50 PLZT this film showed a maximum dielectric constant value of $\varepsilon$\ulcorner=1289.9. P-E hysteresis loop of 14/50/50 PLZT thin film was flim ferro-electric. Leakage current density of 14/50/50 PLZT thin film was 10\ulcorner A/$\textrm{cm}^2$.

• 한국전기전자재료학회논문지
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• 제11권10호
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• pp.866-870
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• 1998

PLZT thin films were fabricated with different Zr/Ti ratios by pulsed laser deposition. PLZT films deposited on Pt/Ti/SiO$_2$/Si substrate. This PLZT thin films of 5000$\AA$ thickness were crystallized at $600^{\circ}C$, $O_2$ pressure 200m Torr. 2/55/45 PLZT thin film showed a maximum dielectric constant value of $\varepsilon$\ulcorner=1550 and dielectric loss was 0.03 at 10kHz. At 2/70/30 PLZT thin film, coercive field and remnant polarization was respectively 19[kV/cm], 8[$\mu$C/$\textrm{cm}^2$]. Raman spectroscopy results showed that the bands of spectra became broader as the amount of Zr mol% increased and two crystal phase coexisted at 2/55/45 PLZT film. Raman spectroscopy was useful for crystal structure analysis of PLZT thin films.