• 한국진공학회지
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• 제19권5호
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• pp.347-352
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• 2010

SiOC 박막의 유전상수를 서로 다른 2가지 방법을 사용하여 계산하고 그 차이점에 대하여 비교분석하였다. SiOC 박막의 유전장수는 전형적인 유전상수 측정법으로써 MIS 구조를 이용하여 C-V 측정법에 의하여 얻을 수 있으며, 또한 엘립소미터를 이용한 굴절률로부터 $n^2$을 구하는 방법이 있다. SiOC 박막의 유전상수는 쌍극자, 이온, 전자의 성분으로 이루어지며, 댁개 쌍극자 성분은 무시된다. 박막을 증착하는 동안 플라즈마에 의한 프리커서의 해리로부터 이온결합이 생성되면서 증착된다. 증착한 박막의 유전상수는 주로 이온결합 효과가 주를 이루었다. 열처리를 하면서 OH 수산기의 기화에 의해 유전상수는 감소되는데 이때 이온의 효과도 더불어 감소하게 된다. 상대적으로 무시되었던 전자에 의한 분극의 효과가 나타나면서 유전상수는 더욱 감소하였다. 하지만 물리 화학적 그리고 전기적으로 안정된 SiOC 박막은 이온과 전자에 의한 분극의 효과가 없어지는 무 분극성의 박막으로서 유전상수는 열처리한 박막에서 2.0 정도인 것으로 측정되었다.

• 한국지하수토양환경학회지:지하수토양환경
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• 제9권3호
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• pp.1-11
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• 2004

매립지 침출수로 오염된 지반의 오염도 조사에 유전상수 측정기법의 적용성을 평가하기 위하여 매립지 침출수로 오염된 간극수를 포함한 사질토 지반의 유전특성을 분석하였다. 본 연구에서는 75kHz-12MHz 범위의 주파수에서 유전 상수를 실수부와 허수부로 구분하여 분석을 수행하였다. 유전상수 실수부는 공간전하분극과 배향분극의 발현정도에 영향을 받기 때문에 침출수 농도가 증가함에 따라 저주파 영역에서는 유전상수의 실수부 값이 증가하는 경향을 나타내었으나, 고주파 영역에서는 감소하는 경향을 나타내었다. 유전상수 허수부의 경우에는 측정 주파수에 관계없이 침출수의 농도가 증가함에 따라 전류전도에 의한 에너지 손실량이 증대되어 유전상수 허수부가 증가하는 경향을 나타내었다. 유전상수의 실수부와 허수부가 간극수 내 침출수 농도에 따라 변하는 것에 기초하여 유전상수 측정기법이 침출수로 오염된 지반의 오염도 평가에 효과적으로 적용될 수 있음을 확인하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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• pp.494-496
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• 2000

The properties of piezoelectric and dielectric for 0.05Pb$(Mn_{0.4}W_{0.2}Nb_{0.4})O_3$ - $0.95PbZr_{x}Ti_{1-x}O_{3}$ compositions have been investigated. In the composition of 0.05Pb$(Mn_{0.4}W_{0.2}Nb_{0.4})O_3$-$0.95PbZr_{0.51}Ti_{0.49}O_{3}$, the values of $k_p$ and ${\varepsilon_{33}}^T/{\varepsilon}_0$ are maximized, but $Q_m$ was minimized ($k_p$=56.5[%], $Q_m$=1130, $d_{33}$=258[pC/N], ${\varepsilon_{33}}^T/{\varepsilon}_0$=1170). The grain size was suppressed and the uniformity of gram was improved at the $1100[^{\circ}C]$. Dielectric constant increase at the Ti rich, but decrease at the Zr rich after poling. Because the dielectric constant after poling is determined by compromising effects between dipole switching and electostriction inducing stress(dielectric constant increasing factor) and dipole rotation to the poling direction (dielectric constant decreasing factor).

• Applied Science and Convergence Technology
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• 제24권6호
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• pp.224-227
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• 2015

Ferroelectric $Pb_2(Sc,Nb)O_6$ were prepared under two different sintering conditions using the oxide mixing method and the electrical properties were measured. The sintering conditions were $1350^{\circ}C$ for 25 minutes and $1400^{\circ}C$ for 20 minutes. EDX spectroscopy and XRD were used to determine the crystalline characteristic of the $Pb_2(Sc,Nb)O_6$ compositions Pyrochlore phase showed about 2% in all $Pb_2(Sc,Nb)O_6$ specimens. It expands the growth of crystals in samples sintered at $1400^{\circ}C$ than $1350^{\circ}C$, but all samples were the optimal crystallization. The temperature and frequency dependence of the complex dielectric constant and admittance were measured to analyze the electrical properties. The high dielectric constant of the specimens reflects the good stoichiometry and crystallization. The maximum value of the dielectric constant in the two specimens treated with sintering at $1350^{\circ}C$ and $1400^{\circ}C$ were more than 27,000, and the dielectric loss at room temperature is smaller than 0.05. The maximum dielectric constant decreased with increasing frequency, the transition temperature also increased in $Pb_2(Sc,Nb)O_6$ compositions. The admittance and susceptance values reach a peak at all temperatures, and the magnitude of the peak increases with increasing measuring temperature. Strong frequency dependent of maximum admittance, susceptance, dielectric constant and dielectric loss were observed.

