• The Korean Journal of Nuclear Medicine
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• v.34 no.1
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• pp.62-73
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• 2000

Purpose: Esophageal cancer patients have a difficulty in the intake of meals through the blocked esophageal lumen, which is caused by an ingrowth of cancer cells and largely influences on the prognosis. It is reported that esophageal cancer has a very low survival rate due to the lack of nourishment and immunity as the result of this. In this study a new radioactive stent, which prevents tumor ingrowth and restenosis by additional radiation treatment, has been developed. Materials and Methods: Using ${\ulcorner}HANARO{\lrcorner}$ research reactor, the radioactive stent assembly ($^{166}Ho$-SA) was prepared by covering the metallic stent with a radioactive sleeve by means of a post-irradiation and pre-irradiation methods. Results: Scanning electron microscopy and autoradiography exhibited that the distribution of $^{165/166}Ho\;(NO_3)$ compounds in polyurethane matrix was homogeneous. A geometrical model of the esophagus considering its structural properties, was developed for the computer simulation of energy deposition to the esophageal wall. The dose distributions of $^{166}Ho$-stent were calculated by means of the EGS4 code system. The sources are considered to be distributed uniformly on the surface in the form of a cylinder with a diameter of 20 mm and length of 40 mm. As an animal experiment, when radioactive stent developed in this study was inserted into the esophagus of a Mongrel dog, tissue destruction and widening of the esophageal lumen were observed. Conclusion: We have developed a new radioactive stent comprising of a radioactive tubular sleeve covering the metallic stent, which emits homogeneous radiation. If it is inserted into the blocked or narrowed lumen, it can lead to local destruction of the tumor due to irradiation effect with dilatation resulting from self-expansion of the metallic property. Accordingly, it is expected that restenosis esophageal lumen by the continuous ingrowth and infiltration of cancer after insertion of our radioactive stent will be decreased remarkably.

• Journal of the Korean earth science society
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• v.21 no.5
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• pp.563-582
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• 2000

Two Cretaceous(80-90 Ma) non-marine sedimentary basins, Namyang and Tando Basins, are distributed in the Namyang area, Hwaseonggun and in the Tando area, Ansanshi, Kyungki Province, Korea. The Namyang and Tando Basins are composed of 10 facies, which are pooped into 5 facies associations(FA). FA I consists of massive conglomerate facies, normally graded conglomerate facies and reversely graded conglomerate facies, which is interpreted to have been formed by laminated sandstone facies, massive conglomerate facies(channelized), which is thought to have been formed by sheet flow, stream flow and suspension sedimentation in an alluvial/braided plain environment. FA III consists of massive mudstone(pebbly) facies, laminated mudstone facies, massive sandstone facies and is interbedded by channel-fill conglomerate. It is interpreted to have been deposited by suspension settling during flooding and channel-fill deposition in a floodplain environment. FA IV consists of massive conglomerate facies, normally graded conglomerate facies, massive sandstone facies, normally graded sandstone facies, and laminated sandstone facies and is interbedded with mudstone facies. It is thought to have been deposited by debris flow and turbidity current in a fan-delta environment. FA V consists of massive mudstone facies, laminated mudstone facies, laminated sandstone facies and is interbedded by massive conglomerate bed. It is thought to have been formed by suspension sedimentation and low-density turbidity current in a lake. In the Namyang Basin FA I is distributed in the eastern and southern margin of the basin, FA II in the middle part of the basin as north-south tending band. and FA III in the western part. In the Tando Basin FA II is distributed in the middle part of eastern margin and in the northwestern margin, FA IV in the southwestern part, and FA V in the central part. Correlation of the facies associations shows that FA I and II in the Namyang Basin are distributed in the lower to middle part of stratigraphic sequence and FA III in the upper part of the sequence whereas FA II and IV in the Tando Basin are in the lower to middle part and FA V in the upper part of the sequence. These patterns of facies associations distribution suggest that the Namyang Basin was developed as an alluvial fan and alluvial/braided plain at first and then evolved into a floodplain whereas the Tando Basin was developed as a fan-delta and alluvial/braided plain at first and then evolved into a lake environment.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.46 no.7
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• pp.7-14
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• 2009

