• Journal of the Korean Society for Marine Environment & Energy
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• v.15 no.1
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• pp.9-18
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• 2012

Annual power consumption of our country is positioned in the upper percentile in the world, and because the proportion of fossil power generation is high, which ranks the 10th $CO_2$ emission country. In this regard, government has established and is implementing the National Energy Basic Plan to realize to get out of fossilization in energy supply while focusing on securing the technology for renewable energy as well as its commercialization in order to reduce greenhouse gas. Resource recovery technology for deep seawater thermal energy which is one of renewable energies is newly getting attention domestically as well as in overseas for securing resources and environmental improvement as a core technology for multilateral use of marine resources for low carbon and green growth. Economic feasibility analysis was conducted for the research and development as follows on the use of ocean thermal energy conversion and seawater air conditioning. First, in the case of power generation using deep seawater and warm discharge water from ocean thermal energy conversion plant of 1MW level, it is judged that the economic feasibility is insufficient but the feasibility will be significantly improved if we consider not only power generation but also drinking water and certified emission reduction by developing the power plant to the size for commercialization. Second, the economic feasibility for the use of deep seawater as air conditioning for the power plant of 1,000RT level turned out to be very good. Especially, when we consider certified emission reduction, it will be possible to secure sufficient economic feasibility. When we use it in connection with ocean thermal energy conversion, water conversion and agricultural and fishery use, it is judged that economic ripple effect will be significant and therefore it will be necessary to conduct research and development for early commercialization, distribution and diffusion of deep seawater energy.

• Electrical & Electronic Materials
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• v.8 no.6
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• pp.752-758
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• 1995

Red emitting CaS:Eu,S electroluminescent(EL) device prepared at 550.deg. C by an electron-beam evaporation technique, demonstrated luminance of 175cd/m$\^$2/ and efficiency of 0.311m/W with 3kHz drive. Luminance was increased with the increase of applied voltage and frequency. From the results of the PL spectrum and the EL spectrum, the CaS:Eu, S device showed emission peak near 640nm resulted from the transition of EU$\^$2+/ 4f$\^$6/5d.rarw.4f$\^$7/. The capacitance of the phosphor layer from the Sawyer-Tower circuit was 10.5nF/cm$\^$2/.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.319-323
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• 2001

In order to investigate the effect of thickness on the properties of ZnO thin films, a series of films having different thickness were deposited on (0001) sapphire by using pulsed laser deposition(PLD). SEM and XRD analyses showed that, as the film thickness increases, the grain size increased and the crystallinity improved. Room-temperature PL spectra also exhibited that the intensities of both ultraviolet and deep level emission Peaks increased as the film thickness increased. Hall measurements at room- temperature revealed that, as the film thickness changes from 400 to 4000 , the carrier concentration of the film showed sharp decrease, which that of thicker film gradually saturated. Therefore, it is concluded that the strain due to the lattice mismatch between substrate and film is fully relaxed around the thickness of 4000 .

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.291.1-291.1
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• 2014

산화아연 박막은 아연이 코팅된 테프론 기판 위에 졸-겔 스핀코팅 방법을 이용하여 각기 다른 후열처리 온도에서 제작되었다. 산화아연 박막의 후열처리 온도에 따른 구조적, 광학적 특성은 field emission scanning electron microscopy (FE-SEM), X-ray diffractometer, and photoluminescence spectroscope를 이용하여 분석하였다. 후열처리 온도를 달리하여 성장한 모든 산화아연 박막은 수지상(dendrite) 구조를 가지고 있으며, 이 수지상 구조 위에 약 20 nm의 산화아연 입자들이 성장되었다. 후열처리 온도가 증가함에 따라 c-축 배향성이 우세하게 나타났으며, 인장응력도 증가하였다. 후열처리 온도 $400^{\circ}C$에서 Near-band-edge emission (NBE) 피크는 적색편이(red-shift) 하였고, 후열처리 온도가 증가함에 따라 deep-level emission (DLE) 피크의 세기는 감소하였다. 또한 $400^{\circ}C$의 후열처리 온도에서 NBE 피크의 반치폭(FWHM)이 가장 작았으며, INBE/IDLE의 비율이 가장 높았다. 따라서 $400^{\circ}C$의 후열처리 공정에 의해 결정성 및 광학적 특성이 가장 우수한 산화아연 박막을 얻을 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.83-83
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• 2011

본 연구에서는 p-type Si (100) 위에 분자선 에피택시 성장방법으로 ZnO 완충층이 삽입된 ZnO 박막을 성장시켰다. ZnO 완충층은 Zn 셀 셔터의 열림/닫힘을 반복하는 성장 멈춤법으로 성장되었다. Zn 셀 셔터의 열림 시간은 4분, 2분, 1분이며 닫힘 시간은 2분으로 동일하게 유지하였다. 이러한 과정은 각각 5, 10, 20회로 반복되었으며 ZnO 완충층을 성장한 후 ZnO 박막은 기존의 분자선 에피택시 방법으로 성장되었다. ZnO 박막의 구조적, 광학적 특성은 field-emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), photoluminescence (PL)로 조사하였다. SEM 측정결과 성장 멈춤 횟수가 증가함에 따라 ZnO 박막의 표면은 섬(island) 구조에서 미로(maze) 구조로 변화하였고, XRD 측정결과 full-width at half-maximum (FWHM) 이 감소하고 결정립 크기(grain size)가 증가하였다. 그리고 PL 측정결과 성장 멈춤 횟수가 증가함에 따라 near-band-edge emission (NBE) 피크의 세기가 증가하였고 deep-level emission (DLE) 피크의 위치는 오렌지 발광에서 녹색 발광으로 청색편이(blue-shift)하였다.