• The Korean Journal of Ceramics
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• 제4권4호
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• pp.394-398
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• 1998

$Pb_{1-x}Sr_x(Mg-{1}2}W_{1}2})O_3$$ ceramics for application in the microwave frequency range were investigated by dielectric constant and X-ray diffraction measurements. The dielectric constant curves showed two concentration dependent characteristics in the $$Pb(Mg-{1}2}W_{1}2})O_3$-rich$ region. As the Sr constant further increases to x=0.3 the dielectric curve levels off. In the concentration range between x=0.4 and x=1 in which dielectric constant dependence on temperature is negligible, it decreases and Qf value increases in the microwave frequency with increasing Sr. The temperature coefficient (${\tau}_{\varepsilon} $) of the dielectric constant changes from the negative to positive value between x=0.9 and x=1. The dielectric constant, Qf and $\tau\varepsilon$ are correlated with tolerance factor(t). From the X-ray diffraction results for $0.1{\le}x{\le}1$ the cell parameter is found to decrease as x increases and B-site ordering is observed in all the composition ranges.

• Journal of information and communication convergence engineering
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• 제9권2호
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• pp.217-219
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• 2011

As silicon devices shrink and their density increases, the low dielectric constant materials instead of $SiO_2$ film is required. SiOC film as low-k films was deposited by the capacitively coupled plasma chemical vapor deposition and then annealed at $300{\sim}500^{\circ}C$ to find out the properties of the dependence on the temperature and polarity. This study researched the dielectric constant using by the structure of the metal/SiOC film/p-Si, chemical shift, thickness, refractive index and hardness. The trend of reflective index was inverse proportioned the thickness, but the dielectric constant was proportioned it. The dielectric constant decreased with decreasing the thickness and the increment of the refractive index.

• Journal of Microbiology and Biotechnology
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• 제15권3호
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• pp.587-594
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• 2005

The contribution of electrostriction of water molecules to the stabilization of the negatively charged tetrahedral transition state of a lipase-catalyzed reaction was examined by means of kinetic studies involving high-pressure and solvent dielectric constant. A good correlation was observed between the increased catalytic efficiency of lipase and the decreased solvent dielectric constant. When the dielectric constant of solvents was lowered by 5.00 units, the losses of activation energy and free energy of activation were 7.92 kJ/mol and 11.24 kJ/mol, respectively. The activation volume for $k_{cat}$ decreased significantly as the dielectric constant of solvent decreased, indicating that the degree of electrostriction of water molecules around the charged tetrahedral transition state has been enhanced. These observations demonstrate that the increase in the catalytic efficiency of the lipase reaction with decreasing dielectric constant resulted from the stabilization of electrostatic energy for the formation of an oxyanion hole, and that this stabilization was caused by the increase of electrostricted water around the charged tetrahedral transition state. Therefore, we conclude that the control of solvent dielectric constant can stabilize the tetrahedral transition state, thus lowering the activation energy.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.725-727
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• 2009

Lowering the dielectric constant is one of the important issues for the efficiency and the power consumption in the plasma display panel (PDP) industry. This study examined the effect of the addition of ceramic filler (up to 10% of crystalline and amorphous silica, respectively) to a $B_2O_3$-ZnO- $P_2O_5$ glass matrix on the dielectric, coefficient of thermal expansion, etching behaviors and residual stress for the barrier ribs in plasma display panels. The dielectric constant of barrier ribs is affected by containing two types of $SiO_2$ filler for the barrier rib composition in PDP.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.159-159
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• 2007

In order to reduce a signal delay in ULSI, low resistive metal and intermetal dielectric material of low dielectric constant are required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. In this study, ordered mesoporous silica films was synthesized using TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-$76^{(R)}$ surfactant. These films had the porosity of 40% and dielectric constant of 2.5. To lower dielectric constant, the ordered mesoporous silica films were surface-modified by HMDS (hexamethyldisilazane) treatment. HMDS substituted -OH groups on the surface of silica wall for -Si$(CH_3)_3$ groups. After the HMDS treatment, ordered mesoporous silica films were calcined at various calcination temperatures. Through the investigation, it was concluded that the proper calcination temperature is necessary as aspects of structural, electrical, and mechanical properties.

• 한국지구물리탐사학회:학술대회논문집
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• 한국지구물리탐사학회 2007년도 공동학술대회 논문집
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• pp.135-138
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• 2007

A novel technique to estimate the dielectric constant of ground material by means of air launching GPR is proposed. The technique is an application of SAR algorithm. A laboratory experiment was conducted to examine the technique.