• 제목/요약/키워드: Deposition methods

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익산지역 대기에어로졸 중 수용성 이온성분의 계절별 침적 특성 (Seasonal Deposition Characteristics of Water-soluble Ion Species in Ambient Aerosol in Iksan City)

  • 강공언
    • 한국환경보건학회지
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    • 제39권1호
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    • pp.56-70
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    • 2013
  • Objectives: This paper aims to investigate the seasonal deposition characteristics of water-soluble ion species by comparing the deposition amount of two samples taken according to different sampling methods of deposition for ambient aerosol such as gases and particulate matters. Methods: Deposition samples were collected using two deposition gauges in the downtown area of Iksan City over approximately two weeks of each season in 2004. The type of deposition gauges consisted of two different sampling methods known as dry gauge and a wet gauge. The dry gauge was empty and used a dry PE bottle with an inlet diameter of 9.6 cm. Before the beginning of each deposition sampling, a volume of 30-50 ml distilled ionized water was added to the wet gauge to wet the bottom during the sampling period. Deposition samples were measured twice per day and analyzed for inorganic water-soluble ion species using ion chromatography. Results: The daily deposition amounts of all measured ions in the dry gauge and the wet gauge showed a significant increase when precipitation occurred, having no difference of deposition amount between in the wet gauge and in the dry gauge. By excluding two samples from rainy days during the sampling period, the mean daily deposition of all ions in dry gauge and wet gauge were $6.58mg/m^2/day$ and $18.16mg/m^2/day$, respectively. The mean deposition amounts of each ion species were higher in the wet gauge than in the dry gauge because of the surface difference of the sampling gauge, especially for $NH_4{^+}$ and ${SO_4}^{2-}$. The mean deposition amounts of $NH_4{^+}$ and ${SO_4}^{2-}$ in the wet gauge were found to be about 15.4 times and 5.2 times higher than that in dry gauge, with a pronounced difference between spring and summer, while the remaining ion species were 1.1-2.0 times higher in the wet gauge than in the dry gauge. Dominant species in the dry gauge were $Ca^{2+}$ and $NO_3{^-}$, accounting for 36.4% and 18.1% of the total ion deposition, whereas those in the wet gauge were $NH_4{^+}$ and ${SO_4}^{2-}$, accounting for 32.5% and 25.0% of the total ion deposition, respectively. Conclusion: The seasonal differences in deposition amounts of water-soluble ion species in ambient aerosol depending on the two types of different sampling methods were identified. This suggests that the removal of ambient aerosol is strongly influenced by the weather conditions of each season as well as the condition of earth's surface, such as dry ground and water.

초음파 풍속온도계를 이용한 $SO_2$건성침착속도의 계절변화 특징 (Seasonal Variations of $SO_2$Dry Deposition Velocity Obtained by Sonic Anemometer-Thermometer)

  • 이종범;박세영
    • 한국대기환경학회지
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    • 제14권5호
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    • pp.465-478
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    • 1998
  • In this study, seasonal variations of the dry deposition velocity and deposition flux for the sulfur dioxide were analysed. The field observation was performed during one year (from November 1, 1995 to October 31, 1996) in Chunchon basin. The turbulence data were measured by 3-dimensional sonic anemometer/thermometer, and were estimated by mean meteorological data obtained at two heights (2.5 m and 10 m) of meteorological tower. Also, the estimation methods were evaluated by comparing the turbulence data. The results showed that the estimated dry deposition velocity and turbulence parameter such as uc and sensible heat flux using mean meteorological data were relatively similar to the sonic measurements, but all showed somewhat large differences. The dry deposition velocity was large in summer and small in winter mainly due to canopy resistance (rc). The major factor which affects diurnal variation of the velocity was aerodynamic resistance (rw). The SO2 dry deposition flux was large in winter and small in summer in Chunchon.

