• Title/Summary/Keyword: Diaphragm Type Pressure Sensor

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Microstructure and properties of 316L stainless steel foils for pressure sensor of pressurized water reactor

  • He, Qubo;Pan, Fusheng;Wang, Dongzhe;Liu, Haiding;Guo, Fei;Wang, Zhongwei;Ma, Yanlong
    • Nuclear Engineering and Technology
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    • v.53 no.1
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    • pp.172-177
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    • 2021
  • The microstructure and texture of three 316L foils of 25 ㎛ thickness, which were subjected to different manufacturing process, were systematically characterized using advance analytical techniques. Then, the electrochemical property of the 316L foils in simulated pressurized water reactor (PWR) solution was analyzed using potentiodynamic polarization. The results showed that final rolling strain and annealing temperature had evident effect on grain size, fraction of recrystallization, grain boundary type and texture distribution. It was suggested that large final rolling strain could transfer Brass texture to Copper texture; low annealing temperature could limit the formation of preferable orientations in the rolling process to reduce anisotropy. Potentiodynamic polarization test showed that all samples exhibited good corrosion performance in the simulated primary PWR solution.

The Fabrication of Chromium Nitride Thin-Film Type Pressure Sensors for High Pressure Application and Its Characteristics (고압용 코롬질화박막형 압력센서의 제작과 그 특성)

  • 정귀상;최성규;서정환;류지구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.6
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    • pp.470-474
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    • 2001
  • This paper describes the fabrication and characteristics of CrN thin-film type pressure sensors, in which the sensing elements were deposited on SuS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500$\AA$ and annealing condition(300$\^{C}$, 3 hr) in Ar-10%N$_2$ deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, ρ=1147.65 $\mu$Ωcm, a low temperature coefficient of resistance, TCR=186ppm/$\^{C}$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20nA and the maximum non-linearity is 0.4%FS and hysteresis is less than 0.2%FS.

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Characteristics of thin-film type pressure sensors for high pressure (고압용 박막형 압력센서의 특성)

  • 서정환;최성규;정찬익;류지구;남효덕;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.737-740
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    • 2001
  • This paper describes the fabrication and characteristics of CrN thin-film type pessure sensors, which the sensing elements were deposited on SUS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500${\AA}$ and annealing condition(300$^{\circ}C$, 3 hr) in Ar-10 %N$_2$deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, $\rho$=1147.65 ${\mu}$$\Omega$cm, a low temperature coefficient of resistance, TCR=-186 ppm/$^{\circ}C$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20 mA and the maximum non-linearity is 0.4 %FS and hysteresis is less than 0.2 %FS.

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Low vacuum characteristics of the capacitance diaphragm gauges and the resonance silicon gauges (용량형 격막식 게이지와 공진형 실리콘 게이지의 저진공 특성)

  • ;;;I. Arakawa
    • Journal of the Korean Vacuum Society
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    • v.12 no.3
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    • pp.151-156
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    • 2003
  • Two capacitance diaphragm gauges(CDG) and two resonance silicon gauges(RSG) were calibrated using an ultrasonic interferometer as a national low vacuum standard in KRISS. The CDG has superior pressure resolution and is rugged as well as resistant to over-pressure because of all-metal inner components. Meanwhile, the RSG is a new type of MEMS sensor that has excellent calibration stability and is resistant to mechanical shocks. The calibration uncertainties were analyzed according to the ISO procedures. Results showed that the maximum difference of the expanded uncertainties was $9\times10^{-3}$Pa at the generated pressure of 100 Pa for the two different types. It is remarkable that the RSG can be used as a transfer standard at low vacuum since their accuracies were found to be within 0.5 %.

Study of Output Characteristics of Pressure T/D using Piezo Capacitor Type (Piezo-Capacitor방식 입력 Transducer와 출력특성 고찰)

  • Lee, Seong-Jae;Yoo, Byung-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.245-246
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    • 2009
  • 정전용량형 후막 스트레인 게이지(piezocapacitive thick film strain gage)는 세라믹 ($Al_2O_3$)을 주 원료로 하는 지지대(약 5mm)와 다이어프램(약 $300{\mu}m$) 그리고 가드 링으로 구성된다. 전극 판은 도전성 페이스트를 이용하여 지지대와 다이어프램에 형성되었으며 극판 사이에는 유전체 메이스트를 사용하여 스크린 인쇄로 후막을 형성하였다. 극판 사이의 가드 링 두께는 약 $30{\mu}m$정도로 다이어프램의 변위 최대값을 유지시키는 데 필요한 간격이다. 따라서 정전용랑형 후막 스트레인 게이지는 지지대를 중심으로 다이어프램에 압력 (0.5~1.0bar)이 인가될 때 변위를 발생시키면서 커패시터 값이 압력의 크기에 따라 비례 특성을 가지고 변화하는 것을 이용한 것이다. 압력이 없을때 초기값은 35pF~40pF 정도이고 정격압력의 최대치를 인가시켰을 때 약 55pF~55p를 나타내었다.