• The Journal of Engineering Geology
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• v.25 no.1
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• pp.1-8
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• 2015

Deep geological disposal is the preferred storage method for high-level radioactive waste, because it ensures stable long-term storage with minimal potential for human disruption. Because of the risk of groundwater contamination, a buffer of steel and bentonite layers has been proposed to prevent the leaching of radionuclides into groundwater. Quartz is one of the most common minerals in earth's crust. To understand how deformation and dissolution phenomena affect waste disposal, here we study quartz samples at pressure, temperature, and pH conditions typical of deep geological disposal sites. We perform a dissolution experiment for single quartz crystals under different pressure and temperature conditions. Solution samples are collected and the dissolution rate is calculated by analyzing Si concentrations in a solution excited by inductively coupled plasma-atomic emission spectroscopy (ICP-AES). After completing the dissolution experiment, deformation of the quartz sample surfaces is investigated with a confocal laser scanning microscope (CLSM). An empirical formula is introduced that describes the relationship between dissolution rate, pressure, and temperature. These results suggest that bentonite layers in engineering barrier systems may be vulnerable to thermal deformation, even when exposed to higher temperatures on relatively short timescales.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.50-50
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• 2008

ZnO has been extensively studied for optoelectronic applications such as blue and ultraviolet (UV) light emitters and detectors, because it has a wide band gap (3.37 eV) anda large exciton binding energy of ~60 meV over GaN (~26 meV). However, the fabrication of the light emitting devices using ZnO homojunctions is suffered from the lack of reproducibility of the p-type ZnO with high hall concentration and mobility. Thus, the ZnO-based p-n heterojunction light emitting diode (LED) using p-Si and p-GaN would be expected to exhibit stable device performance compared to the homojunction LED. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducibleavailability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices with low defect density. However, the electroluminescence (EL) of the device using n-ZnO/p-GaN heterojunctions shows the blue and greenish emissions, which are attributed to the emission from the p-GaN and deep-level defects. In this work, the n-ZnO:Ga/p-GaN:Mg heterojunction light emitting diodes (LEDs) were fabricated at different growth temperatures and carrier concentrations in the n-type region. The effects of the growth temperature and carrier concentration on the electrical and emission properties were investigated. The I-V and the EL results showed that the device performance of the heterostructure LEDs, such as turn-on voltage and true ultraviolet emission, developed through the insertion of a thin intrinsic layer between n-ZnO:Ga and p-GaN:Mg. This observation was attributed to a lowering of the energy barriers for the supply of electrons and holes into intrinsic ZnO, and recombination in the intrinsic ZnO with the absence of deep level emission.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.420-420
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• 2012

ZnO seed layer were deposited on quartz substrate by sol-gel method and prism-like Al-doped ZnO nanorods (AZO nanorods) were grown on ZnO seed layer by hydrothermal method with various Al concentration ranging from 0 to 2.0 at.%. Structural and optical properties of the AZO nanorods were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), photoluminescence (PL). The diameter of the AZO nanorods was smaller than undoped ZnO nanorods and its diameter of the AZO nanorods decreased with increasing Al concentration. In XRD spectrum, it was observed that stress and full width at half maximum (FWHM) of the AZO nanorods decreased and the 'c' lattice constant increased as the Al concentration increased. From undoped ZnO nanorods, it was observed that the green-red emission peak of deep-level emission (DLE) in PL spectra. However, after Al doping, not only a broad green emission peak but also a blue emission peak of DLE were observed.

• Journal of the Korean Vacuum Society
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• v.19 no.6
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• pp.483-488
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• 2010

ZnO nano-fibrous thin films with various precursor concentrations ranging from 0.2 to 1.0 mol (M) were grown by spin-coating method and effects of the precursor concentration on surface and optical properties of the ZnO nano-ribrous thin films were investigated by using scanning electron microscopy (SEM) and photoluminescence (PL). ZnO nuclei were formed at the precursor concentration below 0.4 M and the ZnO nano-fibrous thin films were grown at the precursor concentration above 0.6 M. Further increase in the precursor concentration, the thickness of the ZnO nano-fibrous thin films is gradually increased. The intensity and the full-width at half-maximum (FWHM) of the near-band-edge emission (NBE) is increased as the precursor concentration is increased. The deep-level emission (DLE) is red-shifted as the precursor concentration is increased.

• Proceedings of the IEEK Conference
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• 2004.06b
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• pp.501-504
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• 2004

High quality GaN layer was obtained on 0001 sapphire substrate using ammonia($NH_3$) as a nitrogen source by gas source molecular beam epitaxy. As a result, RHEED is used to investigate the relaxation processes which take place during the growth of GaN. In-situ RHEED(reflection high electron energy diffraction) appeared streaky-like pattern. The full Width at half maximum of the x-ray diffraction(FWHM) rocking curve measured from plane of GaN has exhibited as narrow as 8arcmin and surface roughness was 7.83nm. Photoluminescence measurement of GaN was investigated at room temperature, where the intensity of the band edge emission is much stronger than that of deep level emission. The GaN epitaxy layer according to various growth condition was investigated.