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A STUDY ON THE DIMENSIONAL ACCURACY OF MODELS USING 3-DIMENSIONAL COMPUTER TOMOGRAPHY AND 2 RAPID PROTOTYPING METHODS

  • Cho Lee-Ra;Park Chan-Jin;Park In-Woo
    • 대한치과보철학회지
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    • 제39권6호
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    • pp.633-640
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    • 2001
  • Statement of problem. Relatively low success rate of root analogue implant system was supposed to be due to the time duration between extraction and implant installation. The use of three-dimensional computer tomography and the reconstruction of objects using rapid prototyping methods would be helpful to shorten this time. Purpose. This aim of this study was to evaluate the application possibility of the 3-dimensional computer tomography and the rapid prototyping to root analogue implants. Material and methods. Ten single rooted teeth were prepared. Width and height of the teeth were measured by the marking points. This was followed by CT scanning, data conversion and rapid prototyping model fabrication. 2 methods were used; fused deposition modelling and stereolithography. Same width and height of this models were measured and compared to the original tooth. Results. Fused deposition modelling showed an enlarged width and reduced height. The stereolithography showed more exact data compared with the fused deposition modelling. Smaller standard deviation were recorded in the stereolithographic method. Overall width error from tooth to rapid prototyping was 7.15% in fused deposition modelling and 0.2% in stereolithography. Overall height showed the tendency of reducing dimensions. Conclusion. From the results of this study, stereolithography seems to be very predictable method of fabricating root analogue implant.

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Annealing Effects of Laser Ablated PZT Films

  • Rhie, Dong-Hee;Jung, Jin-Hwee;Cho, Bong-Hee;Ryutaro Maeda
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.528-531
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    • 2000
  • Deposition of PZT with UV laser ablatio was applied for realization of thin film sensors and actuators. Deposition rate of more than 20nm/min was attained by pulsed KrF excimer laser deposition, which is fairly better than those obtained by the other methods. Perovskite phase was obtained at room temperature deposition with Fast Atom Beam(FAB) treatment and annealing. Smart MEMS(Micro electro-mechanical system) is now a suject of interest in the field of micro optical devices, micro pumps, AFM cantilever devices etc. It can be fabricated by deposition of PZT thin films and micromachining. PZT films of more than 1 micron thickness is difficult to obtain by conventional methods. This is the reason why we applied excimer laser ablation for thin film deposition. The remanent polarization Pr of 700nm PZT thin film was measured, and the relative dielectric constant was determined to about 900 and the dielectric loss tangent was also measured to be about 0.04. XRD analysis shows that, after annealing at 650 degrees C in 1 hour, the perovskite structure would be formed with some amount of pyrochlore phase, as is the case of the annealing at 750 degrees C in 1 hour.

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Latent fingerprint development from rubber gloves using MMD I (Multimetal deposition I)

  • An, Jaeyoung;Kim, Heesu;Oh, Jungmin;Han, Sooyong;Yu, Jeseol
    • 분석과학
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    • 제33권2호
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    • pp.108-114
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    • 2020
  • Gloves are very important evidence at a crime scene; specifically, rubber gloves can be found easily at homes. Therefore, crime scene investigators attempt to develop fingerprints inside the rubber gloves that are discovered, for identifying unknown suspects. This study compared the effectiveness of three different methods that are used for developing latent prints on gloves with aging time. These were the powder, cyanoacrylate fuming, and multi-metal deposition I methods. The powder method achieved good results for 1-3 days of aged prints, and the cyanoacrylate fuming method worked well on 2-week-old prints. In comparison, multi-metal deposition I method developed good quality fingerprints for 6 weeks of aging time.

비 제어 상태의 레이저 직접 금속성형공정에서 적층높이의 모델링 (Modeling of Deposition Height in the Uncontrolled Laser Aided Direct Metal Deposition Process)

  • 장윤상
    • 한국기계가공학회지
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    • 제7권4호
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    • pp.128-134
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    • 2008
  • Models of the deposition heights in the uncontrolled laser aided direct metal deposition process are constructed for the enhancement of the process integrity. Linear and non-linear statistical models as well as fuzzy model are utilized as the modeling methods. The predictability of the models are evaluated with the values of the sum of square error. The algorithm to use the models in the feedback controlled system is suggested to increase the deposition height accuracy within a layer.