In this paper, the effects of annealing conditions on the structural ((002) intensity, FWHM, d-spacing, grain size, (002) peak position), optical (UV peak, UV peak position) and electrical properties (carrier concentrations, resistivity, mobility) of ZnO films were investigated. ZnO films were deposited onto SiO$_2$/si substrates by RF magnetron sputtering from a ZnO target. The substrate was not heated during deposition. ZnO films were annealed in temperature ranges of $500\sim650^{\circ}C$ in the O$_2$ flow for 5$\sim$20 min. The film average thicknesses were in the range of 291 nm. The surface morphologies and structures of the samples were characterize by SEM and XRD, respectively. The optical properties were evaluated by photoluminescence (PL) measurement at room temperature (RT) using a He-Cd 325 nm laser. As the annealing temperature and time vary, the following relations were also observed: (1) proportional relationships among UV intensity (002) intensity, and grain size exist, (2) UV intensity is inversely proportional to FWHM, (3) there is no special relationship between UV intensity and electron carrier concentrations, (4) d-spacing is inversely proportional to (002) peak position, (5) UV peak position in the range of 3.20$\sim$3.24 eV means that ZnO films have a n-type conductivity which was consistent with that obtained from the electrical property, (6) the optimal conditions for the best optical and structural characteristics were found to be oxygen fraction, (O$_2$/(O$_2$+Ar)) of 0.2, RF power of 240W, substrate temperature of RT, annealing condition of 600$^{\circ}C$ for 20 min, and sputtering pressure of 20 mTorr.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.13 no.7
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• pp.667-678
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• 2002

In this paper, a new radiating structure with a multi-layered two-dimensional metallic disk array was proposed for shaping the flat-topped element pattern. It is an infinite periodic planar array structure with metallic disks finitely stacked above the radiating circular waveguide apertures. The theoretical analysis was in detail performed using rigid full-wave analysis, and was based on modal representations for the fields in the partial regions of the array structure and for the currents on the metallic disks. The final system of linear algebraic equations was derived using the orthogonal property of vector wave functions, mode-matching method, boundary conditions and Galerkin's method, and also their unknown modal coefficients needed for calculation of the array characteristics were determined by Gauss elimination method. The application of the algorithm was demonstrated in an array design for shaping the flat-topped element patterns of $\pm$20$^{\circ}$ beam width in Ka-band. The optimal design parameters normalized by a wavelength for general applications are presented, which are obtained through optimization process on the basis of simulation and design experience. A Ka-band experimental breadboard with symmetric nineteen elements was fabricated to compare simulation results with experimental results. The metallic disks array structure stacked above the radiating circular waveguide apertures was realized using ion-beam deposition method on thin polymer films. It was shown that the calculated and measured element patterns of the breadboard were in very close agreement within the beam scanning range. The result analysis for side lobe and grating lobe was done, and also a blindness phenomenon was discussed, which may cause by multi-layered metallic disk structure at the broadside. Input VSWR of the breadboard was less than 1.14, and its gains measured at 29.0 GHz. 29.5 GHz and 30 GHz were 10.2 dB, 10.0 dB and 10.7 dB, respectively. The experimental and simulation results showed that the proposed multi-layered metallic disk array structure could shape the efficient flat-topped element pattern.

• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.528-537
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• 2008

60 nm and 20 nm thick hydrogenated amorphous silicon(a-Si:H) layers were deposited on 200 nm $SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by an e-beam evaporator. Finally, 30 nm-Ni/(60 nm and 20 nm) a-Si:H/200 nm-$SiO_2$/single-Si structures were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 40 sec. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy(FE-SEM), transmission electron microscopy(TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide from the 60 nm a-Si:H substrate showed low sheet resistance from $400^{\circ}C$ which is compatible for low temperature processing. The nickel silicide from 20 nm a-Si:H substrate showed low resistance from $300^{\circ}C$. Through HRXRD analysis, the phase transformation occurred with silicidation temperature without a-Si:H layer thickness dependence. With the result of FE-SEM and TEM, the nickel silicides from 60 nm a-Si:H substrate showed the microstructure of 60 nm-thick silicide layers with the residual silicon regime, while the ones from 20 nm a-Si:H formed 20 nm-thick uniform silicide layers. In case of SPM, the RMS value of nickel silicide layers increased as the silicidation temperature increased. Especially, the nickel silicide from 20 nm a-Si:H substrate showed the lowest RMS value of 0.75 at $300^{\circ}C$.

• Journal of Conservation Science
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• v.31 no.1
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• pp.37-46
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• 2015

In the case of adhesives & restoration agents currently being used for the preservation treatment of ceramics and earthenware, epoxy type, cellulose type and cellulose type are mainly being used. However, they are showing various problems such as re-detachment from severe contraction, color change from yellowing, work inconvenience of staining on tools and hand during usage and irreversibility. For the purpose of solving the issues of yellowing and irreversibility of epoxy resin being used to restore ceramics, urethane synthetic resin with low yellowing excellent reversibility has been developed in this study. The adhesive strength of urethane resin that has been developed has excellent properties with 2.07MPa for undiluted solution, which is 1.5 times higher than that of existing material EPO-$TEK301^{(R)}$ 1.21MPa. The result of workability measurement showed that the wear rate of urethane resin (in Talc 50wt%) was 1.09%, which was somewhat higher than that of existing material Quick $Wood^{(R)}$ (1.02%). In addition, its wear rate is two times higher than that of $EPO-TEK301^{(R)}$ (0.41%) and $L30^{(R)}$ (0.39%), thereby showing an advantage in its forming process compared to existing materials. As for the advantage of urethane resin of reversibility experiment, 12 hours after acetone, ethyl alcohol deposition, urethane resin and filler talc were dissolved 100% while showing powdering phenomenon. Compared to 0% reversibility of existing epoxy resin, it has much superior reversibility. The result of UV rays experiment to evaluate its durability showed that ${\Delta}E^*ab$ color change value based on undiluted solution of urethane resin was 2.76 before & after UV rays exposure, which was a decrease by about 7-20 times compared to that of existing resin, thereby minimizing the issue of heterogeneity.

• Korean Journal of Ichthyology
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• v.36 no.2
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• pp.120-128
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• 2024

In this study, the characteristics of the early life history were investigated for the Hypomesus nipponensis in the west coast Daeho Bay. Egg's were adhesive eggs that had the property of sinking in water in a circular shape. The size of mature eggs was 0.52~0.66 (average of 0.59±0.03, n=30) mm. The hatching time took 140 hours at a water temperature of 22~23℃. Immediately after hatching, the yolk sac larvae was 4.78~5.60 (average of 5.25±0.26, n=30) mm in total length, and the mouth and anus were not completely opened. On the 7 days after hatching, the preflexion larvae was 5.91~6.64 (6.32±0.21) mm in total length, and the mouth and anus were opened, and feeding activities were started. On the 25 days after hatching, the flexion larvae was 9.70~12.3 (10.2±0.63) mm in total length, and the end of the spine at the tail end began to bend upward. On the 42 days after hatching, the postflexion larvae was 14.1~18.8 (16.9±1.44) mm in total length, and the end of the spine at the tail was completely bent at 45°. On the 56 days after hatching, it reached the integer with 10 dorsal fins, 16 anal fins, 7 ventral fins, and 19 caudal fins. According to the study, there were spot-shaped melanophore vesicles under the pectoral fins during the incubation period, the different positions of the egg yolk compared to the battlefield, the deposition of melanophore vesicles on the back and under the body of the caudal part during the postflexion larvae period, and the absence of melanophore vesicles on the torso between the head and the starting point of the dorsal fin. It was distinguished from related species in that melanophore vesicles were deposited in one row from the back of the body to the caudal part during the juvenile period.