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Optimization on the fabrication process of Si pressure sensors utilizing piezoresistive effect (압저항 효과를 이용한 실리콘 압력센서 제작공정의 최적화)

  • Yun Eui-Jung;Kim Jwayeon;Lee Seok-Tae
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.1
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    • pp.19-24
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    • 2005
  • In this paper, the fabrication process of Si pressure sensors utilizing piezoresistive effect was optimized. The efficiency(yield) of the fabrication process for Si piezoresistive pressure sensors was improved by conducting Si anisotrophic etching process after processes of piezoresistors and AI circuit patterns. The position and process parameters for piezoresistors were determined by ANSYS and SUPREM simulators, respectively. The measured thickness of p-type Si piezoresistors from the boron depth-profile measurement was in good agreement with the simulated one from SUPREM simulation. The Si anisotrohic etching process for diaphragm was optimized by adding ammonium persulfate(AP) to tetramethyl ammonium hydroxide (TMAH) solution.

Fabrication and characteristic of metal insertedteflon diaphragm piezoeletric device module using quartz crystal oscillator (수정진동자를 이용한 메탈 삽입 테프론 다이어프램 압전소자모듈의제조 및 특성)

  • Kim, Kyung-Min;Park, Sung-Hyun;Kim, Sung-Woo;Son, Won-Geon;Shin, Byoung-Chul
    • Journal of Sensor Science and Technology
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    • v.19 no.2
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    • pp.149-154
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    • 2010
  • Top of the alumina body which is made according to plan has been printed using a screen printer equipment in order to print an electrode pattern. The electrode is connected with the quartz crystal oscillator of the piezoelectricity method which has a piezoelectric characteristic. The pressure contact department has been experimented using three type of the teflon. The teflon is good for pressure delivery vector but it is bad restitution. So we devised the structure which inserts the metal in the teflon. Bottom of the module is connected with the signal processing department which is planned in advance and then has investigated to characteristic. Therefore we have got the best output-voltage and frequency characteristic follows in the pressure.

Pressure Regulation System for Optimal Operation of the Pneumatic VAD with Bellows-Type Closed Pneumatic Circuit (벨로우즈 방식의 폐회로를 가진 공압식 심실 보조장치의 최적 작동을 위한 압력 조절 시스템)

  • Kim, Bum-Soo;Lee, Jung-Joo;Nam, Kyung-Won;Jeong, Gi-Seok;Ahn, Chi-Bum;Sun, Kyung
    • Journal of Biomedical Engineering Research
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    • v.28 no.4
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    • pp.569-576
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    • 2007
  • Ventricular Assist Device(VAD) has switched its goal from a short-tenn use for bridge-to-transplantation to a long-tenn use for destination therapy, With this goal, the importance of long-tenn reliability gets more interests and importances, H-VAD is an portable extracorporeal biventricular assist device, and adopts an electro-pneumatic driving mechanism. The pneumatic pressure to pump out blood is generated with compression of bellows, and is transmitted in a closed pneumatic circuit through a pneumatic line. The existing pneumatic VAD adopts a air compressor which can generate stable pressures but has defects such as a noise and a size problem. Thus, it is not suitable for being used as a portable device, These problems are covered with adopting a closed pneumatic circuit mechanism with a bellows which has a small size and small noise generation, but it has defects that improper pneumatic setting causes a failure of adequate flow generation. In this study, the pneumatic pressure regulation system is developed to cover these defects of a bellows-type pneumatic VAD. The optimal pneumatic pressure conditions according to various afterload conditions for an optimal flow rate were investigated and the afterload estimation algorithm was developed, The final pneumatic regulation system estimates a current afterload and regulate the pneumatic pressure to the optimal point at a given afterload condition. The afterload estimation algorithm showed a sufficient performance that the standard deviation of error is 8.8 mmHg, The pneumatic pressure regulation system showed a sufficient performance that the flow rate was stably governed to various afterload conditions. In a further study, if a additional sensor such as ultrasonic sensor is developed to monitor the direct movement of diaphragm in a blood pump part, the reliability would be greatly increased. Moreover, if the afterload estimation algorithm gets more accuracy, it would be also helpful to monitor the hemodynamic condition of patients.

Analysis of Frequency Response Characteristics in Optical Microphone (광 마이크로폰의 주파수 응답특성 분석)

  • Yeom, Keong-Tae;Kim, Kwan-Kyu;Heh, Do-Geun;Kim, Yong-Kab
    • The Journal of the Korea Contents Association
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    • v.8 no.6
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    • pp.8-15
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    • 2008
  • In this paper, in order to analyze property of frequency response in optical microphone, system was implemented. The capacitance microphone and fiber-optic transmission path type fiber-optic microphone (FOM) have weaknesses in directivity, size, weight, and price. However suggested optical microphone can be constituted by cheap devices, so it has many benefits like small size, light weight, high directivity, etc. Head part of optical microphone which is suggested in this paper is movable back and forth by sound pressure with the attached reflection plate. Operating point is determined by measuring the respond characteristics and choosing the point on which has maximum linearity and sensitivity while changing the distance between optical head and vibrating plate. We measured the output of the O/E transformed signal of the optical microphone while frequency of sound signal is changed using sound measurement/analysis program, Smaart Live and USBPre, which are based on PC, and compared the result from an existing capacitance microphone. The measured Optical microphone showed almost similar output characteristics as those of the compared condenser microphone, and its bandwidth performance was about 300[Hz]-3[kHz] at up to 3 [dB].