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펄스레이저 증착법에 의해 성장된 ZnO 박막의 특성 관찰 (Investigating of the Properties of ZnO Film Synthesized by Pulsed Laser Deposition)

  • 최재완;지현진;정창욱;이보화;김규태
    • 한국전기전자재료학회논문지
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    • 제24권2호
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    • pp.108-111
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    • 2011
  • The semiconducting material of ZnO in II-VI group was well known as its good application for photo electronics, chemical sensors and field effect transistors due to the remarkable optical properties with wide energy band gap and great ionic reactivities. Up to now the growth of a good quality of ZnO film has been issued for better performances. Even though there were many deposition methods for making ZnO films, pulse laser deposition methods have been preferred for high crystalline films. In this report, the ZnO film was also created by pulsed laser deposition technique which also showed high crystalinity. By controlling several factors when deposited, it was investigated that the optimal condition for ZnO film formation. Mainly, oxygen partial pressures and growth temperatures were changed when ZnO films were synthesized and followed the characterization by HRXRD and AFM.

Nanoscale Fluoropolymer Pattern Fabrication by Capillary Force Lithography for Selective Deposition of Copper

  • 백장미;이린;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.369-369
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    • 2012
  • The present work deals with selective deposition of copper on fluoropolymers patterned silicon (111) surfaces. The pattern of fluoropolymer was fabricated by nanoimprint lithography (NIL) and plasma reactive ion etching (RIE) was used to remove the residuals layers. Copper was electrochemically deposited in bare Si regions which were not covered with fluoropolymers. The patterns of fluoropolymers and copper have been investigated by scanning electron microscopy (SEM). In this work, we used two deposition methods. One is galvanic displacement method and another is electrodeposition. Selective deposition works in both cases and it shows applicability to other materials. By optimization of the deposition conditions can be achieved therefore this process represents a simple approach for a direct high resolution patterning of silicon surfaces.

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Atomic layer deposition of In-Sb-Te Thin Films for PRAM Application

  • Lee, Eui-Bok;Ju, Byeong-Kwon;Kim, Yong-Tae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.132-132
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    • 2011
  • For the programming volume of PRAM, Ge2Sb2Te5(GST) thin films have been dominantly used and prepared by physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD). Among these methods, ALD is particularly considered as the most promising technique for the integration of PRAM because the ALD offers a superior conformality to PVD and CVD methods and a digital thickness control precisely to the atomic level since the film is deposited one atomic layer at a time. Meanwhile, although the IST has been already known as an optical data storage material, recently, it is known that the IST benefits multistate switching behavior, meaning that the IST-PRAM can be used for mutli-level coding, which is quite different and unique performance compared with the GST-PRAM. Therefore, it is necessary to investigate a possibility of the IST materials for the application of PRAM. So far there are many attempts to deposit the IST with MOCVD and PVD. However, it has not been reported that the IST can be deposited with the ALD method since the ALD reaction mechanism of metal organic precursors and the deposition parameters related with the ALD window are rarely known. Therefore, the main aim of this work is to demonstrate the ALD process for IST films with various precursors and the conformal filling of a nano size programming volume structure with the ALD?IST film for the integration. InSbTe (IST) thin films were deposited by ALD method with different precursors and deposition parameters and demonstrated conformal filling of the nano size programmable volume of cell structure for the integration of phase change random access memory (PRAM). The deposition rate and incubation time are 1.98 A/cycle and 25 cycle, respectively. The complete filling of nano size volume will be useful to fabricate the bottom contact type PRAM.

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화학기상증착법(CVD)을 이용한 진공 박막 공정기술 (Thin Film Vacuum Process Technology via Chemical Vapor Deposition Methods)

  • 홍완식
    • 진공이야기
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    • 제1권3호
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    • pp.9-13
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    • 2014
  • Vacuum growth of thin films via chemical vapor deposition (CVD) methods has been extensively used in modern semiconductor and flat panel display industries. The CVD processes have a wide range of variation and are categorized according to their working conditions, power sources, precursor materials, and so forth. Basic components and process steps common to all CVD branches are discussed. In addition, characteristics and applications of two major CVD techniques - LPCVD and PECVD - are reviewed briefly.